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1. 发明授权

US08105441B2 Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus 有权
标题翻译：用于减少基板处理弯月面留下的入口和/或出口痕迹的载体
公开(公告)号：US08105441B2
公开(公告)日：2012-01-31
申请号：US13094153
申请日：2011-04-26
申请人： Robert O'Donnell , Eric Lenz , Mark Wilcoxson , Mike Ravkin , Alexander A. Yatskar
发明人： Robert O'Donnell , Eric Lenz , Mark Wilcoxson , Mike Ravkin , Alexander A. Yatskar
IPC分类号： B08B1/02 , B08B5/04 , B08B11/02 , B08B3/04 , B08B3/10
CPC分类号： H01L21/67051 , H01L21/6708 , Y10S134/902 , Y10S269/90 , Y10S269/902 , Y10T29/49826
摘要： A carrier for supporting a substrate during processing by a meniscus formed by upper and lower proximity heads is described. The carrier includes a frame having an opening sized for receiving a substrate and a plurality of support pins for supporting the substrate within the opening. The opening is slightly larger than the substrate such that a gap exists between the substrate and the opening. Means for reducing a size and frequency of entrance and/or exit marks on substrates is provided, the means aiding and encouraging liquid from the meniscus to evacuate the gap. A method for reducing the size and frequency of entrance and exit marks is also provided.
摘要翻译：描述了在由上下接近头形成的弯液面的处理期间支撑衬底的载体。载体包括具有开口的框架，该开口的尺寸用于容纳基底和用于将基底支撑在开口内的多个支撑销。开口略大于基板，使得基板和开口之间存在间隙。提供了用于减小基板上的入口和/或出口痕迹的尺寸和频率的手段，该装置帮助和鼓励来自弯月面的液体以排出间隙。还提供了用于减小入口和出口标记的尺寸和频率的方法。

2. 发明授权

US08534303B2 Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus 失效
标题翻译：用于减少基板处理弯月面留下的入口和/或出口痕迹的载体
公开(公告)号：US08534303B2
公开(公告)日：2013-09-17
申请号：US13324295
申请日：2011-12-13
申请人： Robert O'Donnell , Eric Lenz , Mark Wilcoxson , Mike Ravkin , Alexander A. Yatskar
发明人： Robert O'Donnell , Eric Lenz , Mark Wilcoxson , Mike Ravkin , Alexander A. Yatskar
IPC分类号： B08B11/02
CPC分类号： H01L21/67051 , H01L21/6708 , Y10S134/902 , Y10S269/90 , Y10S269/902 , Y10T29/49826
摘要： A carrier for supporting a substrate during processing by a meniscus fowled by upper and lower proximity heads is described. The carrier includes a frame having an opening sized for receiving a substrate and a plurality of support pins for supporting the substrate within the opening. The opening is slightly larger than the substrate such that a gap exists between the substrate and the opening. Means for reducing a size and frequency of entrance and/or exit marks on substrates is provided, the means aiding and encouraging liquid from the meniscus to evacuate the gap. A method for reducing the size and frequency of entrance and exit marks is also provided.
摘要翻译：描述了用于在加工期间通过上和下邻近头部的弯液面来支撑衬底的载体。载体包括具有开口的框架，该开口的尺寸用于容纳基底和用于将基底支撑在开口内的多个支撑销。开口略大于基板，使得基板和开口之间存在间隙。提供了用于减小基板上的入口和/或出口痕迹的尺寸和频率的手段，该装置帮助和鼓励来自弯月面的液体以排出间隙。还提供了用于减小入口和出口标记的尺寸和频率的方法。

3. 发明申请

US20110197928A1 Carrier for Reducing Entrance and/or Exit Marks Left by a Substrate-Processing Meniscus 有权
标题翻译：用于减少入口和/或退出标记的载体由底物加工半月板留下
公开(公告)号：US20110197928A1
公开(公告)日：2011-08-18
申请号：US13094153
申请日：2011-04-26
申请人： Robert O'Donnell , Eric Lenz , Mark Wilcoxson , Mike Ravkin , Alexander A. Yatskar
发明人： Robert O'Donnell , Eric Lenz , Mark Wilcoxson , Mike Ravkin , Alexander A. Yatskar
IPC分类号： B08B3/00 , B23P17/04
CPC分类号： H01L21/67051 , H01L21/6708 , Y10S134/902 , Y10S269/90 , Y10S269/902 , Y10T29/49826
摘要： A carrier for supporting a substrate during processing by a meniscus formed by upper and lower proximity heads is described. The carrier includes a frame having an opening sized for receiving a substrate and a plurality of support pins for supporting the substrate within the opening. The opening is slightly larger than the substrate such that a gap exists between the substrate and the opening. Means for reducing a size and frequency of entrance and/or exit marks on substrates is provided, the means aiding and encouraging liquid from the meniscus to evacuate the gap. A method for reducing the size and frequency of entrance and exit marks is also provided.
摘要翻译：描述了在由上下接近头形成的弯液面的处理期间支撑衬底的载体。载体包括具有开口的框架，该开口的尺寸用于容纳基底和用于将基底支撑在开口内的多个支撑销。开口略大于基板，使得基板和开口之间存在间隙。提供了用于减小基板上的入口和/或出口痕迹的尺寸和频率的手段，该装置帮助和鼓励来自弯月面的液体以排出间隙。还提供了用于减小入口和出口标记的尺寸和频率的方法。

4. 发明申请

US20120079698A1 Carrier for Reducing Entrance and/or Exit Marks Left by a Substrate-Processing Meniscus 失效
标题翻译：用于减少入口和/或退出标记的载体由底物加工半月板留下
公开(公告)号：US20120079698A1
公开(公告)日：2012-04-05
申请号：US13324295
申请日：2011-12-13
申请人： Robert O'Donnell , Eric Lenz , Mark Wilcoxson , Mike Ravkin , Alexander A. Yatskar
发明人： Robert O'Donnell , Eric Lenz , Mark Wilcoxson , Mike Ravkin , Alexander A. Yatskar
IPC分类号： B23P11/00
CPC分类号： H01L21/67051 , H01L21/6708 , Y10S134/902 , Y10S269/90 , Y10S269/902 , Y10T29/49826
摘要： A carrier for supporting a substrate during processing by a meniscus fowled by upper and lower proximity heads is described. The carrier includes a frame having an opening sized for receiving a substrate and a plurality of support pins for supporting the substrate within the opening. The opening is slightly larger than the substrate such that a gap exists between the substrate and the opening Means for reducing a size and frequency of entrance and/or exit marks on substrates is provided, the means aiding and encouraging liquid from the meniscus to evacuate the gap. A method for reducing the size and frequency of entrance and exit marks is also provided.
摘要翻译：描述了用于在加工期间通过上和下邻近头部的弯液面来支撑衬底的载体。载体包括具有开口的框架，该开口的尺寸用于容纳基底和用于将基底支撑在开口内的多个支撑销。开口略大于基板，使得在基板和开口之间存在间隙，用于减小基板上的入口和/或出口痕迹的尺寸和频率的装置，帮助和鼓励来自弯液面的液体以排出间隙。还提供了用于减小入口和出口标记的尺寸和频率的方法。

5. 发明授权

US07946303B2 Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus 失效
标题翻译：用于减少基板处理弯月面留下的入口和/或出口痕迹的载体
公开(公告)号：US07946303B2
公开(公告)日：2011-05-24
申请号：US11537501
申请日：2006-09-29
申请人： Robert O'Donnell , Eric Lenz , Mark Wilcoxson , Mike Ravkin , Alexander A. Yatskar
发明人： Robert O'Donnell , Eric Lenz , Mark Wilcoxson , Mike Ravkin , Alexander A. Yatskar
IPC分类号： B08B3/04 , B23Q1/25
CPC分类号： H01L21/67051 , H01L21/6708 , Y10S134/902 , Y10S269/90 , Y10S269/902 , Y10T29/49826
摘要： A carrier for supporting a substrate during processing by a meniscus formed by upper and lower proximity heads is described. The carrier includes a frame having an opening sized for receiving a substrate and a plurality of support pins for supporting the substrate within the opening. The opening is slightly larger than the substrate such that a gap exists between the substrate and the opening. Means for reducing a size and frequency of entrance and/or exit marks on substrates is provided, the means aiding and encouraging liquid from the meniscus to evacuate the gap. A method for reducing the size and frequency of entrance and exit marks is also provided.
摘要翻译：描述了在由上下接近头形成的弯液面的处理期间支撑衬底的载体。载体包括具有开口的框架，该开口的尺寸用于容纳基底和用于将基底支撑在开口内的多个支撑销。开口略大于基板，使得基板和开口之间存在间隙。提供了用于减小基板上的入口和/或出口痕迹的尺寸和频率的手段，该装置帮助和鼓励来自弯月面的液体以排出间隙。还提供了用于减小入口和出口标记的尺寸和频率的方法。

6. 发明申请

US20080081775A1 CARRIER FOR REDUCING ENTRANCE AND/OR EXIT MARKS LEFT BY A SUBSTRATE-PROCESSING MENISCUS 失效
标题翻译：承运人减少进口和/或退出标记由基板处理的菜单
公开(公告)号：US20080081775A1
公开(公告)日：2008-04-03
申请号：US11537501
申请日：2006-09-29
申请人： Robert O'Donnell , Eric Lenz , Mark Wilcoxson , Mike Ravkin , Alexander A. Yatskar
发明人： Robert O'Donnell , Eric Lenz , Mark Wilcoxson , Mike Ravkin , Alexander A. Yatskar
IPC分类号： C11D3/20
CPC分类号： H01L21/67051 , H01L21/6708 , Y10S134/902 , Y10S269/90 , Y10S269/902 , Y10T29/49826
摘要： A carrier for supporting a substrate during processing by a meniscus formed by upper and lower proximity heads is described. The carrier includes a frame having an opening sized for receiving a substrate and a plurality of support pins for supporting the substrate within the opening. The opening is slightly larger than the substrate such that a gap exists between the substrate and the opening. Means for reducing a size and frequency of entrance and/or exit marks on substrates is provided, the means aiding and encouraging liquid from the meniscus to evacuate the gap. A method for reducing the size and frequency of entrance and exit marks is also provided.
摘要翻译：描述了在由上下接近头形成的弯液面的处理期间支撑衬底的载体。载体包括具有开口的框架，该开口的尺寸用于容纳基底和用于将基底支撑在开口内的多个支撑销。开口略大于基板，使得基板和开口之间存在间隙。提供了用于减小基板上的入口和/或出口痕迹的尺寸和频率的手段，该装置帮助和鼓励来自弯月面的液体以排出间隙。还提供了用于减小入口和出口标记的尺寸和频率的方法。

7. 发明申请

US20130084392A1 PREVENTION OF PARTICLE ADDERS WHEN CONTACTING A LIQUID MENISCUS OVER A SUBSTRATE 有权
标题翻译：在接触液体液体基板时防止颗粒添加剂
公开(公告)号：US20130084392A1
公开(公告)日：2013-04-04
申请号：US13250872
申请日：2011-09-30
申请人： Enrico Magni , Suresh Gupta , Mark Gahagan , Eric Lenz , Mike Ravkin
发明人： Enrico Magni , Suresh Gupta , Mark Gahagan , Eric Lenz , Mike Ravkin
IPC分类号： B05D5/00 , B05D1/26 , B05C11/00 , B05C5/00
CPC分类号： H01L21/67086 , B05C5/0254 , B05C11/1036 , B05C11/1039 , B05D3/002 , B05D3/104 , H01L21/6776 , Y10S134/902
摘要： A method for meniscus processing a substrate is provided. The method initiates with generating a meniscus spanning at least a length of the substrate. A pre-wetting liquid or vapor is dispensed. A substrate is moved through the dispensed pre-wetting liquid or vapor and the meniscus. The dispensed pre-wetting vapor condenses a pre-wetting liquid over a region of the substrate adjacent to a region of the substrate where the meniscus is generated. The pre-wetting liquid is deposited without substantially generating surface flow of the pre-wetting liquid on the substrate, and the pre-wetting liquid prevents the leading edge of the meniscus from contacting a dry surface region of the substrate.
摘要翻译：提供了一种用于弯液面处理衬底的方法。该方法开始产生跨越衬底的至少一段长度的弯液面。分配预润湿液体或蒸汽。将基底移动通过分配的预润湿液体或蒸气和弯液面。分配的预润湿蒸汽将预润湿液体在基板的与生成弯月面的区域相邻的区域上冷凝。沉积预润湿液体而基本上不会在基底上产生预润湿液体的表面流，并且预润湿液体防止弯月面的前缘接触基底的干表面区域。

8. 发明授权

US08997684B2 Prevention of particle adders when contacting a liquid meniscus over a substrate 有权
标题翻译：当在液体弯液面上接触衬底时，防止颗粒加料器
公开(公告)号：US08997684B2
公开(公告)日：2015-04-07
申请号：US13250872
申请日：2011-09-30
申请人： Enrico Magni , Suresh Gupta , Mark Gahagan , Eric Lenz , Mike Ravkin
发明人： Enrico Magni , Suresh Gupta , Mark Gahagan , Eric Lenz , Mike Ravkin
IPC分类号： B05C11/00 , H01L21/67 , B05C11/10 , B05C5/02 , H01L21/677 , B05D3/10 , B05D3/00
CPC分类号： H01L21/67086 , B05C5/0254 , B05C11/1036 , B05C11/1039 , B05D3/002 , B05D3/104 , H01L21/6776 , Y10S134/902
摘要： A method for meniscus processing a substrate is provided. The method initiates with generating a meniscus spanning at least a length of the substrate. A pre-wetting liquid or vapor is dispensed. A substrate is moved through the dispensed pre-wetting liquid or vapor and the meniscus. The dispensed pre-wetting vapor condenses a pre-wetting liquid over a region of the substrate adjacent to a region of the substrate where the meniscus is generated. The pre-wetting liquid is deposited without substantially generating surface flow of the pre-wetting liquid on the substrate, and the pre-wetting liquid prevents the leading edge of the meniscus from contacting a dry surface region of the substrate.
摘要翻译：提供了一种用于弯液面处理衬底的方法。该方法开始产生跨越衬底的至少一段长度的弯液面。分配预润湿液体或蒸汽。将基底移动通过分配的预润湿液体或蒸气和弯液面。分配的预润湿蒸汽将预润湿液体在基板的与生成弯液面的区域相邻的区域上冷凝。沉积预润湿液体而基本上不会在基底上产生预润湿液体的表面流，并且预润湿液体防止弯月面的前缘接触基底的干表面区域。

9. 发明申请

US20120260517A1 Apparatus and Method for Reducing Substrate Pattern Collapse During Drying Operations 审中-公开
标题翻译：在干燥操作期间减少底物图案折叠的装置和方法
公开(公告)号：US20120260517A1
公开(公告)日：2012-10-18
申请号：US13089186
申请日：2011-04-18
申请人： Eric Lenz , Mike Ravkin , Katrina Mikhaylichenko
发明人： Eric Lenz , Mike Ravkin , Katrina Mikhaylichenko
IPC分类号： F26B3/00
CPC分类号： F26B3/04 , F26B21/145 , H01L21/02057 , H01L21/67034
摘要： Apparatuses and methods for drying a surface of a substrate includes a proximity drying head having a head body that includes a process surface configured to be disposed opposite a surface of a substrate when present. The process surface includes a first region, a second region and a third region. The first region is defined at a leading edge of the head body and includes a cavity region that is recessed into the head body. The cavity region includes a plurality of inlet ports that are used to introduce a vapor fluid to the cavity region. The second region is disposed proximate to the surface of the substrate when present and is located beside the first region. The third region is disposed proximate to the surface of the substrate when present and is located beside the second region. A plurality of vacuum ports is defined at the interface of the second region and the third region. The third region includes a plurality of angled inlet ports that are directed toward the second region. A method for performing a drying operation includes applying heated isopropyl alcohol as vapor to a wafer surface in the first region and heating the underside region of the wafer corresponding to the first region. Heated Nitrogen is injected to the surface of the wafer in the third region. The deionized water and isopropyl alcohol are removed from the surface of the wafer through the vacuum ports along with the Nitrogen so as to leave the wafer surface substantially dry.
摘要翻译：用于干燥基材表面的装置和方法包括：接近干燥头，其具有头部本体，头部主体包括被配置为当存在时与基底的表面相对设置的处理表面。处理表面包括第一区域，第二区域和第三区域。第一区域被限定在头部主体的前缘，并且包括凹入到头部本体中的空腔区域。空腔区域包括多个入口端口，用于将蒸汽流体引入空腔区域。当存在时，第二区域靠近衬底的表面设置并且位于第一区域旁边。当存在时，第三区域靠近基板的表面设置并且位于第二区域旁边。在第二区域和第三区域的界面处限定多个真空口。第三区域包括指向第二区域的多个成角度的入口端口。执行干燥操作的方法包括将加热的异丙醇作为蒸气施加到第一区域中的晶片表面并加热与第一区域相对应的晶片的下侧区域。在第三区域中将加热的氮气注入晶片的表面。去离子水和异丙醇通过真空端口与氮气一起从晶片表面除去，以使晶片表面基本上干燥。

10. 发明授权

US09111724B2 Apparatus and method for controlling plasma potential 有权
标题翻译：用于控制等离子体电位的装置和方法
公开(公告)号：US09111724B2
公开(公告)日：2015-08-18
申请号：US12905041
申请日：2010-10-14
申请人： Douglas Keil , Lumin Li , Reza Sadjadi , Eric Hudson , Eric Lenz , Rajinder Dhindsa
发明人： Douglas Keil , Lumin Li , Reza Sadjadi , Eric Hudson , Eric Lenz , Rajinder Dhindsa
IPC分类号： H01J7/24 , C23C16/00 , C23F1/00 , H01L21/306 , H01J37/32
CPC分类号： H01J37/32183 , H01J37/32091 , H01J37/32174 , H01J37/32532
摘要： A chamber includes a lower electrode and an upper electrode. The lower electrode is defined to transmit a radiofrequency current through the chamber and to support a semiconductor wafer in exposure to a plasma within the chamber. The upper electrode is disposed above and in a spaced apart relationship with the lower electrode. The upper electrode is electrically isolated from the chamber and is defined by a central section and one or more annular sections disposed concentrically outside the central section. Adjacent sections of the upper electrode are electrically separated from each other by a dielectric material. Multiple voltage sources are respectively connected to the upper electrode sections. Each voltage source is defined to control an electric potential of the upper electrode section to which it is connected, relative to the chamber. The electric potential of each upper electrode section influences an electric potential of the plasma within the chamber.
摘要翻译：腔室包括下电极和上电极。下电极被限定为透射射频电流通过腔室并且支撑半导体晶片暴露于腔室内的等离子体。上电极设置在下电极的上方并与之隔开的关系。上部电极与腔室电气隔离，并且由中心部分和一个或多个同心地设置在中心部分外部的环形部分限定。上部电极的相邻部分通过电介质材料彼此电分离。多个电压源分别连接到上电极部分。每个电压源被定义为相对于腔室控制与其连接的上电极部分的电位。每个上电极部分的电位影响室内的等离子体的电位。

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