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    • 5. 发明申请
    • Nitride semiconductor device
    • 氮化物半导体器件
    • US20090045392A1
    • 2009-02-19
    • US11907169
    • 2007-10-10
    • Seong Eun ParkMin Ho KimJae Woong Han
    • Seong Eun ParkMin Ho KimJae Woong Han
    • H01L33/00
    • H01L33/06B82Y20/00H01L33/32H01S5/3407H01S5/3416H01S5/34333
    • There is provided a nitride semiconductor device including an active layer of a superlattice structure. The nitride semiconductor device including: a p-type nitride semiconductor layer; an n-type nitride semiconductor layer; and an active layer disposed between the p-type and n-type nitride layers, the active layer comprising a plurality of quantum barrier layers and quantum well layers deposited alternately on each other, wherein the active layer has a superlattice structure where the quantum barrier layer has a thickness for enabling a carrier injected from the p-type and n-type nitride semiconductor layers to be tunneled therethrough, and at least one of the quantum barrier layers has an energy band gap greater than another quantum barrier layer adjacent to the n-type nitride semiconductor layer.
    • 提供了包括超晶格结构的有源层的氮化物半导体器件。 氮化物半导体器件包括:p型氮化物半导体层; n型氮化物半导体层; 以及设置在所述p型和n型氮化物层之间的有源层,所述有源层包括彼此交替沉积的多个量子势垒层和量子阱层,其中所述有源层具有超晶格结构,其中所述量子势垒层 具有能够使从p型和n型氮化物半导体层注入的载流子穿过其中的厚度,并且至少一个量子势垒层具有比与n-型氮化物半导体层相邻的另一个量子势垒层更大的能带隙。 氮化物半导体层。