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    • 1. 发明申请
    • MAGNETO-RESISTANCE EFFECT ELEMENT, MAGNETO-RESISTANCE EFFECT TYPE HEAD, MEMORY ELEMENT, AND METHOD FOR MANUFACTURING THEM
    • 磁阻效应元件,磁阻效应型头,记忆元件及其制造方法
    • WO1997045883A1
    • 1997-12-04
    • PCT/JP1997001830
    • 1997-05-28
    • SHIMADZU CORPORATIONMATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.SAKAKIMA, HiroshiSATOMI, MituoNAGAMACHI, ShinjiUEDA, Masahiro
    • SHIMADZU CORPORATIONMATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    • H01L43/08
    • G11B5/48G11C11/15H01L43/08Y10T428/1143
    • A magneto-resistance effect element, a magneto-resistance effect type head, a memory element which can provide large MR changes under smaller magnetic fields and a method for manufacturing them. The magneto-resistance effect element has a basic structure composed of a laminated body of a magnetic film, a nonmagnetic insulating film, and a magnetic film piled one upon another in this order and a conductive part which is sufficiently smaller in size than the contacting part between the nonmagnetic insulating film and the magnetic film is formed on the exposed part of the nonmagnetic insulating film so as to electrically connect the magnetic films to each other. In addition, electrode lead sections are provided on the upper and lower magnetic films. Alternatively, it is possible to form a cylindrical conductive part which is sufficiently made smaller in size than the contacting part between the nonmagnetic insulating film and the magnetic film in the nonmagnetic insulating film. The nonmagnetic insulating film is composed of the oxide or nitride of a conductor and the nitrogen or oxygen concentration in the conductive part can be made lower than that in the nonmagnetic insulating film. Moreover, the basic structure of the element can be constituted of a laminated body of a reversal-of-magnetization suppressing film, a magnetic film, a nonmagnetic insulating film, and a magnetic film by providing the reversal-of-magnetization suppressing film on the surface of one magnetic film so as to suppress the reversal of magnetization of the magnetic film.
    • 磁阻效应元件,磁阻效应型头,可在较小磁场下提供大的MR变化的存储元件及其制造方法。 磁阻效应元件具有基本结构,该基本结构由依次堆叠的磁性膜,非磁性绝缘膜和磁性膜的层压体组成,导电部的尺寸比接触部分小得多 在非磁性绝缘膜的暴露部分上形成非磁性绝缘膜和磁性膜之间,以将磁性膜彼此电连接。 此外,电极引线部设置在上下磁性膜上。 或者,可以形成与非磁性绝缘膜中的非磁性绝缘膜和磁性膜之间的接触部分相比尺寸更小的圆柱形导电部件。 非磁性绝缘膜由导体的氧化物或氮化物构成,导电部中的氮或氧的浓度可以比非磁性绝缘膜低。 此外,元件的基本结构可以由磁化反转抑制膜,磁性膜,非磁性绝缘膜和磁性膜的层叠体构成,通过在磁体上设置反转磁化抑制膜 一个磁性膜的表面,以抑制磁性膜的磁化反转。
    • 5. 发明申请
    • SOFT X-RAY LITHOGRAPHIC SYSTEM
    • 软X射线光刻系统
    • WO1987000644A1
    • 1987-01-29
    • PCT/JP1986000376
    • 1986-07-18
    • SHIMADZU CORPORATIONMAKABE, HidekiIWAHASHI, Kenji
    • SHIMADZU CORPORATION
    • G03F07/20
    • B82Y10/00G03F7/70316G21K1/06G21K2201/064
    • Conventional soft X-ray lithographic system employing proximity exposure method is advanced by rendering the system feasibility of reductive projection method which has been proved of its merit in photo-lithography and the present inventive imaging system comprises basically a soft X-ray source which is emissive like a point source, a spherically concaved reflector to converge the soft X-ray onto a Fresnel zone plate (FZP) wherein a mask pattern or an original to be copied is positioned between the reflector and the FZP so that the soft X-ray will transmit through the mask pattern to form a reduced image or copy thereof on a resist coated target substrate. Therefore, the present invention will be most advantageously applied to patterning jobs in IC industry.
    • 使用接近曝光方法的常规软X射线光刻系统通过提供还原投影方法的系统可行性得到提高,已经证明其在光刻中的优点,并且本发明的成像系统基本上包括发射的软X射线源 像点源,球形凹面的反射器,将软X射线会聚到菲涅耳带状区域(FZP)上,其中要复制的掩模图案或原件位于反射器和FZP之间,使得软X射线将 通过掩模图案传输以在抗蚀剂涂覆的目标基底上形成缩小的图像或其副本。 因此,本发明将最有利地应用于IC工业中的图案化工作。
    • 7. 发明申请
    • X-RAY REFLECTIVE MASK AND SYSTEM FOR IMAGE FORMATION WITH USE OF THE SAME
    • 用于图像形成的X射线反射掩模和系统
    • WO1987006028A2
    • 1987-10-08
    • PCT/JP1987000177
    • 1987-03-24
    • SHIMADZU CORPORATIONIWAHASHI, Kenji
    • SHIMADZU CORPORATION
    • G03F01/00
    • B82Y10/00B82Y40/00G03F1/24G03F7/2039G03F7/70283G03F7/70316
    • X-ray lithography which has been applied, for instance, to reproduction of a pattern for integrated electronic circuit wherein the proximity method is prevailed with use of a transmissive patterned mask. But this conventional method is defective, for instance, in difficulty of dimensional reduction from an original pattern. In contrast, the disclosed invention overcomes such defect by introducing an X-ray reflective mask element, instead of conventional type of transmission. The reflective mask element is comprised of a crystalline substrate to reflect incident X-ray according to the Bragg's diffraction rule, which was worked out of a crystalline body having outwardly curved lattice surfaces, wherein the substrate face is formed to have an inclination against the lattice surfaces so that reflection at center of the substrate face will converge to a point on normal line assumed at the same center. Another aspect of the disclosure herein is directed to a system for X-ray projection and image formation with use of said mask element, additionally comprising an X-ray source, a Fresnel zone plate.
    • 已经应用于例如用于集成电子电路的图案的再现的X射线光刻,其中使用透射型图案掩模来实现接近方法。 但是,这种传统方法是有缺陷的,例如难以从原始图案中减小尺寸。 相比之下,本发明通过引入X射线反射掩模元件而不是常规类型的传输来克服这种缺陷。 反射掩模元件由结晶基底构成,以根据布拉格衍射规则反射入射的X射线,其由具有向外弯曲的格子表面的晶体制成,其中基底面形成为具有对格子的倾斜 使得基板面的中心处的反射会聚到在同一中心假设的法线上的点。 本文公开的另一方面涉及一种使用所述掩模元件进行X射线投射和图像形成的系统,该系统还包括X射线源,菲涅耳带区。
    • 9. 发明申请
    • EMISSION SPECTRAL ANALYSIS METHOD AND INSTRUMENT THEREFOR
    • 发射光谱分析方法及其仪器
    • WO1995003536A1
    • 1995-02-02
    • PCT/JP1994001216
    • 1994-07-25
    • KAWASAKI STEEL CORPORATIONSHIMADZU CORPORATIONSUGIHARA, Takashi
    • KAWASAKI STEEL CORPORATIONSHIMADZU CORPORATION
    • G01N21/67
    • G01N21/67
    • An improved emission spectral analysis method for analyzing a sample by causing discharge and light emission between the sample and the counter electrode, spectroscopically dispersing the spectral lines peculiar to the elements, and measuring the wavelength and intensity of each spectral line. The discharge is caused in such a way that the surface of the sample facing the counter electrode is made to almost parallel with the light gathering axis of a spectroscope. Consequently spectral lines which are not affected by the light of the sample itself and vapor cloud can be gathered into the spectroscope and the background variation of the spectral lines can be reduced. In addition, light is gathered in a plurality of direction, so that the analysis accuracy can be improved and the lower determination limit can be expanded.
    • 一种改进的发射光谱分析方法,用于通过在样品和对电极之间引起放电和发光来分析样品,光谱分散元件特有的谱线,并测量每个谱线的波长和强度。 以使得面对对电极的样品的表面几乎与分光器的聚光轴几乎平行的方式引起放电。 因此,不受样品本身和蒸气云的光影响的谱线可以聚集到分光镜中,并且可以减少谱线的背景变化。 另外,光在多个方向上聚集,从而可以提高分析精度,并且可以扩大较低的确定极限。