专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

EP3205993A4 PRESSURE SENSOR 有权
公开(公告)号：EP3205993A4
公开(公告)日：2018-03-07
申请号：EP15849018
申请日：2015-09-28
申请人： UNIV TOKYO , SEIKO INSTR INC
发明人： SHIMOYAMA ISAO , MATSUMOTO KIYOSHI , TAKAHASHI HIDETOSHI , NGUYEN MINH-DUNG , UCHIYAMA TAKESHI , OUMI MANABU , SHINOHARA YOKO , SUDA MASAYUKI
IPC分类号： G01L9/00 , G01L1/22 , G01L23/10 , H01L29/84
CPC分类号： G01L1/18 , G01L1/2206 , G01L1/2262 , G01L9/00 , G01L9/0002 , G01L9/0022 , G01L23/10 , H01L29/84
摘要： The present invention is a pressure sensor (1) which includes a sensor main body (2) having a cavity, a cantilever (3) having a lever main body (20) and a lever support portion (21A, 21B) and which is bent according to a pressure difference between the cavity and the outside of the sensor main body (2), and a displacement detection unit (4) which detects displacement of the cantilever (3) based on resistance variation in resistance values of the main body-resistance portion (31) formed in the lever main body (20) and a lever-resistance portion (32) formed in the lever support portion (21A, 21B). A division groove (40) is formed in the lever support (21A), and the division groove (40) divides the lever-resistance portion (32) into a first resistance portion (32a) which is electrically connected to a detection electrode (35) in series and a second resistance portion (32b) which is positioned so as to be closer to the other adjacent lever support portion (21B) than the first resistance portion (32a). The first resistance portion (32a) of the lever support portion (21A, 21B) is electrically connected to the detection electrode (35) via a parallel path of a first path (S1) passing through the main body-resistance portion (31) and a second path (S2) passing through the second resistance portion (32b).

2. 发明公开

EP3118598A4 PRESSURE SENSOR 有权
公开(公告)号：EP3118598A4
公开(公告)日：2017-11-08
申请号：EP15762325
申请日：2015-02-27
申请人： SEIKO INSTR INC , UNIV TOKYO
发明人： SHIMOYAMA ISAO , MATSUMOTO KIYOSHI , TAKAHASHI HIDETOSHI , NGUYEN MINH-DUNG , UCHIYAMA TAKESHI , OUMI MANABU , SHINOHARA YOKO , SUDA MASAYUKI
IPC分类号： G01L9/00 , G01L23/18 , H01L29/84
CPC分类号： G01L9/0052 , G01L9/0002 , G01L9/0019 , G01L23/18
摘要： The present invention relates to a pressure sensor (1) which detects variation in pressures, the pressure sensor including a cantilever (4) which is bent according to a pressure difference between the inside and the outside of a cavity in a sensor main body, and an intra-lever gap (21) which is formed on a proximal end portion (4a) of the cantilever. The proximal end portion is partitioned into a first support portion (22) and a second support portion (23) by an intra-lever gap in a second direction (L2) orthogonal to a first direction (L1) in which the proximal end portion and a distal end portion (4b) are connected to each other in plan view. A doped layer (24) which is provided on a portion of the first and second support portions forms a first displacement detection portion (25) and a second displacement detection portion (26). Lengths of the first and second displacement detection portions are shorter than those of the first and second supports along the second direction.

3. 发明专利

DE69734221T2 未知
公开(公告)号：DE69734221T2
公开(公告)日：2006-05-11
申请号：DE69734221
申请日：1997-03-27
申请人： SEIKO INSTR INC
发明人： SUDA MASAYUKI , SAKUHARA TOSHIHIKO , ATAKA TATSUAKI
IPC分类号： B23H3/00 , G01N27/416 , B81C99/00 , C25D21/12 , C25F3/00 , C25F7/00 , G01Q60/10 , G01Q70/08 , G01Q80/00 , G11B9/14
摘要： An electrochemical cell is constructed with the use of a four-electrode system that comprises a probe 1, material to be worked 2, reference electrode 10 and outer electrode 11. Respective potentials of the probe 1 and material to be worked 2 are set to be at potentials that cause no electrochemical reaction to occur. Then, the Z-axial position of the probe 1 is controlled so that the tunnel current that flows between the probe 1 and the material to be worked 2 may be fixed. Then, while the probe 1 is being moved along a working line, the Z-axial position of the probe 1 is stored continuously in a memory device 8 whereby storage is performed of the irregularities configuration and inclinations of the material to be worked 2. When working is performed, the electrochemical cell is reconstructed in the form of a three-electrode system that comprises the probe 1, material to be worked 2, and reference electrode 10, whereby, the probe 1 is again moved along the working line while controlling the Z-axial position of the probe 1 to be kept at the stored position or a position that has been obtained by adding thereto a certain offset. Simultaneously, a voltage is applied between the probe 1 and the material to be worked 2 to thereby perform the working operation along the working line through an electrochemical reaction.

4. 发明专利

DE69316419D1 未知
公开(公告)号：DE69316419D1
公开(公告)日：1998-02-26
申请号：DE69316419
申请日：1993-03-05
申请人： SEIKO INSTR INC
发明人： SHINOGI MASATAKA , SAKUHARA TOSHIHIKO , SUDA MASAYUKI , IWASAKI FUMIHARU
IPC分类号： B23H7/22 , B81C99/00 , C23F4/00 , C25D5/18 , C25D7/12 , C25D17/10 , C25F3/14 , C25F7/00
摘要： An electrochemical fine processing apparatus for electrochemically performing an adding processing and a removing processing of a substance such as a metal or a polymer in a solution in order to produce a structure necessitating a high aspect ratio. Removing electrodes for applying an electric potential opposite to that of an addition electrode are disposed around the addition electrode, thereby an excess portion of metal or polymer film pattern can be scraped electrochemically. In addition, alternate electric potentials are applied successively for each pulse to the addition electrode and next to removing electrodes. It becomes possible to form on the sample a structure with sharp pattern end portion and high aspect ratio.

5. 发明公开

EP3163275A4 PRESSURE CHANGE MEASURING APPARATUS AND PRESSURE CHANGE MEASURING METHOD 有权
公开(公告)号：EP3163275A4
公开(公告)日：2018-03-07
申请号：EP14895825
申请日：2014-06-25
申请人： SEIKO INSTR INC
发明人： SHINOHARA YOKO , UCHIYAMA TAKESHI , OUMI MANABU , SUDA MASAYUKI
IPC分类号： G01L7/00 , G01L9/00 , G01L13/06
CPC分类号： G01L23/10 , G01L9/0002 , G01L9/0052
摘要： An arithmetic processing unit (30) included in a pressure change measuring apparatus (1) includes: a differential pressure calculation unit configured to obtain a pressure difference between an inner pressure of a cavity (10) and a pressure to be measured based on an output signal of a differential pressure measuring cantilever (4); a pressure-to-be-measured calculating unit configured to calculate the pressure to be measured based on a set inner pressure of the cavity (10) and the differential pressure calculated by the differential pressure calculation unit; a flow rate calculating unit configured to calculate a flowing quantity of a pressure transmission medium flowing into and out of the cavity (10) for every unit of a predetermined time period based on the differential pressure calculated by the differential pressure calculation unit; and an inner pressure updating unit configured to calculate the inner pressure of the cavity (10) after the predetermined time period based on the flowing quantity calculated by the flow rate calculating unit and a volume of the cavity (10), and to update, to the calculated inner pressure, a set value of the inner pressure of the cavity (10) to be used by the pressure-to-be-measured calculating unit.

6. 发明专利

DE69734221D1 未知
公开(公告)号：DE69734221D1
公开(公告)日：2006-02-02
申请号：DE69734221
申请日：1997-03-27
申请人： SEIKO INSTR INC
发明人： SUDA MASAYUKI , SAKUHARA TOSHIHIKO , ATAKA TATSUAKI
IPC分类号： B23H3/00 , B81C99/00 , C25D21/12 , C25F3/00 , C25F7/00 , G01N27/416 , G01Q60/10 , G01Q70/08 , G01Q80/00 , G11B9/14
摘要： An electrochemical cell is constructed with the use of a four-electrode system that comprises a probe 1, material to be worked 2, reference electrode 10 and outer electrode 11. Respective potentials of the probe 1 and material to be worked 2 are set to be at potentials that cause no electrochemical reaction to occur. Then, the Z-axial position of the probe 1 is controlled so that the tunnel current that flows between the probe 1 and the material to be worked 2 may be fixed. Then, while the probe 1 is being moved along a working line, the Z-axial position of the probe 1 is stored continuously in a memory device 8 whereby storage is performed of the irregularities configuration and inclinations of the material to be worked 2. When working is performed, the electrochemical cell is reconstructed in the form of a three-electrode system that comprises the probe 1, material to be worked 2, and reference electrode 10, whereby, the probe 1 is again moved along the working line while controlling the Z-axial position of the probe 1 to be kept at the stored position or a position that has been obtained by adding thereto a certain offset. Simultaneously, a voltage is applied between the probe 1 and the material to be worked 2 to thereby perform the working operation along the working line through an electrochemical reaction.

7. 发明专利

DE69824125D1 未知
公开(公告)号：DE69824125D1
公开(公告)日：2004-07-01
申请号：DE69824125
申请日：1998-12-03
申请人： SEIKO INSTR INC
发明人： IRIE REIKO , SUDA MASAYUKI , SAKUHARA TOSHIHIKO , ATAKA TATSUAKI
IPC分类号： B23H5/00 , B23H1/00 , B23H9/00 , B81B5/00 , C25D1/00 , H03M1/12 , G01D5/353 , B29C33/56 , B23H3/00 , A01N59/26
摘要： A machining solution for removal-machining an object to be machined 103 is introduced to a machining solution container 101, and a predetermined voltage is applied to between the machining electrode 104 and the object to be machined 103 to cause electrochemical reaction thereby fabricating a part cast mold. Then the machining solution is changed to a machining solution for metal layer formation to effect additional machining on a surface of the cast mold by forming a metal layer. Then the machining solution is changed to a machining solution for part formation to effect additional machining inside the cast mold by forming a part. Finally the machining solution is changed to a machining solution for dissolving the metal layer to take out the fabricated part.

8. 发明专利

DE69316419T2 未知
公开(公告)号：DE69316419T2
公开(公告)日：1998-05-07
申请号：DE69316419
申请日：1993-03-05
申请人： SEIKO INSTR INC
发明人： SHINOGI MASATAKA , SAKUHARA TOSHIHIKO , SUDA MASAYUKI , IWASAKI FUMIHARU
IPC分类号： B23H7/22 , B81C99/00 , C23F4/00 , C25D5/18 , C25D7/12 , C25D17/10 , C25F3/14 , C25F7/00
摘要： An electrochemical fine processing apparatus for electrochemically performing an adding processing and a removing processing of a substance such as a metal or a polymer in a solution in order to produce a structure necessitating a high aspect ratio. Removing electrodes for applying an electric potential opposite to that of an addition electrode are disposed around the addition electrode, thereby an excess portion of metal or polymer film pattern can be scraped electrochemically. In addition, alternate electric potentials are applied successively for each pulse to the addition electrode and next to removing electrodes. It becomes possible to form on the sample a structure with sharp pattern end portion and high aspect ratio.

9. 发明专利

DE19529170A1 Photolithography mask prodn. system 未知
公开(公告)号：DE19529170A1
公开(公告)日：1996-02-15
申请号：DE19529170
申请日：1995-08-08
申请人： SEIKO INSTR INC
发明人： SUDA MASAYUKI , ANDO AKITO , ATAKA TATSUAKI
IPC分类号： G03F1/00 , B41N1/14 , B41M1/06
摘要： The prodn. system has a transparent electrically conductive film applied to a transparent mask substrate (1), which is then immersed in an electrolyte soln. (5) and displaced relative to the front end of a working electrode (2) in 2 dimensions. The required mask pattern is formed in the mask substrate by the electrochemical reaction obtained when a given voltage is applied across the electrode and the transparent conductive film. Pref. the 2-dimensional mask pattern is formed with a given voltage applied between the electrode and the transparent conductive film, with subsequent electrochemical deposition of an opaque material onto the latter from the electrolytic soln.

10. 发明专利

DE19529170B4 未知
公开(公告)号：DE19529170B4
公开(公告)日：2006-09-14
申请号：DE19529170
申请日：1995-08-08
申请人： SEIKO INSTR INC
发明人： SUDA MASAYUKI , ANDO AKITO , ATAKA TATSUAKI
IPC分类号： G03F1/00
摘要： A method of forming a mask for photolithography comprises forming a transparent conductive film on a transparent substrate. The substrate and an electrode having a sharp front end are immersed in an electrolytic solution. The sharp front end of the electrode and the transparent film are then positioned close to each other while controlling a distance therebetween. The substrate and the electrode are then scanned relative to each other in two-dimensions while maintaining the distance between the sharp front end of the electrode and the transparent film constant. Thereafter, an electrochemical reaction is processed on the substrate while a voltage is applied between the transparent film and the electrode to form a mask pattern on the substrate. During repair of the mask thus formed, the substrate and the electrode are immersed in the electrolytic solution. The sharp front end of the electrode and a portion of the mask pattern to be repaired are positioned close to one another, and a distance between the sharp front end of the electrode and the mask pattern is controlled by detecting a tunnelling current flowing therebetween. Thereafter, a voltage is applied between the electrode and the mask pattern to either deposit a pattern material onto the portion of the mask pattern to be repaired or to dissolve a pattern material from the portion of the substrate pattern to be repaired.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式