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1. 发明申请

US20070139629A1 Lithographic apparatus and method for manufacturing a device 有权
标题翻译：光刻设备及其制造方法
公开(公告)号：US20070139629A1
公开(公告)日：2007-06-21
申请号：US11312660
申请日：2005-12-21
申请人： Timotheus Sengers , Nicolaas Johannes Van Asten , Wilhelmus Box , Tjarko Van Empel , Leon Levasier , Erik Loopstra , Marcel Hubertus Muitjens , Luberthus Ouwehand , Leon Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
发明人： Timotheus Sengers , Nicolaas Johannes Van Asten , Wilhelmus Box , Tjarko Van Empel , Leon Levasier , Erik Loopstra , Marcel Hubertus Muitjens , Luberthus Ouwehand , Leon Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
IPC分类号： G03B27/42
CPC分类号： G03F7/70883 , G03F7/7075 , G03F7/70858 , G03F9/7011 , G03F9/7034
摘要： A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.
摘要翻译：公开了一种光刻设备。该装置包括构造成保持基板的基板台。衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。该装置还包括测量系统，其被配置为当衬底台将衬底保持在测量位置时，测量衬底的至少一个方面或特征。测量系统被配置为将至少一个测量光束和/或场朝向衬底的表面引导。投影系统被配置为当衬底台将衬底保持在衬底处理位置时将图案化的辐射束投射到衬底的目标部分上，并且调节系统被配置为将调节流体提供给至少部分路径测量系统的测量光束和/或场来调节路径的一部分。

2. 发明申请

US20060114436A1 Using unflatness information of the substrate table or mask table for decreasing overlay 有权
标题翻译：使用衬底表或掩模台的不平坦信息减少重叠
公开(公告)号：US20060114436A1
公开(公告)日：2006-06-01
申请号：US10998179
申请日：2004-11-29
申请人： Rene Oesterholt , Ralph Brinkhof , Tjarko Van Empel , Leon Levasier , Joost Ottens , Koen Jacobus Zaal , Koenraad Stephan Salden
发明人： Rene Oesterholt , Ralph Brinkhof , Tjarko Van Empel , Leon Levasier , Joost Ottens , Koen Jacobus Zaal , Koenraad Stephan Salden
IPC分类号： G03B27/52
CPC分类号： G03F7/70783 , G03F7/707
摘要： The invention relates to a lithographic system that includes an illumination system for providing a projection beam of radiation, a mask table for supporting a mask, the mask serving to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. The system also comprises a processor arranged to calculate overlay corrections using a reference height map representing a surface of the substrate table or the mask table. The invention allows feed forward correction of non-flatness induced wafer grid distortion during alignment and during exposure, thereby reducing overlay errors caused by differences in flatness characteristics. It provides an indirect qualification method for overlay accuracy related to exposure chuck flatness based on height map information.
摘要翻译：本发明涉及一种光刻系统，其包括用于提供投影辐射束的照明系统，用于支撑掩模的掩模台，用于使投影光束在其横截面上具有图案的掩模，用于保持基板和用于将图案化的光束投影到基板的目标部分上的投影系统。该系统还包括处理器，其被布置为使用表示衬底台或掩模台的表面的参考高度图计算覆盖校正。本发明允许在对准和曝光期间非平坦度引起的晶片格栅失真的前馈校正，从而减少由平坦度特性的差异引起的重叠误差。它提供了基于高度图信息的与曝光卡盘平坦度相关的覆盖精度的间接鉴定方法。

3. 发明申请

US20060023194A1 Lithographic apparatus and method for calibrating the same 有权
标题翻译：平版印刷设备及其校准方法
公开(公告)号：US20060023194A1
公开(公告)日：2006-02-02
申请号：US10899295
申请日：2004-07-27
申请人： Erik Loopstra , Leon Levasier , Rene Oesterholt
发明人： Erik Loopstra , Leon Levasier , Rene Oesterholt
IPC分类号： G03B27/58
CPC分类号： G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
摘要： Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. 3 or more of the at least 3 optical encoders being connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is described.
摘要翻译：光刻设备包括用于控制衬底台的移动的衬底台和运动控制系统。运动控制系统包括构造用于检测衬底台的位置的至少3个位置检测器。为了测量衬底台的位置和取向，每个位置检测器包括一维或多维类型的光学编码器，光学编码器被布置为一起提供至少6个位置值，为每个位置值提供至少一个位置值的三维。所述至少3个光学编码器中的3个或更多个在所述三维坐标系中的不同位置连接到所述基板台。运动控制系统被布置为从6个位置值中的至少3个的子集计算三维坐标系中的衬底台的位置，并且从另一个子集计算相对于坐标系的衬底台的取向至少6个位置值中的3个。此外，描述了用于校准位置检测器的方法。

4. 发明申请

US20080074681A1 Lithographic apparatus and method for calibrating the same 有权
标题翻译：平版印刷设备及其校准方法
公开(公告)号：US20080074681A1
公开(公告)日：2008-03-27
申请号：US11902786
申请日：2007-09-25
申请人： Erik Loopstra , Leon Levasier , Rene Oesterholt
发明人： Erik Loopstra , Leon Levasier , Rene Oesterholt
IPC分类号： G01B11/14 , G01B11/00
CPC分类号： G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
摘要： A measurement system configured to measure a position of an object in a lithographic apparatus, includes at least three position detectors configured to detect the position of the object, the at least three position detectors each including a single or multi-dimensional optical encoder to provide at least six position values, the optical encoders being coupled to the object at different locations within a three dimensional coordinate system, wherein at least one position value is provided for each dimension of the three dimensional coordinate system, and wherein the measurement system is configured to calculate the position of the object within the three dimensional coordinate system from a subset of at least three of the six position values and to calculate an orientation of the object with respect to the three dimensional coordinate system from another subset of at least three of the six position values.
摘要翻译：被配置为测量光刻设备中的物体的位置的测量系统包括配置成检测物体的位置的至少三个位置检测器，所述至少三个位置检测器包括单个或多维光学编码器以提供在至少六个位置值，所述光学编码器在三维坐标系内的不同位置处耦合到所述对象，其中为所述三维坐标系的每个维度提供至少一个位置值，并且其中所述测量系统被配置为计算从六个位置值中的至少三个的子集的三维坐标系中的对象的位置，并且从六个位置中的至少三个的另一子集计算相对于三维坐标系的对象的取向价值观。

5. 发明申请

US20070256471A1 Lithographic apparatus and method for calibrating the same 有权
标题翻译：平版印刷设备及其校准方法
公开(公告)号：US20070256471A1
公开(公告)日：2007-11-08
申请号：US11822633
申请日：2007-07-09
申请人： Erik Loopstra , Leon Levasier , Rene Oesterholt
发明人： Erik Loopstra , Leon Levasier , Rene Oesterholt
IPC分类号： G01B21/00 , G01P21/00
CPC分类号： G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
摘要： Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. 3 or more of the at least 3 optical encoders being connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is described.
摘要翻译：光刻设备包括用于控制衬底台的移动的衬底台和运动控制系统。运动控制系统包括构造用于检测衬底台的位置的至少3个位置检测器。为了测量衬底台的位置和取向，每个位置检测器包括一维或多维类型的光学编码器，光学编码器被布置为一起提供至少6个位置值，为每个位置值提供至少一个位置值的三维。所述至少3个光学编码器中的3个或更多个在所述三维坐标系中的不同位置连接到所述基板台。运动控制系统被布置为从6个位置值中的至少3个的子集计算三维坐标系中的衬底台的位置，并且从另一个子集计算相对于坐标系的衬底台的取向至少6个位置值中的3个。此外，描述了用于校准位置检测器的方法。

6. 发明申请

US20060023178A1 Lithographic apparatus and method for calibrating the same 有权
标题翻译：平版印刷设备及其校准方法
公开(公告)号：US20060023178A1
公开(公告)日：2006-02-02
申请号：US11179665
申请日：2005-07-13
申请人： Erik Loopstra , Leon Levasier , Rene Oesterholt
发明人： Erik Loopstra , Leon Levasier , Rene Oesterholt
IPC分类号： G03B27/42
CPC分类号： G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
摘要： Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. Some of the optical encoders may be connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is presented.
摘要翻译：光刻设备包括用于控制衬底台的移动的衬底台和运动控制系统。运动控制系统包括构造用于检测衬底台的位置的至少3个位置检测器。为了测量衬底台的位置和取向，每个位置检测器包括一维或多维类型的光学编码器，光学编码器被布置为一起提供至少6个位置值，为每个位置值提供至少一个位置值的三维。一些光学编码器可以在三维坐标系中的不同位置处连接到基板台。运动控制系统被布置为从6个位置值中的至少3个的子集计算三维坐标系中的衬底台的位置，并且从另一个子集计算相对于坐标系的衬底台的取向至少6个位置值中的3个。此外，提出了一种用于校准位置检测器的方法。

7. 发明申请

US20060250617A1 Lithographic apparatus, position quantity detection system and method 有权
标题翻译：光刻设备，位置量检测系统及方法
公开(公告)号：US20060250617A1
公开(公告)日：2006-11-09
申请号：US11120193
申请日：2005-05-03
申请人： Edwin Donkelaar , Evert Draaijer , Leon Levasier , Nicolas Lallemant , Gerardus De Rooij
发明人： Edwin Donkelaar , Evert Draaijer , Leon Levasier , Nicolas Lallemant , Gerardus De Rooij
IPC分类号： G01B11/02
CPC分类号： G03F7/70858 , G03F7/70775
摘要： A lithographic apparatus includes a position quantity determination system to determine a position quantity of a movable part which is in operation at least partly surrounded by an area comprising a fluid. The position quantity determination system includes an interferometer system, a global sensor to determine a global value of a physical quantity of the fluid in the area, and a local sensor to determine a local value of the physical quantity of the fluid in the part of the area. The position quantity determination system is configured to determine the position quantity from an output of the interferometer, the global value of the physical quantity and the local value of the physical quantity. The physical quantity may include a pressure, a temperature, etc. The local physical quantity determination system may include a sensor, such as a high-speed sensor, a computational fluid dynamics model or a linear approximation model.
摘要翻译：光刻设备包括位置量确定系统，用于确定至少部分地被包括流体的区域包围的可操作部件的位置量。位置量确定系统包括干涉仪系统，用于确定该区域中的流体的物理量的总体值的全局传感器，以及局部传感器，用于确定该部分中的流体的物理量的局部值区。位置量确定系统被配置为从干涉仪的输出，物理量的总体值和物理量的局部值确定位置量。物理量可以包括压力，温度等。局部物理量确定系统可以包括传感器，例如高速传感器，计算流体动力学模型或线性近似模型。

8. 发明申请

US20050138988A1 Lithographic apparatus, method of calibration, calibration plate, device manufacturing method, and device manufactured thereby 失效
公开(公告)号：US20050138988A1
公开(公告)日：2005-06-30
申请号：US10746141
申请日：2003-12-29
申请人： Leon Levasier , Anastasius Anicetus Bruinsma , Jacob Fredrik Klinkhamer , Gerrit Nijmeijer , Petra Margaretha Dekkers-Rog
发明人： Leon Levasier , Anastasius Anicetus Bruinsma , Jacob Fredrik Klinkhamer , Gerrit Nijmeijer , Petra Margaretha Dekkers-Rog
IPC分类号： G03F7/20 , G03F9/00 , G01B21/00 , B23Q33/00
CPC分类号： G03F7/7085 , G03F7/70516 , G03F9/7011 , G03F9/7019 , G03F9/7034 , Y10T29/49771
摘要： A method according to one embodiment of the invention may be performed using a calibration plate having at least one alignment marker and at least one height profile. First, the calibration plate is positioned using an alignment sensor. Then the height profile is measured by a height sensor. Then the calibration plate is rotated by substantially 180 degrees and the two operations are repeated. This procedure results in two measured height profiles, which are compared in order to find a best fit. The amount of shift performed to find the best fit is used to determine a distance between the alignment marker and the X,Y position of the measurement point of the height sensor.

9. 发明申请

US20070002295A1 System and method of monitoring and diagnosing system condition and performance 审中-公开
标题翻译：监测和诊断系统状况和性能的系统和方法
公开(公告)号：US20070002295A1
公开(公告)日：2007-01-04
申请号：US11170739
申请日：2005-06-30
申请人： Maria Reuhman-Huisken , Leon Levasier , Tasja Van Rhee , Rosaria Salpietro , Erik Schoemaker , Eric Jacqmin , Martin Prins , Marcel Nicolaas Van Kervinck , Timotheus Bootsma
发明人： Maria Reuhman-Huisken , Leon Levasier , Tasja Van Rhee , Rosaria Salpietro , Erik Schoemaker , Eric Jacqmin , Martin Prins , Marcel Nicolaas Van Kervinck , Timotheus Bootsma
IPC分类号： G03B27/42
CPC分类号： G03F7/70525 , G03F7/70483
摘要： The invention is directed to a system and method of monitoring and/or diagnosing tool performance in real-time for system degradation. The invention issues alerts and provides a structured process for identifying the source of the problem and enabling action to be taken before defects are detected on the final product. The invention provides a hierarchical data structure including elements that are monitored based on key performance indicators and diagnostic data sets.
摘要翻译：本发明涉及一种用于系统劣化实时监测和/或诊断工具性能的系统和方法。本发明发出警报并提供一个结构化的过程，用于识别问题的根源，并且能够在最终产品上检测到缺陷之前采取行动。本发明提供了一种分级数据结构，包括基于关键性能指标和诊断数据集进行监控的元件。

10. 发明申请

US20050146699A1 Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured thereby 有权
标题翻译：具有对准子系统的光刻设备，器件制造方法以及由此制造的器件
公开(公告)号：US20050146699A1
公开(公告)日：2005-07-07
申请号：US11068895
申请日：2005-03-02
申请人： Leon Levasier , Arie Den Boef , Ingo Dirnstorfer , Andre Jeunink , Stefan Kruijswijk , Henricus Pellemans , Irwan Setija , Hoite Tolsma
发明人： Leon Levasier , Arie Den Boef , Ingo Dirnstorfer , Andre Jeunink , Stefan Kruijswijk , Henricus Pellemans , Irwan Setija , Hoite Tolsma
IPC分类号： G01B11/00 , G03F7/20 , G03F9/00 , H01L21/027 , G03B27/42
CPC分类号： G03F9/7003 , G03F9/7049 , G03F9/7076
摘要： A lithographic apparatus according to one embodiment of the invention includes an alignment subsystem configured to align the substrate on the substrate table relative to the patterning structure. The alignment structure comprises a non-periodic feature which may be detectable as e.g. a capture position or a check position using a reference grating in the alignment subsystem. The non-periodic feature may cause a phase effect in the detected signal of the alignment subsystem or an amplitude effect.
摘要翻译：根据本发明的一个实施例的光刻设备包括对准子系统，该对准子系统被配置为相对于图案化结构对准衬底台上的衬底。对准结构包括非周期性特征，其可以被检测为例如。在对准子系统中使用参考光栅的捕获位置或检查位置。非周期性特征可能导致对准子系统的检测信号中的相位效应或幅度效应。

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