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1. 发明授权

US07538875B2 Lithographic apparatus and methods for use thereof 失效
标题翻译：光刻设备及其使用方法
公开(公告)号：US07538875B2
公开(公告)日：2009-05-26
申请号：US11014062
申请日：2004-12-17
申请人： Remco Marcel Van Dijk , Donis George Flagello , Michel Fransois Hubert Klaassen , Tammo Uitterdijk
发明人： Remco Marcel Van Dijk , Donis George Flagello , Michel Fransois Hubert Klaassen , Tammo Uitterdijk
IPC分类号： G01J4/00
CPC分类号： G03F7/70566 , G01J4/04 , G03F1/44 , G03F7/70125 , G03F7/70133 , G03F7/70591
摘要： A method for determining a polarization state of light passed through the projection lens of a lithographic apparatus is described. Polarizing structures are disposed on an object side of the projection lens of the lithographic apparatus. By measuring light that has passed through the polarizing structures information regarding the polarization characteristics of the projection lens can be determined.
摘要翻译：描述了一种用于确定通过光刻设备的投影透镜的光的偏振状态的方法。极化结构设置在光刻设备的投影透镜的物体侧。通过测量已经通过偏振结构的光，可以确定关于投影透镜的偏振特性的信息。

2. 发明申请

US20100182582A1 Passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool 审中-公开
标题翻译：无源光罩工具，光刻设备和在光刻工具中构图设备的方法
公开(公告)号：US20100182582A1
公开(公告)日：2010-07-22
申请号：US11922018
申请日：2006-06-13
申请人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
发明人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
IPC分类号： G03B27/72 , G01J4/04
CPC分类号： G01M11/0264 , G03F7/70566 , G03F7/706 , G03F7/7085
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的偏振传感器，其中所述光罩极化传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。

3. 发明申请

US20100045956A1 Lithographic Apparatus, Method for Determining at Least One Polarization Property Thereof, Polarization Analyzer and Polarization Sensor Thereof 审中-公开
标题翻译：平版印刷设备，用于确定其极化特性的方法，极化分析仪和极化传感器
公开(公告)号：US20100045956A1
公开(公告)日：2010-02-25
申请号：US11922056
申请日：2006-06-13
申请人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
发明人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
IPC分类号： G03B27/72 , G01J4/00
CPC分类号： G01M11/0264 , G03F7/70566 , G03F7/706 , G03F7/7085
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的极化传感器，其中所述光罩偏振传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。

4. 发明授权

US07375799B2 Lithographic apparatus 有权
标题翻译：平版印刷设备
公开(公告)号：US07375799B2
公开(公告)日：2008-05-20
申请号：US11065349
申请日：2005-02-25
申请人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk
发明人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70133 , G03F7/70566 , G03F7/70591 , G03F7/7085
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a detector for measuring the intensity of the radiation after it has passed through the projection system. The apparatus further includes a polarization changing element, such as a quarter-wave plate, that is adjustable; and a polarization analyzer, such as a linear polarizer, wherein the polarization changing element and the polarization analyzer are arranged in order in the radiation beam path at the level at which a patterning device would be held by the support. By taking intensity measurements, using the detector, for different rotational orientations of the polarization changing element, information on the state of polarization of the radiation at the level of the patterning device can be obtained. Because the polarization analyzer is located before the projection system, the measurements are not affected by the fact that the detector is located after the projection system, such as at the level of the substrate.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 以及用于在辐射通过投影系统之后测量辐射强度的检测器。该装置还包括可调节的诸如四分之一波片的偏振变化元件; 以及诸如线性偏振器的偏振分析器，其中偏振改变元件和偏振分析器在辐射束路径中依次布置在图案形成装置将被支撑件保持的水平处。通过采用强度测量，使用检测器，对于偏振变化元件的不同的旋转取向，可以获得关于在图案形成装置的电平处的辐射的偏振状态的信息。由于偏振分析仪位于投影系统之前，测量不受检测器位于投影系统之后（例如在基板的水平面）的事实的影响。

5. 发明申请

US20100118288A1 Lithographic projection system and projection lens polarization sensor 审中-公开
标题翻译：平版投影系统和投影透镜偏振传感器
公开(公告)号：US20100118288A1
公开(公告)日：2010-05-13
申请号：US11922020
申请日：2006-06-13
申请人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
发明人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
IPC分类号： G01J4/00 , G03B27/72
CPC分类号： G01M11/0264 , G03F7/70566 , G03F7/706 , G03F7/7085
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的极化传感器，其中所述光罩偏振传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。

6. 发明申请

US20110279796A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20110279796A1
公开(公告)日：2011-11-17
申请号：US13189288
申请日：2011-07-22
申请人： Tammo Uitterdijk , Erik Roelof Loopstra , Laurens Anthony Sanderse
发明人： Tammo Uitterdijk , Erik Roelof Loopstra , Laurens Anthony Sanderse
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70958
摘要： In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.
摘要翻译：在浸没式光刻设备中，公开了一种最终元件，其在最接近衬底的表面上具有与该层相同的材料结合到该表面并具有与层相同的材料的层，该层从该层延伸离开该衬底至该屏蔽层来自液体的最终元素。在一个实施例中，最终元件经由层和/或边缘屏障附接到设备，该层和/或边缘屏障可以由热膨胀系数低于最终元件的热膨胀系数的材料制成。

7. 发明授权

US07538952B2 Lithographic apparatus, aberration correction device and device manufacturing method 有权
标题翻译：光刻设备，像差校正装置和器件制造方法
公开(公告)号：US07538952B2
公开(公告)日：2009-05-26
申请号：US12078847
申请日：2008-04-07
申请人： Tammo Uitterdijk , Laurentius Catrinus Jorritsma
发明人： Tammo Uitterdijk , Laurentius Catrinus Jorritsma
IPC分类号： G02B3/00 , G03B27/42
CPC分类号： G03F7/70891 , G03F7/70308 , G03F7/706
摘要： An aberration correction device useable in lithography comprises two elements, at least one of which is relatively rotatable to the other about, for example, an optical axis. One surface of each element has an aspheric form describable by higher Zernike polynomials. When the two surfaces are rotationally aligned, the device has the optical effect of a plane plate. If there is a small relative rotation of the two elements the effect of the device is a phase shift describable by the derivative of the aspheric form. The correction device may be used to correct aberrations caused by lens heating, especially with illumination modes and pattern types resulting in strong off-axis localized pupil filling in the projection system.
摘要翻译：可用于光刻的像差校正装置包括两个元件，其中至少一个可以例如相对于光轴相对旋转。每个元素的一个表面具有可被较高Zernike多项式描述的非球面形式。当两个表面旋转对准时，该装置具有平板的光学效果。如果两个元件的相对旋转小，器件的影响是由非球面形式的导数描述的相移。校正装置可以用于校正由透镜加热引起的像差，特别是在照明模式和图案类型下，导致在投影系统中强大的离轴局部光瞳填充。

8. 发明申请

US20080212183A1 Lithographic apparatus, aberration correction device and device manufacturing method 有权
公开(公告)号：US20080212183A1
公开(公告)日：2008-09-04
申请号：US12078847
申请日：2008-04-07
申请人： Tammo Uitterdijk , Laurentius Catrinus Jorritsma
发明人： Tammo Uitterdijk , Laurentius Catrinus Jorritsma
IPC分类号： G02B27/64
CPC分类号： G03F7/70891 , G03F7/70308 , G03F7/706
摘要： An aberration correction device useable in lithography comprises two elements, at least one of which is relatively rotatable to the other about, for example, an optical axis. One surface of each element has an aspheric form describable by higher Zernike polynomials. When the two surfaces are rotationally aligned, the device has the optical effect of a plane plate. If there is a small relative rotation of the two elements the effect of the device is a phase shift describable by the derivative of the aspheric form. The correction device may be used to correct aberrations caused by lens heating, especially with illumination modes and pattern types resulting in strong off-axis localized pupil filling in the projection system.

9. 发明授权

US07372633B2 Lithographic apparatus, aberration correction device and device manufacturing method 有权
标题翻译：光刻设备，像差校正装置和器件制造方法
公开(公告)号：US07372633B2
公开(公告)日：2008-05-13
申请号：US11488172
申请日：2006-07-18
申请人： Tammo Uitterdijk , Laurentius Catrinus Jorritsma
发明人： Tammo Uitterdijk , Laurentius Catrinus Jorritsma
IPC分类号： G02B3/00 , G03B27/42
CPC分类号： G03F7/70891 , G03F7/70308 , G03F7/706
摘要： An aberration correction device useable in lithography comprises two elements, at least one of which is relatively rotatable to the other about, for example, an optical axis. One surface of each element has an aspheric form describable by higher Zernike polynomials. When the two surfaces are rotationally aligned, the device has the optical effect of a plane plate. If there is a small relative rotation of the two elements the effect of the device is a phase shift describable by the derivative of the aspheric form. The correction device may be used to correct aberrations caused by lens heating, especially with illumination modes and pattern types resulting in strong off-axis localized pupil filling in the projection system.
摘要翻译：可用于光刻的像差校正装置包括两个元件，其中至少一个可以例如相对于光轴相对旋转。每个元素的一个表面具有可被较高Zernike多项式描述的非球面形式。当两个表面旋转对准时，该装置具有平板的光学效果。如果两个元件的相对旋转小，器件的影响是由非球面形式的导数描述的相移。校正装置可以用于校正由透镜加热引起的像差，特别是在照明模式和图案类型下，导致在投影系统中强大的离轴局部光瞳填充。

10. 发明申请

US20070296938A1 Method of reducing a wave front aberration, and computer program product 有权
标题翻译：降低波前像差的方法，以及计算机程序产品
公开(公告)号：US20070296938A1
公开(公告)日：2007-12-27
申请号：US11473323
申请日：2006-06-23
申请人： Wim Tjibbo Tel , Freerk Adriaan Stoffels , Laurentius Catrinus Jorritsma , Tammo Uitterdijk , Johannes Wilhelmus De Klerk
发明人： Wim Tjibbo Tel , Freerk Adriaan Stoffels , Laurentius Catrinus Jorritsma , Tammo Uitterdijk , Johannes Wilhelmus De Klerk
IPC分类号： G03B27/42
CPC分类号： G03B27/72 , G03B27/53 , G03F7/70125 , G03F7/70258 , G03F7/706 , G03F7/70891
摘要： A method of reducing a wave front aberration is provided for a lithographic process whereby the reducing is based on the selected pattern to be printed and the selected illumination mode used for exposure. Wave front aberrations of a projection system of a lithographic apparatus are measured and reduced by calculating adjustments of optical elements of the projection system and applying the calculated adjustments to the projection system. The calculation of adjustments is based on information on a spatial distribution of radiant intensity in a pupil of the projection system as present during exposing the radiation sensitive layer, and is limited to aberrations in projection lens pupil areas of relative high radiant flux.
摘要翻译：提供了一种降低波前像差的方法，用于光刻处理，由此减少是基于所选择的要打印的图案和用于曝光的所选择的照明模式。通过计算投影系统的光学元件的调整并将计算的调整应用于投影系统来测量和减少光刻设备的投影系统的波前像差。调整的计算基于在曝光辐射敏感层期间在投影系统的光瞳中的辐射强度的空间分布的信息，并且限于相对高辐射通量的投影透镜瞳孔区域中的像差。

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