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1. 发明申请

US20070258061A1 System and method for using a two part cover and a box for protecting a reticle 有权
标题翻译：使用两部分覆盖物和保护掩模版的盒子的系统和方法
公开(公告)号：US20070258061A1
公开(公告)日：2007-11-08
申请号：US11785548
申请日：2007-04-18
申请人： Santiago Puerto , Erik Loopstra , Andrew Massar , Duane Kish , Abdullah Alikhan , Woodrow Olson , Jonathan Feroce
发明人： Santiago Puerto , Erik Loopstra , Andrew Massar , Duane Kish , Abdullah Alikhan , Woodrow Olson , Jonathan Feroce
IPC分类号： G03B27/42
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/62 , G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983 , G03F9/7011 , H01L21/67353 , H01L21/67359 , Y10S414/135
摘要： Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
摘要翻译：描述了保护面罩免受空气传播颗粒污染的系统和方法。这些系统和方法包括提供固定在两部分覆盖物中的掩模版。两部分盖子包括一个可拆卸的保护装置，用于保护光罩免受污染。盖可以保持在可以用于将盖通过光刻系统从大气部分输送到真空部分的盒或盒中。在真空部分中，可移动的盖可以在曝光过程中移动，在曝光过程期间可以在晶片上形成掩模版上的图案。

2. 发明申请

US20060087639A1 System and method for using a two part cover for and a box for protecting a reticle 有权
标题翻译：使用两部分盖子和盒子保护标线的系统和方法
公开(公告)号：US20060087639A1
公开(公告)日：2006-04-27
申请号：US11299787
申请日：2005-12-13
申请人： Santiago Puerto , Erik Loopstra , Andrew Massar , Duane Kish , Abdullah Alikhan , Woodrow Olson , Jonathan Feroce
发明人： Santiago Puerto , Erik Loopstra , Andrew Massar , Duane Kish , Abdullah Alikhan , Woodrow Olson , Jonathan Feroce
IPC分类号： G03B27/62
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/62 , G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983 , G03F9/7011 , H01L21/67353 , H01L21/67359 , Y10S414/135
摘要： A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
摘要翻译：使用系统和方法来保护面罩免受空气传播的颗粒污染。它们包括提供固定在两部分覆盖物中的掩模版。两部分盖子包括一个可拆卸的保护装置，用于保护光罩免受污染。盖可以保持在可以用于将盖通过光刻系统从大气部分输送到真空部分的盒或盒中。在真空部分中，可移动的盖可以在曝光过程中移动，在曝光过程期间可以在晶片上形成掩模版上的图案。

3. 发明申请

US20070263201A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070263201A1
公开(公告)日：2007-11-15
申请号：US11433767
申请日：2006-05-15
申请人： Erik Loopstra , Joost Ottens
发明人： Erik Loopstra , Joost Ottens
IPC分类号： G03B27/58
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/707
摘要： An article support constructed to support an article for lithographic processing purposes is disclosed. The article support includes a channel configuration arranged to guide thermally stabilizing media in the article support to provide thermal stabilization to the article, wherein the channel configuration comprises an input channel structure and an output channel structure, the input and output channel structures arranged in a nested configuration and connected to each other by a fine grid structure provided at or near a surface of the article support. A lithographic apparatus and device manufacturing incorporating the article support is also disclosed.
摘要翻译：公开了一种用于支撑用于光刻处理目的的物品的物品支撑。物品支撑件包括布置成引导物品支撑件中的热稳定剂介质以向物品提供热稳定性的通道配置，其中通道配置包括输入通道结构和输出通道结构，输入和输出通道结构布置成嵌套配置并且通过设置在物品支撑件的表面处或附近的细格栅结构彼此连接。还公开了并入物品支撑件的光刻设备和设备制造。

4. 发明申请

US20070247605A1 Optical element for correction of aberration, and a lithographic apparatus comprising same 有权
标题翻译：用于校正像差的光学元件，以及包括其的光刻设备
公开(公告)号：US20070247605A1
公开(公告)日：2007-10-25
申请号：US11410282
申请日：2006-04-25
申请人： Erik Loopstra , Paul Graupner , Johannes Mulkens
发明人： Erik Loopstra , Paul Graupner , Johannes Mulkens
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G02B27/0068 , G03F7/70266
摘要： An optical element for correcting aberrations in an optical apparatus has a casing. The casing is filled with liquid and has a support layer and a cover layer designed to pass light of a predetermined wavelength range. The casing accommodates several actuators. Each actuator has a first end supporting the cover layer and a second end supporting the support layer. Each actuator is able to locally change a local distance between the support layer and the cover layer to correct for local aberrations in a light beam directed to the optical element by providing local phase shifts. The optical element may be used in a lithographic apparatus.
摘要翻译：用于校正光学装置中的像差的光学元件具有壳体。壳体充满液体并具有支撑层和设计成使预定波长范围的光通过的覆盖层。外壳容纳几个执行器。每个致动器具有支撑覆盖层的第一端和支撑支撑层的第二端。每个致动器能够局部地改变支撑层和覆盖层之间的局部距离，以通过提供局部相移来校正指向光学元件的光束中的局部像差。光学元件可以用在光刻设备中。

5. 发明申请

US20070216881A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070216881A1
公开(公告)日：2007-09-20
申请号：US11377636
申请日：2006-03-17
申请人： Harmen Van Der Schoot , Erik Loopstra , Fransicus Jacobs , Godfried Franciscus Geelen
发明人： Harmen Van Der Schoot , Erik Loopstra , Fransicus Jacobs , Godfried Franciscus Geelen
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/70341 , G03F7/70716 , G03F7/70733
摘要： A moveable member is provided which extends the top surface of a substrate table, in plan, beyond a bumper which protects the substrate table during collision. The moveable member may be retracted to a retracted position in which it no longer extends beyond the bumper. In this way it is possible to move two substrate tables together and to allow the retractable member to pass under a liquid supply system which normally provides liquid between the projection system and a substrate without turning off of the liquid supply system.
摘要翻译：提供了可移动构件，其以平面方式延伸衬底台的顶表面超过在碰撞期间保护衬底台的保险杠。可移动构件可以缩回到缩回位置，在缩回位置，其不再延伸超过保险杠。以这种方式，可以将两个基板台移动到一起，并允许可伸缩构件在液体供应系统之下通过，该液体供应系统通常在投影系统和基板之间提供液体而不关闭液体供应系统。

6. 发明申请

US20070159616A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US20070159616A1
公开(公告)日：2007-07-12
申请号：US10894367
申请日：2004-07-20
申请人： Bastiaan Lambertus Van De Ven , Gert-Jan Heerens , Robert Lansbergen , Martinus Leenders , Erik Loopstra
发明人： Bastiaan Lambertus Van De Ven , Gert-Jan Heerens , Robert Lansbergen , Martinus Leenders , Erik Loopstra
IPC分类号： G03B27/62
CPC分类号： G03F7/707 , G03F7/70716 , G03F7/70741 , G03F7/70783 , G03F7/70825 , G03F7/709
摘要： The invention pertains to a lithographic apparatus that includes a docking system for positioning a patterning device, such as a reticle, relative to the reticle stage. The lithographic projection apparatus has an operational cycle that includes a projection phase, in which the reticle stage carries the patterning device and an exchange phase, in which the patterning device is exchanged and the docking system positions the patterning device relative to the reticle stage. The docking system is configured to be spaced from the patterning device during the projection phase in order to ensure that a higher accuracy of the projected image is obtained.
摘要翻译：本发明涉及一种光刻设备，其包括用于相对于标线片台定位图案形成装置（例如掩模版）的对接系统。光刻投影设备具有包括投影相的操作周期，其中标线片载物台承载图案形成装置和交换相，其中图案形成装置被更换，并且对接系统相对于掩模版台定位图案形成装置。对接系统被配置为在投影阶段与图案形成装置间隔开，以便确保获得更高的投影图像精度。

7. 发明申请

US20070139629A1 Lithographic apparatus and method for manufacturing a device 有权
标题翻译：光刻设备及其制造方法
公开(公告)号：US20070139629A1
公开(公告)日：2007-06-21
申请号：US11312660
申请日：2005-12-21
申请人： Timotheus Sengers , Nicolaas Johannes Van Asten , Wilhelmus Box , Tjarko Van Empel , Leon Levasier , Erik Loopstra , Marcel Hubertus Muitjens , Luberthus Ouwehand , Leon Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
发明人： Timotheus Sengers , Nicolaas Johannes Van Asten , Wilhelmus Box , Tjarko Van Empel , Leon Levasier , Erik Loopstra , Marcel Hubertus Muitjens , Luberthus Ouwehand , Leon Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
IPC分类号： G03B27/42
CPC分类号： G03F7/70883 , G03F7/7075 , G03F7/70858 , G03F9/7011 , G03F9/7034
摘要： A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.
摘要翻译：公开了一种光刻设备。该装置包括构造成保持基板的基板台。衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。该装置还包括测量系统，其被配置为当衬底台将衬底保持在测量位置时，测量衬底的至少一个方面或特征。测量系统被配置为将至少一个测量光束和/或场朝向衬底的表面引导。投影系统被配置为当衬底台将衬底保持在衬底处理位置时将图案化的辐射束投射到衬底的目标部分上，并且调节系统被配置为将调节流体提供给至少部分路径测量系统的测量光束和/或场来调节路径的一部分。

8. 发明申请

US20060280829A1 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US20060280829A1
公开(公告)日：2006-12-14
申请号：US11150465
申请日：2005-06-13
申请人： Yvonne Kruijt-Stegeman , Aleksey Kolesnychenko , Erik Loopstra , Johan Dijksman , Helmar Santen , Sander Wuister
发明人： Yvonne Kruijt-Stegeman , Aleksey Kolesnychenko , Erik Loopstra , Johan Dijksman , Helmar Santen , Sander Wuister
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A lithographic apparatus is disclosed that has an imprint template or a template holder configured to hold an imprint template, and a substrate table arranged to receive a substrate, the apparatus further comprising walls which together with the substrate table and the imprint template or the template holder, are configured to form an enclosed space which is substantially sealed from a surrounding area.
摘要翻译：公开了一种光刻设备，其具有构造成保持压印模板的压印模板或模板保持器，以及布置成接收衬底的衬底台，该设备还包括与衬底台和压印模板或模板保持器一起的壁被构造成形成从周围区域基本密封的封闭空间。

9. 发明申请

US20060266244A1 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US20060266244A1
公开(公告)日：2006-11-30
申请号：US11139991
申请日：2005-05-31
申请人： Yvonne Kruijt-Stegeman , Aleksey Kolensnychenko , Helmar Santen , Erik Loopstra
发明人： Yvonne Kruijt-Stegeman , Aleksey Kolensnychenko , Helmar Santen , Erik Loopstra
IPC分类号： B41F1/34
CPC分类号： B41F1/34 , B41F1/18 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , G03F9/7042 , G03F9/7084 , H05K1/0269 , H05K3/0008 , H05K2201/09918 , H05K2203/0108
摘要： An imprint lithography apparatus is disclosed that has a substrate table configured to hold a substrate, a template holder configured to hold an imprint template, the imprint template or the template holder having a template alignment mark configured to be imprinted onto the substrate table or onto a substrate to form an imprinted alignment mark, the imprint template having a functional pattern, and the template alignment mark and the functional pattern having a known spatial relationship, and an alignment sensor configured to determine the location of the imprinted alignment mark.
摘要翻译：公开了一种压印光刻设备，其具有被配置为保持基板的基板台，配置成保持压印模板的模板保持器，压印模板或模板保持器，其具有被配置为印刷到基板台上的模板对准标记基板以形成压印的对准标记，所述印模模板具有功能图案，并且所述模板对准标记和所述功能图案具有已知的空间关系，以及对准传感器，其被配置为确定所述打印的对准标记的位置。

10. 发明授权

US07136214B2 Active faceted mirror system for lithography 有权
标题翻译：用于光刻的主动分面镜系统
公开(公告)号：US07136214B2
公开(公告)日：2006-11-14
申请号：US10986076
申请日：2004-11-12
申请人： Erik Loopstra , Stephen Roux
发明人： Erik Loopstra , Stephen Roux
IPC分类号： G02B26/00
CPC分类号： G02B27/0977 , G02B7/1827 , G02B27/0905 , G03F7/70116 , G03F7/702 , G03F7/70291
摘要： An active faceted mirror system is disclosed. The active faceted mirror system includes a set of active facet mirror devices, a base plate and a set of pins for mounting the active facet mirror devices to the base plate. Each of the active facet mirror devices includes a mirror substrate with a reflective surface and a bearing hole on the reverse side for mounting. Additionally, each of the active facet mirror devices includes at least three actuator targets located on the back side of the mirror substrate, a jewel bearing and a flexure for supporting the mirror substrate. The base plate includes a series of bearing holes for mounting the active facet mirror devices and at least three actuators for each of the active facet mirror devices. A set of facet controllers located on the base plate can be used to control the positioning of the active facet mirror devices to produce a desired illumination effect.
摘要翻译：公开了一种主动刻面镜系统。主动分面镜系统包括一组主动分面镜装置，底板和一组用于将活动小面镜装置安装到基板的销。每个活性刻面镜装置包括具有反射表面的反射镜基板和用于安装的反面上的轴承孔。此外，每个活动刻面镜装置包括位于镜基板背面的至少三个致动器目标，宝石轴承和用于支撑镜面基板的挠曲件。基板包括用于安装主动分面镜装置的一系列轴承孔和用于每个主动分面镜装置的至少三个致动器。可以使用位于基板上的一组小面控制器来控制活动小面镜装置的定位以产生期望的照明效果。

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