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1. 发明申请

US20030039896A1 Exposure device, exposure method, semiconductor device manufacturing method, electro-optical device, and electronic appliance 有权
标题翻译：曝光装置，曝光方法，半导体装置制造方法，电光装置和电子设备
公开(公告)号：US20030039896A1
公开(公告)日：2003-02-27
申请号：US10201153
申请日：2002-07-24
申请人： SEIKO EPSON CORPORATION
发明人： Chiharu Iriguchi
IPC分类号： G03F009/00 , G03C005/00
CPC分类号： G03F7/70558 , G03F7/7035 , G03F7/70608 , G03F9/703 , G03H1/0408 , G03H1/22 , G03H1/2286 , G03H2001/0094 , G03H2223/18
摘要： In an exposure device 100 having a vertically movable stage device 120, and which performs exposure by projecting a pattern recorded on a hologram mask 130 onto a substrate to be exposed 110 on which is formed a photosensitive material film 112 and which is placed on the above stage device, a film thickness measurement mechanism 160, 162 measures the thickness of the photosensitive material film 112, and based on the measured film thickness a light amount control mechanism 162 controls the amount of exposure light from the exposure light source 140. An appopriate amount of light is set according to the film thickness, so that an accurate pattern can be formed in a single exposure pass.
摘要翻译：在具有垂直可移动台装置120的曝光装置100中，并且通过将记录在全息图掩模130上的图案投影到待形成的感光材料膜112并被放置在其上的待曝光基板110上进行曝光薄膜厚度测量机构160,162测量感光材料薄膜112的厚度，并且基于所测量的薄膜厚度，光量控制机构162控制来自曝光光源140的曝光量。适量根据膜厚度设定光，从而可以在单次曝光过程中形成精确的图案。

2. 发明申请

US20030203284A1 Method for forming micropore, method for manufacturing semiconductor device, semiconductor device, display unit, and electronic device 审中-公开
标题翻译：微孔形成方法，半导体装置的制造方法，半导体装置，显示装置以及电子装置
公开(公告)号：US20030203284A1
公开(公告)日：2003-10-30
申请号：US10395147
申请日：2003-03-25
申请人： SEIKO EPSON CORPORATION
发明人： Chiharu Iriguchi , Mitsutoshi Miyasaka
IPC分类号： G03H001/04 , G03H001/10 , G03F007/40 , G03F007/16 , H01L029/04 , H01L031/036 , H01L029/76 , H01L031/112 , H01L027/148 , H01L021/00 , H01L021/84
CPC分类号： H01L29/66757 , G03F7/70125 , G03F7/70408 , G03H1/0408 , G03H2001/0094 , H01L29/78603 , H01L29/78675
摘要： The invention forms micropores by an off-axis holographic exposure process. A method of forming micropores in a substrate includes: forming a photosensitive material layer on a substrate using a photosensitive material; applying a reconstruction beam on a holographic mask, which has a pattern that is formed by an off-axis holographic exposure process and has high resolution in a predetermined direction, to allow the holographic mask to emit a first diffracted beam, and then exposing the photosensitive material layer to the first diffracted beam; causing the holographic mask to rotate at a predetermined angle with respect to the substrate or causing the substrate to rotate at a predetermined angle with respect to the holographic mask, applying the reconstruction beam to the holographic mask to emit a second diffracted beam, and then exposing the photosensitive material layer to the second diffracted beam; removing unnecessary portions from the photosensitive material layer by developing the photosensitive material layer; and forming micropores in the substrate by etching the substrate using the resulting photosensitive material layer on the substrate.
摘要翻译：本发明通过离轴全息曝光工艺形成微孔。在基板中形成微孔的方法包括：使用感光材料在基板上形成感光材料层; 将重建光束施加在全息掩模上，全息掩模具有通过离轴全息曝光工艺形成的图案，并且在预定方向上具有高分辨率，以允许全息掩模发射第一衍射光束，然后曝光感光材料层到第一衍射光束; 使全息掩模相对于基板以预定角度旋转或使基板相对于全息掩模以预定角度旋转，将重建光束施加到全息掩模以发射第二衍射光束，然后曝光感光材料层到第二衍射光束; 通过显影感光材料层从感光材料层去除不需要的部分; 并且通过使用所得到的感光材料层在衬底上蚀刻衬底，在衬底中形成微孔。

3. 发明申请

US20040256622A1 Thin film transistor type display device, method of manufacturing thin film element, thin film transistor circuit board, electro-optical device, and electronic apparatus 有权
标题翻译：薄膜晶体管型显示装置，薄膜元件制造方法，薄膜晶体管电路基板，电光装置及电子装置
公开(公告)号：US20040256622A1
公开(公告)日：2004-12-23
申请号：US10764502
申请日：2004-01-27
申请人： SEIKO EPSON CORPORATION
发明人： Mutsumi Kimura , Chiharu Iriguchi
IPC分类号： H01L029/76
CPC分类号： H01L27/1266 , H01L27/1214
摘要： The invention reduces the size of an element chip and reduces the manufacturing cost in a thin film transistor type display device in which thin film transistors are formed on a first substrate, wiring lines are formed on a second substrate, and the element chip, including one or more thin film transistors, is peeled off from the first substrate and transferred to the second substrate. In the patterning process of the thin film transistors, holographic lithography or a dynamic auto focus system is used, a design rule of 1.0 nullm or less is used, and only a polycrystalline silicon layer and a first metal layer are used as the wiring lines of the element chip.
摘要翻译：本发明在第一基板上形成薄膜晶体管的薄膜晶体管型显示装置中减少了元件芯片的尺寸并降低了制造成本，在第二基板上形成布线，并且元件芯片包括一个或更多的薄膜晶体管从第一衬底剥离并转移到第二衬底。在薄膜晶体管的图案化处理中，使用全息光刻或动态自动聚焦系统，使用1.0μm以下的设计规则，并且仅使用多晶硅层和第一金属层作为布线元件芯片。

4. 发明申请

US20040185353A1 Aligner, exposing method, method for manufacturing thin-film transistor, display device, and electronic device using shading means 有权
标题翻译：对准器，曝光方法，制造薄膜晶体管的方法，显示装置和使用遮蔽装置的电子装置
公开(公告)号：US20040185353A1
公开(公告)日：2004-09-23
申请号：US10790221
申请日：2004-03-02
申请人： SEIKO EPSON CORPORATION
发明人： Chiharu Iriguchi
IPC分类号： G03C005/00 , G03C005/04
CPC分类号： G03F7/70408
摘要： An aligner to expose any exposure area includes an exposure light source that emits an exposure beam having a specified width to expose the exposure area to light; a douser having a width corresponding to at least the width of the exposure beam; and a shading unit to prevent the exposure beam from reaching an area other than the exposure area by driving the douser to shut off part or all of the exposure beam. The aligner is capable of forming different exposure areas with high density and having a structure suitable to reduce the size of the entire unit.
摘要翻译：用于曝光任何曝光区域的对准器包括：曝光光源，其发射具有指定宽度的曝光光束，以将曝光区域曝光; 具有至少对应于曝光光束的宽度的宽度的浸渍器; 以及遮光单元，用于通过驱动曝光器来遮断曝光光束的一部分或全部来防止曝光光束到达曝光区域以外的区域。对准器能够形成具有高密度的不同曝光区域并且具有适于减小整个单元的尺寸的结构。

5. 发明申请

US20040103950A1 Liquid quantity determination unit, photolithography apparatus, and liquid quantity determination method 失效
标题翻译：液量确定单元，光刻设备和液量确定方法
公开(公告)号：US20040103950A1
公开(公告)日：2004-06-03
申请号：US10394034
申请日：2003-03-24
申请人： SEIKO EPSON CORPORATION
发明人： Chiharu Iriguchi
IPC分类号： G03B027/32 , G03B027/54 , G03H001/00 , G02B001/06 , G02B003/12 , G02B017/00 , G01N021/00 , G01B009/00 , B65B001/04 , B65B003/04 , B65B001/30 , B65B003/26
CPC分类号： G03F7/70341 , G02B1/06 , G03F7/7035 , G03H1/0005 , G03H1/0408 , G03H2001/0094 , G03H2223/25
摘要： nullObjectnull To automate determination of the quantity of a index matching liquid. nullSolving Meansnull The invention is a liquid quantity determination unit for determining the quantity of a filling liquid (204) to be filled between a plurality of optical components (200, 202), and includes an inspection beam emitting unit (260) for emitting an inspection beam substantially vertically to an opposed surface (203) of one of a pair of the optical components (202) facing each other with the filling liquid (204) interposed therebetween, a transporting unit (262) for transporting the inspection beam emitting unit (260) to emit the inspection beam to a desired inspection point on the opposed surface, a reflecting point identifying unit (240) for identifying the reflecting point of the inspection beam based on a reflected beam of the inspection beam emitted from the inspection beam emitting unit (260) toward the opposed surface (230), and a determination unit (264) for determining the presence or absence of the filling liquid at the inspection point based on the reflecting point determined by the reflecting point identifying unit (240).
摘要翻译： [对象]自动确定指标匹配液体的数量。解决方案本发明是一种用于确定要填充在多个光学部件（200,202）之间的填充液体（204）的量的液体量确定单元，并且包括用于发射的检查光束发射单元（260）基本上垂直于一对光学部件（202）中的一个的相对表面（203）的检查光束，所述光学部件（202）中插入有所述填充液体（204）彼此面对;传送单元（262），用于传送所述检查光束发射单元（260），用于将检查光束发射到相对表面上的期望检查点;反射点识别单元（240），用于基于从检查光束发射的检查光束发射的反射光束来识别检查光束的反射点单元（260）朝向相对表面（230），以及确定单元（264），用于基于反射点确定在检查点处的充满液体的存在或不存在由所述反射点识别单元确定。

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