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    • 3. 发明授权
    • Quaternary ammonium salt compounds of spirocyclopiperazines, preparation methods and uses thereof
    • 螺环吡嗪的季铵盐化合物,其制备方法和用途
    • US09133195B2
    • 2015-09-15
    • US12305174
    • 2007-06-15
    • Runtao LiQi SunJia YeCaiqin YueXin WangZemei GeChangling LiTieming Cheng
    • Runtao LiQi SunJia YeCaiqin YueXin WangZemei GeChangling LiTieming Cheng
    • A61K31/55C07D471/10A61K31/438A61K31/5386C07D498/10C07D487/10C07D513/10C07D519/00
    • C07D471/10C07D487/10C07D498/10C07D513/10C07D519/00
    • Compounds represented by general formula (I), their stereoisomers, tautomers, derivatives, prodrugs or pharmaceutically acceptable salts, and their preparation methods or uses for the manufacture of a medicament of analgesics. In which R1 is selected from H, substituted or unsubstituted phenyl, or substituted or unsubstituted heteroaryl; A is bond, or saturated or unsaturated straight-chain or branched-chain hydrocarbon radical; R2, R3 are each independently hydrogen or methyl, which linked with any position of spirocyclo-structure; n and m are each independently integer between 0-2, do not represent 0 at the same time; B and D are each independently C1-C3 straight-chain or branched-chain alkylene; Y is selected from —CHR4—, O, S, —S(O)—, —SO2—, —NR4— and substituted or unsubstituted phenylene, in which R4 represents H, C1-C6 saturated or unsaturated alkyl, methyl or ethyl substituted by substituted or unsubstituted aryl or heteroaryl; and X− is pharmaceutical acceptable organic or inorganic anion. These compounds can be used as muscarine receptor (M-receptor) and/or nicotine acetylcholine receptor (N-receptor) agonist or antagonist. These compounds have good analgesic effect without side effect such as addiction.
    • 由通式(I)表示的化合物,其立体异构体,互变异构体,衍生物,前药或药学上可接受的盐,及其制备方法或用途,用于制备镇痛药物。 其中R1选自H,取代或未取代的苯基或取代或未取代的杂芳基; A是键或饱和或不饱和的直链或支链烃基; R2,R3各自独立地为氢或甲基,其与任何位置的螺环结构连接; n和m各自独立地为0-2之间的整数,不同时为0; B和D各自独立地为C1-C3直链或支链亚烷基; Y选自-CHR 4 - ,O,S,-S(O) - , - SO 2 - , - NR 4 - 和取代或未取代的亚苯基,其中R 4表示H,C 1 -C 6饱和或不饱和烷基,甲基或乙基取代 由取代或未取代的芳基或杂芳基取代; X-是药学上可接受的有机或无机阴离子。 这些化合物可用作毒蕈碱受体(M-受体)和/或尼古丁乙酰胆碱受体(N-受体)激动剂或拮抗剂。 这些化合物具有良好的止痛效果,无副作用,如成瘾。
    • 6. 发明申请
    • Method And Device For Monitoring Measurement Data In Semiconductor Process
    • 用于监控半导体工艺中测量数据的方法和装置
    • US20110161030A1
    • 2011-06-30
    • US12976872
    • 2010-12-22
    • Haijun NiuLixia YangQi Sun
    • Haijun NiuLixia YangQi Sun
    • G06F17/18G06F19/00
    • G05B19/41875G05B2219/34491G05B2219/37224G05B2219/37522G05B2219/37533H01L22/20Y02P90/22
    • An embodiment of the present invention discloses a method for monitoring measurement data in a semiconductor process, which includes: updating measurement data of wafer performance parameters periodically from a real time system into an analysis database; retrieving from the analysis database the measurement data of a predetermined performance parameter for analysis covered in a time range required in a selected analysis rule according to information on the performance parameter for analysis and information on the selected analysis rule; determining whether the measurement data of the performance parameter retrieved from the analysis database violates a control range of the selected analysis rule, and if so, then transmitting alarm information for the performance parameter violating the control range of the selected analysis rule. The method and device according to the embodiments of the invention can automatically monitor measurement data of wafer performance parameters and discover an abnormal performance parameter.
    • 本发明的实施例公开了一种用于监视半导体工艺中的测量数据的方法,包括:将晶片性能参数的周期性测量数据从实时系统更新为分析数据库; 从分析数据库检索根据关于用于分析的性能参数的信息和所选择的分析规则的信息在所选择的分析规则中所需的时间范围内涵盖的用于分析的预定性能参数的测量数据; 确定从分析数据库检索的性能参数的测量数据是否违反所选分析规则的控制范围,如果是,则发送违反所选分析规则的控制范围的性能参数的报警信息。 根据本发明的实施例的方法和装置可以自动监视晶片性能参数的测量数据并发现异常性能参数。
    • 10. 发明授权
    • Systems for recycling slurry materials during polishing processes
    • 在抛光过程中回收浆料的系统
    • US08696404B2
    • 2014-04-15
    • US13333950
    • 2011-12-21
    • Qi SunDavid GravesJohn P. SargentLindsey A. Hamilton
    • Qi SunDavid GravesJohn P. SargentLindsey A. Hamilton
    • B24C9/00
    • B24B57/02
    • Systems for recycling slurry materials during polishing processes are provided. One system includes a polisher having an inlet and drain outlet, and a slurry storage tank to supply a slurry including a preselected material to the polisher inlet, and a recycling assembly including a cross flow filter including an inlet to receive a waste slurry including the preselected material from the polisher drain outlet, where the cross flow filter is configured to concentrate the preselected material in an outlet slurry, a density meter configured to measure a concentration of the preselected material in the filter outlet slurry, a valve coupled to the filter outlet and configured to supply the slurry storage tank, and a controller coupled to the density meter and valve, where the controller is configured to open the valve when the concentration of the preselected material reaches a first concentration threshold.
    • 提供了在抛光过程中回收浆料的系统。 一个系统包括具有入口和排出口的抛光机和用于将包括预选材料的浆料供应到抛光机入口的浆料储罐,以及包括交叉流过滤器的循环组件,该循环组件包括用于接收包括预选的废浆的入口 来自抛光机排放出口的材料,其中横流过滤器被配置为将预选材料集中在出口浆料中;密度计,其配置成测量过滤器出口浆料中预选材料的浓度;耦合到过滤器出口的阀; 被配置为供应所述浆料储存罐,以及耦合到所述密度计和阀的控制器,其中所述控制器构造成当所述预选材料的浓度达到第一浓度阈值时打开所述阀。