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1. 发明授权

US07538875B2 Lithographic apparatus and methods for use thereof 失效
标题翻译：光刻设备及其使用方法
公开(公告)号：US07538875B2
公开(公告)日：2009-05-26
申请号：US11014062
申请日：2004-12-17
申请人： Remco Marcel Van Dijk , Donis George Flagello , Michel Fransois Hubert Klaassen , Tammo Uitterdijk
发明人： Remco Marcel Van Dijk , Donis George Flagello , Michel Fransois Hubert Klaassen , Tammo Uitterdijk
IPC分类号： G01J4/00
CPC分类号： G03F7/70566 , G01J4/04 , G03F1/44 , G03F7/70125 , G03F7/70133 , G03F7/70591
摘要： A method for determining a polarization state of light passed through the projection lens of a lithographic apparatus is described. Polarizing structures are disposed on an object side of the projection lens of the lithographic apparatus. By measuring light that has passed through the polarizing structures information regarding the polarization characteristics of the projection lens can be determined.
摘要翻译：描述了一种用于确定通过光刻设备的投影透镜的光的偏振状态的方法。极化结构设置在光刻设备的投影透镜的物体侧。通过测量已经通过偏振结构的光，可以确定关于投影透镜的偏振特性的信息。

2. 发明申请

US20100182582A1 Passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool 审中-公开
标题翻译：无源光罩工具，光刻设备和在光刻工具中构图设备的方法
公开(公告)号：US20100182582A1
公开(公告)日：2010-07-22
申请号：US11922018
申请日：2006-06-13
申请人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
发明人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
IPC分类号： G03B27/72 , G01J4/04
CPC分类号： G01M11/0264 , G03F7/70566 , G03F7/706 , G03F7/7085
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的偏振传感器，其中所述光罩极化传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。

3. 发明申请

US20100045956A1 Lithographic Apparatus, Method for Determining at Least One Polarization Property Thereof, Polarization Analyzer and Polarization Sensor Thereof 审中-公开
标题翻译：平版印刷设备，用于确定其极化特性的方法，极化分析仪和极化传感器
公开(公告)号：US20100045956A1
公开(公告)日：2010-02-25
申请号：US11922056
申请日：2006-06-13
申请人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
发明人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
IPC分类号： G03B27/72 , G01J4/00
CPC分类号： G01M11/0264 , G03F7/70566 , G03F7/706 , G03F7/7085
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的极化传感器，其中所述光罩偏振传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。

4. 发明授权

US07375799B2 Lithographic apparatus 有权
标题翻译：平版印刷设备
公开(公告)号：US07375799B2
公开(公告)日：2008-05-20
申请号：US11065349
申请日：2005-02-25
申请人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk
发明人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70133 , G03F7/70566 , G03F7/70591 , G03F7/7085
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a detector for measuring the intensity of the radiation after it has passed through the projection system. The apparatus further includes a polarization changing element, such as a quarter-wave plate, that is adjustable; and a polarization analyzer, such as a linear polarizer, wherein the polarization changing element and the polarization analyzer are arranged in order in the radiation beam path at the level at which a patterning device would be held by the support. By taking intensity measurements, using the detector, for different rotational orientations of the polarization changing element, information on the state of polarization of the radiation at the level of the patterning device can be obtained. Because the polarization analyzer is located before the projection system, the measurements are not affected by the fact that the detector is located after the projection system, such as at the level of the substrate.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 以及用于在辐射通过投影系统之后测量辐射强度的检测器。该装置还包括可调节的诸如四分之一波片的偏振变化元件; 以及诸如线性偏振器的偏振分析器，其中偏振改变元件和偏振分析器在辐射束路径中依次布置在图案形成装置将被支撑件保持的水平处。通过采用强度测量，使用检测器，对于偏振变化元件的不同的旋转取向，可以获得关于在图案形成装置的电平处的辐射的偏振状态的信息。由于偏振分析仪位于投影系统之前，测量不受检测器位于投影系统之后（例如在基板的水平面）的事实的影响。

5. 发明申请

US20100118288A1 Lithographic projection system and projection lens polarization sensor 审中-公开
标题翻译：平版投影系统和投影透镜偏振传感器
公开(公告)号：US20100118288A1
公开(公告)日：2010-05-13
申请号：US11922020
申请日：2006-06-13
申请人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
发明人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
IPC分类号： G01J4/00 , G03B27/72
CPC分类号： G01M11/0264 , G03F7/70566 , G03F7/706 , G03F7/7085
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的极化传感器，其中所述光罩偏振传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。

6. 发明申请

US20110122389A1 RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：辐射源，光刻设备和器件制造方法
公开(公告)号：US20110122389A1
公开(公告)日：2011-05-26
申请号：US13055827
申请日：2009-07-15
申请人： Michel Fransois Hubert Klaassen , Rogier Herman Mathijs Groeneveld , Alexander Matthijs Struycken , Gerardus Hubertus Petrus Maria Swinkels
发明人： Michel Fransois Hubert Klaassen , Rogier Herman Mathijs Groeneveld , Alexander Matthijs Struycken , Gerardus Hubertus Petrus Maria Swinkels
IPC分类号： G03B27/34
CPC分类号： G03F7/7085 , G03F7/70141 , G03F7/70175
摘要： A lithographic apparatus includes a source module that include a collector and a radiation source. The collector is configured to collect radiation from the radiation source. An illuminator is configured to condition the radiation, collected by the collector and to provide a radiation beam. A detector is disposed in a fixed positional relationship with respect to the illuminator. The detector is configured to determine a position of the radiation source relative to the collector and a position of the source module relative to the illuminator.
摘要翻译：光刻设备包括源模块，其包括收集器和辐射源。收集器被配置为收集来自辐射源的辐射。照明器被配置为调节由收集器收集的辐射并提供辐射束。检测器相对于照明器以固定的位置关系设置。检测器被配置为确定辐射源相对于收集器的位置和源模块相对于照明器的位置。

7. 发明申请

US20080062385A1 Method of monitoring polarization performance, polarization measurement assembly, lithographic apparatus and computer program product using the same 审中-公开
标题翻译：监测极化性能的方法，偏振测量组件，光刻设备和使用该方法的计算机程序产品
公开(公告)号：US20080062385A1
公开(公告)日：2008-03-13
申请号：US11399592
申请日：2006-04-07
申请人： Michel Fransois Hubert Klaassen
发明人： Michel Fransois Hubert Klaassen
IPC分类号： G03B21/14
CPC分类号： G03F7/7085 , G03F7/70566
摘要： The invention relates to a method of monitoring a polarization performance of an optical system in a lithographic projection apparatus. The lithographic projection apparatus has an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and provided with a polarization sensitive feature. In the method, first the patterning device, a detector and a projection system are provided such that upon illumination of the polarization sensitive feature, an image of this feature is projected by the projection system on the detector. Then, an image intensity of the image is measured. Finally, a polarization-related parameter based on the image intensity as measured is determined.
摘要翻译：本发明涉及一种在光刻投影设备中监测光学系统的偏振性能的方法。光刻投影设备具有被配置为调节辐射束和构造成支撑图案形成装置的支撑件的照明系统。图案形成装置能够使辐射束在其横截面上具有图案以形成图案化的辐射束，并且具有极化敏感特征。在该方法中，首先，提供图案形成装置，检测器和投影系统，使得在照射偏振敏感特征时，该特征的图像被投影系统投影在检测器上。然后，测量图像的图像强度。最后，确定基于测量的图像强度的偏振相关参数。

8. 发明申请

US20110188018A1 Alignment of Collector Device in Lithographic Apparatus 有权
标题翻译：收集器在平版印刷设备中的对准
公开(公告)号：US20110188018A1
公开(公告)日：2011-08-04
申请号：US13002544
申请日：2009-07-15
申请人： Michel Fransois Hubert Klaassen , Jan Bernard Plechelmus Van Schoot , Sylvain Dutartre
发明人： Michel Fransois Hubert Klaassen , Jan Bernard Plechelmus Van Schoot , Sylvain Dutartre
IPC分类号： G03B27/54
CPC分类号： G03F7/70033 , G03F7/70141 , G03F7/70175 , G03F7/70825 , G03F7/7085
摘要： A lithographic apparatus (2) can include a radiation source (SO) configured to provide radiation (200), a radiation collector (CO) configured to collect radiation (200) from the radiation source (SO), an illumination system (IL), and a detector (300). The detector (300) can be disposed in a fixed positional relationship with the illumination system (IL) relative to an alignment of the collector (CO). Further, a region (310) of the collector (CO) can be configured to direct a portion of radiation (200) emanating from the radiation source (SO) and traversing the region (310) towards the detector (300). The detector (300) can be configured to detect a change in a portion of the radiation (200). The change can be indicative of a change in position or orientation of the collector (CO) relative to the illumination system (IL) relative to an alignment of the collector (CO).
摘要翻译：光刻设备（2）可以包括被配置为提供辐射（200）的辐射源（SO），被配置为从辐射源（SO）收集辐射（200）的辐射收集器（CO），照明系统（IL）和检测器（300）。检测器（300）可以相对于收集器（CO）的排列与照明系统（IL）以固定的位置关系设置。此外，收集器（CO）的区域（310）可以被配置为引导从辐射源（SO）发出并且朝向检测器（300）横穿该区域（310）的一部分辐射（200）。检测器（300）可以被配置为检测辐射（200）的一部分中的变化。该变化可以指示相对于收集器（CO）的对准，收集器（CO）相对于照明系统（IL）的位置或取向的变化。

9. 发明申请

US20080225260A1 Illuminator for a lithographic apparatus and method 有权
标题翻译：光刻设备和方法的照明器
公开(公告)号：US20080225260A1
公开(公告)日：2008-09-18
申请号：US11724331
申请日：2007-03-15
申请人： Michel Fransois Hubert Klaassen , Hendrikus Robertus Marie Van Greevenbroek , Bernd Geh , Emil Peter Schmitt-Weaver
发明人： Michel Fransois Hubert Klaassen , Hendrikus Robertus Marie Van Greevenbroek , Bernd Geh , Emil Peter Schmitt-Weaver
IPC分类号： G03B27/32 , G03B27/72
CPC分类号： G03F7/701 , G03F7/70566
摘要： An illuminator for a lithographic apparatus, the illuminator including an illumination mode defining element and a plurality of polarization modifiers, the polarization modifiers being moveable into or out of partial intersection with a radiation beam having an angular and spatial distribution as governed by an illumination mode defining element.
摘要翻译：一种用于光刻设备的照明器，所述照明器包括照明模式限定元件和多个偏振调节器，所述偏振调节器可移动到与具有角度和空间分布的辐射束的部分交叉中，所述辐射束具有由限定元件。

10. 发明授权

US08704199B2 Alignment of collector device in lithographic apparatus 有权
标题翻译：光刻设备中收集器的对准
公开(公告)号：US08704199B2
公开(公告)日：2014-04-22
申请号：US13002544
申请日：2009-07-15
申请人： Michel Fransois Hubert Klaassen , Jan Bernard Plechelmus Van Schoot , Sylvain Dutartre
发明人： Michel Fransois Hubert Klaassen , Jan Bernard Plechelmus Van Schoot , Sylvain Dutartre
IPC分类号： H05G2/00 , G03B27/54 , G03F7/20
CPC分类号： G03F7/70033 , G03F7/70141 , G03F7/70175 , G03F7/70825 , G03F7/7085
摘要： A lithographic apparatus (2) can include a radiation source (SO) configured to provide radiation (200), a radiation collector (CO) configured to collect radiation (200) from the radiation source (SO), an illumination system (IL), and a detector (300). The detector (300) can be disposed in a fixed positional relationship with the illumination system (IL) relative to an alignment of the collector (CO). Further, a region (310) of the collector (CO) can be configured to direct a portion of radiation (200) emanating from the radiation source (SO) and traversing the region (310) towards the detector (300). The detector (300) can be configured to detect a change in a portion of the radiation (200). The change can be indicative of a change in position or orientation of the collector (CO) relative to the illumination system (IL) relative to an alignment of the collector (CO).
摘要翻译：光刻设备（2）可以包括被配置为提供辐射（200）的辐射源（SO），被配置为从辐射源（SO）收集辐射（200）的辐射收集器（CO），照明系统（IL）和检测器（300）。检测器（300）可以相对于收集器（CO）的排列与照明系统（IL）以固定的位置关系设置。此外，收集器（CO）的区域（310）可以被配置为引导从辐射源（SO）发出并且朝向检测器（300）横穿该区域（310）的一部分辐射（200）。检测器（300）可以被配置为检测辐射（200）的一部分中的变化。该变化可以指示相对于收集器（CO）的对准，收集器（CO）相对于照明系统（IL）的位置或取向的变化。

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