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1. 发明申请

WO2006009295A1 ELECTRON BEAM APPLYING APPARATUS AND DRAWING APPARATUS 审中-公开
标题翻译：电子束应用设备和绘图设备
公开(公告)号：WO2006009295A1
公开(公告)日：2006-01-26
申请号：PCT/JP2005/013683
申请日：2005-07-20
申请人： RICOH COMPANY, LTD. , CRESTEC CORPORATION , MIYAZAKI, Takeshi , OHYI, Hideyuki , OBARA, Takashi
发明人： MIYAZAKI, Takeshi , OHYI, Hideyuki , OBARA, Takashi
IPC分类号： H01J37/305 , G11B9/10 , G21K1/087 , H01J37/09 , H01J37/10 , G03F7/20
CPC分类号： H01J37/3007 , G11B7/0045 , G11B7/261 , G11B9/10 , G11B11/002 , H01J2237/3175
摘要： An electron beam applying apparatus includes: a thermal field emission type electron source (12) emitting an electron beam; an electrostatic lens (14) disposed immediately below the electron source (12) and acting as a condensing electrode for condensing the electron beam in a first angular aperture emitted by the electron source in a second angular aperture smaller than the first angular aperture; a condenser lens disposed on a downstream side of the electrostatic lens (14) and condensing the electron beam condensed in the second aperture angel by the electrostatic lends (14) in a crossover point; and an objective lens (28) disposed on a downstream side of the condenser lens (18) and condensing the electron beam condensed in the crossover point by the condenser lens (18) on the surface of the material (32).
摘要翻译：电子束施加装置包括：发射电子束的热场发射型电子源（12）; 静电透镜（14），其设置在所述电子源（12）的正下方，并且用作聚集电极，用于将电子束在由所述电子源发射的第一角孔中在小于所述第一角孔的第二角度孔中聚集; 设置在所述静电透镜（14）的下游侧的聚光透镜，并且以交叉点将由所述静电透镜（14）在第二孔径角度中聚光的电子束聚光; 以及设置在聚光透镜（18）的下游侧的物镜（28），并且将通过聚光透镜（18）在交叉点处会聚的电子束会聚在材料（32）的表面上。

2. 发明申请

WO2007105817A1 ELECTRON BEAM RECORDING APPARATUS 审中-公开
标题翻译：电子束记录装置
公开(公告)号：WO2007105817A1
公开(公告)日：2007-09-20
申请号：PCT/JP2007/055330
申请日：2007-03-12
申请人： RICOH COMPANY, LTD. , CRESTEC CORPORATION , OBARA, Takashi , MIYAZAKI, Takeshi
发明人： OBARA, Takashi , MIYAZAKI, Takeshi
IPC分类号： G11B7/26 , G11B9/10 , G11B11/03
CPC分类号： G11B7/261 , G11B9/10 , G11B11/03
摘要： An electron beam recording apparatus is disclosed that records information onto the surface of a sample by using an electron beam. The electron beam recording apparatus includes an electron source that irradiates the electron beam, a magnetic detector that is configured to move onto and out of an irradiation axis and acquires magnetic information on the irradiation axis, a convergence position control part that calculates a convergence position correction amount for correcting a convergence position of the electron beam with respect to the surface of the sample based on the magnetic information, and a convergence position adjusting part that adjusts the convergence position of the electron beam with respect to the surface of the sample. The convergence position control part causes the convergence position adjusting part to adjust the convergence position of the electron beam with respect to the surface of the sample based on the convergence position correction amount.
摘要翻译：公开了一种通过使用电子束将信息记录在样品的表面上的电子束记录装置。电子束记录装置包括照射电子束的电子源，被配置为移动和移出照射轴的磁检测器，并获取照射轴上的磁信息;会聚位置控制部，其计算会聚位置校正用于基于磁信息校正电子束相对于样品表面的会聚位置的量;以及会聚位置调整部，其调整电子束相对于样品表面的会聚位置。会聚位置控制部使会聚位置调整部基于会聚位置校正量来调整电子束相对于面的表面的会聚位置。

3. 发明申请

WO2008082000A1 ABERRATION EVALUATION PATTERN, ABERRATION EVALUATION METHOD, ABERRATION CORRECTION METHOD, ELECTRON BEAM DRAWING APPARATUS, ELECTRON MICROSCOPE, MASTER, STAMPER, RECORDING MEDIUM, AND STRUCTURE 审中-公开
标题翻译： ABERRATION评估模式，ABERRATION评估方法，ABERRATION校正方法，电子束绘图设备，电子显微镜，MASTER，STAMPER，记录介质和结构
公开(公告)号：WO2008082000A1
公开(公告)日：2008-07-10
申请号：PCT/JP2007/075417
申请日：2007-12-27
申请人： RICOH COMPANY, LTD. , CRESTEC CORPORATION , MIYATA, Hiroyuki , MIYAZAKI, Takeshi , KOBAYASHI, Kazuhiko , HAYASHI, Kunito
发明人： MIYATA, Hiroyuki , MIYAZAKI, Takeshi , KOBAYASHI, Kazuhiko , HAYASHI, Kunito
IPC分类号： H01L21/027 , G01N1/00 , G03F7/20 , H01J37/153 , H01J37/28 , H01J37/305
CPC分类号： H01J37/153 , H01J37/28 , H01J2237/1532 , H01J2237/282
摘要： A method of evaluating astigmatism of an irradiation system irradiating an electron beam is disclosed. In this method, a figure pattern consisting of plural (for example, four) concentric circles is formed on a reference sample "WP" and an image (scanned image) is formed based on an electron signal obtained by scanning the electron beam onto the reference sample "WP". In the scanned image, the image has a blur in a region with its longitudinal direction parallel to the generating direction of the astigmatism and the size of the blur depends on magnitude of the astigmatism. Therefore, the direction and the magnitude of the astigmatism of the irradiation system of an irradiation apparatus can be detected based on the obtained scanned image.
摘要翻译：公开了一种评估照射电子束的照射系统的像散的方法。在该方法中，在参考样品“WP”上形成由多个（例如四个）同心圆组成的图形图形，并且基于通过将电子束扫描到参考上而获得的电子信号形成图像（扫描图像）样品“WP”。在扫描图像中，图像在其纵向方向平行于像散的产生方向的区域中具有模糊，并且模糊的大小取决于像散的大小。因此，可以基于获得的扫描图像来检测照射装置的照射系统的散光的方向和大小。

4. 发明申请

WO2008026759A1 DRAWING METHOD, DRAWING DEVICE, AND INFORMATION RECORDING MEDIUM 审中-公开
标题翻译：绘图方法，绘图装置和信息记录介质
公开(公告)号：WO2008026759A1
公开(公告)日：2008-03-06
申请号：PCT/JP2007/067112
申请日：2007-08-28
申请人： RICOH COMPANY, LTD. , CRESTEC CORPORATION , MIYAZAKI, Takeshi , MURAYAMA, Noboru
发明人： MIYAZAKI, Takeshi , MURAYAMA, Noboru
IPC分类号： G11B7/26 , G11B9/10 , G11B5/84 , G03F7/20 , H01J37/317
CPC分类号： G11B7/261 , B82Y10/00 , B82Y40/00 , G11B5/743 , G11B5/82 , G11B5/855 , G11B9/10 , H01J37/3174
摘要： In a drawing method and device, an electron beam is radiated to a surface of an object to draw a pattern along scan lines on the surface of the object. A pattern is drawn along the scan lines on the surface of the object by the electron beam through relative movement of the object relative to the electron beam. The electron beam is deflected at a speed that does not cause a pattern to be formed on the object surface, in one of a first direction intersecting the scan lines and a second direction opposite to the first direction, without performing blanking of the electron beam, so that a beam spot of the deflected electron beam is positioned to one of the scan lines on the object surface. The drawing step and the deflecting step are repeated alternately.
摘要翻译：在绘图方法和装置中，将电子束照射到物体的表面，以沿对象表面上的扫描线绘制图案。通过物体相对于电子束的相对运动，电子束沿着物体表面上的扫描线绘制图案。在不对电子束进行消隐的情况下，电子束以不会在扫描线相交的第一方向和与第一方向相反的第二方向的一个方向上不会在物体表面上形成图案的速度偏转，使得偏转的电子束的束斑位于物体表面上的扫描线之一上。交替地重复绘制步骤和偏转步骤。

5. 发明公开

EP2057629A1 DRAWING METHOD, DRAWING DEVICE, AND INFORMATION RECORDING MEDIUM 有权
标题翻译： SIGN方法和元件特性
公开(公告)号：EP2057629A1
公开(公告)日：2009-05-13
申请号：EP07806585.1
申请日：2007-08-28
申请人： Ricoh Company, Ltd. , CRESTEC CORPORATION
发明人： MIYAZAKI, Takeshi , MURAYAMA, Noboru
IPC分类号： G11B7/26 , G11B9/10 , G11B5/84 , G03F7/20 , H01J37/317
CPC分类号： G11B7/261 , B82Y10/00 , B82Y40/00 , G11B5/743 , G11B5/82 , G11B5/855 , G11B9/10 , H01J37/3174
摘要： In a drawing method and device, an electron beam is radiated to a surface of an object to draw a pattern along scan lines on the surface of the object. A pattern is drawn along the scan lines on the surface of the object by the electron beam through relative movement of the object relative to the electron beam. The electron beam is deflected at a speed that does not cause a pattern to be formed on the object surface, in one of a first direction intersecting the scan lines and a second direction opposite to the first direction, without performing blanking of the electron beam, so that a beam spot of the deflected electron beam is positioned to one of the scan lines on the object surface. The drawing step and the deflecting step are repeated alternately.

6. 发明授权

EP2057629B1 DRAWING METHOD AND DRAWING DEVICE 有权
标题翻译： SIGN方法和元件特性
公开(公告)号：EP2057629B1
公开(公告)日：2010-08-04
申请号：EP07806585.1
申请日：2007-08-28
申请人： Ricoh Company, Ltd. , CRESTEC CORPORATION
发明人： MIYAZAKI, Takeshi , MURAYAMA, Noboru
IPC分类号： G11B7/26 , G11B9/10 , G11B5/84 , G03F7/20 , H01J37/317
CPC分类号： G11B7/261 , B82Y10/00 , B82Y40/00 , G11B5/743 , G11B5/82 , G11B5/855 , G11B9/10 , H01J37/3174
摘要： In a drawing method and device, an electron beam is radiated to a surface of an object to draw a pattern along scan lines on the surface of the object. A pattern is drawn along the scan lines on the surface of the object by the electron beam through relative movement of the object relative to the electron beam. The electron beam is deflected at a speed that does not cause a pattern to be formed on the object surface, in one of a first direction intersecting the scan lines and a second direction opposite to the first direction, without performing blanking of the electron beam, so that a beam spot of the deflected electron beam is positioned to one of the scan lines on the object surface. The drawing step and the deflecting step are repeated alternately.

7. 发明授权

EP1769521B1 ELECTRON BEAM APPLYING APPARATUS FOR RECORDING INFORMATION 有权
标题翻译： ELECTRON DEVICE用于记录信息
公开(公告)号：EP1769521B1
公开(公告)日：2012-03-07
申请号：EP05767823.7
申请日：2005-07-20
申请人： Ricoh Company, Ltd. , CRESTEC CORPORATION
发明人： MIYAZAKI, Takeshi , OHYI, Hideyuki , OBARA, Takashi
IPC分类号： H01J37/305 , G11B9/10 , G21K1/087 , H01J37/09 , H01J37/10 , G03F7/20
CPC分类号： H01J37/3007 , G11B7/0045 , G11B7/261 , G11B9/10 , G11B11/002 , H01J2237/3175
摘要： An electron beam applying apparatus includes: a thermal field emission type electron source (12) emitting an electron beam; an electrostatic lens (14) disposed immediately below the electron source (12) and acting as a condensing electrode for condensing the electron beam in a first angular aperture emitted by the electron source in a second angular aperture smaller than the first angular aperture; a condenser lens disposed on a downstream side of the electrostatic lens (14) and condensing the electron beam condensed in the second aperture angel by the electrostatic lends (14) in a crossover point; and an objective lens (28) disposed on a downstream side of the condenser lens (18) and condensing the electron beam condensed in the crossover point by the condenser lens (18) on the surface of the material (32).

8. 发明公开

EP1769521A1 ELECTRON BEAM APPLYING APPARATUS AND DRAWING APPARATUS 有权
标题翻译： ELECTRON DEVICE用于记录信息
公开(公告)号：EP1769521A1
公开(公告)日：2007-04-04
申请号：EP05767823.7
申请日：2005-07-20
申请人： Ricoh Company, Ltd. , CRESTEC CORPORATION
发明人： MIYAZAKI, Takeshi , OHYI, Hideyuki , OBARA, Takashi
IPC分类号： H01J37/305 , G11B9/10 , G21K1/087 , H01J37/09 , H01J37/10 , G03F7/20
CPC分类号： H01J37/3007 , G11B7/0045 , G11B7/261 , G11B9/10 , G11B11/002 , H01J2237/3175
摘要： An electron beam applying apparatus includes: a thermal field emission type electron source (12) emitting an electron beam; an electrostatic lens (14) disposed immediately below the electron source (12) and acting as a condensing electrode for condensing the electron beam in a first angular aperture emitted by the electron source in a second angular aperture smaller than the first angular aperture; a condenser lens disposed on a downstream side of the electrostatic lens (14) and condensing the electron beam condensed in the second aperture angel by the electrostatic lends (14) in a crossover point; and an objective lens (28) disposed on a downstream side of the condenser lens (18) and condensing the electron beam condensed in the crossover point by the condenser lens (18) on the surface of the material (32).

9. 发明授权

EP2008276B1 ELECTRON BEAM RECORDING APPARATUS 有权
标题翻译：电子记录仪
公开(公告)号：EP2008276B1
公开(公告)日：2015-11-18
申请号：EP07738777.7
申请日：2007-03-12
申请人： Ricoh Company, Ltd. , CRESTEC CORPORATION
发明人： OBARA, Takashi , MIYAZAKI, Takeshi
IPC分类号： G11B7/26 , G11B11/03 , G11B9/10
CPC分类号： G11B7/261 , G11B9/10 , G11B11/03

10. 发明公开

EP2008276A2 ELECTRON BEAM RECORDING APPARATUS 有权
标题翻译：电子记录仪
公开(公告)号：EP2008276A2
公开(公告)日：2008-12-31
申请号：EP07738777.7
申请日：2007-03-12
申请人： Ricoh Company, Ltd. , CRESTEC CORPORATION
发明人： OBARA, Takashi , MIYAZAKI, Takeshi
IPC分类号： G11B7/26 , G11B11/03 , G11B9/10
CPC分类号： G11B7/261 , G11B9/10 , G11B11/03
摘要： An electron beam recording apparatus is disclosed that records information onto the surface of a sample by using an electron beam. The electron beam recording apparatus includes an electron source that irradiates the electron beam, a magnetic detector that is configured to move onto and out of an irradiation axis and acquires magnetic information on the irradiation axis, a convergence position control part that calculates a convergence position correction amount for correcting a convergence position of the electron beam with respect to the surface of the sample based on the magnetic information, and a convergence position adjusting part that adjusts the convergence position of the electron beam with respect to the surface of the sample. The convergence position control part causes the convergence position adjusting part to adjust the convergence position of the electron beam with respect to the surface of the sample based on the convergence position correction amount.

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