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    • 7. 发明授权
    • Diol latex compositions and modified condensation polymers
    • 二醇胶乳组合物和改性缩合聚合物
    • US06197878B1
    • 2001-03-06
    • US09262156
    • 1999-03-03
    • David Logan MurrayAllan Scott JonesDouglas Weldon Carico, Jr.
    • David Logan MurrayAllan Scott JonesDouglas Weldon Carico, Jr.
    • C08L3100
    • C08J11/24C08J2367/02Y02W30/706
    • In a first aspect, the invention provides a diol latex composition comprising: (a) latex polymer particles comprising a residue of an ethylenically unsaturated monomer, wherein the latex polymer particles have a size below 1000 mn; (b) a surfactant; and (c) a continuous liquid phase comprising a diol component, wherein the diol component comprises from 60 to 100% by weight of the continuous phase, wherein the latex polymer particles are dispersed in the continuous phase. In a next aspect, the invention provides a method of making a condensation polymer/first polymer matrix comprising the steps of: (a) preparing a polymer colloid system comprising a first polymer dispersed in a liquid continuous phase; and (b) introducing the polymer colloid system into a condensation reaction medium prior to or during the condensation reaction, wherein the condensation reaction medium comprises (1) a diacid, di-isocyanate, dialkyl carbonate, diaryl carbonate, dihalo carbonate or a mixture thereof, wherein the liquid continuous phase, the condensation reaction medium or both comprises a diol component; and (c) polymerizing the diol component and component b(1), thereby forming a condensation polymer/first polymer matrix.
    • 在第一方面,本发明提供一种二醇胶乳组合物,其包含:(a)包含烯键式不饱和单体残基的胶乳聚合物颗粒,其中所述胶乳聚合物颗粒具有小于1000m的尺寸;(b)表面活性剂; 和(c)包含二醇组分的连续液相,其中所述二醇组分包含60-100重量%的连续相,其中胶乳聚合物颗粒分散在连续相中。 在下一方面,本发明提供了制备缩聚物/第一聚合物基质的方法,包括以下步骤:(a)制备包含分散在液体连续相中的第一聚合物的聚合物胶体体系; 和(b)在缩合反应之前或期间将聚合物胶体体系引入缩合反应介质中,其中缩合反应介质包括(1)二酸,二异氰酸酯,碳酸二烷基酯,碳酸二芳基酯,二卤代碳酸酯或其混合物 其中液体连续相,缩合反应介质或二者均包含二醇组分; 和(c)使二醇组分和组分b(1)聚合,由此形成缩聚物/第一聚合物基质。
    • 10. 发明授权
    • Polyester containing benzylidene having reduced fluorescence
    • 含有亚苄基的聚酯具有降低的荧光
    • US6001952A
    • 1999-12-14
    • US095036
    • 1998-06-10
    • Karen Lynn CarmanMartin Emerson RogersAllan Scott JonesMax Allen Weaver
    • Karen Lynn CarmanMartin Emerson RogersAllan Scott JonesMax Allen Weaver
    • C08G63/685C08K5/00C08K5/315C08L67/02C08G63/00
    • C08K5/0008C08G63/6854C08K5/315C08L67/02
    • A polymer composition having naphthalenedicarboxylic residue includes a fluorescence quenching benzylidene compound capable of absorbing ultraviolet light radiation. In a preferred embodiment, the composition includes at least a 0.1 mole percent of naphthalene-2,6-dicarboxylate and about 0.01 mole percent to about 5 mole percent of a benzylidene compound having the following structure: ##STR1## wherein R is selected from the group consisting of hydrogen, C.sub.1 -C.sub.8 alkyl, substituted C.sub.1 -C.sub.8 alkyl, C.sub.3 -C.sub.8 alkenyl, C.sub.3 -C.sub.8 alkynyl, C.sub.3 -C.sub.8 cycloalkyl, C.sub.3 -C.sub.8 cycloalkenyl and --R.sub.2 --X, wherein R.sub.2 is selected from the group consisting of C.sub.1 -C.sub.8 alkylene, C.sub.2 -C.sub.8 alkylene-O--C.sub.2 -C.sub.8 alkylene, C.sub.2 -C.sub.8 alkylene-S--C.sub.1 -C.sub.8 alkylene, C.sub.2 -C.sub.8 alkylene, C.sub.2 -C.sub.8 alkylene-S--C.sub.2 -C.sub.8 alkylene, C.sub.2 -C.sub.8 alkylene-N(SO.sub.2 C.sub.1-C.sub.8 alkyl)-C.sub.2 -C.sub.8 alkylene and X is selected from the group consisting of hydroxy, carboxy, carboalkoxy and acyloxy; R.sub.1 is hydrogen or has 1-3 groups independently selected from the group consisting of hydroxy, C.sub.1 -C.sub.8 alkyl, C.sub.1 -C.sub.8 alkoxy and halogen; Y is selected from the group consisting of carbalkoxy, cyano, carbamoyl, substituted carbamoyl, aryl, aroyl, C.sub.1 -C.sub.8 alkylsulfonyl and arylsulfonyl.
    • 具有萘二羧酸残基的聚合物组合物包括能够吸收紫外光辐射的荧光淬灭亚苄基化合物。 在优选的实施方案中,组合物包含至少0.1摩尔%的2,6-二甲酸萘酯和约0.01摩尔%至约5摩尔%的具有以下结构的亚苄基化合物:其中R选自 氢,C1-C8烷基,取代的C1-C8烷基,C3-C8烯基,C3-C8炔基,C3-C8环烷基,C3-C8环烯基和-R2-X,其中R2选自C1-C8 亚烷基,C2-C8亚烷基-O-C2-C8亚烷基,C2-C8亚烷基-S-C1-C8亚烷基,C2-C8亚烷基,C2-C8亚烷基-S-C2-C8亚烷基,C2-C8亚烷基-N( SO 2 C 1 -C 8烷基)-C 2 -C 8亚烷基,X选自羟基,羧基,烷氧羰基和酰氧基; R 1是氢或具有1-3个独立地选自羟基,C 1 -C 8烷基,C 1 -C 8烷氧基和卤素的基团; Y选自烷氧基,氰基,氨基甲酰基,取代的氨基甲酰基,芳基,芳酰基,C 1 -C 8烷基磺酰基和芳基磺酰基。