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    • 3. 发明授权
    • Method of and apparatus for modifying polarity of light
    • 修改光的极性的方法和装置
    • US07760431B2
    • 2010-07-20
    • US11123562
    • 2005-05-05
    • David L. WilliamsMichael GoldsteinJames P. Kardach
    • David L. WilliamsMichael GoldsteinJames P. Kardach
    • G02B27/28
    • G02B27/286
    • A method of modifying polarity of light is provided. The light propagates through a first transverse plane and has known polarization states in respective cells of the first transverse plane. A first retardation compensator having respective waveplates matching the cells then changes the polarity of the light so that light propagating through a second transverse plane is circularly polarized across the entire second transverse plane. A second retardation compensator includes a plurality of quarter waveplates that change the polarization of the circularly polarized light, so that light passing through a third transverse plane is linearly polarized. The crystal alignment of the quarter waveplates and their shape and configuration are selected so that the direction of the polarization is normal to a radius from a single point.
    • 提供了改变光的极性的方法。 光通过第一横向平面传播并且在第一横向平面的相应单元中具有已知的偏振状态。 具有与单元匹配的各个波片的第一延迟补偿器然后改变光的极性,使得通过第二横向平面传播的光在整个第二横向平面上被圆偏振。 第二延迟补偿器包括改变圆偏振光的偏振的多个四分之一波片,使得穿过第三横向平面的光线性偏振。 选择四分之一波片的晶体对准及其形状和结构,使得偏振方向垂直于单个点的半径。
    • 9. 发明授权
    • Extreme ultraviolet transition oscillator
    • 极紫外线过渡振荡器
    • US06903354B2
    • 2005-06-07
    • US10371541
    • 2003-02-21
    • Michael Goldstein
    • Michael Goldstein
    • H05G2/00A61N5/00
    • H05G2/00
    • Systems and techniques to generate extreme ultraviolet (EUV) illumination. An EUV system includes first layers, and second layers interleaved with the first layers, where the first layers and the second layers have a thickness selected to produce coherent transition radiation in an extreme ultraviolet wavelength region when an electron beam passes through the first layers and the second layers. The first and second layers may be built using thin film deposition techniques and etching techniques. The first layers may include metal, such as molybdenum. The second layers may include a dielectric material and may define regions of vacuum between the first layers, including possibly multiple regions of vacuum per layer.
    • 用于产生极紫外(EUV)照明的系统和技术。 EUV系统包括第一层和与第一层交错的第二层,其中当电子束通过第一层时,第一层和第二层具有被选择用于产生极紫外波长区域中的相干过渡辐射的厚度, 第二层。 可以使用薄膜沉积技术和蚀刻技术来构建第一和第二层。 第一层可以包括金属,例如钼。 第二层可以包括介电材料并且可以限定第一层之间的真空区域,包括每层可能具有多个真空区域。