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    • 1. 发明授权
    • Object picking system
    • 对象采摘系统
    • US5772392A
    • 1998-06-30
    • US699985
    • 1996-08-20
    • Ryoichi OkuraYutaka Saeki
    • Ryoichi OkuraYutaka Saeki
    • B65G1/137B65G59/06A01C9/00
    • B65G1/1376
    • An object picking system includes a plurality of object storage and discharge devices. Each object storage and discharge device includes an object storage section housing a stack of objects and an object discharge mechanism for discharging the bottommost object of the stack of objects. Each object discharge device is inclined so that part of the weight of the objects rests on the sides of the object storage sections. Each object storage section accommodates a support between a top and bottom of the object storage section to support an upper stack of objects in the object storage section. The support reduces the load on the bottommost object when the stack of objects in the object storage section is large. An auxiliary panel along one side of the object storage section has an adjustable position so that different size objects can be securely held in the object storage section. A horizontal plate is a predetermined height above a bottom surface of the object storage section. The horizontal plate and the bottom surface form a discharge port. The predetermined height of the horizontal plate is adjustable making height of the discharge port adjustable so that different size objects can be discharged.
    • 物品拾取系统包括多个物体存放装置。 每个物体储存和排出装置包括容纳物体堆的物体存储部分和用于排放物体堆叠的最底部物体的物体排出机构。 每个物体排出装置倾斜,使得物体的重量的一部分位于物体存储部分的侧面上。 每个对象存储部分容纳对象存储部分的顶部和底部之间的支撑,以支撑对象存储部分中的上部堆叠的对象。 当对象存储部分中的对象堆叠较大时,支持减少最底层对象上的负载。 沿着物体存储部分的一侧的辅助面板具有可调节位置,使得可以将不同尺寸的物体牢固地保持在物体存储部分中。 水平板是物体存储部的底面之上的预定高度。 水平板和底面形成排出口。 水平板的预定高度是可调节的,使得排出口的高度可调节,使得可以排出不同尺寸的物体。
    • 2. 发明授权
    • Object picking device
    • 物体拾取装置
    • US5713718A
    • 1998-02-03
    • US699627
    • 1996-08-19
    • Ryoichi OkuraYutaka Saeki
    • Ryoichi OkuraYutaka Saeki
    • B65G1/137B65G47/08B65G59/06
    • B65G59/068
    • An object discharge mechanism of an object picking device for discharging a bottommost object from a stack of objects includes a bottom platform on which the bottommost object of the stack of objects rests. The platform has a longitudinal slot running along an object discharge direction. The upper portion of a belt, stretched between two vertically mounted pulleys, runs through the longitudinal slot parallel to the upper surface of the bottom platform. Discharge projections are mounted periodically on an outer surface of the belt. The discharge projections push objects across the bottom platform in the object discharge direction when the belt is rotated. The object discharge mechanism also includes a lifting member for lifting all objects above the bottommost object in the stack of objects. The lifting member reduces the frictional force created by the weight of the stack of objects on the bottommost object during discharge of the bottommost object. A controller controls the speed at which the discharge projections travel during the discharge process. Specifically, the speed at which the discharge projections contact the objects to be discharged is dependent on the fragility of the object to be discharged such that the discharge projection moves slowly when contacting objects that are fragile and moves at a maximum speed when contacting objects that are not easy to break.
    • 用于从物体堆放出最下面的物体的物体拾取装置的物体排出机构包括底部平台,物体堆叠的最底部物体停靠在底部平台上。 平台具有沿物体排出方向延伸的纵向槽。 在两个垂直安装的滑轮之间延伸的带的上部穿过平行于底部平台的上表面的纵向狭槽。 放电突起周期性地安装在带的外表面上。 当皮带旋转时,排出突起在物体排放方向上推动物体穿过底部平台。 物体排放机构还包括用于提升物体堆叠中最底部物体上方的所有物体的提升构件。 提升构件在最下面的物体排放期间降低由最下面的物体上的物体堆的重量产生的摩擦力。 控制器控制放电过程中放电突起行进的速度。 具体地说,放电突起与放电物体接触的速度取决于被放电物体的脆弱性,使得当接触物体时,当接触易碎物体并以最大速度移动时,放电突起移动缓慢 不容易打破
    • 4. 发明授权
    • Treatment apparatus
    • 治疗仪器
    • US5562383A
    • 1996-10-08
    • US583669
    • 1996-01-05
    • Hiroyuki IwaiTamotsu TanifujiTakanobu AsanoRyoichi Okura
    • Hiroyuki IwaiTamotsu TanifujiTakanobu AsanoRyoichi Okura
    • H01L21/304H01L21/677H01L21/00
    • H01L21/67769H01L21/67772Y10S414/137Y10S414/139Y10S414/14
    • A treatment apparatus comprises a treatment chamber for performing a treatment for a workpiece W, a loading chamber connected to the treatment chamber, for loading and unloading a holding member which contains the workpiece into and from the treatment chamber, and an input/output chamber for inputting and outputting the workpiece to and from the loading chamber. The input/output chamber includes a cassette accommodating vessel port which holds a cassette accommodating vessel. The vessel is filled with clean air or an inert gas, and is airtightly closed. A cassette receiving mechanism is disposed below the port and lowers only the cassette of the vessel so as to receive the cassette. Thus, when the cassette is input and output to and from the outside of the treatment apparatus, the workpiece contained within the cassette is not exposed to the atmosphere in a working region. Consequently, it is not necessary to improve the cleanliness level of the atmosphere in the working region. As a result, the construction cost of the clean room and the operation cost thereof can be reduced. A clean air blowing device is disposed below the port. The clean air blowing device blows a side flow of clean air. Thus, the atmosphere at a position below the port where air tends to stay is circulated. Thus, since the surface of the workpiece loaded in the treatment chamber is exposed to the side flow, particles and the like that adhere thereto are purged.
    • 处理装置包括:处理室,用于对工件W进行处理,连接到处理室的装载室,用于将包含工件的保持构件装载到处理室和从处理室中卸载;以及输入/输出室, 将工件输入和输出到装载室。 输入/输出室包括容纳容纳容器的盒式磁带容纳容器端口。 容器内装有清洁空气或惰性气体,并且气密地关闭。 盒接收机构设置在端口下方,并且仅降低容器的盒以便接收盒。 因此,当盒子从处理设备的外部输入和输出时,包含在盒内的工件不会暴露在工作区域中的大气中。 因此,不需要提高工作区域的气氛的清洁度。 因此,能够降低洁净室的建筑成本及其运转成本。 清洁吹风装置设置在端口下方。 清洁吹风装置吹扫清洁空气的侧流。 因此,空气倾向于停留的港口下方的气氛被循环。 因此,由于装载在处理室中的工件的表面暴露于侧流,所以清除附着在其上的颗粒等。
    • 6. 发明申请
    • Cleaning apparatus, cleaning system using cleaning apparatus, cleaning method of substrate-to-be-cleaned
    • 清洁装置,使用清洁装置的清洁系统,待清洗基材的清洗方法
    • US20090084409A1
    • 2009-04-02
    • US11792994
    • 2005-12-14
    • Ryoichi OkuraTatsuro YoshidaYoshishige TakikawaOsamu Nakamura
    • Ryoichi OkuraTatsuro YoshidaYoshishige TakikawaOsamu Nakamura
    • H01L21/3105H01L21/677B08B3/04
    • G11B5/8404B08B3/02B08B15/02G02F1/1303G02F2001/1316H01L21/67051H01L21/67253
    • [Object] It is an object of the invention to provide a cleaning apparatus for cleaning a precision substrate capable of preventing a contamination factor from adhering again, to prevent a natural oxide film from being formed, and to prevent a water mark.[Solving Means] In a cleaning apparatus 1, a substrate-to-be-cleaned 2 is disposed in a container 3, and an atmosphere component measuring device 4 which measures an atmosphere in the container 3, gas supply means 5 for controlling an atmosphere, and gas discharge means 6 and 7 are disposed in the cleaning apparatus 1, the cleaning apparatus 1 includes at least one the gas supply means 5 which equally supplies gas from a portion opposed to a surface-to-be-cleaned, gas supply means 21 for supplying gas to a rotating/holding mechanism comprising a cylindrical stationary shaft 16, a fluid bearing 17 and a rotation support member 18, gas discharge means 7 for discharging gas into a drainage mechanism, and gas supply means 31 for supplying gas for controlling an atmosphere when cleaning liquid is injected. The atmosphere component measuring device 4 which measures the atmosphere in the cleaning apparatus 1 can measure at any timing, and can detect one or more of a flammable component, a combustible component and a oxdizer component.
    • 发明内容本发明的目的是提供一种用于清洁能够防止污染因子再次粘附的精密基板的清洁装置,以防止形成天然氧化物膜并防止水痕。 解决方法在清洁装置1中,将待清洗基体2设置在容器3内,测量容器3内的气氛的气氛成分测量装置4,气氛控制气体 ,并且排气装置6和7设置在清洁装置1中,清洁装置1包括至少一个气体供应装置5,其从与待清洁表面相对的部分等同地供应气体,气体供应装置 21,用于将气体供给到包括圆柱形固定轴16,流体轴承17和旋转支撑构件18的旋转/保持机构,用于将气体排放到排水机构中的气体排出装置7,以及用于供应气体的气体供给装置31 注入清洗液时的气氛。 测量清洁装置1中的气氛的气氛成分测量装置4可以在任何时刻测量,并且可以检测可燃组分,可燃组分和氧化剂组分中的一种或多种。
    • 7. 发明申请
    • Substrate Treatment Apparatus
    • 基板处理装置
    • US20070272357A1
    • 2007-11-29
    • US10592311
    • 2005-03-07
    • Tamio EndoRyoichi OkuraTatsuro YoshidaYoshishige Takikawa
    • Tamio EndoRyoichi OkuraTatsuro YoshidaYoshishige Takikawa
    • H01L21/306
    • H01L21/67051H01L21/6708
    • A plurality of liquid chemicals are fed onto a substrate to be treated, which is held and spinned, and the liquid chemicals scattered from the substrate to be treated by a rotator are separately recovered in respective recovery tanks (16 to 19) by each chemical. A lifting mechanism controls lifting operation of respective fences (3a to 3s) which form respective recovery tanks (16 to 19) so as to recover the liquid chemical into a certain recovery tank, while at the time, inlets of the other recovery tanks are closed at that time. Such a lifting mechanism includes a fence lifting plate provided with a cams portions 29a engaging with the respective fences (3a to 3d) to lift the corresponding fence, and performs lifting operation of the respective fences (3a to 3d) by rotating the fence lifting plate (29) around the shaft of the fence lifting plate (29) by a motor (34) so that the liquid chemical to be recovered is prevented from mixing in other recovery tanks.
    • 多个液体化学品被供给到待保持和旋转的待处理基板上,并且通过旋转器从待处理的基板散射的液体化学品通过每种化学品分别回收到相应的回收罐(16至19)中。 提升机构控制形成相应的回收罐(16至19)的相应栅栏(3 a至3 s)的提升操作,以便将液体化学品回收到某个回收罐中,而在其他回收罐的入口处 当时关闭。 这种提升机构包括:栅栏提升板,其具有与相应围栏(3a至3d)接合的凸轮部分29a,以提升对应的围栏,并且通过以下方式执行各个栅栏(3a至3d)的提升操作: 通过马达(34)将围栏提升板(29)围绕围栏提升板(29)的轴旋转,使得要回收的液体化学品被防止在其他回收罐中混合。
    • 8. 发明授权
    • Treatment apparatus
    • US5829939A
    • 1998-11-03
    • US667584
    • 1996-06-24
    • Hiroyuki IwaiTamotsu TanifujiTakanobu AsanoRyoichi Okura
    • Hiroyuki IwaiTamotsu TanifujiTakanobu AsanoRyoichi Okura
    • H01L21/304H01L21/677H01L21/00
    • H01L21/67769H01L21/67772Y10S414/137Y10S414/139Y10S414/14
    • A treatment apparatus comprises a treatment chamber for performing a treatment for a workpiece W, a loading chamber connected to the treatment chamber, for loading and unloading a holding member which contains the workpiece into and from the treatment chamber, and an input/output chamber for inputting and outputting the workpiece to and from the loading chamber. The input/output chamber includes a cassette accommodating vessel port which holds a cassette accommodating vessel. The vessel is filled with clean air or an inert gas, and is airtightly closed. A cassette receiving mechanism is disposed below the port and lowers only the cassette of the vessel so as to receive the cassette. Thus, when the cassette is input and output to and from the outside of the treatment apparatus, the workpiece contained within the cassette is not exposed to the atmosphere in a working region. Consequently, it is not necessary to improve the cleanliness level of the atmosphere in the working region. As a result, the construction cost of the clean room and the operation cost thereof can be reduced. A clean air blowing device is disposed below the port. The clean air blowing device blows a side flow of clean air. Thus, the atmosphere at a position below the port where air tends to stay is circulated. Thus, since the surface of the workpiece loaded in the treatment chamber is exposed to the side flow, particles and the like that adhere thereto are purged.