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1. 发明申请

US20100329290A1 LITHOGRAPHIC APPARATUS, EXCIMER LASER AND DEVICE MANUFACTURING METHOD 有权
标题翻译：光刻设备，激光器和器件制造方法
公开(公告)号：US20100329290A1
公开(公告)日：2010-12-30
申请号：US12838750
申请日：2010-07-19
申请人： Robertus Cornelis Martinus DE KRUIF , Richard Joseph Bruls , Johannes Wilhelmus Maria Cornelis Teeuwsen , Erik Petrus Buurman
发明人： Robertus Cornelis Martinus DE KRUIF , Richard Joseph Bruls , Johannes Wilhelmus Maria Cornelis Teeuwsen , Erik Petrus Buurman
IPC分类号： H01S3/10
CPC分类号： G03F7/70625 , G03F7/70575
摘要： A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.
摘要翻译：用于光刻图案印刷工艺的CD间距依赖关系用于投影图案的辐射的光谱强度分布。 CD间距依赖关系可以从一个系统到另一个系统不同。这可能导致系统之间的等密度偏差失配。本发明通过提供一种光刻设备来提供包括用于提供投影辐射束的照明系统的光刻设备，用于将图案化光束投影到基板的目标部分上的投影系统以及用于保持基板的基板台，利用控制器以提供投影光束的辐射强度的光谱分布的调整。光谱强度分布的调整基于与等密度偏差相关的数据，并且包括光谱带宽的扩大或光谱强度分布的形状变化。

2. 发明授权

US07817247B2 Lithographic apparatus, excimer laser and device manufacturing method 有权
标题翻译：光刻设备，准分子激光器和器件制造方法
公开(公告)号：US07817247B2
公开(公告)日：2010-10-19
申请号：US11316346
申请日：2005-12-23
申请人： Robertus Cornelis Martinus De Kruif , Richard Joseph Bruls , Johannes Wilhelmus Maria Cornelis Teeuwsen , Erik Petrus Buurman
发明人： Robertus Cornelis Martinus De Kruif , Richard Joseph Bruls , Johannes Wilhelmus Maria Cornelis Teeuwsen , Erik Petrus Buurman
IPC分类号： G03B27/54 , G03B27/42 , G03B27/72
CPC分类号： G03F7/70625 , G03F7/70575
摘要： A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.
摘要翻译：用于光刻图案印刷工艺的CD间距依赖关系用于投影图案的辐射的光谱强度分布。 CD间距依赖关系可以从一个系统到另一个系统不同。这可能导致系统之间的等密度偏差失配。本发明通过提供一种光刻设备来提供包括用于提供投影辐射束的照明系统的光刻设备，用于将图案化光束投影到基板的目标部分上的投影系统以及用于保持基板的基板台，利用控制器以提供投影光束的辐射强度的光谱分布的调整。光谱强度分布的调整基于与等密度偏差相关的数据，并且包括光谱带宽的扩大或光谱强度分布的形状变化。

3. 发明授权

US09316924B2 Lithographic apparatus, excimer laser and device manufacturing method 有权
公开(公告)号：US09316924B2
公开(公告)日：2016-04-19
申请号：US13271757
申请日：2011-10-12
申请人： Robertus Cornelis Martinus De Kruif , Richard Joseph Bruls , Johannes Wilhelmus Maria Cornelis Teeuwsen , Erik Petrus Buurman
发明人： Robertus Cornelis Martinus De Kruif , Richard Joseph Bruls , Johannes Wilhelmus Maria Cornelis Teeuwsen , Erik Petrus Buurman
IPC分类号： G03B27/72 , G03F7/20
CPC分类号： G03F7/70625 , G03F7/70575
摘要： A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.

4. 发明授权

US08089613B2 Lithographic apparatus, excimer laser and device manufacturing method 有权
标题翻译：光刻设备，准分子激光器和器件制造方法
公开(公告)号：US08089613B2
公开(公告)日：2012-01-03
申请号：US12838750
申请日：2010-07-19
申请人： Robertus Cornelis Martinus De Kruif , Richard Joseph Bruls , Johannes Wilhelmus Maria Cornelis Teeuwsen , Erik Petrus Buurman
发明人： Robertus Cornelis Martinus De Kruif , Richard Joseph Bruls , Johannes Wilhelmus Maria Cornelis Teeuwsen , Erik Petrus Buurman
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70625 , G03F7/70575
摘要： A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.
摘要翻译：用于光刻图案印刷工艺的CD间距依赖关系用于投影图案的辐射的光谱强度分布。 CD间距依赖关系可以从一个系统到另一个系统不同。这可能导致系统之间的等密度偏差失配。本发明通过提供一种光刻设备来提供包括用于提供投影辐射束的照明系统的光刻设备，用于将图案化光束投影到基板的目标部分上的投影系统以及用于保持基板的基板台，利用控制器以提供投影光束的辐射强度的光谱分布的调整。光谱强度分布的调整基于与等密度偏差相关的数据，并且包括光谱带宽的扩大或光谱强度分布的形状变化。

5. 发明申请

US20120057144A1 LITHOGRAPHIC APPARATUS, EXCIMER LASER AND DEVICE MANUFACTURING METHOD 有权
标题翻译：光刻设备，激光器和器件制造方法
公开(公告)号：US20120057144A1
公开(公告)日：2012-03-08
申请号：US13271757
申请日：2011-10-12
申请人： Robertus Cornelis Martinus DE KRUIF , Richard Joseph Bruls , Johannes Wihelmus Maria Cornelis Teeuwsen , Erik Petrus Buurman
发明人： Robertus Cornelis Martinus DE KRUIF , Richard Joseph Bruls , Johannes Wihelmus Maria Cornelis Teeuwsen , Erik Petrus Buurman
IPC分类号： G03B27/54
CPC分类号： G03F7/70625 , G03F7/70575
摘要： A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.
摘要翻译：用于光刻图案印刷工艺的CD间距依赖关系用于投影图案的辐射的光谱强度分布。 CD间距依赖关系可以从一个系统到另一个系统不同。这可能导致系统之间的等密度偏差失配。本发明通过提供一种光刻设备来提供包括用于提供投影辐射束的照明系统的光刻设备，用于将图案化光束投影到基板的目标部分上的投影系统以及用于保持基板的基板台，利用控制器以提供投影光束的辐射强度的光谱分布的调整。光谱强度分布的调整基于与等密度偏差相关的数据，并且包括光谱带宽的扩大或光谱强度分布的形状变化。

6. 发明授权

US07655367B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07655367B2
公开(公告)日：2010-02-02
申请号：US11384824
申请日：2006-03-21
申请人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Marc Antonius Maria Haast
发明人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Marc Antonius Maria Haast
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： G03F7/70575 , G03F7/70641 , G03F9/7026
摘要： A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by an inboard sensor, such as a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.
摘要翻译：一种方法和装置利用表示辐射源的波长变化的数据来提供焦平面位置的控制或提供传感器数据的校正。在第一方面中，波长变化数据被提供给通过移动包括例如掩模台，基板台或投影光学系统的光学元件的装置部件来控制焦点的控制系统。在第二方面，变化数据用于校正例如由诸如传输图像传感器的内部传感器测量的焦平面位置数据。这两个方面可以组合在单个装置中或者可以单独使用。

7. 发明申请

US20100091260A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100091260A1
公开(公告)日：2010-04-15
申请号：US12644903
申请日：2009-12-22
申请人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Marc Antonius Maria Haast
发明人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Marc Antonius Maria Haast
IPC分类号： G03B27/54
CPC分类号： G03F7/70575 , G03F7/70641 , G03F9/7026
摘要： A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by an inboard sensor, such as a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.
摘要翻译：一种方法和装置利用表示辐射源的波长变化的数据来提供焦平面位置的控制或提供传感器数据的校正。在第一方面中，波长变化数据被提供给通过移动包括例如掩模台，基板台或投影光学系统的光学元件的装置部件来控制焦点的控制系统。在第二方面，变化数据用于校正例如由诸如传输图像传感器的内部传感器测量的焦平面位置数据。这两个方面可以组合在单个装置中或者可以单独使用。

8. 发明授权

US07525638B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07525638B2
公开(公告)日：2009-04-28
申请号：US11086667
申请日：2005-03-23
申请人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Mare Antonius Maria Haast
发明人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Mare Antonius Maria Haast
IPC分类号： G03B27/52 , G03B27/42 , G03B27/54 , G03B27/74
CPC分类号： G03F7/70575 , G03F7/70641 , G03F9/7026
摘要： A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.
摘要翻译：一种方法和装置利用表示辐射源的波长变化的数据来提供焦平面位置的控制或提供传感器数据的校正。在第一方面中，波长变化数据被提供给通过移动包括例如掩模台，基板台或投影光学系统的光学元件的装置部件来控制焦点的控制系统。在第二方面，变化数据用于校正例如由透射图像传感器测量的焦平面位置数据。这两个方面可以组合在单个装置中或者可以单独使用。

9. 发明授权

US07595863B2 Lithographic apparatus, excimer laser and device manufacturing method 有权
标题翻译：光刻设备，准分子激光器和器件制造方法
公开(公告)号：US07595863B2
公开(公告)日：2009-09-29
申请号：US11316360
申请日：2005-12-23
申请人： Robertus Cornelis Martinus Kruif , Richard Joseph Bruls , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus De Klerk , Erik Petrus Buurman
发明人： Robertus Cornelis Martinus Kruif , Richard Joseph Bruls , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus De Klerk , Erik Petrus Buurman
IPC分类号： G03B27/72 , G03B27/42
CPC分类号： G03F7/70641 , G03F7/70558 , G03F7/70575
摘要： A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and includes a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.
摘要翻译：用于光刻图案印刷工艺的CD间距依赖关系用于投影图案的辐射的光谱强度分布。 CD间距依赖关系可以从一个系统到另一个系统不同。这可能导致系统之间的等密度偏差失配。本发明通过提供一种光刻设备来提供包括用于提供投影辐射束的照明系统的光刻设备，用于将图案化光束投影到基板的目标部分上的投影系统以及用于保持基板的基板台，利用控制器以提供投影光束的辐射强度的光谱分布的调整。光谱强度分布的调整基于与等密度偏差有关的数据，并且包括光谱带宽的扩大或光谱强度分布的形状变化。

10. 发明授权

US08663881B2 Radiation source, method of controlling a radiation source, lithographic apparatus, and method for manufacturing a device 有权
标题翻译：辐射源，控制辐射源的方法，光刻设备及其制造方法
公开(公告)号：US08663881B2
公开(公告)日：2014-03-04
申请号：US13554725
申请日：2012-07-20
申请人： Erik Petrus Buurman , Szilard Istvan Csiszar
发明人： Erik Petrus Buurman , Szilard Istvan Csiszar
IPC分类号： G03C5/00
CPC分类号： H05G2/006 , G03F7/70033 , G03F7/70133 , H05G2/008
摘要： A lithographic apparatus includes an illuminator for receiving a beam of EUV radiation from a radiation source apparatus and for conditioning the beam to illuminate a target area of a patterning device, such as a reticle. The reticle forms a patterned radiation beam. A projection system transfers the pattern from said patterning device to a substrate by EUV lithography. Sensors are provided for detecting a residual asymmetry in the conditioned beam as the beam approaches the reticle, particularly in a non-scanning direction. A feedback control signal is generated to adjust a parameter of said radiation source in response to detected asymmetry. The feedback is based on a ratio of intensities measured by two sensors at opposite ends of an illumination slit, and adjusts the timing of laser pulses generating an EUV-emitting plasma.
摘要翻译：光刻设备包括用于接收来自辐射源设备的EUV辐射束的照明器，并且用于调节光束照射诸如光罩之类的图案形成装置的目标区域。掩模版形成图案化的辐射束。投影系统通过EUV光刻将图案从所述图案形成装置传送到基板。提供传感器，用于当光束接近光罩时，特别是在非扫描方向上，用于检测调节光束中的残余不对称性。产生反馈控制信号以响应于检测到的不对称来调整所述辐射源的参数。反馈基于由照明狭缝的相对端处的两个传感器测量的强度比，并且调整产生EUV发射等离子体的激光脉冲的定时。

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