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    • 3. 发明专利
    • Diffraction grating forming method
    • 衍射成像方法
    • JP2006163299A
    • 2006-06-22
    • JP2004358653
    • 2004-12-10
    • Sumitomo Electric Ind Ltd住友電気工業株式会社
    • KISHI TAKESHI
    • G02B5/18H01S5/12
    • H01S5/12H01S5/1231H01S5/1243
    • PROBLEM TO BE SOLVED: To provide a method capable of precisely forming a diffraction grating in which phases are respectively inverted between a first region and a second region.
      SOLUTION: The diffraction grating forming method consists of: a process (S1) of forming first masks 12 with a constant period on the first region A and the second region B on the principal plane of a first member 11, a process (S2) of forming ruggedness having a constant period on the first region A and the second region B of the first member 11 by performing etching by the use of the first masks 12, a process (S3) of removing the first masks 12 on the first region A and the second region B, a process (S4) of forming a second member 21 in which an etching rate upon the subsequent second etching process S16 is smaller than that in the first member 11, on the first region A and the second region B of the first member 11 and a process (S5) of forming a second mask 22 on the second member 21 of the first region A, whereupon the etching is performed by using the second mask 22. Thereby, the ruggedness which is formed by inverting the ruggedness formed on the first etching process S2 is provided on the second region B of the first member 11 (S16).
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供一种能够精确地形成其中相位分别在第一区域和第二区域之间反转的衍射光栅的方法。 解决方案:衍射光栅形成方法包括:在第一区域A上形成具有恒定周期的第一掩模12和在第一构件11的主平面上形成第二区域B的工艺(S1),工艺 S2)通过使用第一掩模12进行蚀刻在第一区域A和第一区域B的第一区域A和第二区域B上形成具有恒定周期的坚固性;在第一掩模12上去除第一掩模12的处理(S3) 区域A和第二区域B,在第一区域A和第二区域A上形成第二构件21的处理(S4),其中在随后的第二蚀刻处理S16中的蚀刻速率小于第一构件11中的蚀刻速率 B和在第一区域A的第二构件21上形成第二掩模22的处理(S5),由此通过使用第二掩模22进行蚀刻。由此,通过反转形成的粗糙度 在第一蚀刻工艺S2上形成的粗糙度为p 旋转在第一构件11的第二区域B上(S16)。 版权所有(C)2006,JPO&NCIPI