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1. 发明申请

US20150140704A1 CLEANING SOLUTION AND METHOD FOR MANUFACTURING DISPLAY DEVICE USING THE SAME 审中-公开
标题翻译：用于制造使用该显示装置的显示装置的清洁方案和方法
公开(公告)号：US20150140704A1
公开(公告)日：2015-05-21
申请号：US14301840
申请日：2014-06-11
申请人： SAMSUNG DISPLAY CO., LTD.
发明人： Jong-Hyun CHOUNG , In-Bae KIM , Hongsick PARK , Hyeonjeong SANG , Jaewoo JEONG , Byung uk KIM , Suk Il YOON , Se Hwan JUNG , Soon Beom HUH
IPC分类号： H01L21/02
CPC分类号： H01L21/02052 , C03C23/0075 , C11D3/042 , C11D3/046 , C11D3/2075 , C11D3/2082 , C11D3/2086 , C11D3/3409 , C11D7/08 , C11D7/10 , C11D7/265 , C11D11/0047 , H01L27/1262
摘要： A cleaning solution and a method for manufacturing a display device, the cleaning solution including about 2 wt % to about 12 wt % of nitric acid; about 0.5 wt % to about 15 wt % of an organic acid; about 0.1 wt % to about 10 wt % of a salt compound; about 0.01 wt % to about 3 wt % of an inorganic salt that includes fluorine; and a balance of water, all amounts being based on a total weight of the cleaning solution.
摘要翻译：一种清洁溶液和显示装置的制造方法，所述清洗液含有约2重量％〜约12重量％的硝酸; 约0.5重量％至约15重量％的有机酸; 约0.1重量％至约10重量％的盐化合物; 约0.01重量％至约3重量％的包含氟的无机盐; 和水的平衡，所有量基于清洁溶液的总重量。

2. 发明申请

US20150259598A1 ETCHANT COMPOSITION AND METHOD OF FORMING METAL WIRE AND THIN FILM TRANSISTOR ARRAY PANEL USING THE SAME 审中-公开
标题翻译：使用其形成金属线和薄膜晶体管阵列的蚀刻组合物和方法
公开(公告)号：US20150259598A1
公开(公告)日：2015-09-17
申请号：US14725849
申请日：2015-05-29
申请人： Samsung Display Co., Ltd. , DONGWOO FINE-CHEM CO., LTD.
发明人： In-Bae KIM , Jong-Hyun CHOUNG , Seon-Il KIM , Hong-Sick PARK , Wang Woo LEE , Jae-Woo JEONG , In Seol KUK , Sang-Tae KIM , Young-Chul PARK , Keyong Bo SHIM , In-Ho YU , Young-Jin YOON , Suck-Jun LEE , Joon-Woo LEE , Sang-Hoon JANG , Young-Jun JIN
IPC分类号： C09K13/08 , H01L21/32 , H01L21/3213 , H01L27/12
CPC分类号： C22F1/18 , C09K13/00 , C09K13/04 , C09K13/06 , C09K13/08 , C23F1/14 , C23F1/18 , C23F1/26 , C23F1/44 , H01L21/28008 , H01L21/32 , H01L21/32134 , H01L27/124 , H01L27/1288 , H05K3/067
摘要： A etchant composition that includes, based on a total weight of the etchant composition, about 0.5 wt % to about 20 wt % of a persulfate, about 0.5 wt % to about 0.9 wt % of an ammonium fluoride, about 1 wt % to about 10 wt % of an inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 10.0 wt % of a sulfonic acid, about 5 wt % to about 10 wt % of an organic acid or a salt thereof, and a remainder of water. The etchant composition may be configured to etch a metal layer including copper and titanium, to form a metal wire that may be included in a thin film transistor array panel of a display device.
摘要翻译：一种蚀刻剂组合物，其包含基于蚀刻剂组合物的总重量为约0.5重量％至约20重量％的过硫酸盐，约0.5重量％至约0.9重量％的氟化铵，约1重量％至约10重量％无机酸的重量百分比，约0.5重量％至约5重量％的环胺化合物，约0.1重量％至约10.0重量％的磺酸，约5重量％至约10重量％的有机酸，或其盐，剩余的水。蚀刻剂组合物可以被配置为蚀刻包括铜和钛的金属层，以形成可以包括在显示装置的薄膜晶体管阵列面板中的金属线。

3. 发明申请

US20140125904A1 LIQUID CRYSTAL DISPLAY 有权
标题翻译：液晶显示器
公开(公告)号：US20140125904A1
公开(公告)日：2014-05-08
申请号：US14046326
申请日：2013-10-04
申请人： Samsung Display Co., Ltd.
发明人： Jong-Hyun CHOUNG , Wang Woo LEE , Bong-Kyun KIM , In-Bae KIM , Seol-Il KIM , Young Min MOON , Hong Sick PARK , Ki Tae KIM
IPC分类号： G02F1/1368
CPC分类号： G02F1/133345 , G02F1/133707 , G02F1/134363 , G02F1/136259 , G02F1/1368 , G02F2001/134372 , G02F2001/136231 , G02F2001/136295 , G02F2201/124 , H01L27/1225
摘要： A liquid crystal display includes: a substrate; a gate line and a data line disposed on the substrate; a semiconductor layer disposed on the substrate; first and second field generating electrodes disposed on the substrate; and a first protecting layer formed from the same layer as the first field generating electrode and covering at least a portion of the data line.
摘要翻译：液晶显示器包括：基板; 设置在基板上的栅极线和数据线; 设置在所述基板上的半导体层; 设置在基板上的第一和第二场产生电极; 以及由与第一场产生电极相同的层形成并覆盖数据线的至少一部分的第一保护层。

4. 发明申请

US20140011352A1 METAL WIRE ETCHANT AND METHOD OF FORMING METAL WIRE USING THE SAME 有权
标题翻译：金属线材和使用该金属线形成金属线的方法
公开(公告)号：US20140011352A1
公开(公告)日：2014-01-09
申请号：US13728463
申请日：2012-12-27
申请人： SAMSUNG DISPLAY CO., LTD.
发明人： Jong-Hyun CHOUNG , In-Bae KIM , Seon-Il KIM , Hong Sick PARK , Jae Woo JEONG , Gyu-Po KIM , Won-Guk SEO , Hyun-Cheol SHIN , Ki-Beom LEE , Sam-Young CHO , Seung-Yeon HAN
IPC分类号： C23F1/18 , H01L21/48
CPC分类号： C23F1/18 , C23F1/26 , H01L21/4814
摘要： A metal wire etchant including persulfate, a sulfonate, a fluorine compound, an azole-based compound, an organic acid, a nitrate, and a chlorine compound, and a method of making the same.
摘要翻译：包括过硫酸盐，磺酸盐，氟化合物，唑类化合物，有机酸，硝酸盐和氯化合物的金属线蚀刻剂及其制备方法。

5. 发明申请

US20150220202A1 TOUCH SCREEN PANEL AND MANUFACTURING METHOD THEREOF 有权
标题翻译：触摸屏面板及其制造方法
公开(公告)号：US20150220202A1
公开(公告)日：2015-08-06
申请号：US14466673
申请日：2014-08-22
申请人： Samsung Display Co., Ltd.
发明人： Jong-Hyun CHOUNG , In-Bae KIM , Hong Sick PARK , Byeong-Jin LEE
IPC分类号： G06F3/041 , G06F3/044
CPC分类号： G06F3/0416 , G06F3/044 , G06F2203/04103 , G06F2203/04111
摘要： A touch screen panel and manufacturing method thereof are disclosed. In one aspect, the touch screen panel includes a substrate having a touch area and a peripheral area that surrounds the touch area and a plurality of first touch electrode patterns that are formed in the touch area, extend in a first direction, and are configured to transmit a first touch signal. The touch panel also includes a plurality of second touch electrode patterns that are formed in the touch area, extend in a second direction crossing the first direction, and are configured to transmit a second touch signal and a plurality of first driving circuit wirings that are formed in the peripheral area and are respectively electrically connected to the first touch electrode patterns. The first driving circuit wirings include a low resistance wiring layer.
摘要翻译：公开了触摸屏面板及其制造方法。一方面，触摸屏面板包括具有触摸区域和围绕触摸区域的周边区域的基板和形成在触摸区域中的多个第一触摸电极图案，沿第一方向延伸，并且被配置为发送第一触摸信号。触摸面板还包括形成在触摸区域中的多个第二触摸电极图案，沿与第一方向交叉的第二方向延伸，并且被配置为传输形成的第二触摸信号和多个第一驱动电路布线并且分别电连接到第一触摸电极图案。第一驱动电路布线包括低电阻布线层。

6. 发明申请

US20150140712A1 ETCHANT AND METHOD FOR MANUFACTURING DISPLAY DEVICE USING THE SAME 有权
标题翻译：用于制造使用该显示器件的显示器件的蚀刻和方法
公开(公告)号：US20150140712A1
公开(公告)日：2015-05-21
申请号：US14318815
申请日：2014-06-30
申请人： SAMSUNG DISPLAY CO., LTD. , DONGWOO FINE-CHEM CO., LTD.
发明人： Seon-il KIM , In-Bae KIM , HONGSICK PARK , Jong-Hyun CHOUNG , Inseol KUK , Suckjun LEE , Giyong NAM , Youngchul PARK , Inho YU , Youngjin YOON
IPC分类号： C23F1/18 , H01L21/3213
CPC分类号： C23F1/18 , C09K13/06 , C09K13/08 , C23F1/26 , H01L21/32134 , H01L27/124 , H01L27/1262
摘要： An etchant includes, based on a total amount of the etchant, from about 0.5 to about 20 wt % of a persulfate, from about 0.01 to about 2 wt % of a fluorine compound, from about 1 to about 10 wt % of an inorganic acid, from about 0.5 to about 5 wt % of an azole compound, from about 0.1 to about 5 wt % of an electron-donating compound, from about 0.1 to about 5 wt % of a chlorine compound, from about 0.05 to about 3 wt % of a copper salt, from about 0.1 to about 10 wt % of an organic acid or an organic acid salt, and a remaining amount of water.
摘要翻译：蚀刻剂包括基于蚀刻剂的总量约0.5至约20重量％的过硫酸盐，约0.01至约2重量％的氟化合物，约1至约10重量％的无机酸，约0.5至约5重量％的唑化合物，约0.1至约5重量％的给电子化合物，约0.1至约5重量％的氯化合物，约0.05至约3重量％的铜盐，约0.1至约10重量％的有机酸或有机酸盐，以及剩余量的水。

7. 发明申请

US20140024206A1 ETCHANT COMPOSITION AND METHOD OF FORMING METAL WIRE AND THIN FILM TRANSISTOR ARRAY PANEL USING THE SAME 有权
标题翻译：使用其形成金属线和薄膜晶体管阵列的蚀刻组合物和方法
公开(公告)号：US20140024206A1
公开(公告)日：2014-01-23
申请号：US13718557
申请日：2012-12-18
申请人： SAMSUNG DISPLAY CO., LTD. , DONGWOO FINE-CHEM CO., LTD.
发明人： In-Bae KIM , Jong-Hyun CHOUNG , Seon-Il KIM , Hong-Sick PARK , Wang Woo LEE , Jae-Woo JEONG , In Seol KUK , Sang-Tae KIM , Young-Chul PARK , Keyong Bo SHIM , In-Ho YU , Young-Jin YOON , Suck-Jun LEE , Joon-Woo LEE , Sang-Hoon JANG , Young-Jun JIN
IPC分类号： C23F1/18 , H01L21/28
CPC分类号： C22F1/18 , C09K13/00 , C09K13/04 , C09K13/06 , C09K13/08 , C23F1/14 , C23F1/18 , C23F1/26 , C23F1/44 , H01L21/28008 , H01L21/32 , H01L21/32134 , H01L27/124 , H01L27/1288 , H05K3/067
摘要： A etchant composition that includes, based on a total weight of the etchant composition, about 0.5 wt % to about 20 wt % of a persulfate, about 0.5 wt % to about 0.9 wt % of an ammonium fluoride, about 1 wt % to about 10 wt % of an inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 10.0 wt % of a sulfonic acid, about 5 wt % to about 10 wt % of an organic acid or a salt thereof, and a remainder of water. The etchant composition may be configured to etch a metal layer including copper and titanium, to form a metal wire that may be included in a thin film transistor array panel of a display device.
摘要翻译：一种蚀刻剂组合物，其包含基于蚀刻剂组合物的总重量为约0.5重量％至约20重量％的过硫酸盐，约0.5重量％至约0.9重量％的氟化铵，约1重量％至约10重量％无机酸的重量百分比，约0.5重量％至约5重量％的环胺化合物，约0.1重量％至约10.0重量％的磺酸，约5重量％至约10重量％的有机酸或其盐，剩余的水。蚀刻剂组合物可以被配置为蚀刻包括铜和钛的金属层，以形成可以包括在显示装置的薄膜晶体管阵列面板中的金属线。

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