专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2012165792A3 VACUUM DEPOSITION APPARATUS 审中-公开
标题翻译：真空沉积装置
公开(公告)号：WO2012165792A3
公开(公告)日：2013-02-07
申请号：PCT/KR2012004025
申请日：2012-05-22
申请人： SNU PRECISION CO LTD , KONG DOO WON , LEE JONG HA , LEE DONG HYUN , JUNG SUNG JEA , PARK SANG HYUN
发明人： KONG DOO WON , LEE JONG HA , LEE DONG HYUN , JUNG SUNG JEA , PARK SANG HYUN
IPC分类号： C23C14/24
CPC分类号： C23C16/4401 , C23C14/50 , C23C14/562 , C23C14/564 , C23C16/4586 , C23C16/545
摘要： The present invention relates to a vacuum deposition apparatus. The vacuum deposition apparatus for depositing a source onto a substrate disposed within a vacuum chamber according to the present invention includes: a substrate transfer part for transferring the substrate; a nozzle disposed to face the substrate transfer part, the nozzle spraying the source onto the substrate disposed on the substrate transfer part; and a temperature control part for controlling a surface temperature of the substrate transfer part to prevent the source from being deposited onto the substrate transfer part. Thus, since the source may be prevented from being particulated and deposited on the substrate transfer part for transferring the substrate, a decrease in productivity may be minimized.
摘要翻译：本发明涉及一种真空沉积设备。根据本发明的用于将源沉积到设置在真空室内的基板上的真空沉积设备包括：用于转移基板的基板转移部分; 设置成面对基板转印部的喷嘴，喷嘴将源喷射到设置在基板转印部上的基板上; 以及用于控制基板转印部件的表面温度以防止源沉积到基板转印部件上的温度控制部件。因此，由于可以防止源极被颗粒化并沉积在用于转移衬底的衬底转移部分上，所以可以使生产率的降低最小化。

2. 发明申请

WO2012165793A3 FUEL SUPPLY UNIT FOR A THIN FILM DEPOSITION APPARATUS 审中-公开
标题翻译：用于薄膜沉积装置的燃料供应单元
公开(公告)号：WO2012165793A3
公开(公告)日：2013-02-07
申请号：PCT/KR2012004026
申请日：2012-05-22
申请人： SNU PRECISION CO LTD , KONG DOO WON , PARK SANG HYUN , KWON JIN HWAN , CHA JEA JUNG , PARK BYOUNG MIN , LEE YOUNG KUK
发明人： KONG DOO WON , PARK SANG HYUN , KWON JIN HWAN , CHA JEA JUNG , PARK BYOUNG MIN , LEE YOUNG KUK
IPC分类号： C23C14/24 , C23C14/56
CPC分类号： C23C16/455 , C23C14/246 , C23C14/56
摘要： The present invention relates to a fuel supply unit for a thin film deposition apparatus. The fuel supply unit for a thin film deposition apparatus which supplies an evaporated material into an injector disposed within a chamber of the thin film deposition apparatus to inject the evaporated material according to the present invention includes: a container body having a storage space in which the evaporated material is stored, the container body having a discharge hole defined in one side thereof and being connected to the injector through a connection line; a piston body inserted to be movable in a straight linear direction into the storage space of the container body; at least two seat members that each include a seat part on an outer surface thereof and are disposed on an outer surface of the piston body; a transfer member including at least two contact rings respectively assembled with the seat parts of the seat members and closely attached to an inner surface of the storage space of the container body; and a pressing member applying a pressing force to the transfer member so that the transfer member is moved toward an outlet of the container body.
摘要翻译：本发明涉及一种用于薄膜沉积设备的燃料供应单元。本发明的薄膜蒸镀装置的燃料供给装置，其向蒸发材料供给设置在该薄膜沉积装置的室内的喷射器的喷射蒸镀材料的喷射装置，其特征在于，包括：容纳体，储存蒸发的物质，容器主体具有限定在其一侧的排放孔，并且通过连接线连接到喷射器; 活塞体，其插入以能够沿直线方向移动到所述容器主体的收纳空间; 至少两个座椅构件，每个座椅构件在其外表面上包括座椅部件，并且设置在所述活塞体的外表面上; 传送构件，其包括分别与所述座椅构件的所述座椅部件组装并且紧密地附接到所述容器主体的所述存储空间的内表面的至少两个接触环; 以及向所述转印构件施加按压力的按压构件，使得所述转印构件朝向所述容器主体的出口移动。

3. 发明公开

EP2562288A4 VACUUM DEPOSITION APPARATUS 审中-公开
标题翻译：真空分离装置
公开(公告)号：EP2562288A4
公开(公告)日：2015-06-10
申请号：EP12753370
申请日：2012-05-22
申请人： SNU PRECISION CO LTD
发明人： KONG DOO WON , LEE JONG HA , JUNG SUNG JEA , PARK SANG HYUN
IPC分类号： C23C14/24 , C23C14/50 , C23C14/56 , C23C16/44 , C23C16/458 , C23C16/54
CPC分类号： C23C16/4401 , C23C14/50 , C23C14/562 , C23C14/564 , C23C16/4586 , C23C16/545

4. 发明公开

EP2568060A4 FUEL SUPPLY UNIT FOR A THIN FILM DEPOSITION APPARATUS 审中-公开
标题翻译：燃料供应单元的薄膜沉积设备
公开(公告)号：EP2568060A4
公开(公告)日：2014-07-16
申请号：EP12790781
申请日：2012-05-22
申请人： SNU PRECISION CO LTD
发明人： KONG DOO WON , PARK SANG HYUN , KWON JIN HWAN , CHA JEA JUNG , PARK BYOUNG MIN , LEE YOUNG KUK
IPC分类号： C23C14/24 , C23C14/56
CPC分类号： C23C16/455 , C23C14/246 , C23C14/56

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式