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1. 发明授权

US09558987B2 Gap-fill methods 有权
标题翻译：间隙填充方法
公开(公告)号：US09558987B2
公开(公告)日：2017-01-31
申请号：US14582149
申请日：2014-12-23
申请人： Rohm and Haas Electronic Materials LLC , Dow Global Technologies LLC , Rohm and Haas Electronic Materials Korea Ltd.
发明人： Jae Hwan Sim , Jin Hong Park , Jae-Bong Lim , Jung Kyu Jo , Cheng-Bai Xu , Jong Keun Park , Mingqi Li , Phillip D. Hustad
IPC分类号： H01L21/31 , H01L21/762 , H01L21/3105
CPC分类号： H01L21/76224 , H01L21/31058
摘要： Gap-fill methods comprise: (a) providing a semiconductor substrate having a relief image on a surface of the substrate, the relief image comprising a plurality of gaps to be filled; (b) applying a gap-fill composition over the relief image, wherein the gap-fill composition comprises a non-crosslinked crosslinkable polymer, an acid catalyst, a crosslinker and a solvent, wherein the crosslinkable polymer comprises a first unit of the following general formula (I): wherein: R1 is chosen from hydrogen, fluorine, C1-C3 alkyl and C1-C3 fluoroalkyl; and Ar1 is an optionally substituted aryl group that is free of crosslinkable groups; and a second unit of the following general formula (II): wherein: R3 is chosen from hydrogen, fluorine, C1-C3 alkyl and C1-C3 fluoroalkyl; and R4 is chosen from optionally substituted C1 to C12 linear, branched or cyclic alkyl, and optionally substituted C6 to C15 aryl, optionally containing heteroatoms, wherein at least one hydrogen atom is substituted with a functional group independently chosen from hydroxyl, carboxyl, thiol, amine, epoxy, alkoxy, amide and vinyl groups; and (c) heating the gap-fill composition at a temperature to cause the polymer to crosslink. The methods find particular applicability in the manufacture of semiconductor devices for the filling of high aspect ratio gaps.
摘要翻译：间隙填充方法包括：（a）在衬底的表面上提供具有浮雕图像的半导体衬底，所述浮雕图像包括要填充的多个间隙; （b）在所述浮雕图像上施加间隙填充组合物，其中所述间隙填充组合物包含非交联的可交联聚合物，酸催化剂，交联剂和溶剂，其中所述可交联聚合物包含以下通用物质的第一单元式（I）：其中：R 1选自氢，氟，C 1 -C 3烷基和C 1 -C 3氟代烷基; 并且Ar1是不含可交联基团的任选取代的芳基; 和下列通式（II）的第二单元：其中：R 3选自氢，氟，C 1 -C 3烷基和C 1 -C 3氟代烷基; 并且R 4选自任选取代的C 1至C 12直链，支链或环状烷基，以及任选含有杂原子的任选取代的C 6至C 15芳基，其中至少一个氢原子被独立地选自羟基，羧基，硫醇，胺，环氧，烷氧基，酰胺和乙烯基; 和（c）在一定温度下加热间隙填充组合物以使聚合物交联。该方法在用于填充高纵横比间隙的半导体器件的制造中具有特别的适用性。

2. 发明申请

US20220397827A1 COMPOSITION FOR PHOTORESIST UNDERLAYER 有权
公开(公告)号：US20220397827A1
公开(公告)日：2022-12-15
申请号：US17333622
申请日：2021-05-28
申请人： ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. , ROHM AND HAAS ELECTRONIC MATERIALS LLC
发明人： Jung June Lee , Jae Hwan Sim , Suwoong Kim , Jin Hong Park , Bhooshan Popere
IPC分类号： G03F7/11 , C08G18/81 , C08F220/24 , C09D175/04
摘要： A photoresist underlayer composition, comprising: a first polymer comprising a crosslinkable group; a second polymer comprising: a first repeating unit comprising a repeating unit comprising a photoacid generator, and a second repeating unit comprising a hydroxy-substituted C1-30 alkyl group, a hydroxy-substituted C3-30 cycloalkyl group, or a hydroxy-substituted C6-30 aryl group; an acid catalyst; and a solvent.

3. 发明授权

US11822248B2 Coating compositions for use with an overcoated photoresist 有权
公开(公告)号：US11822248B2
公开(公告)日：2023-11-21
申请号：US15337558
申请日：2016-10-28
申请人： Rohm and Haas Electronic Materials Korea Ltd.
发明人： Eui-Hyun Ryu , Jin Hong Park , You Rim Shin , Ji-Hon Kang , Jung-June Lee , Jae-Bong Lim
IPC分类号： G03F7/09 , G03F7/11 , G03F7/30 , G03F7/16 , C09D179/04 , C09D5/00 , C08G73/06
CPC分类号： G03F7/16 , C08G73/0644 , C09D5/006 , C09D179/04 , G03F7/091 , G03F7/11
摘要： Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that in a first aspect comprise a crosslinker component that comprises a structure of the following Formula (I):

4. 发明申请

US20210324122A1 POLYMERS, UNDERLAYER COATING COMPOSITIONS COMPRISING THE SAME, AND PATTERNING METHODS 有权
公开(公告)号：US20210324122A1
公开(公告)日：2021-10-21
申请号：US16851806
申请日：2020-04-17
申请人： ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
发明人： Jung June Lee , Suwoong Kim , Min Kyung Jang , Jin Hong Park , Jae Hwan Sim , Jae Bong Lim
IPC分类号： C08F220/32 , G03F7/09 , G03F7/16 , C08F220/30 , C08F220/36
摘要： A polymer comprising a first repeating unit including an amino group protected by an alkoxycarbonyl group; a second repeating unit including a nucleophilic group; and a third repeating unit including a crosslinkable group, wherein the first repeating unit, the second repeating unit, and the third repeating unit are different from each other.

5. 发明申请

US20210200093A1 COATING COMPOSITION FOR PHOTORESIST UNDERLAYER 有权
公开(公告)号：US20210200093A1
公开(公告)日：2021-07-01
申请号：US17138069
申请日：2020-12-30
申请人： ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
发明人： Jin Hong Park , Yoo-Jin Ghang , Suwoong Kim , You Rim Shin , Jung June Lee , Jae Hwan Sim
IPC分类号： G03F7/11 , C09D167/02 , C09D133/14 , C08G63/91 , C08F20/32
摘要： A coating composition comprising a crosslinkable polyester polymer comprising an isocyanurate group and a crosslinkable group; a crosslinker; and an acid catalyst, wherein at least one of the crosslinkable polyester polymer and the crosslinker comprises an iodine-containing polymer.

6. 发明申请

US20180364575A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST 审中-公开
公开(公告)号：US20180364575A1
公开(公告)日：2018-12-20
申请号：US15624701
申请日：2017-06-15
申请人： Rohm and Haas Electronic Materials Korea Ltd.
发明人： Hye-Won Lee , Jae Hwan Sim , Soo Jung Leem , Jin Hong Park , You Rim Shin
IPC分类号： G03F7/09 , C08G18/09 , C08G18/32 , C08G18/16 , C09D175/04 , G03F7/16 , G03F7/20 , G03F7/26
摘要： In a preferred aspect, organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more substituted uracil moieties; and 2) one or more reacted dicarboxylic acid groups.

7. 发明授权

US11567409B2 Polymers, underlayer coating compositions comprising the same, and patterning methods 有权
公开(公告)号：US11567409B2
公开(公告)日：2023-01-31
申请号：US16851806
申请日：2020-04-17
申请人： ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
发明人： Jung June Lee , Suwoong Kim , Min Kyung Jang , Jin Hong Park , Jae Hwan Sim , Jae Bong Lim
IPC分类号： G03F7/11 , C08F220/32 , G03F7/09 , C08F220/36 , C08F220/30 , G03F7/16 , G03F7/20 , G03F7/039 , G03F7/004
摘要： A polymer comprising a first repeating unit including an amino group protected by an alkoxycarbonyl group; a second repeating unit including a nucleophilic group; and a third repeating unit including a crosslinkable group, wherein the first repeating unit, the second repeating unit, and the third repeating unit are different from each other.

8. 发明申请

US20170153547A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST 审中-公开
公开(公告)号：US20170153547A1
公开(公告)日：2017-06-01
申请号：US15363533
申请日：2016-11-29
申请人： Rohm and Haas Electronic Materials Korea Ltd.
发明人： Jae Hwan Sim , Jung Kyu Jo , EunHye Cho , Hye-Won Lee , Jin Hong Park , Eui-Hyun Ryu , Jae-Bong Lim
IPC分类号： G03F7/09 , C08G63/78 , C08G63/685 , C09D167/00 , C08F220/18 , G03F7/32 , C08F220/32 , C09D133/14 , C08F220/30 , G03F7/16 , G03F7/20 , C09D5/00 , C09D133/08
摘要： In a preferred aspect, organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more glycidyl groups; and 2) one or more aromatic groups that each comprises two or more substituents that comprise hydroxy, thiol and/or amine moieties. Catechol-containing polymers and methods for producing same also are provided.

9. 发明公开

US20230418161A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST 审中-公开
公开(公告)号：US20230418161A1
公开(公告)日：2023-12-28
申请号：US18464695
申请日：2023-09-11
申请人： Rohm and Haas Electronic Materials Korea Ltd.
发明人： Eui-Hyun Ryu , Jin Hong Park , You Rim Shin , Ji-Hon Kang , Jung-June Lee , Jae-Bong Lim
IPC分类号： G03F7/16 , C09D179/04 , C09D5/00 , C08G73/06 , G03F7/11 , G03F7/09
CPC分类号： G03F7/16 , C09D179/04 , C09D5/006 , C08G73/0644 , G03F7/11 , G03F7/091
摘要： Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that in a first aspect comprise a crosslinker component that comprises a structure of the following Formula (I):

10. 发明授权

US11262656B2 Coating compositions for use with an overcoated photoresist 有权
公开(公告)号：US11262656B2
公开(公告)日：2022-03-01
申请号：US15088091
申请日：2016-03-31
申请人： Rohm and Haas Electronic Materials Korea Ltd.
发明人： Jae Hwan Sim , Hye-Won Lee , Eunhye Cho , Jung Kyu Jo , Jin Hong Park , Eui Hyun Ryu , Jae-Bong Lim
IPC分类号： C08L67/00 , C08L63/00 , G03F7/11 , C08G73/06 , G03F7/09 , C08L33/08 , C08G63/685 , C09D167/02 , C08G63/183 , C08G63/189 , C08G63/682 , C08F220/14
摘要： Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that a blend of two or more resins, where one resin has epoxy groups either pendant or fused to the polymer backbone. Preferred coating compositions include: 1) a first resin that comprises one or more epoxy reactive groups; and 2) a crosslinker resin that is distinct from the first resin and comprises epoxy groups.

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