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1. 发明授权

US08082918B2 Inhaler 有权
标题翻译：吸入器
公开(公告)号：US08082918B2
公开(公告)日：2011-12-27
申请号：US10221379
申请日：2001-03-16
申请人： Rob Jansen , Lars Knudsen , Henrik Vilstrup
发明人： Rob Jansen , Lars Knudsen , Henrik Vilstrup
IPC分类号： A61M11/00
CPC分类号： A61M15/0091 , A61M15/009 , A61M15/0096
摘要： A breath-actuated inhaler for delivery of a medicament by inhalation from a canister (2) which is compressible to deliver a dose of medicament. The inhaler comprises a housing (1) for holding a canister (2) and including a mouthpiece (5) for delivery of a dose of medicament from a canister (2) held in the housing; and an actuation mechanism (6) for compressing a canister (2) held in the housing (1) in response to inhalation at the mouthpiece (5). The housing includes two separable portions (19, 20). The first housing portion (19) mounts the actuation mechanism (6). The second housing portion (20) houses the mouthpiece (5) and a duct (24) shaped to direct an inhalation flow from the mouthpeice (5) to the first housing portion (19) for triggering the actuation mechanism (6). The duct (24) and the mouthpiece (5) are integrally formed and separable from the second housing portion (20).
摘要翻译：一种用于通过吸入从罐（2）输送药物的呼吸致动吸入器，其可压缩以递送一定剂量的药物。吸入器包括用于容纳罐（2）的壳体（1）并且包括用于从保持在壳体中的罐（2）输送一定剂量的药物的接口（5）以及致动机构（6），用于响应于在所述接口（5）处的吸入而压缩保持在所述壳体（1）中的罐（2）。壳体包括两个可分离部分（19,20）。第一壳体部分（19）安装致动机构（6）。第二壳体部分（20）容纳接口（5）和形状为将吸入流从口部（5）引导到第一容纳部分（19）的管道（24），用于触发致动机构（6）。管道（24）和接口管（5）一体形成并与第二容纳部分（20）分离。

2. 发明申请

US20130107236A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20130107236A1
公开(公告)日：2013-05-02
申请号：US13659729
申请日：2012-10-24
申请人： Jan Steven Christiaan WESTERLAKEN , Rob Jansen , Erik Vervoort
发明人： Jan Steven Christiaan WESTERLAKEN , Rob Jansen , Erik Vervoort
IPC分类号： G03B27/52
CPC分类号： G03F7/7075 , G03F7/70875
摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate; a compartment configured to receive the substrate table; a thermal conditioning unit arranged to receive a substrate to be exposed and thermally condition the substrate; and a transfer system for transferring a thermally conditioned substrate to the substrate table, wherein the substrate table and the thermal conditioning unit are arranged inside the compartment of the lithographic apparatus, at least during a transfer of the thermally conditioned substrate from the thermal conditioning unit to the substrate table.
摘要翻译：光刻设备包括：构造成保持衬底的衬底台; 被配置为接收所述衬底台的室; 热调节单元，其布置成接收要暴露的基板并对所述基板进行热调节; 以及转印系统，用于将经热处理的基材转印到基板台上，其中基板台和热调节单元布置在光刻设备的隔室内，至少在热调节基板从热调节单元转移到底物台。

3. 发明授权

US07542127B2 Lithographic apparatus and method for manufacturing a device 有权
标题翻译：光刻设备及其制造方法
公开(公告)号：US07542127B2
公开(公告)日：2009-06-02
申请号：US11312660
申请日：2005-12-21
申请人： Timotheus Franciscus Sengers , Nicolaas Antonius Allegondus Johannes Van Asten , Wilhelmus Josephus Box , Tjarko Adriaan Rudolf Van Empel , Leon Martin Levasier , Erik Roelof Loopstra , Marcel Johannus Elisabeth Hubertus Muitjens , Luberthus Ouwehand , Leon Joseph Marie Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
发明人： Timotheus Franciscus Sengers , Nicolaas Antonius Allegondus Johannes Van Asten , Wilhelmus Josephus Box , Tjarko Adriaan Rudolf Van Empel , Leon Martin Levasier , Erik Roelof Loopstra , Marcel Johannus Elisabeth Hubertus Muitjens , Luberthus Ouwehand , Leon Joseph Marie Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
IPC分类号： G03B27/52 , G03B27/54
CPC分类号： G03F7/70883 , G03F7/7075 , G03F7/70858 , G03F9/7011 , G03F9/7034
摘要： A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.
摘要翻译：公开了一种光刻设备。该装置包括构造成保持基板的基板台。衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。该装置还包括测量系统，其被配置为当衬底台将衬底保持在测量位置时，测量衬底的至少一个方面或特征。测量系统被配置为将至少一个测量光束和/或场朝向衬底的表面引导。投影系统被配置为当衬底台将衬底保持在衬底处理位置时将图案化的辐射束投射到衬底的目标部分上，并且调节系统被配置为将调节流体提供给至少部分路径测量系统的测量光束和/或场来调节路径的一部分。

4. 发明授权

US07148951B2 Lithographic apparatus 有权
标题翻译：平版印刷设备
公开(公告)号：US07148951B2
公开(公告)日：2006-12-12
申请号：US10972292
申请日：2004-10-25
申请人： Nicolas Lallemant , Marcel Beckers , Stephan Koelink , Rob Jansen , Wladimir Fransiscus Gerardus Maria Hertog , David Theodorus Willy Van Der Plas
发明人： Nicolas Lallemant , Marcel Beckers , Stephan Koelink , Rob Jansen , Wladimir Fransiscus Gerardus Maria Hertog , David Theodorus Willy Van Der Plas
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58
CPC分类号： G03F7/70933
摘要： A lithographic apparatus includes a radiation system for providing a beam of radiation, and a first support for supporting a patterning device. The patterning device serves to pattern the beam of radiation. The apparatus includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and an interferometer measurement system for providing an interferometric measurement beam extending along an axis in an elongated volume of gas extending below the projection system. The apparatus also includes a gas conditioning structure for providing a conditioned gas flow in the volume. The gas conditioning structure includes a plurality of gas guiding vanes disposed at an outlet of the structure for guiding the gas flow to the volume. The gas guiding vanes are shaped continuously and are oriented diverging away from the axis of the volume.
摘要翻译：光刻设备包括用于提供辐射束的辐射系统和用于支撑图案形成装置的第一支撑件。图案形成装置用于对辐射束进行图案化。该装置包括用于支撑基板的第二支撑件，用于将图案化的光束投影到基板的目标部分上的投影系统，以及干涉计测量系统，用于提供沿着轴延伸的细长体积的气体延伸的干涉测量光束投影系统。该装置还包括用于在体积中提供经调节的气流的气体调节结构。气体调节结构包括设置在结构的出口处的多个气体导向叶片，用于将气体流引导到体积。气体导向叶片被连续地成形并且定向为远离体积的轴线发散。

5. 发明申请

US20050083496A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050083496A1
公开(公告)日：2005-04-21
申请号：US10925148
申请日：2004-08-25
申请人： Michel Dansberg , Sebastiaan Cornelissen , Henrikus Cox , Robert Van Diesen , Nicolaas Kemper , Robert-Han Munnig-Schmidt , Harmen Van Der Schoot , Rob Jansen
发明人： Michel Dansberg , Sebastiaan Cornelissen , Henrikus Cox , Robert Van Diesen , Nicolaas Kemper , Robert-Han Munnig-Schmidt , Harmen Van Der Schoot , Rob Jansen
IPC分类号： G03F7/20 , H01L21/027 , G03B27/52
CPC分类号： G03F7/70933 , G03F7/70716 , G03F7/70775 , G03F7/7095
摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, a first support structure for supporting a patterning device, a second support structure for supporting a substrate, and a projection system. At least one of the first and second support structures includes a planar base, a movable stage that can be moved over the planar base, and an actuator for moving the stage. The apparatus also includes a contactless position measuring device for measuring a position of the stage, and a first pump for generating a conditioned gas flow in a volume between the measuring device and the stage. The base includes a plurality of gas channels that provide a path for the conditioned gas to flow through the base.
摘要翻译：公开了一种光刻投影装置。该装置包括用于提供辐射束的辐射系统，用于支撑图案形成装置的第一支撑结构，用于支撑衬底的第二支撑结构和投影系统。第一和第二支撑结构中的至少一个包括平面基座，可在平面基座上移动的可移动平台以及用于移动平台的致动器。该装置还包括用于测量载物台的位置的非接触位置测量装置和用于在测量装置和载物台之间产生体积的调节气流的第一泵。底座包括多个气体通道，其提供用于经调节的气体流过基座的路径。

6. 发明授权

US08913228B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08913228B2
公开(公告)日：2014-12-16
申请号：US11730749
申请日：2007-04-03
申请人： Maurice Wijckmans , Martinus Agnes Willem Cuijpers , Martinus Hendrikus Antonius Leenders , Frits Van Der Meulen , Joost Jeroen Ottens , Theodorus Petrus Maria Cadee , Frederik Eduard De Jong , Wilhelmus Franciscus Johannes Simons , Edwin Augustinus Matheus Van Gompel , Martin Frans Pierre Smeets , Rob Jansen , Gerardus Adrianus Antonius Maria Kusters , Martijn Van Baren
发明人： Maurice Wijckmans , Martinus Agnes Willem Cuijpers , Martinus Hendrikus Antonius Leenders , Frits Van Der Meulen , Joost Jeroen Ottens , Theodorus Petrus Maria Cadee , Frederik Eduard De Jong , Wilhelmus Franciscus Johannes Simons , Edwin Augustinus Matheus Van Gompel , Martin Frans Pierre Smeets , Rob Jansen , Gerardus Adrianus Antonius Maria Kusters , Martijn Van Baren
IPC分类号： G03B27/58 , G03F7/20 , F16L55/053
CPC分类号： G03F7/70875 , F16L55/053 , G03F7/70341 , G03F7/70783
摘要： A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.
摘要翻译：公开了一种光刻设备，其被布置成将图案从图案形成装置投影到基板上，光刻设备具有被配置为保持基板的基板台。衬底台包括配置成保持调理流体并调节衬底台的调节系统。调节系统包括压力调节器，其与调节系统流体连通并且被布置成抑制调节系统中的压力变化。

7. 发明申请

US20100263378A1 INSTALLATION AND METHOD FOR THE CONVERSION OF HEAT INTO MECHANICAL ENERGY 审中-公开
标题翻译：将热转换为机械能的安装和方法
公开(公告)号：US20100263378A1
公开(公告)日：2010-10-21
申请号：US12739231
申请日：2008-09-10
申请人： Hans Van Rij , Rob Jansen
发明人： Hans Van Rij , Rob Jansen
IPC分类号： F01K25/02 , F01K27/00
CPC分类号： F01K25/02 , F01K27/005
摘要： An installation and method for the conversion of thermal energy into mechanical energy. The installation includes at least two closed containers, a converter for the conversion of flow energy into mechanical energy, a switching system as well as a supply line, a discharge line and a heat supply system. Each time, the converter is supplied with a fluid under high pressure and temperature from one container and the temperature-reduced fluid is then collected in another container. As soon as the other container is filled and the first container becomes empty, these containers are exchanged or replaced by other containers.
摘要翻译：用于将热能转化为机械能的安装和方法。安装包括至少两个封闭的容器，用于将流动能量转换成机械能的转换器，开关系统以及供应管线，排放管线和供热系统。每当转炉在高压和高温下从一个容器中提供流体，然后将降温液体收集在另一个容器中。一旦另一个容器被填充并且第一个容器变空，这些容器就被其他容器更换或更换。

8. 发明授权

US07679720B2 Apparatus configured to position a workpiece 有权
标题翻译：被配置为定位工件的装置
公开(公告)号：US07679720B2
公开(公告)日：2010-03-16
申请号：US12068071
申请日：2008-02-01
申请人： Michel Pieter Dansberg , Sebastiaan Maria Johannes Cornelissen , Henrikus Herman Marie Cox , Robert Johannes Petrus Van Diesen , Nicolaas Rudolf Kemper , Robert-Han Munnig-Schmidt , Harmen Klaas Van der Schoot , Rob Jansen
发明人： Michel Pieter Dansberg , Sebastiaan Maria Johannes Cornelissen , Henrikus Herman Marie Cox , Robert Johannes Petrus Van Diesen , Nicolaas Rudolf Kemper , Robert-Han Munnig-Schmidt , Harmen Klaas Van der Schoot , Rob Jansen
IPC分类号： G03B27/42 , G03B27/58 , G03B27/62 , H02K41/00
CPC分类号： G03F7/70933 , G03F7/70716 , G03F7/70775 , G03F7/7095
摘要： An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.
摘要翻译：一种装置构造成定位工件。该装置包括平面基座和被配置为支撑工件的可移动台。该台被配置成在平面底座上移动。该装置还包括构造成移动台的致动器，被配置为测量台的位置的非接触位置测量器以及被配置为在测量器和台之间的体积中产生经调节的气流的第一泵。底座包括设置在基座中的多个气体通道，其提供调节气体流经基座的路径。

9. 发明申请

US20070139629A1 Lithographic apparatus and method for manufacturing a device 有权
标题翻译：光刻设备及其制造方法
公开(公告)号：US20070139629A1
公开(公告)日：2007-06-21
申请号：US11312660
申请日：2005-12-21
申请人： Timotheus Sengers , Nicolaas Johannes Van Asten , Wilhelmus Box , Tjarko Van Empel , Leon Levasier , Erik Loopstra , Marcel Hubertus Muitjens , Luberthus Ouwehand , Leon Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
发明人： Timotheus Sengers , Nicolaas Johannes Van Asten , Wilhelmus Box , Tjarko Van Empel , Leon Levasier , Erik Loopstra , Marcel Hubertus Muitjens , Luberthus Ouwehand , Leon Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
IPC分类号： G03B27/42
CPC分类号： G03F7/70883 , G03F7/7075 , G03F7/70858 , G03F9/7011 , G03F9/7034
摘要： A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.
摘要翻译：公开了一种光刻设备。该装置包括构造成保持基板的基板台。衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。该装置还包括测量系统，其被配置为当衬底台将衬底保持在测量位置时，测量衬底的至少一个方面或特征。测量系统被配置为将至少一个测量光束和/或场朝向衬底的表面引导。投影系统被配置为当衬底台将衬底保持在衬底处理位置时将图案化的辐射束投射到衬底的目标部分上，并且调节系统被配置为将调节流体提供给至少部分路径测量系统的测量光束和/或场来调节路径的一部分。

10. 发明申请

US20070041276A1 Double sided tourbillon 失效
标题翻译：双面陀飞轮
公开(公告)号：US20070041276A1
公开(公告)日：2007-02-22
申请号：US10554904
申请日：2004-04-30
申请人： Rob Jansen , Louis Lagler
发明人： Rob Jansen , Louis Lagler
IPC分类号： G04B15/00
CPC分类号： G04B17/285
摘要： The invention relates to a tourbillon mechanism comprising at least one platform, a balance arranged on the face of the platform(s), an escapement mechanism being arranged on the other face.
摘要翻译：本发明涉及一种陀飞轮机构，其包括至少一个平台，布置在所述平台的表面上的平衡物，设置在另一个面上的擒纵机构。

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