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1. 发明授权

US06231668B1 Method for manufacturing a calibrated scale in the nanometer range for technical devices used for the high resolution or ultrahigh-resolution imaging of structures and such scale 失效
标题翻译：用于制造用于结构的高分辨率或超高分辨率成像的技术装置的纳米范围的校准刻度的方法和这种尺度
公开(公告)号：US06231668B1
公开(公告)日：2001-05-15
申请号：US08795622
申请日：1997-02-06
申请人： Rainer Loesch , Hartmut Hillmer , Winfried Schlapp , Armin Poecker , Walter Betz , Rainer Goebel
发明人： Rainer Loesch , Hartmut Hillmer , Winfried Schlapp , Armin Poecker , Walter Betz , Rainer Goebel
IPC分类号： C30B2300
CPC分类号： G01B15/02 , Y10T117/10 , Y10T117/1004
摘要： A method for manufacturing and calibrating a scale in the nanometer range for technical devices which are used for the high-resolution or ultrahigh-resolution imaging of structures, and such a scale. To construct the scale, at least two different crystalline or amorphous materials are used, which, when imaged, are easily distinguished from one another by their contrast. These material layers are deposited using a suitable material deposition method as a heterolayer sequence onto a substrate material. The produced heterolayer sequence is characterized experimentally using an analysis method that is sensitive to the individual layer thicknesses of the heterolayer sequence. The data obtained from the analysis method are evaluated and recorded. The layer structure is exposed by splitting open the heterolayer sequence in the deposition direction. The scale is suited for calibrating technical devices used for scanning electron microscopy, scanning transmission electron microscopy, or scanning probe microscopy (atomic force microscopy, scanning tunneling microscopy).
摘要翻译：用于制造和校准用于结构的高分辨率或超高分辨率成像的技术装置的纳米范围的尺度的方法以及这样的尺度。为了构建刻度，使用至少两种不同的晶体或无定形材料，当成像时，通过其对比容易地彼此区分。使用合适的材料沉积方法将这些材料层作为多层序列沉积到基底材料上。所制备的异双层序列的特征是使用对多层序列的各层厚度敏感的分析方法。评估并记录从分析方法获得的数据。通过在沉积方向上分离打开杂双层序列来暴露层结构。该规模适用于校准用于扫描电子显微镜，扫描透射电子显微镜或扫描探针显微镜（原子力显微镜，扫描隧道显微镜）的技术装置。

2. 发明授权

US07677742B2 Micromirror array 有权
标题翻译：微镜阵列
公开(公告)号：US07677742B2
公开(公告)日：2010-03-16
申请号：US10583490
申请日：2004-12-13
申请人： Hartmut Hillmer , Jürgen Schmid , Ingo Stadler
发明人： Hartmut Hillmer , Jürgen Schmid , Ingo Stadler
IPC分类号： G02B5/08
CPC分类号： G02B26/0841 , E06B9/386 , F24S23/77 , F24S30/40 , F24S50/00 , F24S50/20 , F24S2023/85 , Y02B10/20 , Y02E10/47
摘要： The invention relates to a microstructured technological system and, in particular, micromirror arrangements. The aim of the invention is to produce facade elements for buildings having large areas in square centimetres and above, at reduced cost. The entire micromirror arrangement can be produced as a flat, architectonically useable structural element in a modularly replicable manner. According to the invention, the control electronic system, which contains the logics which are controlled as mirror elements, is arranged in the centre of a control device at a specific, remote distance from which an addressing network is used to control the individual mirror elements or modules. Said addressing network is already integrated into the flat modules during production and to a large degree, in the form of printed lines. As a result, the necessity of incorporating silicon-based chip technology into the facade elements, which is expensive, is no longer necessary. Also, essentially less expensive materials than highly pure silicon are used in the production of the micromirror arrangements. Production costs, which are at least in the same size order as other, traditional, high quality façade elements, result therefrom.
摘要翻译：本发明涉及微结构化技术系统，特别涉及微镜装置。本发明的目的是以降低的成本生产具有大的平方厘米及以上的面积的建筑物的立面元件。整个微镜装置可以以模块化可复制的方式生产为平坦的，可结构地使用的结构元件。根据本发明，包含作为镜元件控制的逻辑的控制电子系统被布置在控制装置的中心，在特定的远程距离处，使用寻址网络来控制各个镜像元件或模块。所述寻址网络在生产期间已经被整合到平板模块中，并且在很大程度上已经以打印线的形式被集成。因此，不需要将硅基芯片技术并入昂贵的立面元件的必要性。此外，在制造微镜布置中使用比高纯度硅更廉价的材料。与其他传统的高品质外墙元素至少具有相同尺寸的生产成本，从而产生。

3. 发明授权

US5834158A Method for the optimum utilization of base material in the manufacture of optoelectronic components with variable-period grating 失效
标题翻译：在具有可变周期光栅的光电子元件制造中最佳利用基材的方法
公开(公告)号：US5834158A
公开(公告)日：1998-11-10
申请号：US655502
申请日：1996-05-30
申请人： Hartmut Hillmer
发明人： Hartmut Hillmer
IPC分类号： G02B6/12 , G02B6/124 , G03F7/20 , H01S5/02 , H01S5/10 , H01S5/12 , H01S5/125 , G03C5/00 , G02B6/34
CPC分类号： G03F7/70425 , G02B6/124 , G03F7/70475 , H01S5/02 , H01S5/0201 , H01S5/1028 , H01S5/1032 , G02B2006/12107 , H01S5/0207 , H01S5/12 , H01S5/125
摘要： Disclosed is a method for the optimum utilization of disk-shaped base material in the manufacture of optoelectronic components with variable-period grating. The method helps avoid material losses by arranging optoelectronic components on a disk-shaped base material in an optimum manner and is based on obtaining variants of nominally identical individual component patterns by mathematical rotation and mirroring, forming a unit cell through shifting of the individual component pattern variants, and reproducing the unit cell in the x and y directions until the active surface of the mask or the entire surface of the disk-shaped base material is tightly covered. The method may be used for the manufacture of photonic components based on DFB, DBR, or sampled grating structures.
摘要翻译：公开了一种在具有可变周期光栅的光电子部件制造中最佳利用盘形基材的方法。该方法通过以最佳方式将光电子部件布置在盘形基材上并且基于通过数学旋转和镜像来获得名义上相同的单独部件图案的变体来帮助避免材料损失，通过单独部件图案的移动来形成单位单元变型，并且在x和y方向上再现单元，直到掩模的活性表面或盘状基材的整个表面被严格地覆盖。该方法可用于制造基于DFB，DBR或采样光栅结构的光子分量。

4. 发明授权

US06219362B1 Method for syntonizing the wave lengths of an arrangement of optoelectronic components 失效
标题翻译：用于使光电子部件的布置的波长合成的方法
公开(公告)号：US06219362B1
公开(公告)日：2001-04-17
申请号：US09355667
申请日：1999-10-25
申请人： Hartmut Hillmer , Bernd Klepser
发明人： Hartmut Hillmer , Bernd Klepser
IPC分类号： H01S310
CPC分类号： H01S5/0612 , H01S5/4025 , H01S5/4031
摘要： A method of wavelength tuning an opto-electronic component arrangement with at least two opto-electronic components is disclosed. The method includes the step of setting a characteristic wavelength for each opto-electronic component by selectively modifying a resistance of a conductor of a resistance heater and/or by selectively modifying a resistance of a resistor arrangement connected upstream from the resistance heater. The method, which minimizes costs, is aimed at wavelength tuning of semiconductor lasers, optical amplifiers, filters, wavelength multiplexers and optical fibers.
摘要翻译：公开了一种利用至少两个光电子部件波长调谐光电子部件布置的方法。该方法包括通过选择性地修改电阻加热器的导体的电阻和/或通过选择性地改变连接在电阻加热器上游的电阻器装置的电阻来设置每个光电子部件的特征波长的步骤。最小化成本的方法是针对半导体激光器，光放大器，滤波器，波分复用器和光纤的波长调谐。

5. 发明授权

US06208793B1 Wavelength-tunable optoelectronic apparatus 失效
标题翻译：波长可调光电子器件
公开(公告)号：US06208793B1
公开(公告)日：2001-03-27
申请号：US09380432
申请日：1999-12-10
申请人： Hartmut Hillmer , Bernd Klepser
发明人： Hartmut Hillmer , Bernd Klepser
IPC分类号： G02B610
CPC分类号： G02B6/124 , H01S5/06258 , H01S5/1215 , H01S5/1228 , H01S5/1243 , H01S5/2275 , H01S5/4031 , H01S5/4087
摘要： The present invention provides an optoelectronic apparatus operating on different wavelength channels, such that the individual wavelength channels are individually variable in wavelength. The optoelectronic apparatus may be based on multisectioning of at least one bent waveguides is realized in one embodiment of the present invention by at least one isolation trench over the bent waveguide, the trench having a resistance of at least 10 ohms between a first and second individual section, wherein the first and the second sections can be supplied with an individual control current. The arrangement and depth of the at least one isolation trench corresponds with the bend of the at least one bent waveguides, wherein a bending function yi(x) of the at least one bent waveguide is determined according to model calculation-assisted optimizations.
摘要翻译：本发明提供了在不同波长信道上操作的光电子装置，使得各个波长信道在波长上可分别变化。光电子装置可以基于至少一个弯曲波导的多重切割，在本发明的一个实施例中通过弯曲波导上的至少一个隔离沟槽实现，该沟槽在第一和第二个体之间具有至少10欧姆的电阻其中可以向第一和第二部分提供单独的控制电流。所述至少一个隔离沟槽的布置和深度对应于所述至少一个弯曲波导的弯曲，其中根据模型计算辅助优化确定所述至少一个弯曲波导的弯曲函数y i（x）。

6. 发明授权

US5600743A Optoelectronic multi-wavelength component 失效
标题翻译：光电多波长成分
公开(公告)号：US5600743A
公开(公告)日：1997-02-04
申请号：US520070
申请日：1995-08-28
申请人： Hartmut Hillmer
发明人： Hartmut Hillmer
IPC分类号： G02B6/12 , G02B6/124 , H01S5/10 , H01S5/12 , H01S5/125 , H01S5/40 , G02B6/34
CPC分类号： H01S5/12 , G02B6/124 , H01S5/125 , G02B2006/12107 , G02B2006/12109 , G02B2006/12114 , H01S5/1064 , H01S5/124 , H01S5/1243 , H01S5/4031 , H01S5/4056 , H01S5/4087
摘要： An optoelectronic multi-wavelength component is described for n waveguides with optical feedback gratings arranged side by side laterally to have different characteristic wavelengths. The multi-wavelength component is based on at least two optical waveguides arranged on a substrate so they intersect the grating lines of one or more grating fields at different angles. The grating lines of the feedback grating run at a tilted angle relative to a preferential direction. The angles between each individual waveguide and the grating lines of the respective grating are in the range between 40.degree. and 140.degree.. A controlled change in the effective corrugation period from one waveguide to the next is achieved by means of the individual dimensioning of the tilt angle between the waveguide and the grating lines of the respective feedback grating. The solution is used in photonic components that work on different waveguide channels and are based on DFB or DBR gratings or sampled gratings.
摘要翻译：对于具有光学反馈光栅并排布置以具有不同特征波长的n个波导描述了光电多波长分量。多波长分量基于布置在基板上的至少两个光波导，使得它们以不同的角度与一个或多个光栅场的光栅线相交。反馈光栅的光栅线相对于优先方向以倾斜角度运行。每个单独波导与各光栅的光栅线之间的角度在40°和140°之间的范围内。通过波导和相应反馈光栅的光栅线之间的倾斜角的单独尺寸来实现从一个波导到下一个波导的有效波纹周期的受控变化。该解决方案用于在不同波导通道上工作的光子元件，并且基于DFB或DBR光栅或采样光栅。

7. 发明授权

US08120775B2 Sensor device and for determining a physical value 有权
标题翻译：传感器设备和用于确定物理值
公开(公告)号：US08120775B2
公开(公告)日：2012-02-21
申请号：US11572722
申请日：2005-07-06
申请人： Hartmut Hillmer
发明人： Hartmut Hillmer
IPC分类号： G01N21/00 , H01S3/30
CPC分类号： G01N21/39
摘要： A sensor device for determining a physical value using a laser, whose emission behavior can be affected by the physical value is described. The laser is arranged to emit at least two concurrent modes lying above a laser threshold and the physical value is determined using a comparison of changes of the at least two modes occurring under the influence of the physical value.
摘要翻译：描述用于使用激光器确定物理值的传感器装置，其发射行为可受物理值的影响。激光被布置成发射位于激光阈值之上的至少两个并发模式，并且使用在物理值的影响下发生的至少两种模式的变化的比较来确定物理值。

8. 发明申请

US20070146741A1 Micromirror array 有权
标题翻译：微镜阵列
公开(公告)号：US20070146741A1
公开(公告)日：2007-06-28
申请号：US10583490
申请日：2004-12-13
申请人： Hartmut Hillmer , Jurgen Schmid , Ingo Stadler
发明人： Hartmut Hillmer , Jurgen Schmid , Ingo Stadler
IPC分类号： H04N1/60
CPC分类号： G02B26/0841 , E06B9/386 , F24S23/77 , F24S30/40 , F24S50/00 , F24S50/20 , F24S2023/85 , Y02B10/20 , Y02E10/47
摘要： The invention relates to a microstructured technological system and, in particular, micromirror arrangements. The aim of the invention is to produce facade elements for buildings having large areas in square centimetres and above, at reduced cost. The entire micromirror arrangement can be produced as a flat, architectonically useable structural element in a modularly replicable manner. According to the invention, the control electronic system, which contains the logics which are controlled as mirror elements, is arranged in the centre of a control device at a specific, remote distance from which an addressing network is used to control the individual mirror elements or modules. Said addressing network is already integrated into the flat modules during production and to a large degree, in the form of printed lines. As a result, the necessity of incorporating silicon-based chip technology into the facade elements, which is expensive, is no longer necessary. Also, essentially less expensive materials than highly pure silicon are used in the production of the micromirror arrangements. Production costs, which are at least in the same size order as other, traditional, high quality faççade elements, result therefrom.
摘要翻译：本发明涉及微结构化技术系统，特别涉及微镜装置。本发明的目的是以降低的成本生产具有大的平方厘米及以上的面积的建筑物的立面元件。整个微镜装置可以以模块化可复制的方式生产为平坦的，可结构地使用的结构元件。根据本发明，包含作为镜元件控制的逻辑的控制电子系统被布置在控制装置的中心，在特定的远程距离处，使用寻址网络来控制各个镜像元件或模块。所述寻址网络在生产期间已经被整合到平板模块中，并且在很大程度上已经以打印线的形式被集成。因此，不需要将硅基芯片技术并入昂贵的立面元件的必要性。此外，在制造微镜布置中使用比高纯度硅更廉价的材料。与其他传统的高品质外观元素至少具有相同尺寸的生产成本。

9. 发明申请

US20140151575A1 OPTICAL FILTER AND METHOD FOR THE PRODUCTION OF THE SAME, AND DEVICE FOR THE EXAMINATION OF ELECTROMAGNETIC RADIATION 有权
标题翻译：光学滤波器及其制造方法以及用于检查电磁辐射的装置
公开(公告)号：US20140151575A1
公开(公告)日：2014-06-05
申请号：US14094804
申请日：2013-12-03
申请人： Hartmut Hillmer , Wolfgang Koecher , Juergen Krieg , Carl Sandhagen , Hardy Hoheisel , Winfried Willemer
发明人： Hartmut Hillmer , Wolfgang Koecher , Juergen Krieg , Carl Sandhagen , Hardy Hoheisel , Winfried Willemer
IPC分类号： G02B5/28 , G01J3/44 , A61B5/00 , G01J3/51
CPC分类号： G02B5/284 , A61B5/0075 , B82Y10/00 , B82Y40/00 , G01J3/02 , G01J3/0259 , G01J3/2803 , G01J3/36 , G01J3/4406 , G01J3/51 , G02B5/201 , G02B5/288 , G03F7/0002 , H01L27/14621 , H01L27/14685 , Y10T29/49826
摘要： An optical filter array includes a substrate permeable to an electromagnetic radiation to be detected, a first DBR mirror arranged on the substrate, a second DBR minor arranged above the first DBR mirror, and a plurality of cavity sections. The cavity sections have different respective optical lengths, and are arranged so as to be spatially separated from each other between the first DBR minor and the second DBR mirror. Each of the first DBR minor, the second DBR mirror, and the plurality of cavity sections with different optical lengths form filter elements of a filter. The filter reflects in a stopband determined by the first DBR mirror and the second DBR mirror. Each filter element has at least one narrow transmission band determined by the optical length of its respective cavity section located inside the stopband. A different thicknesses of the cavity sections is provided via a nanoimprint process.
摘要翻译：光学滤波器阵列包括可透过要检测的电磁辐射的基底，布置在基底上的第一DBR镜，布置在第一DBR镜上方的第二DBR微镜，以及多个空腔部分。空腔部分具有不同的各自的光学长度，并且被布置成在第一DBR次要和第二DBR反射镜之间在空间上彼此分离。第一DBR次要装置，第二DBR反射镜和具有不同光学长度的多个空腔部分中的每一个形成过滤器的过滤元件。滤波器以由第一DBR镜和第二DBR镜确定的阻带反射。每个滤光元件具有由其位于阻挡带内部的相应空腔部分的光学长度确定的至少一个窄透射带。通过纳米压印工艺提供不同厚度的空腔部分。

10. 发明授权

US08629986B2 Optical filter and method for the production of the same, and device for the examination of electromagnetic radiation 有权
标题翻译：光学滤波器及其制作方法相同，以及用于检查电磁辐射的装置
公开(公告)号：US08629986B2
公开(公告)日：2014-01-14
申请号：US12376690
申请日：2007-08-09
申请人： Hartmut Hillmer , Wolfgang Koecher , Juergen Krieg , Carl Sandhagen , Hardy Hoheisel , Winfried Willemer
发明人： Hartmut Hillmer , Wolfgang Koecher , Juergen Krieg , Carl Sandhagen , Hardy Hoheisel , Winfried Willemer
IPC分类号： G01B9/02
CPC分类号： G02B5/284 , A61B5/0075 , B82Y10/00 , B82Y40/00 , G01J3/02 , G01J3/0259 , G01J3/2803 , G01J3/36 , G01J3/4406 , G01J3/51 , G02B5/201 , G02B5/288 , G03F7/0002 , H01L27/14621 , H01L27/14685 , Y10T29/49826
摘要： The invention relates to an optical filter and a method for its production, and to a device for the examination of the spectral and spatial distribution of an electromagnetic radiation irradiated from an object. The invention is based on the task of providing an optical filter of the above described type that is inexpensive to produce, which can be used to detect a plurality of wavelengths, in which, however, tuning of the DBR mirrors by means of displacement is not necessary. Furthermore, a method for the production of such a filter is provided. According to a first aspect of the present invention this task is solved by a method for the production of an optical filter array having two DBR mirrors, and a cavity present between the same, comprising cavity sections having a plurality of different heights, each forming one Fabry Perot filter element, characterized by the following steps: applying a first DBR mirror onto a substrate, forming of a layer comprised of a cavity material on the DBR mirror, wherein this layer is equipped with a plurality of cavity sections forming the filter elements by means of utilizing a nanoimprint method, and applying the second DBR mirror on the cavity material having a structuring that is defined by the different heights of the cavity sections.
摘要翻译：本发明涉及一种光学滤波器及其制造方法，以及用于检查从物体照射的电磁辐射的光谱和空间分布的装置。本发明基于提供上述类型的光学滤波器的任务，该滤波器便于制造，其可用于检测多个波长，然而，通过位移调节DBR反射镜不是必要。此外，提供了一种用于生产这种过滤器的方法。根据本发明的第一方面，该任务通过一种用于制造具有两个DBR反射镜的光学滤光片阵列的方法和在其之间存在的空腔来实现，该腔体包括具有多个不同高度的空腔部分，每个形成一个法布里·珀罗滤光元件，其特征在于以下步骤：将第一DBR反射镜施加到基板上，在DBR反射镜上形成由空腔材料构成的层，其中该层配备有多个通过形成滤光元件的空腔部分利用纳米压印方法的手段，以及将第二DBR反射镜应用于具有由空腔部分的不同高度限定的结构的腔体材料。

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