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    • 4. 发明申请
    • Patterned deposition source unit and method of depositing thin film using the same
    • 图案化沉积源单元和使用其沉积薄膜的方法
    • US20050129848A1
    • 2005-06-16
    • US10902798
    • 2004-08-02
    • Sang-jun ChoiYoung-eal KimDong-joon Ma
    • Sang-jun ChoiYoung-eal KimDong-joon Ma
    • H01L21/203C23C14/24C23C16/00
    • C23C14/243
    • Provided is a patterned deposition source unit for forming a thin film on a substrate and a deposition method using the same. The patterned deposition source unit includes a main body that includes a loading section for loading a deposition material and a cover unit, which covers openings of the loading section and has a plurality of line shaped openings. The deposition material vaporized through line shaped openings of the cover unit can be vertically deposited on the substrate which moves back and forth over the main body. The method enables the improvement in the uniformity of a thin film by preventing dispersion of the deposition material in a conventional depositor, and the improvement in the density of a thin film by increasing vapor flux per unit area by reducing the distance between the deposition source unit and the substrate.
    • 提供了一种用于在基板上形成薄膜的图案化沉积源单元和使用其的沉积方法。 图案化沉积源单元包括主体,该主体包括用于装载沉积材料的装载部分和覆盖装置,其覆盖装载部分的开口并且具有多个线状开口。 通过盖单元的线形开口蒸发的沉积材料可以垂直地沉积在基板上,该基板在主体上前后移动。 该方法通过防止沉积材料在常规沉积物中的分散而提高薄膜的均匀性,并且通过减小沉积源单元之间的距离来提高薄膜的密度,通过增加单位面积的蒸气通量来提高薄膜的密度 和基板。