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1. 发明申请

US20090084409A1 Cleaning apparatus, cleaning system using cleaning apparatus, cleaning method of substrate-to-be-cleaned 审中-公开
标题翻译：清洁装置，使用清洁装置的清洁系统，待清洗基材的清洗方法
公开(公告)号：US20090084409A1
公开(公告)日：2009-04-02
申请号：US11792994
申请日：2005-12-14
申请人： Ryoichi Okura , Tatsuro Yoshida , Yoshishige Takikawa , Osamu Nakamura
发明人： Ryoichi Okura , Tatsuro Yoshida , Yoshishige Takikawa , Osamu Nakamura
IPC分类号： H01L21/3105 , H01L21/677 , B08B3/04
CPC分类号： G11B5/8404 , B08B3/02 , B08B15/02 , G02F1/1303 , G02F2001/1316 , H01L21/67051 , H01L21/67253
摘要： [Object] It is an object of the invention to provide a cleaning apparatus for cleaning a precision substrate capable of preventing a contamination factor from adhering again, to prevent a natural oxide film from being formed, and to prevent a water mark.[Solving Means] In a cleaning apparatus 1, a substrate-to-be-cleaned 2 is disposed in a container 3, and an atmosphere component measuring device 4 which measures an atmosphere in the container 3, gas supply means 5 for controlling an atmosphere, and gas discharge means 6 and 7 are disposed in the cleaning apparatus 1, the cleaning apparatus 1 includes at least one the gas supply means 5 which equally supplies gas from a portion opposed to a surface-to-be-cleaned, gas supply means 21 for supplying gas to a rotating/holding mechanism comprising a cylindrical stationary shaft 16, a fluid bearing 17 and a rotation support member 18, gas discharge means 7 for discharging gas into a drainage mechanism, and gas supply means 31 for supplying gas for controlling an atmosphere when cleaning liquid is injected. The atmosphere component measuring device 4 which measures the atmosphere in the cleaning apparatus 1 can measure at any timing, and can detect one or more of a flammable component, a combustible component and a oxdizer component.
摘要翻译：发明内容本发明的目的是提供一种用于清洁能够防止污染因子再次粘附的精密基板的清洁装置，以防止形成天然氧化物膜并防止水痕。解决方法在清洁装置1中，将待清洗基体2设置在容器3内，测量容器3内的气氛的气氛成分测量装置4，气氛控制气体，并且排气装置6和7设置在清洁装置1中，清洁装置1包括至少一个气体供应装置5，其从与待清洁表面相对的部分等同地供应气体，气体供应装置 21，用于将气体供给到包括圆柱形固定轴16，流体轴承17和旋转支撑构件18的旋转/保持机构，用于将气体排放到排水机构中的气体排出装置7，以及用于供应气体的气体供给装置31 注入清洗液时的气氛。测量清洁装置1中的气氛的气氛成分测量装置4可以在任何时刻测量，并且可以检测可燃组分，可燃组分和氧化剂组分中的一种或多种。

2. 发明申请

US20070272357A1 Substrate Treatment Apparatus 审中-公开
标题翻译：基板处理装置
公开(公告)号：US20070272357A1
公开(公告)日：2007-11-29
申请号：US10592311
申请日：2005-03-07
申请人： Tamio Endo , Ryoichi Okura , Tatsuro Yoshida , Yoshishige Takikawa
发明人： Tamio Endo , Ryoichi Okura , Tatsuro Yoshida , Yoshishige Takikawa
IPC分类号： H01L21/306
CPC分类号： H01L21/67051 , H01L21/6708
摘要： A plurality of liquid chemicals are fed onto a substrate to be treated, which is held and spinned, and the liquid chemicals scattered from the substrate to be treated by a rotator are separately recovered in respective recovery tanks (16 to 19) by each chemical. A lifting mechanism controls lifting operation of respective fences (3a to 3s) which form respective recovery tanks (16 to 19) so as to recover the liquid chemical into a certain recovery tank, while at the time, inlets of the other recovery tanks are closed at that time. Such a lifting mechanism includes a fence lifting plate provided with a cams portions 29a engaging with the respective fences (3a to 3d) to lift the corresponding fence, and performs lifting operation of the respective fences (3a to 3d) by rotating the fence lifting plate (29) around the shaft of the fence lifting plate (29) by a motor (34) so that the liquid chemical to be recovered is prevented from mixing in other recovery tanks.
摘要翻译：多个液体化学品被供给到待保持和旋转的待处理基板上，并且通过旋转器从待处理的基板散射的液体化学品通过每种化学品分别回收到相应的回收罐（16至19）中。提升机构控制形成相应的回收罐（16至19）的相应栅栏（3 a至3 s）的提升操作，以便将液体化学品回收到某个回收罐中，而在其他回收罐的入口处当时关闭。这种提升机构包括：栅栏提升板，其具有与相应围栏（3a至3d）接合的凸轮部分29a，以提升对应的围栏，并且通过以下方式执行各个栅栏（3a至3d）的提升操作：通过马达（34）将围栏提升板（29）围绕围栏提升板（29）的轴旋转，使得要回收的液体化学品被防止在其他回收罐中混合。

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