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    • 5. 发明申请
    • METALLIZATION OF SOLAR CELLS WITH DIFFERENTIATED P-TYPE AND N-TYPE REGION ARCHITECTURES
    • 具有不同P型和N型区域结构的太阳能电池的金属化
    • WO2017173385A1
    • 2017-10-05
    • PCT/US2017/025574
    • 2017-03-31
    • SUNPOWER CORPORATION
    • SMITH, David D.WEIDMAN, TimothyHARRINGTON, ScottBALU, Venkatasubramani
    • H01L31/18H01L31/028H01L31/0216H01L31/0236H01L31/0224
    • Methods of fabricating solar cell emitter regions with differentiated P-type and N-type regions architectures, and resulting solar cells, are described. In an example, a back contact solar cell can include a substrate having a light-receiving surface and a back surface. A first polycrystalline silicon emitter region of a first conductivity type is disposed on a first thin dielectric layer disposed on the back surface of the substrate. A second polycrystalline silicon emitter region of a second, different, conductivity type is disposed on a second thin dielectric layer disposed on the back surface of the substrate. A third thin dielectric layer is disposed over an exposed outer portion of the first polycrystalline silicon emitter region and is disposed laterally directly between the first and second polycrystalline silicon emitter regions. A first conductive contact structure is disposed on the first polycrystalline silicon emitter region. A second conductive contact structure is disposed on the second polycrystalline silicon emitter region. Metallization methods, include etching techniques for forming a first and second conductive contact structure are also described.
    • 描述了制造具有差异化的P型和N型区域架构的太阳能电池发射极区域的方法,以及所得到的太阳能电池。 在一个示例中,背接触太阳能电池可以包括具有光接收表面和背表面的衬底。 第一导电类型的第一多晶硅发射极区域设置在设置在基板背面上的第一薄介电层上。 第二不同导电类型的第二多晶硅发射极区域设置在设置在衬底背面上的第二薄介电层上。 第三薄介电层设置在第一多晶硅发射极区的暴露的外部上,并且横向设置在第一和第二多晶硅发射极区之间。 第一导电接触结构设置在第一多晶硅发射区上。 第二导电接触结构设置在第二多晶硅发射区上。 还描述了金属化方法,包括用于形成第一和第二导电接触结构的蚀刻技术。