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    • 2. 发明专利
    • Shield plate for ion beam etching
    • 用于离子束蚀刻的屏蔽板
    • JP2012021793A
    • 2012-02-02
    • JP2010157658
    • 2010-07-12
    • Sumitomo Electric Ind Ltd住友電気工業株式会社
    • NAKAMURA MOTONORIFUJIOKA HIROYUKIMATSUKAWA SHINJI
    • G01N1/28H01J37/305
    • PROBLEM TO BE SOLVED: To provide an easily reusable long-life shield plate, for use in preparing a sectional observation sample by etching with an ion beam, to give shielding against the ion beam without necessitating flattening of sides even when no usable edge face remains after repeated use.SOLUTION: A shield plate for shielding, in preparing a sectional observation sample by irradiation with an ion beam, the top face of the sample against the ion beam is prismatic in shape, has on a flank thereof an edge that makes possible mirror polishing of the sample by irradiation with the ion beam, and has a plurality of shielding members whose thickness in a direction orthogonal to the flank is not smaller than the diameter of the ion beam radiation and that are so formed integrally that the under faces form a flat shape or the shielding members and holding members that hold the shielding members are integrated.
    • 要解决的问题:为了提供一种易于重复使用的长寿命的屏蔽板,用于通过用离子束蚀刻来制备截面观察样品,以便在不需要侧面的情况下对侧离子束进行屏蔽而不需要平坦化 重复使用后,边缘面仍然残留。 解决方案:一种用于屏蔽屏蔽板,在通过照射离子束来制备截面观察样品时,样品的顶面抵靠离子束的形状是棱柱形的,其侧面具有使得可能的镜面 通过用离子束照射来研磨样品,并且具有多个屏蔽构件,其厚度在垂直于侧面的方向上不小于离子束辐射的直径,并且整体形成为下表面形成的 平板形状或将屏蔽部件保持的屏蔽部件和保持部件一体化。 版权所有(C)2012,JPO&INPIT
    • 4. 发明专利
    • Method and instrument for measuring electronic spectrum
    • 用于测量电子光谱的方法和仪器
    • JP2010281710A
    • 2010-12-16
    • JP2009135778
    • 2009-06-05
    • Sumitomo Electric Ind Ltd住友電気工業株式会社
    • NAKAMURA MOTONORIKIMURA ATSUSHI
    • G01N23/225H01J37/317
    • PROBLEM TO BE SOLVED: To provide an electronic spectrum measuring method and a measuring instrument which can accurately obtain not only a total amount of a secondary electron to be produced when irradiating a sample with an ion beam, but detailed energy information of the secondary electron to detect as an electronic spectrum, and accurately grasping secondary electron emission characteristics of the sample. SOLUTION: There is provided an electronic spectrum measuring method and the measuring instrument used for the same. The electronic spectrum measuring method includes processes of: selecting ion beam irradiation requirements which practically do not change a surface condition of a measurement sample; irradiating the measurement sample with the ion beam on the basis of the ion beam irradiation requirements selected in the irradiation requirements selection step; and measuring a secondary electronic spectrum emitted from the measurement sample by ion beam irradiation, using a coaxial cylindrical mirror energy analyzer installed in a direction different from an ion beam irradiation axis. COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:提供一种电子光谱测量方法和测量仪器,其可以精确地获得当用离子束照射样品时将产生的二次电子的总量,但是详细的能量信息 二次电子作为电子光谱检测,并准确掌握样品的二次电子发射特性。

      解决方案:提供了一种电子光谱测量方法和用于其的测量仪器。 电子光谱测量方法包括以下处理:选择实际上不改变测量样品的表面状态的离子束照射要求; 基于在照射要求选择步骤中选择的离子束照射要求,用离子束照射测量样品; 以及使用安装在与离子束照射轴不同的方向上的同轴圆柱镜镜能量分析器,通过离子束照射来测量从测量样品发射的次级电子光谱。 版权所有(C)2011,JPO&INPIT

    • 5. 发明专利
    • Sample analysis method
    • 样本分析方法
    • JP2010256095A
    • 2010-11-11
    • JP2009104559
    • 2009-04-22
    • Sumitomo Electric Ind Ltd住友電気工業株式会社
    • UMEMOTO TOKIKOHANAFUSA MASASHINAKAMURA MOTONORI
    • G01N23/225G01N23/227
    • PROBLEM TO BE SOLVED: To provide a sample analysis method which enables the proper observation or analysis of a sample by suppressing the charge of the sample without forming a conductive film to the sample.
      SOLUTION: The sample analysis method is provided for analysis of the electrons emitted from the sample associated with the irradiation of the sample with radiation. The method includes a step of irradiating the sample with a neutral atomic beam or ion beam, and a step of irradiating the sample with radiation after the irradiation of the sample with the neutral atomic beam or ion beam and analyzing the electrons from the sample. By this sample analysis method, even if the observation surface of the sample is not coated with the conductive film, the occurrence of an abnormal analysis results associated with the charge of the sample can be avoided.
      COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:提供一种样品分析方法,其能够通过抑制样品的电荷而不对样品形成导电膜来适当地观察或分析样品。 解决方案:提供样品分析方法,用于分析从辐射与样品照射相关的样品发射的电子。 该方法包括用中性原子束或离子束照射样品的步骤,以及在用中性原子束或离子束照射样品并分析来自样品的电子之后,用辐射照射样品的步骤。 通过该样本分析方法,即使样品的观察面没有被导电膜覆盖,也可以避免与样品的电荷相关的异常分析结果的发生。 版权所有(C)2011,JPO&INPIT
    • 9. 发明专利
    • Porous glass material and method of producing glass base material
    • 多孔玻璃材料和生产玻璃基材料的方法
    • JP2014047131A
    • 2014-03-17
    • JP2012194502
    • 2012-09-04
    • Sumitomo Electric Ind Ltd住友電気工業株式会社
    • ITO TERUHIKOISHIHARA TOMOHIRONAKAMURA MOTONORIKUBO YUGO
    • C03B37/018C03B8/04
    • PROBLEM TO BE SOLVED: To provide a high-quality porous glass material with variation of porosity reduced as low as possible and a method of producing a glass base material.SOLUTION: A porous glass material G has two or more deposition layers 12 of glass particulate deposited in a layer form on a glass rod 11 by reciprocating relatively a burner for synthesis of glass particulate and the glass rod 11. The porosity K within the deposition layers 12 is 40-90% and is tapered from the center to the outer periphery of the layers in the radial direction. The configuration can reduce cracking of the deposit in a step of depositing glass particulate on a starting material and the probability of occurrence of residual bubbles in a heating sintering step of heating to obtain a transparent glass base material.
    • 要解决的问题:提供尽可能低的孔隙率变化的高品质多孔玻璃材料和玻璃基材的制造方法。解决方案:多孔玻璃材料G具有两个或更多个玻璃颗粒的沉积层12 通过相对于玻璃颗粒和玻璃棒11的合成燃烧器往复运动而以玻璃棒11的形式沉积。沉积层12内的孔隙率K为40-90%,并且从中心到外周渐缩 层的径向。 通过在加热烧结工序中产生玻璃粒子的原料的残留气泡的发生概率和透明玻璃基材的加热烧结工序中,能够减少沉积物的龟裂。
    • 10. 发明专利
    • Magnesium alloy sheet
    • 镁合金板
    • JP2012041637A
    • 2012-03-01
    • JP2011211483
    • 2011-09-27
    • Sumitomo Electric Ind Ltd住友電気工業株式会社
    • INOUE RYUICHIKAWABE NOZOMIMORI NOBUYUKINUMANO MASASADAMATSUMOTO JUNICHINAKAMURA MOTONORINISHIZAWA MASAYUKIKIMURA ATSUSHIOISHI YUKIHIRO
    • C22C23/00B21B3/00B21D22/20C22C23/02C22C23/04C22C23/06C22F1/00C22F1/06
    • C22C23/04C22C23/00C22C23/02C22F1/06
    • PROBLEM TO BE SOLVED: To provide a magnesium alloy sheet excellent in warm plastic formability, a production method thereof, and a formed body produced by performing the warm plastic forming on this sheet.SOLUTION: The magnesium alloy sheet is produced by giving a prescribed strain to a rolled sheet RS that is not subjected to a heat treatment aiming at recrystallization and by not subjecting the rolled steel sheet RS to the heat treatment after the giving of the strain. The strain is given in such a way that: the rolled sheet RS is heated in a heating furnace 10; the heated rolled sheet RS is passed between heated rollers 21 to give bending to the rolled sheet RS; and the strain-given sheet has a half peak width of 0.2 deg or more and 0.59 deg or less in a (0004) diffraction peak in a monochromatic X-ray diffraction. The alloy sheet forms continuous recrystallization during warm plastic forming through the use of the remaining strain, thereby exhibiting high plastic deformability.
    • 要解决的问题:提供一种具有优异的耐热塑性成形性的镁合金板,其制造方法以及通过在该片上进行热塑性成形制成的成形体。 解决方案:镁合金板是通过对未进行再结晶的热处理的轧制板RS给出规定的应变,并且在给出轧制板RS之后不对轧制钢板RS进行热处理 应变。 该应变以如下方式给出:轧制板RS在加热炉10中加热; 加热后的轧制板RS在加热辊21之间通过,使轧制板RS弯曲; 并且在单色X射线衍射中的(0004)衍射峰中,应变给定片具有0.2度以上且0.59度以下的半峰宽。 通过使用剩余的应变,合金板在温热塑性成形期间形成连续的再结晶,从而表现出高的塑性变形性。 版权所有(C)2012,JPO&INPIT