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1. 发明申请

US20060033053A1 Transition radiation apparatus 失效
标题翻译：过渡辐射装置
公开(公告)号：US20060033053A1
公开(公告)日：2006-02-16
申请号：US10917819
申请日：2004-08-13
申请人： Sang Lee , Yashesh Shroff , Christof Krautschik
发明人： Sang Lee , Yashesh Shroff , Christof Krautschik
IPC分类号： A61N5/00 , G01J3/10
CPC分类号： G03F7/70008
摘要： In one embodiment of the present invention, thermal deformation or bending of membranes in a transition radiation emitting structure can be reduced by providing flex regions in the membranes or the membrane support structures. In a second embodiment, deformation of membranes is compensated for by fabricating the membranes to cooperatively bend in a similar manner and direction. In a third embodiment, deformation of the membrane is reduced by fabricating the membranes with an intrinsic tensile or compressive stress.
摘要翻译：在本发明的一个实施例中，通过在膜或膜支撑结构中设置弯曲区域，可以减少过渡辐射发射结构中的膜的热变形或弯曲。在第二实施例中，通过制造膜以相似的方式和方向协同地弯曲来补偿膜的变形。在第三实施例中，通过制造具有固有的拉伸或压缩应力的膜来减小膜的变形。

2. 发明授权

US07075699B2 Double hidden flexure microactuator for phase mirror array 失效
标题翻译：用于相位镜阵列的双重隐形弯曲微型致动器
公开(公告)号：US07075699B2
公开(公告)日：2006-07-11
申请号：US10952709
申请日：2004-09-28
申请人： William G. Oldham , Yijian Chen , Yashesh Shroff
发明人： William G. Oldham , Yijian Chen , Yashesh Shroff
IPC分类号： G02B26/00 , G02B26/08 , G02B7/182
CPC分类号： G03F7/70283 , G02B26/0841 , G03F7/70291
摘要： Disclosed is an actuator for a phase mirror array including a) a first support member extending perpendicularly from a surface of a mirror, b) a plurality of flexures engaging the first support member with the flexures being generally parallel to the surface of the mirror, c) second and third support members engaging opposing ends of the flexures, at least one of the second and third support members functioning as a first electrode, and d) a second electrode positioned in spaced parallel relationship with the flexures, whereby a voltage impressed across the first electrode and the second electrode causes displacement of the supported mirror on the support structure. The second electrode and one of the flexures can have undulating surfaces which mate in a comb relationship.
摘要翻译：公开了一种用于相位镜阵列的致动器，包括：a）从反射镜的表面垂直延伸的第一支撑件，b）与第一支撑构件接合的多个挠曲件，其中弯曲部大致平行于镜子的表面，c ）第二和第三支撑构件，其接合所述挠曲件的相对端部，所述第二和第三支撑构件中的至少一个用作第一电极，以及d）与所述挠曲件间隔开平行关系的第二电极，第一电极和第二电极引起支撑反射镜在支撑结构上的位移。第二电极和其中一个挠曲件可以具有以梳子关系相配合的起伏表面。

3. 发明授权

US07666555B2 Pellicle, methods of fabrication and methods of use for extreme ultraviolet lithography 失效
标题翻译：薄膜，制造方法和用于极紫外光刻的方法
公开(公告)号：US07666555B2
公开(公告)日：2010-02-23
申请号：US11618487
申请日：2006-12-29
申请人： Michael Goldstein , Yashesh Shroff , Daniel Tanzil
发明人： Michael Goldstein , Yashesh Shroff , Daniel Tanzil
IPC分类号： G03F1/00 , A47G1/12
CPC分类号： G03F1/62 , B82Y10/00 , B82Y40/00 , G03F1/24
摘要： Embodiments of a pellicle, methods of fabrication and methods of use in extreme ultraviolet (EUV) photolithography are disclosed. The pellicle may include a wire mesh with a square or hexagonal geometric configuration. A thin film of a material with a high Young's modulus may be coated on at least one surface of the wire mesh. A method of fabrication may include forming at least one sacrificial layer on a surface of the wire mesh, forming a thin film on another surface of the wire mesh, and removing the sacrificial layer to form a pellicle. A method of use may include positioning a pellicle relative to a photomask to protect the photomask from particulate accumulation during an EUV photolithography process.
摘要翻译：公开了一种防护薄膜组件，制造方法和在极紫外（EUV）光刻技术中的使用方法。防护薄膜组件可以包括具有正方形或六边形几何构型的丝网。具有高杨氏模量的材料的薄膜可以涂覆在金属丝网的至少一个表面上。制造方法可以包括在金属丝网的表面上形成至少一个牺牲层，在金属丝网的另一个表面上形成薄膜，以及去除牺牲层以形成防护薄膜组件。使用的方法可以包括相对于光掩模定位防护薄膜以保护光掩模免于在EUV光刻工艺期间的颗粒聚集。

4. 发明申请

US20080158535A1 PELLICLE, METHODS OF FABRICATION & METHODS OF USE FOR EXTREME ULTRAVIOLET LITHOGRAPHY 失效
标题翻译：制造方法，制造方法及用于极端超紫外线的方法
公开(公告)号：US20080158535A1
公开(公告)日：2008-07-03
申请号：US11618487
申请日：2006-12-29
申请人： Michael Goldstein , Yashesh Shroff , Daniel Tanzil
发明人： Michael Goldstein , Yashesh Shroff , Daniel Tanzil
IPC分类号： G03B27/54 , G03F1/00
CPC分类号： G03F1/62 , B82Y10/00 , B82Y40/00 , G03F1/24
摘要： Embodiments of a pellicle, methods of fabrication and methods of use in extreme ultraviolet (EUV) photolithography are disclosed. The pellicle may include a wire mesh with a square or hexagonal geometric configuration. A thin film of a material with a high Young's modulus may be coated on at least one surface of the wire mesh. A method of fabrication may include forming at least one sacrificial layer on a surface of the wire mesh, forming a thin film on another surface of the wire mesh, and removing the sacrificial layer to form a pellicle. A method of use may include positioning a pellicle relative to a photomask to protect the photomask from particulate accumulation during an EUV photolithography process.
摘要翻译：公开了一种防护薄膜组件，制造方法和在极紫外（EUV）光刻技术中的使用方法。防护薄膜组件可以包括具有正方形或六边形几何构型的丝网。具有高杨氏模量的材料的薄膜可以涂覆在金属丝网的至少一个表面上。制造方法可以包括在金属丝网的表面上形成至少一个牺牲层，在金属丝网的另一个表面上形成薄膜，以及去除牺牲层以形成防护薄膜组件。使用的方法可以包括相对于光掩模定位防护薄膜以保护光掩模免于在EUV光刻工艺期间的颗粒聚集。

5. 发明申请

US20060032811A1 Transition radiation apparatus and method therefor 有权
标题翻译：过渡辐射装置及其方法
公开(公告)号：US20060032811A1
公开(公告)日：2006-02-16
申请号：US10915809
申请日：2004-08-10
申请人： Yashesh Shroff
发明人： Yashesh Shroff
IPC分类号： B01D29/00 , C23F1/00 , H05H7/00
CPC分类号： C23F4/00 , B23K26/0661 , B23K26/18 , B23K26/40 , B23K2101/40 , B23K2103/50 , C23F3/04
摘要： In one embodiment of the present invention, intervening material layers (208) are recessed (304) relative to membrane layers (208) thereby providing increased surface area contact between the membranes (208) and support posts (408). Increased surface area contact assists in reducing membrane shape changes (122) and defects (124, 126) that can result from thermal and physical stress. In an alternative embodiment, problems related to stiction during release of a stack of membranes (208) is reduced by using different processes to completely remove portions of intervening material layers (206) between membrane layers (208). The first process removes the bulk of the intervening material layer (206). The second process removes the remaining portions of the intervening material layer (602).
摘要翻译：在本发明的一个实施例中，中间材料层（208）相对于膜层（208）凹入（304），由此在膜（208）和支撑柱（408）之间提供增加的表面积接触。增加的表面积接触有助于减少由热和物理应力引起的膜形变化（122）和缺陷（124,126）。在替代实施例中，通过使用不同的过程来完全去除膜层（208）之间的中间材料层（206）的部分，减少了在膜叠层（208）释放期间与静摩擦有关的问题。第一种方法去除大部分中间材料层（206）。第二过程移除中间材料层（602）的剩余部分。

6. 发明申请

US20050111119A1 Double hidden flexure microactuator for phase mirror array 失效
标题翻译：用于相位镜阵列的双重隐形弯曲微型致动器
公开(公告)号：US20050111119A1
公开(公告)日：2005-05-26
申请号：US10952709
申请日：2004-09-28
申请人： William Oldham , Yijian Chen , Yashesh Shroff
发明人： William Oldham , Yijian Chen , Yashesh Shroff
IPC分类号： G02B26/08
CPC分类号： G03F7/70283 , G02B26/0841 , G03F7/70291
摘要： Disclosed is an actuator for a phase mirror array including a) a first support member extending perpendicularly from a surface of a mirror, b) a plurality of flexures engaging the first support member with the flexures being generally parallel to the surface of the mirror, c) second and third support members engaging opposing ends of the flexures, at least one of the second and third support members functioning as a first electrode, and d) a second electrode positioned in spaced parallel relationship with the flexures, whereby a voltage impressed across the first electrode and the second electrode causes displacement of the supported mirror on the support structure. The second electrode and one of the flexures can have undulating surfaces which mate in a comb relationship.
摘要翻译：公开了一种用于相位镜阵列的致动器，包括：a）从反射镜的表面垂直延伸的第一支撑件，b）与第一支撑构件接合的多个挠曲件，其中弯曲部大致平行于镜子的表面，c ）第二和第三支撑构件，其接合所述挠曲件的相对端部，所述第二和第三支撑构件中的至少一个用作第一电极，以及d）与所述挠曲件间隔开平行关系的第二电极，第一电极和第二电极引起支撑反射镜在支撑结构上的位移。第二电极和其中一个挠曲件可以具有以梳子关系相配合的起伏表面。

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