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    • 3. 发明申请
    • TOUCH PANEL AND METHOD OF FABRICATING THE SAME
    • 触控面板及其制作方法
    • US20160154516A1
    • 2016-06-02
    • US14673367
    • 2015-03-30
    • Samsung Display Co. Ltd.
    • Sung Kyun PARKCheol Kyu KIMKi Hyun CHOSun Haeng CHOKyung Seop KIMJae Neung KIM
    • G06F3/041G03F7/36G03F7/40G06F3/047G03F7/20
    • G06F3/0416G06F3/03547G06F3/041G06F3/044G06F2203/04103G06F2203/04111H01L31/1888
    • A touch panel and a method of fabricating the same are provided. The touch panel may include: a substrate; first sensing electrodes disposed on a first surface and arranged along a first direction and second sensing electrodes arranged along a second direction; at least one first connector connecting the first sensing electrodes in the first direction; a first insulating layer pattern disposed on the first connector; at least one second connector disposed on the first insulating layer pattern, intersecting the first connector, and connecting the second sensing electrodes in the second direction; and wires disposed on the first surface of the substrate in the peripheral area and electrically connected to the first sensing electrodes and the second sensing electrodes. The first connector includes a first light-transmitting conductive pattern disposed on the first surface of the substrate and a first light-blocking conductive pattern disposed on the first light-transmitting conductive pattern.
    • 提供了触摸面板及其制造方法。 触摸面板可以包括:基板; 设置在第一表面上并沿着第一方向布置的第一感测电极和沿着第二方向布置的第二感测电极; 至少一个第一连接器,其沿第一方向连接第一感测电极; 布置在所述第一连接器上的第一绝缘层图案; 至少一个第二连接器,设置在所述第一绝缘层图案上,与所述第一连接器相交,并且在所述第二方向上连接所述第二感测电极; 以及布置在所述外围区域中的所述基板的所述第一表面上并且电连接到所述第一感测电极和所述第二感测电极的布线。 第一连接器包括设置在基板的第一表面上的第一透光导电图案和设置在第一透光导电图案上的第一遮光导电图案。
    • 8. 发明申请
    • THIN FILM TRANNSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF
    • 薄膜传感器阵列及其制造方法
    • US20140191256A1
    • 2014-07-10
    • US14090487
    • 2013-11-26
    • Samsung Display Co., Ltd.
    • Jeong Min PARKJi-Hyun KIMJung-Soo LEESung Kyun PARK
    • H01L33/58
    • H01L27/124G02F1/13458G02F1/136227G02F1/1368H01L27/1248H01L29/78669H01L29/78678H01L33/58
    • Instead of forming contact holes the same way in both the non-image forming peripheral area (PA) and the image forming display area of a thin film transistor array panel, contact holes in the DA are formed to be substantially smaller than those in the PA for thereby improving an aperture ratio of the corresponding display device. In an exemplary embodiment, an inorganic gate insulating layer is not etched in the DA and only an inorganic first passivation layer among inorganic insulating layers positioned in the DA is etched to allow communication between the drain electrode and the corresponding field generating electrode. On the other hand, in the peripheral area, plural inorganic insulating layers such as the gate insulating laver, the first passivation laver, and the second passivation layer positioned on the gate wire and the data wire are simultaneously etched to form second contact holes and third contact holes exposing respective gate pads and data pads.
    • 代替在非图像形成周边区域(PA)和薄膜晶体管阵列面板的图像形成显示区域中以相同的方式形成接触孔,DA中的接触孔形成为显着小于PA中的接触孔 从而提高对应的显示装置的开口率。 在一个示例性实施例中,在DA中不蚀刻无机栅极绝缘层,并且仅在位于DA中的无机绝缘层中只有无机第一钝化层被蚀刻以允许漏电极和相应的场产生电极之间的连通。 另一方面,在外围区域中,同时蚀刻位于栅极线和数据线上的多个无机绝缘层,例如栅极绝缘层,第一钝化层和第二钝化层,形成第二接触孔,第三接触孔 接触孔暴露各个栅极焊盘和数据焊盘。