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    • 1. 发明授权
    • Method for removing photoresist layer from substrate by ozone treatment
    • 通过臭氧处理从基底去除光致抗蚀剂层的方法
    • US4341592A
    • 1982-07-27
    • US601861
    • 1975-08-04
    • Samuel R. ShortesThomas C. Penn
    • Samuel R. ShortesThomas C. Penn
    • H01L21/302G03F7/42H01L21/027H01L21/30H01L21/3065H01L21/311B44C1/22C03C15/00C23F1/00H01L21/306
    • H01L21/31138G03F7/42
    • Method and apparatus for removing a photoresist layer from a substrate surface of different material, such as a semiconductor slice, in the fabrication of an electronic structure, involving exposure of the photoresist layer to an ozone-containing gaseous atmosphere in a reaction zone of a reactor. The ozone is present as an active reagent in the gaseous atmosphere to which the layer of photoresist material is exposed in an amount sufficient to react with all of the photoresist material in the layer thereof, with the photoresist material being removed from the underlying substrate surface in response to its exposure to the ozone. The photoresist material being treated by the ozone for stripping thereof may be either a negative or positive photoresist. Gaseous reaction products resulting from treatment of the substrate and removal of the photoresist layer therefrom are directed through an ozone reduction chamber prior to the discharge of the exhaust gases created by the reaction of the ozone with the photoresist material, wherein any excess ozone contained in the exhaust gases is reduced to molecular oxygen.
    • 用于在电子结构的制造中从不同材料(例如半导体片)的衬底表面去除光致抗蚀剂层的方法和装置,包括在反应器的反应区中将光致抗蚀剂层暴露于含臭氧的气态气氛 。 臭氧作为活性试剂存在于气态气氛中,光致抗蚀剂材料层以足以与其中的所有光致抗蚀剂材料反应的量暴露于光致抗蚀剂材料层,光致抗蚀剂材料从下面的基底表面被去除 对其暴露于臭氧的反应。 被臭氧处理以除去的光致抗蚀剂材料可以是负性或正性光致抗蚀剂。 通过处理基材和从其中除去光致抗蚀剂层而产生的气态反应产物在通过臭氧与光致抗蚀剂材料的反应产生的废气排出之前通过臭氧还原室引导,其中包含在 废气被还原成分子氧。
    • 2. 发明授权
    • Method and apparatus for cleaning the surface of a semiconductor slice
with a liquid spray of de-ionized water
    • US4027686A
    • 1977-06-07
    • US320400
    • 1973-01-02
    • Samuel R. ShortesEdwin Graham Millis
    • Samuel R. ShortesEdwin Graham Millis
    • H01L21/304H01L21/00B08B3/00B08B3/04
    • H01L21/67051Y10S134/902
    • Method and apparatus for cleaning the surface of a slice of semiconductor material through the use of a liquid spray, wherein the liquid spray is delivered at an angle to the exposed surface of a rotating semiconductor slice at a controlled pressure and velocity, and strikes the surface of the semiconductor slice substantially along a linear path coinciding with the diameter of the slice. The apparatus includes an upstanding pedestal having a slice-supporting surface on which the slice of semiconductor material to be cleaned is disposed. The pedestal is mounted within a housing which includes a motor for imparting rotation to the pedestal and a vacuum pump for inducing a suction in openings provided in the slice-supporting surface of the pedestal so as to retain the slice in place when rotary movement is imparted thereto. A spray nozzle for delivering a flat fan-shaped spray pattern is disposed within the housing, the spray nozzle being positioned above the level of the slice-supporting surface for dispensing a liquid spray onto the exposed surface of the slice positioned thereon. The housing is also provided with a transparent dome-shaped cover overlying the upstanding pedestal and the spray nozzle to define a cleaning chamber. The cover in its closed position completes an electric circuit operating the motor and the vacuum pump to impart rotation to the pedestal and to retain the semiconductor slice upon the surface of the pedestal by inducing suction in the openings provided therein. De-ionized water is delivered from the spray nozzle as a liquid spray to the surface of the semiconductor slice at a high pressure and velocity to produce a corona discharge for effecting a cleaning operation of the exposed surface of the semiconductor slice wherein particulate surface debris of a particle size smaller than the width of the theoretically determined dead space layer associated with the exposed slice surface is removed therefrom.
    • 5. 发明授权
    • Cartridge and target device for markmanship training
    • 用于标记技术培训的墨盒和目标装置
    • US4678437A
    • 1987-07-07
    • US781047
    • 1985-09-27
    • Bentley N. ScottVernon R. PorterSamuel R. Shortes
    • Bentley N. ScottVernon R. PorterSamuel R. Shortes
    • F41A33/02G09B9/00
    • F41A33/02
    • Marksmanship training apparatus which provides for simulated firing of projectile-type weapons is disclosed and comprises a substitute cartridge and a receiver/detector target device. The substitute cartridge is self contained and includes a power source, an energy emitting device which emits a pulse or pulses or energy with predetermined characteristics, a lens device to concentrate the emitted energy, an energy activation device and a transfer device to transfer the energy from the firing mechanism of the weapon to the energy activation device to activate same. The receiver/detector target device includes devices to detect the presence of the pulse or pulses of energy while ignoring the ambient light level surrounding the target device. The target device initiates a time cycle and provides a display of the elapsed time from initiation to the receipt of a hit from the pulse or pulses of energy emitted from the substitute cartridge in the weapon. An audio indication is also provided when a hit occurs.
    • 公开了提供射弹型武器的模拟射击的标记训练装置,其包括替代筒和接收器/检测器目标装置。 替代墨盒是自包含的,并且包括电源,发射具有预定特性的脉冲或脉冲或能量的能量发射装置,用于集中发射的能量的透镜装置,能量激活装置和传送装置,以将能量从 武器的射击机制到能量激活装置激活相同。 接收器/检测器目标装置包括用于检测脉冲或能量脉冲的存在的装置,同时忽略目标装置周围的环境光级。 目标装置启动时间周期,并且提供从从武器中的替代筒发射的能量的脉冲或脉冲的从起始到接收命中的经过时间的显示。 当发生命中时也提供音频指示。
    • 10. 发明授权
    • Marksmanship training apparatus
    • 标识训练器具
    • US4983123A
    • 1991-01-08
    • US431902
    • 1989-11-06
    • Bentley N. ScottSamuel R. Shortes
    • Bentley N. ScottSamuel R. Shortes
    • F41A33/02
    • F41A33/02
    • Marksmanship training apparatus is used with air guns or weapons firing blank cartridges and comprises a housing member with an attached muzzle alignment tube for insertion into the bore of the barrel of the weapon and includes sealing apparatus around the muzzle alignment tube to minimize leakage of gas between the bore and the muzzle alignment tube and to prevent the gas from pushing the muzzle alignment tube out of the bore. The housing member includes a switch which is activated by the gas to complete an electrical circuit positioned in the housing to cause light energy to be emitted from the housing member.
    • 标枪训练装置用于空气枪或武器射击空白墨盒,并且包括具有附接的枪口对准管的壳体构件,用于插入武器枪管的孔中,并且包括围绕枪口对准管的密封装置,以最小化气体在两者之间的泄漏 孔和枪口对准管,并防止气体将枪口对准管推出孔。 壳体构件包括由气体启动的开关,以完成位于壳体中的电路,以使得能量从壳体构件发射。