会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 5. 发明申请
    • Novel Three-Dimensional DRAM Structures
    • US20220139918A1
    • 2022-05-05
    • US17084420
    • 2020-10-29
    • Sang-Yun Lee
    • Sang-Yun Lee
    • H01L27/108H01L29/78
    • Novel three-dimensional DRAM structures are disclosed, together with methods of making the same. Each DRAM cell comprises a vertical transistor and a storage capacitor stacked vertically. Storage capacitors are arranged in a rectangular pattern in the array of DRAM cells. This arrangement improves the area efficiency of storage capacitors over honeycomb type. A first embodiment of the present disclosure uses cup-shaped storage capacitors. The exterior of the cup as well as the interior may contribute to the capacitance. In a second embodiment, a single capacitor pillar forms the internal electrode of each storage capacitor. A third embodiment employs double-pillar storage capacitors. Common to all embodiments are options to dispose contact plugs between vertical transistors and storage capacitors, dispose an etch-stop layer over the gate of vertical transistors, dispose one or more mesh layers for storage capacitors, and widen semiconductor pillars within available space in bit-line direction.
    • 7. 发明授权
    • Apparatus for processing exhaust fluid
    • 废气处理装置
    • US09494065B2
    • 2016-11-15
    • US13976328
    • 2011-12-27
    • Sang-Yun LeeMyung Keun NohHeaungshig Oh
    • Sang-Yun LeeMyung Keun NohHeaungshig Oh
    • F01N3/08B01D53/32H01L21/67H05H1/24
    • F01N3/0892B01D53/32B01D2257/2025B01D2257/2027B01D2257/2047B01D2258/0216B01D2259/818H01L21/67017H05H1/2406H05H2001/2456H05H2245/1215
    • Provided is an apparatus for processing exhaust fluid in which a fluid generated in a process chamber of an apparatus for manufacturing a semiconductor, a display panel, or a solar cell is ejected to the outside. The apparatus for processing exhaust fluid includes: a vacuum pump that is connected to the process chamber, vacuumizes the inside of the process chamber, and ejects the fluid generated in the process chamber to the outside; and a plasma reactor in which plasma is formed and the fluid generated in the process chamber decomposes, wherein the plasma reactor includes: an insulating conduit that is provided between the process chamber and the vacuum pump and provides a space in which the fluid decomposes; at least one electrode unit that is provided on the outer circumferential surface of the conduit and receives a voltage to form the plasma; a buffer unit that is formed of an electrically conductive elastic substance and is disposed between the conduit and the electrode unit to attach the conduit and the electrode unit closely together; and an external pipe into which the conduit, electrode unit and buffer unit are inserted with sealing flanges provided on both end portions of the conduit and external pipe to seal a space between the conduit and the external pipe to prevent fluid process by-products from leaking out should the conduit crack or is damaged.
    • 本发明提供一种处理废液的装置,其中在半导体制造装置,显示面板或太阳能电池的处理室中产生的流体喷射到外部。 用于处理废气流体的装置包括:真空泵,其连接到处理室,对处理室的内部进行真空化,并将处理室中产生的流体喷射到外部; 以及其中形成等离子体并且在处理室中产生的流体分解的等离子体反应器,其中等离子体反应器包括:设置在处理室和真空泵之间并提供流体分解的空间的绝缘导管; 至少一个电极单元,其设置在所述导管的外周面上并接收电压以形成所述等离子体; 缓冲单元,其由导电弹性物质形成并且设置在所述导管和所述电极单元之间,以将所述导管和所述电极单元紧密地附接在一起; 以及管道,电极单元和缓冲单元插入其中的外管,其中设置在导管和外管的两端部上的密封凸缘以密封导管和外管之间的空间,以防止流体加工副产物泄漏 如果管道破裂或损坏。