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    • 1. 发明授权
    • Surface-treated shower head for use in a substrate processing chamber
    • 用于基板处理室的表面处理淋浴喷头
    • US06647993B2
    • 2003-11-18
    • US09740596
    • 2000-12-19
    • Quanyuan ShangSheng SunKam S. LawEmanuel Beer
    • Quanyuan ShangSheng SunKam S. LawEmanuel Beer
    • B08B704
    • C23C16/45565C23C16/4404C23C16/4405G03F7/70925H01J37/32357H01J37/3244H01J37/32522H01J2237/3325H01J2237/334Y10S438/905
    • A substrate processing system includes a processing chamber and a plasma source located external to the chamber. A conduit connects the plasma source to an interior region of the chamber to provide a reactive species to the chamber interior for cleaning interior surfaces of the chamber. A shower head, disposed between the plasma source and an interior region of the chamber, can serve as an electrode and also can serve as a gas distribution mechanism. The shower head includes a surface treatment, such as a non-anodized aluminum outer layer, an electro-polished surface of bare aluminum, or a fluorine-based protective outer layer. The surface-treated shower head improves the rate of removal of materials deposited on the interior surfaces of the chamber during cleaning, reduces contamination of substrates during processing, and provides more efficient use of the power source used for heating the substrate during processing.
    • 衬底处理系统包括位于腔室外部的处理室和等离子体源。 导管将等离子体源连接到腔室的内部区域,以向腔室内部提供反应物质以清洁腔室的内表面。 设置在等离子体源和室的内部区域之间的喷头可以用作电极,并且还可以用作气体分配机构。 淋浴头包括表面处理,例如非阳极氧化的铝外层,裸铝的电抛光表面或氟基保护外层。 表面处理的花洒头在清洁过程中提高了沉积在室内表面上的材料的去除速度,减少了处理过程中衬底的污染,并且在加工过程中提供了用于加热衬底的电源的更有效的使用。