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1. 发明申请

US20080291412A1 Lithographic apparatus and method 失效
标题翻译：平版印刷设备和方法
公开(公告)号：US20080291412A1
公开(公告)日：2008-11-27
申请号：US12081814
申请日：2008-04-22
申请人： Robert KAZINCZI , Wim Tjibbo TEL , Laurentius Cornelius DE WINTER
发明人： Robert KAZINCZI , Wim Tjibbo TEL , Laurentius Cornelius DE WINTER
IPC分类号： G03B27/68
CPC分类号： G03F7/70891
摘要： A lithographic method is provided that includes using an illumination system to provide a beam of radiation having an illumination mode, using a patterning device to impart the radiation beam with a pattern in its cross-section, and projecting the patterned radiation beam onto a substrate. The illumination mode is adjusted after the radiation beam has been projected onto the substrate. The adjustment is arranged to reduce the effect of optical aberrations due to lens heating on the projected pattern during projection of the pattern onto a subsequent substrate.
摘要翻译：提供了一种光刻方法，其包括使用照明系统来提供具有照明模式的辐射束，使用图案形成装置将辐射束赋予其横截面中的图案，并将图案化的辐射束投影到衬底上。在辐射束投射到基板上之后调整照明模式。该调整被布置为在将图案投影到随后的基板上时，减少由于透镜加热引起的光学像差对投影图案的影响。

2. 发明申请

US20130141706A1 LITHOGRAPHIC METHOD AND APPARATUS 有权
标题翻译：光刻方法和装置
公开(公告)号：US20130141706A1
公开(公告)日：2013-06-06
申请号：US13685467
申请日：2012-11-26
申请人： Peter David ENGBLOM , Carsten Andreas KÖHLER , Frank STAALS , Laurentius Cornelius DE WINTER
发明人： Peter David ENGBLOM , Carsten Andreas KÖHLER , Frank STAALS , Laurentius Cornelius DE WINTER
IPC分类号： G03F7/20
CPC分类号： G03F7/70425 , G03F1/144 , G03F1/36 , G03F7/70433 , G03F7/70441
摘要： A method of projecting a pattern from a patterning device onto a substrate using a projection system, the method including using an optical phase adjustment apparatus in the projection system to apply a phase modification to radiation which has been diffracted from an assist feature of the pattern, the phase modification acting to reduce the size of an assist feature image exposed in resist on the substrate or prevent printing of the assist feature image in the resist on the substrate, while maintaining a contribution of the assist feature image to an image enhancement of a functional feature of the pattern.
摘要翻译：一种使用投影系统将图案从图案形成装置投影到基板上的方法，该方法包括在投影系统中使用光学相位调整装置，对从图案的辅助特征衍射的辐射进行相位修改，相位改变用于减小在基板上的抗蚀剂中暴露的辅助特征图像的尺寸，或者防止辅助特征图像在基板上的抗蚀剂中的印刷，同时保持辅助特征图像对功能的图像增强的贡献模式的特征。

3. 发明申请

US20100123887A1 METHOD FOR A LITHOGRAPHIC APPARATUS 有权
标题翻译：一种平面设备的方法
公开(公告)号：US20100123887A1
公开(公告)日：2010-05-20
申请号：US12617855
申请日：2009-11-13
申请人： Laurentius Cornelius DE WINTER , Jozef Maria Finders
发明人： Laurentius Cornelius DE WINTER , Jozef Maria Finders
IPC分类号： G03B27/52
CPC分类号： G03F7/70641 , G03F7/70125 , G03F7/70308 , G03F7/70591 , G03F7/70891
摘要： A method is described that includes illuminating a patterning device pattern with a radiation beam having a symmetric illumination mode, the patterning device pattern comprising a first pattern feature that substantially diffracts radiation of the radiation beam, and a second pattern feature that does not substantially diffract radiation of the radiation beam, introducing an asymmetry, relative to an optical axis, in the substantially diffracted radiation using a phase modulation element, illuminating a radiation beam receiving element with radiation emanating from the phase modulation element to form a receiving element pattern that is related to the patterning device pattern, the receiving element pattern having first and second receiving element pattern features related to the first and second pattern features respectively, and determining information at least indicative of a focal property from positional information regarding the relative positions of the first and second receiving element pattern features.
摘要翻译：描述了一种方法，其包括用具有对称照明模式的辐射束照射图案形成装置图案，图案形成装置图案包括基本上衍射辐射束的辐射的第一图案特征，以及基本上不辐射辐射的第二图案特征使用相位调制元件在基本上衍射的辐射中引入相对于光轴的不对称性，用相位调制元件发射的辐射照射辐射束接收元件，以形成与图案形成装置图案，接收元件图案具有分别与第一和第二图案特征相关的第一和第二接收元件图案特征，以及根据关于第一和第二图案特征的相对位置的位置信息来确定至少指示焦点特性的信息 g元素图案特征。

4. 发明申请

US20100265479A1 DEVICE MANUFACTURING METHOD AND LITHOGRAPHIC APPARATUS 有权
标题翻译：设备制造方法和平面设备
公开(公告)号：US20100265479A1
公开(公告)日：2010-10-21
申请号：US12760247
申请日：2010-04-14
申请人： Laurentius Cornelius DE WINTER , Jozef Maria Finders
发明人： Laurentius Cornelius DE WINTER , Jozef Maria Finders
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70308 , G03F7/70258 , G03F7/70266 , G03F7/70283
摘要： A mask can be used to print a pattern. Due to mask pattern surface topography, an image error may occur, such as an intensity imbalance between adjacent bright lines in the projected pattern. To help alleviate or eliminate the problem of intensity imbalance, the projection system may include an optical phase adjuster constructed and arranged to adjust a phase of an electric field of optical beams of radiation beam traversing the adjuster. A reduction of intensity imbalance is achieved by suitably adjusting the phases of the zeroth, plus first and minus first-order diffracted radiation emanating from the mask pattern. By adjusting the phase differently for different portions of the illumination, the method can be applied such that no decrease of depth of focus due, for example, the 0th order is occurring.
摘要翻译：可以使用掩码打印图案。由于掩模图案表面形貌，可能会出现图像错误，例如投影图案中相邻亮线之间的强度不平衡。为了帮助减轻或消除强度不平衡的问题，投影系统可以包括光学相位调节器，其被构造和布置成调节穿过调节器的辐射束的光束的电场的相位。强度不平衡的减少是通过适当地调整第零阶相加加掩模图形发出的第一和第一级衍射辐射来实现的。通过对照明的不同部分不同地调整相位，可以应用该方法，使得不会发生例如第0次的焦点的降低。

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