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    • 3. 发明申请
    • ETCHING OF SOLAR CELL MATERIALS
    • 太阳能电池材料的蚀刻
    • WO2005013321A3
    • 2006-02-02
    • PCT/US2004023198
    • 2004-07-19
    • SUNPOWER CORPROSE DOUGLAS HURALWONG PONGSTHORNSMITH DAVID D
    • ROSE DOUGLAS HURALWONG PONGSTHORNSMITH DAVID D
    • H01L20060101H01L31/00H01L31/18C23F1/00C23F1/18C23F1/20C23F1/34C23F1/36
    • H01L31/022425H01L31/02008H01L31/18
    • A solar cell is fabricated by etching one or more of its layers without substantially etching another layer of the solar cell. In one embodiment, a copper layer in the solar cell is etched (506) without substantially etching a topmost metallic layer comprising tin. For example, an etchant comprising sulfuric acid and hydrogen peroxide may be employed to etch the copper layer selective to the tin layer. A particular example of the aforementioned etchant is a Co-Bra Etch® etchant modified to comprise about 1% by volume of sulfuric acid, about 4% by volume of phosphoric acid, and about 2% by volume of stabilized hydrogen peroxide. In one embodiment, an aluminum layer in the solar cell is etched (514) without substantially etching the tin layer. For example, an etchant comprising potassium hydroxide may be employed to etch the aluminum layer without substantially etching the tin layer.
    • 通过蚀刻其一个或多个层而不基本上蚀刻太阳能电池的另一层来制造太阳能电池。 在一个实施例中,在基本上蚀刻包含锡的最顶层的金属层的同时蚀刻太阳能电池中的铜层(506)。 例如,可以使用包含硫酸和过氧化氢的蚀刻剂来蚀刻对锡层有选择性的铜层。 上述蚀刻剂的一个具体实例是改性为包含约1体积%的硫酸,约4体积%的磷酸和约2体积%的稳定的过氧化氢的Co-Bra Etch蚀刻剂。 在一个实施例中,蚀刻(514)太阳能电池中的铝层而基本上不蚀刻锡层。 例如,可以使用包含氢氧化钾的蚀刻剂来蚀刻铝层而基本上不蚀刻锡层。