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1. 发明授权

US07821726B2 Optical element positioning apparatus, projection optical system and exposure apparatus 有权
标题翻译：光学元件定位装置，投影光学系统和曝光装置
公开(公告)号：US07821726B2
公开(公告)日：2010-10-26
申请号：US12171644
申请日：2008-07-11
申请人： Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
发明人： Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
IPC分类号： G02B7/02
CPC分类号： G02B7/005 , G02B7/1827 , G03F7/70258 , G03F7/70825
摘要： An optical element is moved in six-degrees-of-freedom. Three first displacement sensors are disposed on a base plate and measure respective displacement amounts of three mutually different points on the optical element in a first direction. A second displacement sensor measures a displacement amount of one point on the optical element in a second direction. Two third displacement sensors measure respective displacement amounts of two mutually different points on the optical element in a third direction. A transformation processor transforms the six measured displacement amounts. A calibration processor calibrates the transformed displacement amounts with a calibration matrix of which coefficients are previously obtained to calibrate the displacement amounts in the six-degrees-of-freedom, which have errors due to measurement errors of the displacement sensors. A controller outputs command values based on differences between the calibrated displacement amounts and target displacement amounts.
摘要翻译：光学元件以6自由度移动。三个第一位移传感器设置在基板上，并且在第一方向上测量光学元件上的三个相互不同的点的相应位移量。第二位移传感器在第二方向上测量光学元件上的一个点的位移量。两个第三位移传感器在第三方向测量光学元件上的两个相互不同的点的相应位移量。变换处理器转换六个测量的位移量。校准处理器使用预先获得系数的校准矩阵校准变换的位移量，以校准六自由度中的位移量，其由于位移传感器的测量误差而具有误差。控制器基于校准的位移量和目标位移量之间的差异输出命令值。

2. 发明申请

US20090021847A1 OPTICAL ELEMENT POSITIONING APPARATUS, PROJECTION OPTICAL SYSTEM AND EXPOSURE APPARATUS 有权
标题翻译：光学元件定位装置，投影光学系统和曝光装置
公开(公告)号：US20090021847A1
公开(公告)日：2009-01-22
申请号：US12171644
申请日：2008-07-11
申请人： Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
发明人： Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
IPC分类号： G02B7/00
CPC分类号： G02B7/005 , G02B7/1827 , G03F7/70258 , G03F7/70825
摘要： The apparatus includes a holder holding an optical element, a back plate supporting the optical element via the holder, a mechanism moving the optical element in a six-degree-of-freedom, a base plate supporting the back plate via the mechanism, and six displacement sensors disposed on the base plate and measuring displacement amounts of different points on the optical element. The displacement sensors includes three ones measuring them in a first direction, one measuring it in a second direction, and two ones measuring them in a third direction. The apparatus further includes a transformation processor transforming the six measured displacement amounts into displacement amounts of the optical element in the six-degree-of-freedom, a calibration processor calibrating the transformed displacement amounts, and a controller outputting command values to the displacing mechanism based on differences between the calibrated displacement amounts and target displacement amounts of the optical element.
摘要翻译：该装置包括保持光学元件的保持器，经由保持器支撑光学元件的背板，以六自由度移动光学元件的机构，经由机构支撑背板的基板，以及六个位移传感器设置在基板上并测量光学元件上的不同点的位移量。位移传感器包括在第一方向上测量它们的三个位移传感器，一个在第二方向上测量它们，并且在第三方向上测量它们的两个。该装置还包括变换处理器，将六个测量的位移量变换为六自由度中的光学元件的位移量，校准经变换的位移量的校准处理器，以及基于位移机构输出命令值的控制器在校准位移量和光学元件的目标位移量之间的差异。

3. 发明授权

US07948695B2 Optical element positioning apparatus, projection optical system and exposure apparatus 有权
标题翻译：光学元件定位装置，投影光学系统和曝光装置
公开(公告)号：US07948695B2
公开(公告)日：2011-05-24
申请号：US12870877
申请日：2010-08-30
申请人： Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
发明人： Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
IPC分类号： G02B7/02
CPC分类号： G02B7/005 , G02B7/1827 , G03F7/70258 , G03F7/70825
摘要： An optical element is moved in six-degrees-of-freedom. Three first displacement sensors are disposed on a base plate and measure respective displacement amounts of three mutually different points on the optical element in a first direction. A second displacement sensor measures a displacement amount of one point on the optical element in a second direction. Two third displacement sensors measure respective displacement amounts of two mutually different points on the optical element in a third direction. A transformation processor transforms the six measured displacement amounts. A calibration processor calibrates the transformed displacement amounts with a calibration matrix of which coefficients are previously obtained to calibrate the displacement amounts in the six-degrees-of-freedom, which have errors due to measurement errors of the displacement sensors. A controller outputs command values based on differences between the calibrated displacement amounts and target displacement amounts.
摘要翻译：光学元件以6自由度移动。三个第一位移传感器设置在基板上，并且在第一方向上测量光学元件上的三个相互不同的点的相应位移量。第二位移传感器在第二方向上测量光学元件上的一个点的位移量。两个第三位移传感器在第三方向测量光学元件上的两个相互不同的点的相应位移量。变换处理器转换六个测量的位移量。校准处理器使用预先获得系数的校准矩阵校准变换的位移量，以校准六自由度中的位移量，其由于位移传感器的测量误差而具有误差。控制器基于校准的位移量和目标位移量之间的差异输出命令值。

4. 发明申请

US20100321803A1 Optical Element Positioning Apparatus, Projection Optical System and Exposure Apparatus 有权
标题翻译：光学元件定位装置，投影光学系统和曝光装置
公开(公告)号：US20100321803A1
公开(公告)日：2010-12-23
申请号：US12870877
申请日：2010-08-30
申请人： Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
发明人： Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
IPC分类号： G02B7/00
CPC分类号： G02B7/005 , G02B7/1827 , G03F7/70258 , G03F7/70825
摘要： An optical element is moved in six-degrees-of-freedom. Three first displacement sensors are disposed on a base plate and measure respective displacement amounts of three mutually different points on the optical element in a first direction. A second displacement sensor measures a displacement amount of one point on the optical element in a second direction. Two third displacement sensors measure respective displacement amounts of two mutually different points on the optical element in a third direction. A transformation processor transforms the six measured displacement amounts A calibration processor calibrates the transformed displacement amounts with a calibration matrix of which coefficients are previously obtained to calibrate the displacement amounts in the six-degrees-of-freedom, which have errors due to measurement errors of the displacement sensors. A controller outputs command values based on differences between the calibrated displacement amounts and target displacement amounts.
摘要翻译：光学元件以6自由度移动。三个第一位移传感器设置在基板上，并且在第一方向上测量光学元件上的三个相互不同的点的相应位移量。第二位移传感器在第二方向上测量光学元件上的一个点的位移量。两个第三位移传感器在第三方向测量光学元件上的两个相互不同的点的相应位移量。变换处理器转换六个测量的位移量A校准处理器用先前获得的系数的校准矩阵校准变换的位移量，以校准六自由度中的位移量，其由于测量误差而发生错误位移传感器。控制器基于校准的位移量和目标位移量之间的差异输出命令值。

5. 发明申请

US20080068603A1 ANTI-VIBRATION APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：防振装置，曝光装置和装置制造方法
公开(公告)号：US20080068603A1
公开(公告)日：2008-03-20
申请号：US11846904
申请日：2007-08-29
申请人： Ryo Nawata , Mitsuru Inoue , Hiroshi Ito , Makoto Mizuno
发明人： Ryo Nawata , Mitsuru Inoue , Hiroshi Ito , Makoto Mizuno
IPC分类号： G01N21/01 , G03B27/62 , H01S4/00
CPC分类号： G03B27/53 , G03F7/70833 , G03F7/709 , Y10T29/49002
摘要： An anti-vibration apparatus includes a target object, a reference object, a measuring device which measures the position of the target object relative to the reference object, a driving mechanism to drive the target object based on the measurement result obtained by the measuring device, a Lorentz's force actuator which supports the reference object, and a power supply device which supplies a constant current to the Lorentz's force actuator. The actuator which supports the reference object uses a Lorentz's force actuator or an actuator which supports the reference object by the pressure of a gas.
摘要翻译：防振装置包括目标物体，参考物体，测量目标物体相对于基准物体的位置的测量装置，基于由测量装置获得的测量结果来驱动目标物体的驱动机构，支撑参考对象的洛伦兹力致动器，以及向洛伦兹力致动器提供恒定电流的电源装置。支撑参考对象的致动器使用洛仑兹力致动器或通过气体压力支撑参考对象的致动器。

6. 发明授权

US07221463B2 Positioning apparatus, exposure apparatus, and method for producing device 失效
标题翻译：定位装置，曝光装置及其制造方法
公开(公告)号：US07221463B2
公开(公告)日：2007-05-22
申请号：US10798812
申请日：2004-03-10
申请人： Makoto Mizuno , Ryo Nawata , Mitsuru Inoue
发明人： Makoto Mizuno , Ryo Nawata , Mitsuru Inoue
IPC分类号： G01B11/14 , G03B27/42
CPC分类号： G02B7/005 , G02B7/023 , G02B7/1828 , G03F7/70825 , G03F7/70833
摘要： The present invention provides a positioning apparatus capable of performing six-axis micro adjustment of an optical element in an exposure apparatus with high accuracy, and the exposure apparatus. The positioning apparatus of the present invention includes a first measurement unit for measuring a position/inclination of a moving part having an optical element while being kept from contact with the moving part, and a driving unit capable of driving the moving part in directions of six axes with respect to a fixed part while being kept from contact with the moving part, based on the result of measurement by the first measurement unit.
摘要翻译：本发明提供一种能够以高精度对曝光装置中的光学元件进行六轴微调的定位装置和曝光装置。本发明的定位装置包括：第一测量单元，用于测量具有光学元件的运动部件的位置/倾斜度，同时不与运动部件接触;以及驱动单元，其能够沿六方向驱动运动部件基于第一测量单元的测量结果，相对于固定部分的轴线与运动部件保持接触。

7. 发明授权

US09052614B2 Vibration control apparatus, lithography apparatus, and method of manufacturing article 有权
标题翻译：振动控制装置，光刻装置及其制造方法
公开(公告)号：US09052614B2
公开(公告)日：2015-06-09
申请号：US13280243
申请日：2011-10-24
申请人： Ryo Nawata , Katsumi Asada
发明人： Ryo Nawata , Katsumi Asada
IPC分类号： G03F7/20
CPC分类号： G03F7/709 , F16F15/002 , F16F15/022 , F16F2230/08 , H01J2237/0216
摘要： A vibration control apparatus includes a first spring mechanism to support a first object as part of a first system. To control vibration of the first object, a first actuator applies a force to the first object via a command value generated by a first computing based on an output of a detection system. The detection system includes a second spring mechanism to support a second object as part of a second system. A third spring mechanism supports a third object as part of a third system. The first displacement detector detects displacement of the third object relative to the second object. The third object is prevented from being displaced relative to the second object. A second natural frequency of the second system is higher than a first natural frequency of the first system, and a third natural frequency of a third system is higher than the first natural frequency.
摘要翻译：振动控制装置包括第一弹簧机构，用于支撑第一物体作为第一系统的一部分。为了控制第一物体的振动，第一致动器通过基于检测系统的输出的第一计算产生的命令值向第一物体施加力。检测系统包括第二弹簧机构，用于支撑第二物体作为第二系统的一部分。第三弹簧机构支撑第三物体作为第三系统的一部分。第一位移检测器检测第三物体相对于第二物体的位移。防止第三物体相对于第二物体移位。第二系统的第二固有频率高于第一系统的第一固有频率，并且第三系统的第三固有频率高于第一固有频率。

8. 发明申请

US20120105820A1 VIBRATION CONTROL APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE 有权
标题翻译：振动控制装置，光刻装置和制造方法
公开(公告)号：US20120105820A1
公开(公告)日：2012-05-03
申请号：US13280243
申请日：2011-10-24
申请人： Ryo Nawata , Katsumi Asada
发明人： Ryo Nawata , Katsumi Asada
IPC分类号： G03B27/32 , G05B15/00
CPC分类号： G03F7/709 , F16F15/002 , F16F15/022 , F16F2230/08 , H01J2237/0216
摘要： A vibration control apparatus includes a first spring mechanism to support a first object as part of a first system. To control vibration of the first object, a first actuator applies a force to the first object via a command value generated by a first computing based on an output of a detection system. The detection system includes a second spring mechanism to support a second object as part of a second system. A third spring mechanism supports a third object as part of a third system. The first displacement detector detects displacement of the third object relative to the second object. The third object is prevented from being displaced relative to the second object. A second natural frequency of the second system is higher than a first natural frequency of the first system, and a third natural frequency of a third system is higher than the first natural frequency.
摘要翻译：振动控制装置包括第一弹簧机构，用于支撑第一物体作为第一系统的一部分。为了控制第一物体的振动，第一致动器通过基于检测系统的输出的第一计算产生的命令值向第一物体施加力。检测系统包括第二弹簧机构，用于支撑第二物体作为第二系统的一部分。第三弹簧机构支撑第三物体作为第三系统的一部分。第一位移检测器检测第三物体相对于第二物体的位移。防止第三物体相对于第二物体移位。第二系统的第二固有频率高于第一系统的第一固有频率，并且第三系统的第三固有频率高于第一固有频率。

9. 发明申请

US20100165313A1 MIRROR SUBSTRATE, MIRROR, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND MIRROR MANUFACTURING METHOD 审中-公开
标题翻译：镜面基板，镜子，曝光装置，器件制造方法和镜像制造方法
公开(公告)号：US20100165313A1
公开(公告)日：2010-07-01
申请号：US12634451
申请日：2009-12-09
申请人： Ryo Nawata , Toru Matsuda , Toshinori Furusawa
发明人： Ryo Nawata , Toru Matsuda , Toshinori Furusawa
IPC分类号： G03B27/70 , G02B5/10 , B05D5/06
CPC分类号： G03B27/70 , G01M11/005 , G02B5/10 , G02B27/0018
摘要： In a light-transmitting mirror substrate having an axisymmetrical aspherical surface, a surface of the mirror substrate on a side opposite to the axisymmetrical aspherical surface is inclined with respect to an axis of symmetry of the axisymmetrical aspherical surface.
摘要翻译：在具有轴对称非球面的透光镜基板中，反射镜基板的与轴对称非球面相反侧的表面相对于轴对称非球面的对称轴倾斜。

10. 发明授权

US07733462B2 Exposure apparatus and exposure method 失效
标题翻译：曝光装置和曝光方法
公开(公告)号：US07733462B2
公开(公告)日：2010-06-08
申请号：US11378495
申请日：2006-03-17
申请人： Ryo Nawata
发明人： Ryo Nawata
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , G03F7/70833
摘要： An exposure apparatus includes a beam providing unit having a first component and second component to provide an exposure beam having pattern information to a substrate W, a measurement unit which measures a relative variation between the first component and the second component, a driving mechanism which drives at least one of the first component and second component, and a compensator which controls the driving mechanism on the basis of the measurement result obtained by the measurement unit so as to reduce the relative variation between the first component and the second component in at least the period during which the pattern is transferred onto the substrate.
摘要翻译：曝光装置包括具有第一部件和第二部件的光束提供单元，用于向基板W提供具有图案信息的曝光光束，测量第一部件和第二部件之间的相对变化的测量单元，驱动机构至少一个第一部件和第二部件，以及补偿器，其基于由测量单元获得的测量结果来控制驱动机构，以便至少减少第一部件和第二部件之间的相对变化图案转移到基板上的期间。

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