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    • 4. 发明授权
    • Lithographic apparatus and device manufacturing method
    • 平版印刷设备和器件制造方法
    • US08164741B2
    • 2012-04-24
    • US13103551
    • 2011-05-09
    • Jozef Maria Finders
    • Jozef Maria Finders
    • G03B27/72G03B27/54
    • G03F7/70891G03F7/70258G03F7/70308
    • A lithographic apparatus includes a phase adjuster to adjust a phase of an optical wave traversing an optical element of the phase adjuster during exposure of a pattern on a substrate. In an embodiment, the optical element is a heat controllable optical element in a projection system of the lithographic apparatus. In use, the pattern is illuminated with an illumination mode including an off-axis radiation beam. This beam is diffracted into zeroth-order and first-order diffracted beams oppositely and asymmetrically inclined with respect to an optical axis. An area is identified where the first-order diffracted beam traverses the optical element. An image characteristic of an image of the pattern is optimized by calculating a desired optical phase of the first-order diffracted beam in relation to the optical phase of the zeroth-order diffracted beam. The phase adjuster is controlled to apply the desired optical phase to the first order diffracted beam.
    • 光刻设备包括相位调节器,用于在曝光基板上的图案时调节穿过相位调节器的光学元件的光波的相位。 在一个实施例中,光学元件是光刻设备的投影系统中的热可控光学元件。 在使用中,用包括离轴辐射束的照明模式照亮图案。 该光束被衍射成相对于光轴相对和不对称倾斜的零级和一级衍射光束。 识别出一级衍射光束穿过光学元件的区域。 通过相对于零级衍射光束的光学相位计算一级衍射光束的期望的光学相位来优化图案的图像的图像特性。 控制相位调节器以将期望的光学相位施加到一阶衍射光束。
    • 6. 发明授权
    • Method of patterning a positive tone resist layer overlaying a lithographic substrate
    • 图案化叠加光刻基板的正色调抗蚀剂层的方法
    • US07811746B2
    • 2010-10-12
    • US11527732
    • 2006-09-27
    • Jozef Maria Finders
    • Jozef Maria Finders
    • H01L21/00G03F1/00
    • G03F7/70466G03F1/36G03F1/70G03F7/70433
    • A single exposure method and a double exposure method for reducing mask error factor and for enhancing lithographic printing-process resolution is presented. The invention comprises decomposing a desired pattern of dense lines and spaces in two sub patterns of semi-dense spaces that are printed in interlaced position with respect to each other, using positive tone resist. Each of the exposures is executed after applying a relative space-width widening to the spaces of two corresponding patterning device patterns of semi-dense spaces. A factor representative for the space-width widening has a value between 1 and 3, thereby reducing mask error factor and line edge roughness.
    • 提出了一种减少掩模误差因子和增强平版印刷工艺分辨率的单一曝光方法和双曝光方法。 本发明包括使用正色调抗蚀剂分解以相互间隔开的位置打印的半密度空间的两个子图案中的所需图案的致密线和空间。 在将相对空间宽度加宽到半密集空间的两个对应的图案形成装置图案的空间之后执行每个曝光。 代表空间宽度加宽的因子具有1到3之间的值,从而减少掩模误差因子和线边缘粗糙度。
    • 7. 发明申请
    • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    • LITHOGRAPHIC装置和装置制造方法
    • US20090296060A1
    • 2009-12-03
    • US12476044
    • 2009-06-01
    • Jozef Maria Finders
    • Jozef Maria Finders
    • G03B27/52G03B27/32
    • G03F7/70891G03F7/70258G03F7/70308
    • A lithographic apparatus includes a phase adjuster to adjust a phase of an optical wave traversing an optical element of the phase adjuster during exposure of a pattern on a substrate. In an embodiment, the optical element is a heat controllable optical element in a projection system of the lithographic apparatus. In use, the pattern is illuminated with an illumination mode including an off-axis radiation beam. This beam is diffracted into zeroth-order and first-order diffracted beams oppositely and asymmetrically inclined with respect to an optical axis. An area is identified where the first-order diffracted beam traverses the optical element. An image characteristic of an image of the pattern is optimized by calculating a desired optical phase of the first-order diffracted beam in relation to the optical phase of the zeroth-order diffracted beam. The phase adjuster is controlled to apply the desired optical phase to the first order diffracted beam.
    • 光刻设备包括相位调节器,用于在曝光基板上的图案时调节穿过相位调节器的光学元件的光波的相位。 在一个实施例中,光学元件是光刻设备的投影系统中的热可控光学元件。 在使用中,用包括离轴辐射束的照明模式照亮图案。 该光束被衍射成相对于光轴相对和不对称倾斜的零级和一级衍射光束。 识别出一级衍射光束穿过光学元件的区域。 通过相对于零级衍射光束的光学相位计算一级衍射光束的期望的光学相位来优化图案的图像的图像特性。 控制相位调节器以将期望的光学相位施加到一阶衍射光束。