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    • 2. 发明授权
    • Trademark retrieval method, apparatus and system, and computer storage medium
    • US10152650B2
    • 2018-12-11
    • US15557449
    • 2016-03-08
    • Qing Xu
    • Qing Xu
    • G06K9/62G06F17/30G06K9/46G06K9/54G06K19/14G06Q50/18G06K9/36G06K9/48
    • A trademark retrieval method, comprising: establishing a sample trademark library and establishing a correlation between sample trademarks and division data for figurative element codes of known pending or registered figurative trademarks; extracting and processing image feature information about the sample trademarks, and establishing a correlation between the sample trademarks and the extracted image feature information; extracting image feature information about a trademark to be retrieved; carrying out matching retrieval by taking the image feature information as a retrieval condition, and finding out a sample trademark reaching a pre-determined similarity degree, and a sample trademark with the highest similarity degree and a corresponding figurative element code; acquiring and confirming a figurative element code of the trademark to be retrieved; taking the figurative element code as a retrieval condition to carry out matching retrieval, and finding out a matching sample trademark; collecting a result retrieved by taking the image feature information as the retrieval condition and a result retrieved by taking the figurative element code as the retrieval condition; and sequencing the collected trademarks according to the similarity degree of the image feature information. By means of the present disclosure, the standardized retrieval of figurative trademarks can be realized.
    • 4. 发明申请
    • Agile Light Source Provisioning for Information and Communications Technology Systems
    • 信息和通信技术系统的敏捷光源配置
    • US20140016946A1
    • 2014-01-16
    • US13545193
    • 2012-07-10
    • Qing XuRobert BrunnerStephane Lessard
    • Qing XuRobert BrunnerStephane Lessard
    • G02F1/035H04B10/12
    • G02B27/1006H04J14/02H04J14/0221
    • A chassis includes a plurality of continuous wave lasers each operable to emit a continuous wave optical beam at the same power as the other lasers, and a plurality of optical couplers operable to input the continuous wave optical beams of the same power and output a plurality of continuous wave optical beams at different powers. The chassis further includes a plurality of optical assemblies operable to modulate the continuous wave optical beams of different powers into a plurality of modulated optical signals at different powers and couple the modulated optical signals onto different length optical mediums so that lower power ones of the modulated optical signals are coupled to shorter ones of the optical mediums and higher power ones of the modulated optical signals are coupled to longer ones of the optical mediums.
    • 底架包括多个连续波激光器,每个连续波激光器可操作以以与其它激光器相同的功率发射连续波光束;以及多个光耦合器,其可操作以输入相同功率的连续波光束并输出多个 连续波光束在不同功率下。 底盘还包括多个光学组件,其可操作以将不同功率的连续波光束调制成不同功率的多个调制光信号,并将调制的光信号耦合到不同长度的光介质上,使得调制光 信号耦合到较短的光介质,并且较高功率的调制光信号耦合到更长的光介质。
    • 5. 发明授权
    • Use of spectrum to synchronize RF switching with gas switching during etch
    • 在蚀刻期间使用频谱来同步RF切换与气体切换
    • US08440473B2
    • 2013-05-14
    • US13154075
    • 2011-06-06
    • Qing XuCamelia RusuBrian K. McMillinAlexander M. Paterson
    • Qing XuCamelia RusuBrian K. McMillinAlexander M. Paterson
    • H01L21/00
    • H01L21/30655H01J37/32972
    • A method for etching features into an etch layer in a plasma processing chamber is provided. An optically timed deposition phase is provided comprising providing a flow of deposition phase gas, detecting the presence of deposition gas within the plasma processing chamber, providing RF energy for forming a plasma from the deposition phase gas in the plasma processing chamber, and stopping the flow of the deposition gas into the plasma processing chamber. An optically timed etching phase is provided, comprising providing a flow of an etch gas, detecting the presence of the etch gas within the plasma processing chamber, providing RF energy for forming a plasma from the etch gas in the plasma processing chamber, and stopping the flow of the etch gas into the plasma processing chamber.
    • 提供了一种用于将特征蚀刻到等离子体处理室中的蚀刻层中的方法。 提供了一种光学定时沉积阶段,包括提供沉积相气体流,检测等离子体处理室内的沉积气体的存在,提供用于从等离子体处理室中的沉积相气体形成等离子体的RF能量,并停止流动 的沉积气体进入等离子体处理室。 提供光学定时的蚀刻阶段,包括提供蚀刻气体流,检测等离子体处理室内的蚀刻气体的存在,提供用于从等离子体处理室中的蚀刻气体形成等离子体的RF能量,并停止 蚀刻气体流入等离子体处理室。
    • 7. 发明授权
    • Type II restriction endonuclease, HpyCH4IV, obtainable from Helicobacter pylori CH4 and a process for producing the same
    • 可从幽门螺杆菌CH4获得的II型限制性内切核酸酶HpyCH4IV及其制备方法
    • US06194188B1
    • 2001-02-27
    • US09404671
    • 1999-09-23
    • Richard D. MorganQing Xu
    • Richard D. MorganQing Xu
    • C12N922
    • C12N9/22C12N9/1007Y10S530/825
    • In accordance with the present invention, there is provided a novel restriction endonuclease and its DNA obtainable from Helicobacter pylori CH4 (NEB#1236), hereinafter referred to as “HpyCH4IV”, which endonuclease: (1) recognizes the nucleotide sequence 5′-ACGT-3′ to in a double-stranded DNA molecule as shown below, 5′-A↓CGT-3′ 3′-TGC↑A-5′ (wherein G represents guanine, C represents cytosine, A represents adenine, T represents thymine and N represents either G, C, A, or T); (2) cleaves said sequence in the phosphodiester bonds between the A and C as indicated with the arrows; and (3) cleaves double-stranded PhiX174 DNA to produce 19 fragments, including fragments of 1036, 749, 397, 379, 371, 365, 362, 343, 282, 282, 268 base pairs, and 8 fragments smaller than 200 base pairs.
    • 根据本发明,提供了一种新的限制性内切核酸酶及其可从幽门螺杆菌CH4(NEB#1236)获得的DNA,以下称为“HpyCH4IV”,该内切核酸酶:(1)识别核苷酸序列5'-ACGT -3'到如下所示的双链DNA分子中,5'-A↓CGT-3'3'-TGC↑A-5'(其中G表示鸟嘌呤,C表示胞嘧啶,A表示腺嘌呤,T表示胸腺嘧啶 并且N表示G,C,A或T);(2)如箭头所示切割A和C之间的磷酸二酯键中的所述序列; 并且(3)切割双链PhiX174DNA以产生19个片段,包括1036,749,397,397,371,365,362,343,282,282,268碱基对和小于200个碱基对的8个片段的片段 。