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1. 发明授权

US07645559B2 Positive resist composition and method of forming resist pattern 有权
标题翻译：正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US07645559B2
公开(公告)日：2010-01-12
申请号：US12064288
申请日：2006-08-16
申请人： Ryoji Watanabe , Masaru Takeshita
发明人： Ryoji Watanabe , Masaru Takeshita
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0045 , C08F220/28 , G03F7/0397 , Y10S430/111 , Y10S430/122
摘要： A positive resist composition and method of forming a resist pattern are provided which enable formation of a resist pattern having excellent shape with reduced LWR.The positive resist composition includes a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon irradiation, the resin component (A) having a structural unit (a1) which has an acetal-type protection group, and the acid-generator component (B) including an acid generator (B1) having a cation moiety represented by general formula (b-5) shown below: wherein Ra and Rb each independently represents an alkyl group, an alkoxy group, a halogen atom or a hydroxyl group; Rc represents an aryl group or alkyl group which may or may not have a substituent; and n′ and n″ each independently represents an integer of 0 to 3.
摘要翻译：提供一种正型抗蚀剂组合物和形成抗蚀剂图案的方法，其能够形成具有优异形状的抗蚀剂图案，其具有减小的LWR。正型抗蚀剂组合物包括在酸作用下表现出增加的碱溶性的树脂组分（A）和在照射时产生酸的酸产生剂组分（B），具有结构单元（a1）的树脂组分（A）具有缩醛型保护基和含有具有下述通式（b-5）表示的阳离子部分的酸发生剂（B1）的酸发生剂成分（B）：其中，Ra和Rb各自独立地表示烷基，烷氧基，卤素原子或羟基; Rc表示可以具有或不具有取代基的芳基或烷基; n'和n“各自独立地表示0〜3的整数。

2. 发明授权

US08247159B2 Positive resist composition and method of forming resist pattern 有权
标题翻译：正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US08247159B2
公开(公告)日：2012-08-21
申请号：US12299529
申请日：2007-04-18
申请人： Masaru Takeshita , Ryoji Watanabe
发明人： Masaru Takeshita , Ryoji Watanabe
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0397
摘要： A positive resist composition including a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a structural unit (a0) represented by general formula (a0) shown below and a structural unit (a1) derived from an acrylate ester having a polycyclic group-containing, acid dissociable, dissolution inhibiting group of a tertiary alkyl ester-type: wherein: R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; Y1 represents an aliphatic cyclic group; Z represents a tertiary alkyl group-containing group; a represents an integer of 1 to 3, and b represents an integer of 0 to 2, such that a+b=1 to 3; and each of c, d and e independently represents an integer of 0 to 3.
摘要翻译：一种正型抗蚀剂组合物，其包含在酸作用下表现出增加的碱溶性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），所述树脂组分（A）包含由由下述通式（a0）表示的结构单元（a1）和由具有含多环基团的酸解离性溶解抑制基团的叔烷基酯型的丙烯酸酯衍生的结构单元（a1）：其中：R表示氢原子，卤素原子，低级烷基或卤代低级烷基; Y1表示脂肪族环状基团; Z表示含叔烷基的基团; a表示1〜3的整数，b表示0〜2的整数，a + b = 1〜3。 c，d和e各自独立地表示0〜3的整数。

3. 发明授权

US07776511B2 Positive resist composition and method of forming resist pattern 有权
标题翻译：正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US07776511B2
公开(公告)日：2010-08-17
申请号：US12299523
申请日：2007-05-18
申请人： Masaru Takeshita , Ryoji Watanabe
发明人： Masaru Takeshita , Ryoji Watanabe
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/111
摘要： A positive resist composition including a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a structural unit (a0-1) represented by general formula (a0-1) shown below and a structural unit (a0-2) represented by general formula (a0-2) shown below: wherein: R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of Y1 and Y3 independently represents an aliphatic cyclic group; Z represents a tertiary alkyl group-containing group or an alkoxyalkyl group; a represents an integer of 1 to 3, and b represents an integer of 0 to 2, such that a+b=1 to 3; each of c, d and e independently represents an integer of 0 to 3; each of g and h independently represents an integer of 0 to 3; and i represents an integer of 1 to 3.
摘要翻译：包含在酸作用下表现出增加的碱溶性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B）的正型抗蚀剂组合物，包括结构单元（a0-1）的树脂组分（A）由下述通式（a0-1）表示的结构单元（a0-2）和下述通式（a0-2）表示的结构单元（a0-2）表示：其中：R表示氢原子，卤素原子，低级烷基或卤代低级烷基; Y 1和Y 3各自独立地表示脂族环基; Z表示含叔烷基的基团或烷氧基烷基; a表示1〜3的整数，b表示0〜2的整数，a + b = 1〜3。 c，d和e各自独立地表示0〜3的整数， g和h各自独立地表示0〜3的整数， i表示1〜3的整数。

4. 发明申请

US20090246683A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：正电阻组合物和形成电阻图案的方法
公开(公告)号：US20090246683A1
公开(公告)日：2009-10-01
申请号：US12064288
申请日：2006-08-16
申请人： Ryoji Watanabe , Masaru Takeshita
发明人： Ryoji Watanabe , Masaru Takeshita
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0045 , C08F220/28 , G03F7/0397 , Y10S430/111 , Y10S430/122
摘要： A positive resist composition and method of forming a resist pattern are provided which enable formation of a resist pattern having excellent shape with reduced LWR.The positive resist composition includes a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon irradiation, the resin component (A) having a structural unit (a1) which has an acetal-type protection group, and the acid-generator component (B) including an acid generator (B1) having a cation moiety represented by general formula (b-5) shown below: wherein Ra and Rb each independently represents an alkyl group, an alkoxy group, a halogen atom or a hydroxyl group; Rc represents an aryl group or alkyl group which may or may not have a substituent; and n′ and n″ each independently represents an integer of 0 to 3.
摘要翻译：提供一种正型抗蚀剂组合物和形成抗蚀剂图案的方法，其能够形成具有优异形状的抗蚀剂图案，其具有减小的LWR。正型抗蚀剂组合物包括在酸作用下表现出增加的碱溶性的树脂组分（A）和在照射时产生酸的酸产生剂组分（B），具有结构单元（a1）的树脂组分（A）具有缩醛型保护基和含有具有下述通式（b-5）表示的阳离子部分的酸发生剂（B1）的酸发生剂成分（B）：其中，Ra和Rb各自独立地表示烷基，烷氧基，卤素原子或羟基; Rc表示可以具有或不具有取代基的芳基或烷基; n'和n“各自独立地表示0〜3的整数。

5. 发明申请

US20090075204A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：正电阻组合物和形成电阻图案的方法
公开(公告)号：US20090075204A1
公开(公告)日：2009-03-19
申请号：US12299523
申请日：2007-05-18
申请人： Masaru Takeshita , Ryoji Watanabe
发明人： Masaru Takeshita , Ryoji Watanabe
IPC分类号： G03F7/027 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/111
摘要： A positive resist composition including a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a structural unit (a0-1) represented by general formula (a0-1) shown below and a structural unit (a0-2) represented by general formula (a0-2) shown below: wherein: R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of Y1 and Y3 independently represents an aliphatic cyclic group; Z represents a tertiary alkyl group-containing group or an alkoxyalkyl group; a represents an integer of 1 to 3, and b represents an integer of 0 to 2, such that a+b=1 to 3; each of c, d and e independently represents an integer of 0 to 3; each of g and h independently represents an integer of 0 to 3; and i represents an integer of 1 to 3.
摘要翻译：包含在酸作用下表现出增加的碱溶性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B）的正型抗蚀剂组合物，包括结构单元（a0-1）的树脂组分（A）由下述通式（a0-1）表示的结构单元（a0-2）和下述通式（a0-2）表示的结构单元（a0-2）表示：其中：R表示氢原子，卤素原子，低级烷基或卤代低级烷基; Y 1和Y 3各自独立地表示脂族环基; Z表示含叔烷基的基团或烷氧基烷基; a表示1〜3的整数，b表示0〜2的整数，a + b = 1〜3。 c，d和e各自独立地表示0〜3的整数， g和h各自独立地表示0〜3的整数， i表示1〜3的整数。

6. 发明申请

US20090068592A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：正电阻组合物和形成电阻图案的方法
公开(公告)号：US20090068592A1
公开(公告)日：2009-03-12
申请号：US12299529
申请日：2007-04-18
申请人： Masaru Takeshita , Ryoji Watanabe
发明人： Masaru Takeshita , Ryoji Watanabe
IPC分类号： G03F7/027 , G03F7/20
CPC分类号： G03F7/0397
摘要： A positive resist composition including a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a structural unit (a0) represented by general formula (a0) shown below and a structural unit (a1) derived from an acrylate ester having a polycyclic group-containing, acid dissociable, dissolution inhibiting group of a tertiary alkyl ester-type: wherein: R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; Y1 represents an aliphatic cyclic group; Z represents a tertiary alkyl group-containing group; a represents an integer of 1 to 3, and b represents an integer of 0 to 2, such that a+b 1 to 3; and each of c, d and e independently represents an integer of 0 to 3.
摘要翻译：一种正型抗蚀剂组合物，其包含在酸作用下表现出增加的碱溶性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），所述树脂组分（A）包含由由下述通式（a0）表示的结构单元（a1）和由具有含多环基团的酸解离性溶解抑制基团的叔烷基酯型的丙烯酸酯衍生的结构单元（a1）：其中：R表示氢原子，卤素原子，低级烷基或卤代低级烷基; Y1表示脂肪族环状基团; Z表示含叔烷基的基团; a表示1〜3的整数，b表示0〜2的整数，a + b 1〜3; c，d和e各自独立地表示0〜3的整数。

7. 发明授权

US07953302B2 Image processing method and image processing computer program 有权
标题翻译：图像处理方法和图像处理计算机程序
公开(公告)号：US07953302B2
公开(公告)日：2011-05-31
申请号：US12010720
申请日：2008-01-29
申请人： Ryoji Watanabe , Akihiko Takada , Masayoshi Sakakibara , Hajime Kishimoto , Yasuo Horino , Toshiyuki Yano , Yasuhiro Matsuo
发明人： Ryoji Watanabe , Akihiko Takada , Masayoshi Sakakibara , Hajime Kishimoto , Yasuo Horino , Toshiyuki Yano , Yasuhiro Matsuo
IPC分类号： G06K9/20 , H04N1/40 , G06F15/00
CPC分类号： H04N1/00331 , H04N1/00127 , H04N1/00342 , H04N1/32138 , H04N2201/0081 , H04N2201/0082 , H04N2201/3225 , H04N2201/3274
摘要： Information indicating an area of an image and information indicating attributes of the image have been stored in an IC chip attached to an original paper. When a copying apparatus performs a character recognition process operation with respect to an image displayed on the original paper, the copying apparatus reads the information related to the area of the image and the information related to the attribute of this area from the IC chip attached to this original paper. Then the copying apparatus separates an area where a character is displayed therefrom. The copying apparatus executes the character recognition process operation with respect to the image of the separated area.
摘要翻译：指示图像的区域的信息和指示图像的属性的信息已经存储在附着在原稿上的IC芯片中。当复印装置对原纸上显示的图像执行字符识别处理操作时，复制装置从附加到IC卡的IC芯片读取与图像的区域相关的信息和与该区域的属性有关的信息这张原文。然后，复制装置将字符从其显示的区域分离。复制装置对分离区域的图像执行字符识别处理操作。

8. 发明授权

US07880871B2 Recording sheet moving device, image forming device, and recording sheet moving method 有权
标题翻译：记录纸移动装置，图像形成装置和记录纸移动方法
公开(公告)号：US07880871B2
公开(公告)日：2011-02-01
申请号：US12336065
申请日：2008-12-16
申请人： Toshiyuki Kazama , Michio Tada , Ryoji Watanabe , Shouichi Maeda , Makoto Ochiai , Tatsunori Izawa , Naoto Nishi , Yoshinobu Nakamura , Satoshi Kanou , Shun Yashima
发明人： Toshiyuki Kazama , Michio Tada , Ryoji Watanabe , Shouichi Maeda , Makoto Ochiai , Tatsunori Izawa , Naoto Nishi , Yoshinobu Nakamura , Satoshi Kanou , Shun Yashima
IPC分类号： G01B3/36
CPC分类号： B65H9/106 , B65H7/02 , B65H2511/11 , B65H2511/414 , B65H2513/40 , B65H2515/112 , B65H2801/06 , B65H2220/01 , B65H2220/03 , B65H2220/02
摘要： A recording sheet moving device includes: a moving unit that moves a recording sheet; a recording sheet specifying unit that specifies a length in the transport direction and a weight per unit area of the recording sheet; a first memory configured to record, for each of plural recording sheets, a threshold for a length in the transport direction in association with a weight per unit area; and a movement control unit that retrieves a threshold for a length on the basis of the specified weight per unit area from the first memory, and compares the retrieved threshold for a length and the specified length, to determine whether to cause the moving unit to move the recording sheet, and if it is determined that the recording sheet should be moved, causes the moving unit to move the recording sheet.
摘要翻译：记录纸移动装置包括：移动记录纸张的移动单元; 记录纸张指定单元，其指定记录纸的传送方向上的长度和每单位面积的重量; 第一存储器，被配置为针对每个多个记录片材，记录与每单位面积的重量相关联的传送方向上的长度的阈值; 以及移动控制单元，其基于来自第一存储器的每单位面积的指定权重检索长度的阈值，并且将检索到的长度和指定长度的阈值进行比较，以确定是否使移动单元移动记录纸，并且如果确定记录纸应该被移动，则使移动单元移动记录纸。

9. 发明申请

US20100035192A1 METHOD OF FORMING RESIST PATTERN 失效
标题翻译：形成电阻图案的方法
公开(公告)号：US20100035192A1
公开(公告)日：2010-02-11
申请号：US12533685
申请日：2009-07-31
申请人： Tomoyuki Ando , Sho Abe , Ryoji Watanabe , Komei Hirahara
发明人： Tomoyuki Ando , Sho Abe , Ryoji Watanabe , Komei Hirahara
IPC分类号： G03F7/20
CPC分类号： G03F7/2022 , G03F7/095
摘要： A method of forming a resist pattern including: forming a resist film on a substrate using a chemically amplified negative resist composition; forming a latent image of a first line and space pattern by subjecting the resist film to first exposure through a photomask; forming a latent image of a second line and space pattern so as to intersect with the latent image of the first line and space pattern by subjecting the resist film to second exposure through a photomask; and subjecting the resist film to developing to form a hole pattern in the resist film.
摘要翻译：一种形成抗蚀剂图案的方法，包括：使用化学放大型负性抗蚀剂组合物在基板上形成抗蚀剂膜; 通过使抗蚀剂膜首先通过光掩模曝光来形成第一线和空间图案的潜像; 通过使光刻胶膜通过光掩模进行第二曝光，形成与第一线和空间图案的潜像相交的第二线和空间图案的潜像; 并且使抗蚀剂膜显影以在抗蚀剂膜中形成孔图案。

10. 发明申请

US20090257074A1 RECORDING MATERIAL MOVING DEVICE AND IMAGE FORMING DEVICE 有权
标题翻译：记录材料移动装置和图像形成装置
公开(公告)号：US20090257074A1
公开(公告)日：2009-10-15
申请号：US12332033
申请日：2008-12-10
申请人： Toshiyuki Kazama , Ryoji Watanabe , Shouichi Maeda , Makoto Ochiai , Tatsunori Izawa , Naoto Nishi , Yoshinobu Nakamura , Satoshi Kanou , Shun Yashima , Michio Tada
发明人： Toshiyuki Kazama , Ryoji Watanabe , Shouichi Maeda , Makoto Ochiai , Tatsunori Izawa , Naoto Nishi , Yoshinobu Nakamura , Satoshi Kanou , Shun Yashima , Michio Tada
IPC分类号： H04N1/60
CPC分类号： H04N1/053 , H04N1/12 , H04N2201/02439 , H04N2201/04712 , H04N2201/04734 , H04N2201/04737 , H04N2201/04756 , H04N2201/04794
摘要： A recording material moving device comprises: a position adjuster that moves a recording material in a direction which is parallel to a recording surface of the recording material and orthogonal to a transporting direction, in an upstream side of a recording position along the transport direction of the recording material; a reference position specifying unit that specifies a reference position; a determination unit that determines whether a range of a predetermined width centered on the reference position exceeds a movable range of the recording material within which the recording material can be moved by the position adjuster; and a controller that causes, if the determination unit determines that the movable range is not exceeded, the position adjuster to sequentially move the recording material within the movable range of the predetermined width centered on the reference position each time a condition for moving the recording material is satisfied.
摘要翻译：记录材料移动装置包括：位置调节器，其沿着沿着记录材料的传送方向在记录位置的上游侧沿着与记录材料的记录表面平行的方向并且与传送方向垂直的方向移动记录材料录音材料; 参考位置指定单元，其指定参考位置; 确定单元，其确定以所述基准位置为中心的预定宽度的范围是否超过所述记录材料的可移动范围，所述记录材料可通过所述位置调节器移动到所述可移动范围内; 以及控制器，如果所述确定单元确定未超过所述可移动范围，则所述位置调整器在每次所述记录材料的移动条件时，将所述记录材料顺序地移动到以所述基准位置为中心的所述预定宽度的可移动范围内满意

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