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1. 发明申请

US20150059277A1 VIP Roofing Insulation 有权
标题翻译：贵宾屋顶保温
公开(公告)号：US20150059277A1
公开(公告)日：2015-03-05
申请号：US14476947
申请日：2014-09-04
申请人： Richard O. Collins
发明人： Richard O. Collins
IPC分类号： E04D3/35 , E04D3/32
CPC分类号： E04D13/1606 , E04B1/803 , E04D3/32 , E04D3/351 , E04D3/357 , Y10T428/231
摘要： An insulating composite panel (ICP) 100, has an initial thermal resistance (R value) greater than about 50 ft2·° F.·h/Btu (8.8 K·m2/W) at a thickness less than 2.0 in (51 mm). The ICP is preassembled with a vacuum insulation panel (VIP) 102 protected by a lower rigid cover board 104 adhered to a lower surface of the VIP by a lower grid of adhesive ribbons 108, and by an upper rigid cover board 106 adhered to an upper surface of the VIP by an upper grid of adhesive ribbons 110. Each of the adhesive grids 108, 110 is augmented by a respective continuous ribbon of adhesive 112, 114 along the entire perimeter of each respective interface between the VIP 102 and each respective cover board 104, 106. The ICP has high resistance to wind uplift, mold, and fire, and low mass per unit area.
摘要翻译：绝缘复合板（ICP）100在（51mm）厚度小于2.0的情况下具有大于约50ft2·°F·h / Btu（8.8K·m 2 / W）的初始热阻（R值）。 ICP预先安装有由下部刚性盖板104保护的真空绝热板（VIP）102，该下部刚性盖板104通过粘合带108的下部格栅粘附到VIP的下表面，并且通过粘附到上部的上部刚性盖板106 通过粘合带110的上格栅，VIP的表面。粘合剂网格108,110中的每一个沿着VIP 102和每个相应覆盖板之间的每个相应接口的整个周边的相应连续的粘合剂带112,114增强 104，106. ICP具有较高的抵抗风抬升，模具和火灾，每单位面积质量低的特点。

2. 发明授权

US08441640B2 Non-contact substrate support position sensing system and corresponding adjustments 有权
标题翻译：非接触式基板支撑位置传感系统及相应调整
公开(公告)号：US08441640B2
公开(公告)日：2013-05-14
申请号：US12238987
申请日：2008-09-26
申请人： Kailash Kiran Patalay , Richard O. Collins , Jean R. Vatus , Zhepeng Cong
发明人： Kailash Kiran Patalay , Richard O. Collins , Jean R. Vatus , Zhepeng Cong
IPC分类号： G01B11/00 , C23F1/00
CPC分类号： H01L21/68 , C30B25/12 , H01L21/67259 , H01L21/68785 , H01L21/68792
摘要： A substrate processing system includes an optical measurement assembly coupled to an exterior of a processing chamber that has a portion that is transparent. The processing chamber includes a reference object and a pedestal for supporting a work piece. The optical measurement assembly measures a lateral location, a height and a tilt of the pedestal by transmitting light into the processing chamber through the transparent portion of the processing chamber and detecting a reflected light from both the reference object and the portion of the pedestal after the reflected light leaves the chamber through the transparent portion of the processing chamber. A method of adjusting a pedestal includes analyzing the reflected light and leveling the pedestal, translating the pedestal, calibrating the pedestal height to a preheat ring level, and checking the level and location of the pedestal in response to the analyzed reflected light.
摘要翻译：衬底处理系统包括耦合到具有透明部分的处理室的外部的光学测量组件。处理室包括用于支撑工件的参考物体和基座。光学测量组件通过将光通过处理室的透明部分传输到处理室中来测量基座的横向位置，高度和倾斜度，并且检测来自基准物体和底座部分之后的反射光反射光通过处理室的透明部分离开室。调整基座的方法包括：分析反射光并调平基座，平移基座，将基座高度校准到预热环电平，以及响应分析的反射光检查基座的电平和位置。

3. 发明授权

US08398777B2 System and method for pedestal adjustment 有权
标题翻译：基座调整系统及方法
公开(公告)号：US08398777B2
公开(公告)日：2013-03-19
申请号：US12238921
申请日：2008-09-26
申请人： Richard O. Collins , Kailash Kiran Patalay , Jean R. Vatus , Zhepeng Cong
发明人： Richard O. Collins , Kailash Kiran Patalay , Jean R. Vatus , Zhepeng Cong
IPC分类号： C23C16/00 , C23C16/50 , C23F1/00 , H01L21/306
CPC分类号： H01L21/68 , C30B25/12 , H01L21/67259 , H01L21/68785 , H01L21/68792
摘要： A pedestal positioning assembly system for use in a substrate processing system includes a pedestal rigidly attached to a pedestal shaft, a reference rigidly attached to the substrate processing system, a lateral adjustment assembly to adjust a lateral location of the pedestal relative to the reference, and a vertical adjustment assembly to adjust a tilt of the pedestal relative to the reference. The lateral adjustment assembly and the vertical adjustment assembly are external to a processing chamber and are coupled to the pedestal disposed within the processing chamber through the pedestal shaft. The reference can be a ring and the lateral adjustment assembly substantially centers the pedestal within the ring. A method of adjusting a pedestal includes leveling the pedestal, translating the pedestal, calibrating the pedestal height to a preheat ring level, and checking the level and location of the pedestal while rotating the pedestal.
摘要翻译：用于基板处理系统的基座定位组件系统包括刚性地连接到基座轴的基座，刚性地附接到基板处理系统的基准，横向调整组件，用于调节基座相对于基准的横向位置，以及垂直调节组件，用于调节基座相对于基准的倾斜。横向调节组件和垂直调节组件位于处理室的外部，并且通过基座轴联接到设置在处理室内的基座。参考可以是环，并且横向调节组件使基座在环内基本上居中。一种调节基座的方法包括调平基座，平移基座，将基座高度校准到预热环水平面，以及在旋转基座时检查基座的水平和位置。

4. 发明申请

US20100075488A1 CVD REACTOR WITH MULTIPLE PROCESSING LEVELS AND DUAL-AXIS MOTORIZED LIFT MECHANISM 审中-公开
标题翻译：具有多种加工水平和双轴电动机构的CVD反应器
公开(公告)号：US20100075488A1
公开(公告)日：2010-03-25
申请号：US12560073
申请日：2009-09-15
申请人： Richard O. Collins , Nyi O. Myo , Kevin J. Bautista , John S. Webb , Errol C. Sanchez , Yi-Chiau Huang , Kailash Kiran Patalay , Zhi Yuan Zhou , Wilson Yu
发明人： Richard O. Collins , Nyi O. Myo , Kevin J. Bautista , John S. Webb , Errol C. Sanchez , Yi-Chiau Huang , Kailash Kiran Patalay , Zhi Yuan Zhou , Wilson Yu
IPC分类号： H01L21/20 , C23C16/458
CPC分类号： H01L21/67115 , C23C16/45551 , H01L21/68742 , H01L21/68792
摘要： An apparatus for processing a substrate, comprising a processing chamber and a substrate support and lift pin assembly disposed within the chamber. The substrate support and lift pin assembly are coupled to a lift mechanism that controls positioning of the substrate support and the lift pins and provides rotation for the substrate support. The lift mechanism includes at least one sensor capable of generating a signal when clearance between the substrate support and the lift pins allows rotation of the substrate support to begin. The substrate support capable of concurrent axial motion and rotation may be used in a processing chamber comprising multiple processing zones separated by edge rings. Substrates may be subjected to successive or cyclical processes by moving between the multiple processing zones.
摘要翻译：一种用于处理衬底的装置，包括处理室和设置在腔室内的衬底支撑件和提升销组件。基板支撑和提升销组件联接到升降机构，该提升机构控制基板支撑件和升降销的定位并提供用于基板支撑件的旋转。提升机构包括至少一个传感器，当传感器支架和提升销之间的间隙允许基板支撑件的旋转开始时能产生信号。能够同时进行轴向运动和旋转的基板支撑件可用于包括由边缘环分开的多个处理区域的处理室。可以通过在多个处理区之间移动来对衬底进行连续或循环过程。

5. 发明申请

US20090276097A1 NON-CONTACT SUBSTRATE SUPPORT POSITION SENSING SYSTEM AND CORRESPONDING ADJUSTMENTS 有权
标题翻译：非接触式基板支撑位置传感系统及相应调整
公开(公告)号：US20090276097A1
公开(公告)日：2009-11-05
申请号：US12238987
申请日：2008-09-26
申请人： Kailash Kiran Patalay , Richard O. Collins , Jean R. Vatus , Zhepeng Cong
发明人： Kailash Kiran Patalay , Richard O. Collins , Jean R. Vatus , Zhepeng Cong
IPC分类号： G01M1/38 , B05C11/00
CPC分类号： H01L21/68 , C30B25/12 , H01L21/67259 , H01L21/68785 , H01L21/68792
摘要： A substrate processing system includes an optical measurement assembly coupled to an exterior of a processing chamber that has a portion that is transparent. The processing chamber includes a reference object and a pedestal for supporting a work piece. The optical measurement assembly measures a lateral location, a height and a tilt of the pedestal by transmitting light into the processing chamber through the transparent portion of the processing chamber and detecting a reflected light from both the reference object and the portion of the pedestal after the reflected light leaves the chamber through the transparent portion of the processing chamber. A method of adjusting a pedestal includes analyzing the reflected light and leveling the pedestal, translating the pedestal, calibrating the pedestal height to a preheat ring level, and checking the level and location of the pedestal in response to the analyzed reflected light.
摘要翻译：衬底处理系统包括耦合到具有透明部分的处理室的外部的光学测量组件。处理室包括用于支撑工件的参考物体和基座。光学测量组件通过将光通过处理室的透明部分传输到处理室中来测量基座的横向位置，高度和倾斜度，并且检测来自基准物体和底座部分之后的反射光反射光通过处理室的透明部分离开室。调整基座的方法包括：分析反射光并调平基座，平移基座，将基座高度校准到预热环电平，以及响应分析的反射光检查基座的电平和位置。

6. 发明申请

US20090272719A1 SYSTEM AND METHOD FOR PEDESTAL ADJUSTMENT 有权
标题翻译：用于调节调节的系统和方法
公开(公告)号：US20090272719A1
公开(公告)日：2009-11-05
申请号：US12238921
申请日：2008-09-26
申请人： Richard O. Collins , Kailash Kiran Patalay , Jean R. Vatus , Zhepeng Cong
发明人： Richard O. Collins , Kailash Kiran Patalay , Jean R. Vatus , Zhepeng Cong
IPC分类号： C23F1/00 , C23C16/00 , B05D5/12 , H01L21/68 , C23F1/08
CPC分类号： H01L21/68 , C30B25/12 , H01L21/67259 , H01L21/68785 , H01L21/68792
摘要： A pedestal positioning assembly system for use in a substrate processing system includes a pedestal rigidly attached to a pedestal shaft, a reference rigidly attached to the substrate processing system, a lateral adjustment assembly to adjust a lateral location of the pedestal relative to the reference, and a vertical adjustment assembly to adjust a tilt of the pedestal relative to the reference. The lateral adjustment assembly and the vertical adjustment assembly are external to a processing chamber and are coupled to the pedestal disposed within the processing chamber through the pedestal shaft. The reference can be a ring and the lateral adjustment assembly substantially centers the pedestal within the ring. A method of adjusting a pedestal includes leveling the pedestal, translating the pedestal, calibrating the pedestal height to a preheat ring level, and checking the level and location of the pedestal while rotating the pedestal.
摘要翻译：用于基板处理系统的基座定位组件系统包括刚性地连接到基座轴的基座，刚性地附接到基板处理系统的基准，横向调整组件，用于调节基座相对于基准的横向位置，以及垂直调节组件，用于调节基座相对于基准的倾斜。横向调节组件和垂直调节组件位于处理室的外部，并且通过基座轴联接到设置在处理室内的基座。参考可以是环，并且横向调节组件使基座在环内基本上居中。一种调节基座的方法包括调平基座，平移基座，将基座高度校准到预热环水平面，以及在旋转基座时检查基座的水平和位置。

7. 发明授权

US09297164B2 VIP roofing insulation 有权
标题翻译：贵宾屋顶保温
公开(公告)号：US09297164B2
公开(公告)日：2016-03-29
申请号：US14476947
申请日：2014-09-04
申请人： Richard O. Collins , Dwight S. Musgrave , Kenneth C. Areskog
发明人： Richard O. Collins , Dwight S. Musgrave , Kenneth C. Areskog
IPC分类号： E04D3/35 , E04D13/16 , E04D3/32 , E04B1/80
CPC分类号： E04D13/1606 , E04B1/803 , E04D3/32 , E04D3/351 , E04D3/357 , Y10T428/231
摘要： An insulating composite panel (ICP) 100, has an initial thermal resistance (R value) greater than about 50 ft2·° F.·h/Btu (8.8 K·m2/W) at a thickness less than 2.0 in (51 mm). The ICP is preassembled with a vacuum insulation panel (VIP) 102 protected by a lower rigid cover board 104 adhered to a lower surface of the VIP by a lower grid of adhesive ribbons 108, and by an upper rigid cover board 106 adhered to an upper surface of the VIP by an upper grid of adhesive ribbons 110. Each of the adhesive grids 108, 110 is augmented by a respective continuous ribbon of adhesive 112, 114 along the entire perimeter of each respective interface between the VIP 102 and each respective cover board 104, 106. The ICP has high resistance to wind uplift, mold, and fire, and low mass per unit area.
摘要翻译：绝缘复合板（ICP）100在（51mm）厚度小于2.0的情况下具有大于约50ft2·°F·h / Btu（8.8K·m 2 / W）的初始热阻（R值）。 ICP预先安装有由下部刚性盖板104保护的真空绝热板（VIP）102，该下部刚性盖板104通过粘合带108的下部格栅粘附到VIP的下表面，并且通过粘附到上部的上部刚性盖板106 通过粘合带110的上格栅，VIP的表面。粘合剂网格108,110中的每一个沿着VIP 102和每个相应覆盖板之间的每个相应接口的整个周边的相应连续的粘合剂带112,114增强 104，106. ICP具有较高的抵抗风抬升，模具和火灾，每单位面积质量低的特点。

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