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    • 1. 发明申请
    • ISOLATED METAL PLUG PROCESS FOR USE IN FABRICATING CARBON NANOTUBE MEMORY CELLS
    • 用于制备碳纳米管存储器细胞的隔离金属压片方法
    • US20100148277A1
    • 2010-06-17
    • US12710477
    • 2010-02-23
    • Richard J. CarterPeter A. BurkeVerne C. HornbackThomas RueckesClaude L. Bertin
    • Richard J. CarterPeter A. BurkeVerne C. HornbackThomas RueckesClaude L. Bertin
    • H01L27/112
    • H01H1/0094Y10S977/724Y10S977/732Y10S977/943
    • The present invention is directed to structures and methods of fabricating electromechanical memory cells having nanotube crossbar elements. Such memory cells include a substrate having transistor with a contact that electrically contacts with the transistor. A first support layer is formed over the substrate with an opening that defines a lower chamber above the electrical contact. A nanotube crossbar element is arranged to span the lower chamber. A second support layer is formed with an opening that defines a top chamber above the lower chamber, the top chamber including an extension region that extends beyond an edge of the lower chamber to expose a portion of the top surface of the first support layer. A roof layer covers the top of the top chamber and includes an aperture that exposes a portion of the extension region of the top chamber and includes a plug that extends into the aperture in the roof layer to seal the top and bottom chambers. The memory cell further includes an electrode that overlies the crossbar element such that electrical signals can activate the electrode to attract or repel the crossbar element to set a memory state for the transistor.
    • 本发明涉及制造具有纳米管横杆元件的机电存储器单元的结构和方法。 这种存储单元包括具有与晶体管电接触的接触的晶体管的衬底。 第一支撑层形成在衬底上,其开口限定了电触点上方的下腔室。 纳米管横杆元件布置成跨越下室。 第二支撑层形成有开口,所述开口限定在所述下腔室上方的顶部腔室,所述顶部腔室包括延伸超出所述下部腔室的边缘以暴露所述第一支撑层的顶部表面的一部分的延伸区域。 屋顶层覆盖顶部室的顶部,并且包括露出顶部室的延伸区域的一部分并且包括延伸到顶部层中的孔中以密封顶部和底部室的插塞的孔。 存储单元还包括覆盖在横杆元件上的电极,使得电信号可以激活电极以吸引或排斥交叉开关元件以设置晶体管的存储状态。
    • 2. 发明授权
    • Isolated metal plug process for use in fabricating carbon nanotube memory cells
    • 用于制造碳纳米管记忆单元的隔离金属塞工艺
    • US07884430B2
    • 2011-02-08
    • US12710477
    • 2010-02-23
    • Richard J. CarterPeter A. BurkeVerne C. HornbackThomas RueckesClaude L. Bertin
    • Richard J. CarterPeter A. BurkeVerne C. HornbackThomas RueckesClaude L. Bertin
    • H01L29/84
    • H01H1/0094Y10S977/724Y10S977/732Y10S977/943
    • The present invention is directed to structures and methods of fabricating electromechanical memory cells having nanotube crossbar elements. Such memory cells include a substrate having transistor with a contact that electrically contacts with the transistor. A first support layer is formed over the substrate with an opening that defines a lower chamber above the electrical contact. A nanotube crossbar element is arranged to span the lower chamber. A second support layer is formed with an opening that defines a top chamber above the lower chamber, the top chamber including an extension region that extends beyond an edge of the lower chamber to expose a portion of the top surface of the first support layer. A roof layer covers the top of the top chamber and includes an aperture that exposes a portion of the extension region of the top chamber and includes a plug that extends into the aperture in the roof layer to seal the top and bottom chambers. The memory cell further includes an electrode that overlies the crossbar element such that electrical signals can activate the electrode to attract or repel the crossbar element to set a memory state for the transistor.
    • 本发明涉及制造具有纳米管横杆元件的机电存储器单元的结构和方法。 这种存储单元包括具有与晶体管电接触的接触的晶体管的衬底。 第一支撑层形成在衬底上,其开口限定了电触点上方的下腔室。 纳米管横杆元件布置成跨越下室。 第二支撑层形成有开口,所述开口限定在所述下腔室上方的顶部腔室,所述顶部腔室包括延伸超出所述下部腔室的边缘以暴露所述第一支撑层的顶部表面的一部分的延伸区域。 屋顶层覆盖顶部室的顶部,并且包括露出顶部室的延伸区域的一部分并且包括延伸到顶部层中的孔中以密封顶部和底部室的插塞的孔。 存储单元还包括覆盖在横杆元件上的电极,使得电信号可以激活电极以吸引或排斥交叉开关元件以设置晶体管的存储状态。
    • 3. 发明授权
    • Isolated metal plug process for use in fabricating carbon nanotube memory cells
    • 用于制造碳纳米管记忆单元的隔离金属塞工艺
    • US07824946B1
    • 2010-11-02
    • US11429069
    • 2006-05-05
    • Richard J. CarterPeter A. BurkeVerne C. HornbackClaude L. BertinThomas Rueckes
    • Richard J. CarterPeter A. BurkeVerne C. HornbackClaude L. BertinThomas Rueckes
    • H01L21/00H01L21/64
    • H01H1/0094Y10S977/724Y10S977/732Y10S977/943
    • The present invention is directed to structures and methods of fabricating electromechanical memory cells having nanotube crossbar elements. Such memory cells include a substrate having transistor with a contact that electrically contacts with the transistor. A first support layer is formed over the substrate with an opening that defines a lower chamber above the electrical contact. A nanotube crossbar element is arranged to span the lower chamber. A second support layer is formed with an opening that defines a top chamber above the lower chamber, the top chamber including an extension region that extends beyond an edge of the lower chamber to expose a portion of the top surface of the first support layer. A roof layer covers the top of the top chamber and includes an aperture that exposes a portion of the extension region of the top chamber and includes a plug that extends into the aperture in the roof layer to seal the top and bottom chambers. The memory cell further includes an electrode that overlies the crossbar element such that electrical signals can activate the electrode to attract or repel the crossbar element to set a memory state for the transistor.
    • 本发明涉及制造具有纳米管横杆元件的机电存储器单元的结构和方法。 这种存储单元包括具有与晶体管电接触的接触的晶体管的衬底。 第一支撑层形成在衬底上,其开口限定了电触点上方的下腔室。 纳米管横杆元件布置成跨越下室。 第二支撑层形成有开口,所述开口限定在所述下腔室上方的顶部腔室,所述顶部腔室包括延伸超出所述下部腔室的边缘以暴露所述第一支撑层的顶部表面的一部分的延伸区域。 屋顶层覆盖顶部室的顶部,并且包括露出顶部室的延伸区域的一部分并且包括延伸到顶部层中的孔中以密封顶部和底部室的插塞的孔。 存储单元还包括覆盖在横杆元件上的电极,使得电信号可以激活电极以吸引或排斥交叉开关元件以设置晶体管的存储状态。
    • 4. 发明授权
    • Non-tensioned carbon nanotube switch design and process for making same
    • 非张力碳纳米管开关的设计与制造过程
    • US07928521B1
    • 2011-04-19
    • US11142725
    • 2005-05-31
    • Peter A. BurkeThomas RueckesClaude L. Bertin
    • Peter A. BurkeThomas RueckesClaude L. Bertin
    • H01L29/82
    • H01H1/0094B82Y10/00H01H59/0009H01H2001/0042H01H2059/0045H01L51/0048H01L51/0591Y10S977/932
    • The invention comprises a carbon nanotube switch suitable for use in an integrated circuit structure and capable of being moved from a first position in a first plane in the switch to a second position in a second plane in the switch using approximately the same energy as required to move the switch from the second position back to the first position. The switch comprises a flexible carbon nanotube strip secured clamped at one end in a first plane in a switching chamber, and secured or clamped, at the opposite end of the carbon nanotube, in a second plane in the switching chamber, which is parallel to the first plane but spaced therefrom, to permit the central portion of the carbon nanotube strip to move in the chamber between a first position in the first plane and in electrical contact with one or more first electrodes and a second position in the second plane and in electrical contact with one or more second electrodes.
    • 本发明包括一种适用于集成电路结构的碳纳米管开关,其能够使用开关中的第一平面中的第一位置移动到开关中的第二平面中的第二位置,使用大约相同的能量 将开关从第二个位置移回到第一个位置。 开关包括柔性碳纳米管条,其固定在切换室中的第一平面中的一端处夹持,并且在碳纳米管的相对端处固定或夹紧在开关室中的平行于第二平面的第二平面中 第一平面但与其间隔开,以允许碳纳米管条的中心部分在室中在第一平面中的第一位置和与一个或多个第一电极电连接并且在第二平面中的第二位置和电气 与一个或多个第二电极接触。