专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US4414196A Method of producing single crystalline, acicular .alpha.-ferric oxide 失效
标题翻译：单晶针状α-氧化铁的制备方法
公开(公告)号：US4414196A
公开(公告)日：1983-11-08
申请号：US322666
申请日：1981-11-18
申请人： Seiji Matsumoto , Tadashi Koga , Kiyoshi Fukai , Hideji Yamamoto
发明人： Seiji Matsumoto , Tadashi Koga , Kiyoshi Fukai , Hideji Yamamoto
IPC分类号： C01G49/06 , C30B7/00 , G11B5/706 , H01F1/11
CPC分类号： G11B5/70642 , C01G49/06 , C30B29/16 , C30B29/62 , C30B7/00 , C01P2004/10 , C01P2004/51 , C01P2004/62
摘要： A method of producing single crystalline, acicular .alpha.-ferric oxide particles of narrow particle size distribution is provided. The method comprises heating an aqueous suspension of ferric hydroxide at temperatures of 100.degree.-250.degree. C. at an alkaline pH in the presence both a water soluble organic or inorganic compound capable of forming complexes with iron as a growth regulating agent and .alpha.-ferric oxide seed crystals of minor axes not larger than 0.4 microns in average in amounts of 0.1-25 mole % in terms of the Fe content thereof in relation to the ferric hydroxide.
摘要翻译：提供了一种制备窄粒度分布的单晶，针状α-氧化铁颗粒的方法。该方法包括在碱性pH下在100-250℃的温度下加热氢氧化铁的水性悬浮液，同时存在能够与铁形成络合物的水溶性有机或无机化合物作为生长调节剂和α铁平均相对于氢氧化铁的Fe含量为0.1〜25摩尔％的小于0.4微米的短轴的氧化物晶种。

2. 发明授权

US5569445A Fine acicular .alpha.-ferric oxide and production thereof 失效
标题翻译：细针状α-氧化铁及其生产
公开(公告)号：US5569445A
公开(公告)日：1996-10-29
申请号：US368203
申请日：1994-12-29
申请人： Yoshiki Fukatsu , Shinji Nakahara , Youichi Yamada , Hideji Yamamoto , Tatsuya Hida , Mizuho Wada
发明人： Yoshiki Fukatsu , Shinji Nakahara , Youichi Yamada , Hideji Yamamoto , Tatsuya Hida , Mizuho Wada
IPC分类号： C01G49/06 , G11B5/706 , G11B5/708 , C01G49/02
CPC分类号： G11B5/70642 , C01G49/06 , G11B5/70615 , G11B5/708 , C01P2002/10 , C01P2002/70 , C01P2004/03 , C01P2004/10 , C01P2004/54 , C01P2004/62 , C01P2006/12 , C01P2006/42
摘要： Disclosed herein is fine acicular .alpha.-ferric oxide which has the crystallite diameter (D.sub.1014) in the direction perpendicular to the (1014) plane and the crystallite diameter (D.sub.1120) in the direction perpendicular to the (1120) plane such that their ratio D.sub.1014 /D.sub.1120 is in the range of 1-2, and also has a specific surface area of 40-50 m.sup.2 g. Disclosed also herein is fine acicular .alpha.-ferric oxide which has the crystallite diameter (D.sub.1014) in the direction perpendicular to the (1014) plane and the crystallite diameter (D.sub.1120) in the direction perpendicular to the (1120) plane such that their ratio D.sub.1014 /D.sub.1120 is the range of 1-2, and also has an average aspect ratio of 10-15 and a specific surface area of 20-40 m.sup.2 /g. They are produced by wet process including the step of hydrothermal reaction.
摘要翻译：本文公开了在垂直于（10 + E，ovs 1 + EE 4）面的方向上具有微晶直径（D10 + E，ov1 + EE4）的细针状α-氧化铁和微晶直径（D11 + E，ovs 2 + EE 0）在垂直于（11 + E，ovs 2 + EE 0）平面的方向上使得它们的比率D10 + E，ov1 + EE4 / D11 + E，ov2 + EE0 在1-2的范围内，还具有40-50m 2 g的比表面积。此处还公开了在垂直于（10 + E，ovs 1 + EE 4）面和微晶直径（D11）的方向上具有微晶直径（D10 + E，ov1 + EE4）的精细针状α-氧化铁 + E，ovs 2 + EE 0）在垂直于（11 + E，ovs 2 + EE 0）平面的方向上使得它们的比率D10 + E，ov1 + EE4 / D11 + E，ov2 + EE0 为1-2的范围，平均纵横比为10-15，比表面积为20-40m 2 / g。它们通过湿法制备，包括水热反应步骤。

3. 发明授权

US4664767A Plasma treating method and apparatus therefor 失效
标题翻译：等离子体处理方法及其设备
公开(公告)号：US4664767A
公开(公告)日：1987-05-12
申请号：US741526
申请日：1985-06-05
申请人： Katsuyoshi Kudo , Katsuaki Nagatomo , Hideji Yamamoto , Katsuyasu Nishita , Yoshifumi Ogawa
发明人： Katsuyoshi Kudo , Katsuaki Nagatomo , Hideji Yamamoto , Katsuyasu Nishita , Yoshifumi Ogawa
IPC分类号： C23F1/00 , B01J19/08 , B29C59/14 , H01J37/32 , B05D3/14
CPC分类号： H01J37/32935 , B01J19/088 , B29C59/14 , B29C2037/90
摘要： Herein disclosed are a plasma treating method and an apparatus therefor. The plasma treating method comprises: the step of monitoring the energies of plasmas corresponding to the faces of a plurality of samples to be treated; the step of adjusting to equalize the energies of said plasmas on the basis of the monitored values; and the step simultaneously treating said samples with the plasmas having said equalized energies. The plasma treating apparatus comprises: a plurality of sample electrodes disposed independently of one another in positions opposed to an opposed electrode in a treating chamber evacuated to be supplied with a treating gas; power supply means for applying and adjusting electric power to said sample electrodes; and monitor means for monitoring the energies of plasmas to be generated between said opposed electrode and said sample electrodes. The electric power to be applied independently of one another from a power supply to the independently formed plural sample electrodes are adjusted such that the energies of the plasmas to be generated between the opposed electrode and the sample electrodes are equalized, whereby the energy of the plasma corresponding to the respective treated faces of the plural samples are equalized so that the uniformity of the treatment of the respective faces of the plural samples to be simultaneously treated can be improved.
摘要翻译：这里公开了一种等离子体处理方法及其装置。等离子体处理方法包括：监测与待处理的多个样品的面对应的等离子体的能量的步骤; 基于所监测的值调整所述等离子体的能量的步骤; 以及用具有所述均衡能的等离子体同时处理所述样品的步骤。等离子体处理装置包括：多个样品电极，彼此独立地设置在处理室中的与相对电极相对的位置，所述处理室被排出以供应处理气体; 用于对所述样品电极施加和调整电力的电源装置; 以及用于监测在所述相对电极和所述样品电极之间产生的等离子体能量的监视装置。调节从电源向独立形成的多个样品电极彼此独立施加的电力，使得在相对电极和样品电极之间产生的等离子体的能量相等，由此等离子体的能量对应于多个样品的各个处理面相对应，可以提高要同时处理的多个样品的各个面的处理的均匀性。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式