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    • 5. 发明申请
    • DATA-DRIVEN DATABASE PROCESSOR
    • 数据驱动数据库处理器
    • US20110010402A1
    • 2011-01-13
    • US12812016
    • 2008-12-24
    • Ken TakeuchiYuji TakeuchiTakahiro Yodo
    • Ken TakeuchiYuji TakeuchiTakahiro Yodo
    • G06F7/00
    • G06F17/3051G06F17/30371G06F17/30595
    • Provided is a technique for a data-driven database which frees a user from having to be conscious of a sequence in which instructions of a program for accessing a database are described, an interrelation of data items, and the like, and from having to describe redundant instructions. A data-driven database processor includes: schema definition storage means 2 for storing a schema definition of a database 24; derived definition storage means 3 for storing a derived definition describing a cause-and-effect relationship that exists when a value of a given data item is derived from a value of another data item; derived definition processing means 26 for generating a trigger program 27 that makes a chain of changes to values of data items based on the cause-and-effect relationship described in the derived definition; and a database management system 23 for executing the trigger program 27 when a change is made to the other data item that affects the value of the given data item.
    • 提供了一种用于数据驱动数据库的技术,其释放用户不必意识到描述用于访问数据库的程序的指令,数据项的相关性等的序列,并且不必描述 冗余指令。 数据驱动数据库处理器包括:用于存储数据库24的模式定义的模式定义存储装置2; 派生定义存储装置3,用于存储描述当从另一数据项的值导出给定数据项的值时存在的因果关系的派生定义; 导出定义处理装置26,用于基于导出的定义中描述的因果关系,产生触发程序27,触发程序27使数据项的值变化链; 以及数据库管理系统23,用于当对影响给定数据项的值的其他数据项进行改变时,执行触发程序27。
    • 6. 发明授权
    • Nonvolatile semiconductor memory
    • 非易失性半导体存储器
    • US07595522B2
    • 2009-09-29
    • US11565822
    • 2006-12-01
    • Yuji Takeuchi
    • Yuji Takeuchi
    • H01L27/108H01L29/76H01L29/94H01L31/119
    • H01L29/42336H01L27/115H01L27/11521
    • According to the invention, there is provided a nonvolatile semiconductor memory having: a floating gate electrode formed on a gate insulating film on an element region isolated by an element isolation region on a semiconductor substrate; an inter-gate insulating film formed to cover a portion from an upper surface to a middle of a side surface of the floating gate electrode; and a control gate electrode formed on the floating gate electrode via the inter-gate insulating film, wherein a portion from the upper surface of the floating gate electrode to at least a middle of the portion of the side surface which is covered with the inter-gate insulating film has a tapered shape largely inclined to a direction perpendicular to a surface of the semiconductor substrate, compared to the other portion of the side surface.
    • 根据本发明,提供了一种非易失性半导体存储器,其具有:形成在由半导体衬底上的元件隔离区域隔离的元件区域上的栅极绝缘膜上的浮栅电极; 形成为覆盖从所述浮栅电极的侧面的上表面到中间的部分的栅极间绝缘膜; 以及通过所述栅极间绝缘膜形成在所述浮栅上的控制栅电极,其中,从所述浮栅电极的上表面到所述侧表面的所述部分的至少中间的部分, 与侧面的其他部分相比,栅极绝缘膜具有大致倾斜于垂直于半导体衬底的表面的方向的锥形形状。
    • 8. 发明申请
    • SEMICONDUCTOR MEMORY
    • 半导体存储器
    • US20080290396A1
    • 2008-11-27
    • US12125546
    • 2008-05-22
    • Yasuhiko MATSUNAGAYuji TakeuchiTakashi Shigeoka
    • Yasuhiko MATSUNAGAYuji TakeuchiTakashi Shigeoka
    • H01L29/00
    • H01L27/105H01L27/0207H01L27/11519H01L27/11526H01L27/11529
    • A semiconductor memory according to an aspect of this invention comprises a semiconductor substrate which includes a memory cell array region and an interconnect line region adjoining the memory cell array region, memory cells which are provided in the memory cell array region, contact plugs which are provided in the interconnect line region, and control gate lines which are provided so as to extend from the interconnect line region to the memory cell array region and which connect the contact plugs with the memory cells, wherein the control gate lines provided in the memory cell array region include metal silicide and the control gate lines provided in the interconnect line region include no metal silicide at any part of the interconnect line region.
    • 根据本发明的一个方面的半导体存储器包括半导体衬底,其包括存储单元阵列区域和与存储单元阵列区域相邻的互连线区域,设置在存储单元阵列区域中的存储单元,提供的接触插头 以及控制栅极线,其设置为从互连线区域延伸到存储单元阵列区域,并将接触插头与存储器单元连接,其中设置在存储单元阵列中的控制栅极线 区域包括金属硅化物,并且设置在互连线区域中的控制栅极线在互连线区域的任何部分不包括金属硅化物。