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    • 9. 发明申请
    • METHODS OF MAKING FLASH MEMORY CELL ARRAYS HAVING DUAL CONTROL GATES PER MEMORY CELL CHARGE STORAGE ELEMENT
    • 每个存储单元充电存储元件制作具有双重控制门的闪存存储单元阵列的方法
    • WO2007121343A3
    • 2007-12-21
    • PCT/US2007066610
    • 2007-04-13
    • SANDISK CORPHARARI ELIYAHOUSAMACHISA GEORGE
    • HARARI ELIYAHOUSAMACHISA GEORGE
    • H01L21/8247G11C16/04H01L27/115
    • H01L27/115G11C16/0483H01L27/11521H01L27/11524H01L29/42336
    • Methods of fabricating a dual control gate non-volatile memory array are described. Parallel strips (1705) of floating gate material are formed over the substrate (1700) in a first direction but separated from it by a tunnel dielectric (1702). In the gaps between these strips control gate material (1735) is forming a second set of parallel strips but insulated from both the adjacent floating gate stripes and the substrate. Both sets of strips are isolated in a second direction perpendicular to the first direction forming an array of individual floating gates and control gates. The control gates formed from an individual control gate strip are then interconnected by a conductive wordline (1735) such that the potential on individual floating gates is controlled by the voltages on two adjacent wordlines. In other variations either the floating gates or the control gates may be recessed into the original substrate.
    • 描述了制造双重控制门非易失性存储器阵列的方法。 浮动栅极材料的平行条(1705)在第一方向上形成在衬底(1700)上方,但是由隧道电介质(1702)与其隔开。 在这些条带之间的间隙中,控制栅极材料(1735)正在形成第二组平行条带,但与相邻的浮栅条和基板两者绝缘。 两组条带在垂直于第一方向的第二方向上被隔离,形成单独的浮动栅极和控制栅极的阵列。 然后,由单独的控制栅极条形成的控制栅极通过导电字线(1735)互连,使得各个浮动栅极上的电位由两个相邻字线上的电压控制。 在其他变型中,浮动栅极或控制栅极可以凹入原始衬底。