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1. 发明申请

US20080242798A1 Anti-leaking cartridge and anti-leaking ink 审中-公开
标题翻译：防漏墨盒和防漏墨
公开(公告)号：US20080242798A1
公开(公告)日：2008-10-02
申请号：US12078015
申请日：2008-03-26
申请人： Po-Son Wang , Yu-Ting Lin , Yun-I Liu , Ming-Chung Peng , Wen-Chen Liu , Hung-Sheng Hu
发明人： Po-Son Wang , Yu-Ting Lin , Yun-I Liu , Ming-Chung Peng , Wen-Chen Liu , Hung-Sheng Hu
IPC分类号： C08G67/00
CPC分类号： C09D11/328
摘要： The present invention is generally related to an anti-leaking cartridge and anti-leaking ink. The anti-leaking ink comprises: an organic solvent, which is selected from the group consisting of diethylene glycol, triethylene glycol, triethanolamine amine extra pure, polyethylene glycol 200, and ethylene glycol and functions with at least one seal member for avoiding leakage; at least one dye dissolved in the organic solvent; a buffer solution maintaining the pH value of the anti-leaking ink in between 6.0 to 8.0; an antibacterial avoiding that the properties of the ink is changed; surfactant, which homogenizes the aquas of ink and the organic solvent; and de-ionized water.
摘要翻译：本发明通常涉及防漏墨盒和防漏墨。防漏油墨包括：有机溶剂，其选自二甘醇，三甘醇，三乙醇胺胺特别纯的，聚乙二醇200和乙二醇，并具有至少一个用于避免渗漏的密封件的功能; 溶于有机溶剂中的至少一种染料; 将防漏油墨的pH值保持在6.0至8.0之间的缓冲溶液; 避免墨水性质改变的抗菌剂; 表面活性剂，其使油墨和有机溶剂的水均匀化; 和去离子水。

2. 发明申请

US20050157091A1 Method for fabricating an enlarged fluid chamber 审中-公开
标题翻译：制造扩大流体室的方法
公开(公告)号：US20050157091A1
公开(公告)日：2005-07-21
申请号：US11030396
申请日：2005-01-06
申请人： Hung-Sheng Hu , Wei-Lin Chen , Ming-Chung Peng
发明人： Hung-Sheng Hu , Wei-Lin Chen , Ming-Chung Peng
IPC分类号： B41J2/16 , B41J2/05 , B41J2/04 , B41J2/17
CPC分类号： B41J2/1629 , B41J2/1603 , B41J2/1639
摘要： A method for fabricating an enlarged fluid chamber using multiple sacrificial layers. The method comprises providing a plurality of patterned sacrificial layers between a substrate and a structural layer. A chamber neck is formed between a fluid chamber and a fluid channel using different sacrificial layers with different etching rates. The chamber neck can stabilize ejection of the fluid droplet. Additionally, a single print-head chip with different chamber sizes can also be formed, thereby ejecting droplets with different sizes.
摘要翻译：一种使用多个牺牲层制造扩大的流体室的方法。该方法包括在衬底和结构层之间提供多个图案化牺牲层。使用具有不同蚀刻速率的不同牺牲层，在流体室和流体通道之间形成腔室颈部。腔室颈部可以稳定液滴的喷射。此外，还可以形成具有不同室尺寸的单个打印头芯片，从而喷射具有不同尺寸的液滴。

3. 发明申请

US20060170731A1 Fluid injection device and method of fabricating the same 审中-公开
标题翻译：流体注射装置及其制造方法
公开(公告)号：US20060170731A1
公开(公告)日：2006-08-03
申请号：US11297432
申请日：2005-12-09
申请人： Kuo-Tong Ma , In-Yao Lee , Hung-Sheng Hu
发明人： Kuo-Tong Ma , In-Yao Lee , Hung-Sheng Hu
IPC分类号： B41J2/135
CPC分类号： B41J2/1628 , B41J2/1433 , B41J2/162 , B41J2/1629
摘要： A fluid injection device. The fluid injection device comprises a substrate, a chamber formed in the substrate, a structural layer covering the substrate and the chamber, at least one nozzle through the structural layer and connecting the chamber, an opening through the structural layer and connecting the terminal of the chamber, wherein an outlet is formed at the connecting region therebetween. A method of fabricating the fluid injection device is also disclosed.
摘要翻译：流体注射装置。流体注射装置包括基底，形成在基底中的腔室，覆盖基底和腔室的结构层，穿过结构层的至少一个喷嘴并连接腔室，穿过结构层的开口，其中在其间的连接区域处形成有出口。还公开了一种制造流体注射装置的方法。

4. 发明申请

US20050127028A1 Method for fabricating an enlarged fluid channel 审中-公开
标题翻译：制造扩大流体通道的方法
公开(公告)号：US20050127028A1
公开(公告)日：2005-06-16
申请号：US10987087
申请日：2004-11-12
申请人： Wei-Lin Chen , Hung-Sheng Hu
发明人： Wei-Lin Chen , Hung-Sheng Hu
IPC分类号： B41J2/16 , G01D15/00
CPC分类号： B41J2/1629 , B41J2/1603 , B41J2/1628 , B41J2/1642
摘要： A method for fabricating an enlarged fluid channel. The method includes providing a substrate with a patterned sacrificial layer thereon. A patterned support layer is formed on the substrate and covers the sacrificial layer. A fluid channel is formed by wet etching the substrate and exposing the sacrificial layer. A first chamber is formed by removing a portion of the sacrificial layer in the wet etching process. Finally, the first chamber and the exit-end of the fluid channel are enlarged by wet etching. More specifically, the exit-end of the fluid channel is enlarged using multiple steps of etching the sacrificial layer without changing the dimensions of the entry-end of the fluid channel.
摘要翻译：一种制造扩大流体通道的方法。该方法包括在其上提供具有图案化牺牲层的衬底。图案化支撑层形成在衬底上并覆盖牺牲层。通过湿蚀刻衬底并暴露牺牲层形成流体通道。通过在湿蚀刻工艺中去除牺牲层的一部分来形成第一室。最后，流体通道的第一腔室和出口端通过湿法蚀刻而增大。更具体地，流体通道的出口端通过蚀刻牺牲层的多个步骤来扩大，而不改变流体通道入口端的尺寸。

5. 发明申请

US20060071302A1 Fluid injection devices and fabrication methods thereof 审中-公开
标题翻译：流体注射装置及其制造方法
公开(公告)号：US20060071302A1
公开(公告)日：2006-04-06
申请号：US11242780
申请日：2005-10-05
申请人： Wei-Lin Chen , Hung-Sheng Hu , Der-Rong Shyn
发明人： Wei-Lin Chen , Hung-Sheng Hu , Der-Rong Shyn
IPC分类号： H01L23/58
CPC分类号： B41J2/14137 , B41J2/1603 , B41J2/1625 , B41J2/1629 , B41J2/1631 , B41J2/1642 , B41J2/1643 , B41J2/1646
摘要： Fluid injection devices and fabrication methods thereof. A first structural layer is disposed on a substrate. A fluid chamber is disposed between the substrate and the first structural layer. At least one bubble generator is disposed on the first structural layer and on the opposite side of the fluid chamber. A first passivation layer is disposed on the first structural layer covering the bubble generator. A second structural layer is disposed on the passivation layer. A second passivation layer is conformably deposited on the second passivation layer. A nozzle adjacent to the bubble generator passes through the second passivation layer, the second structural layer, the first passivation layer, and the first structural layer communicating the fluid chamber, wherein the sidewall of the nozzle is made of the first structural, the first passivation layer and the second passivation layer.
摘要翻译：流体注射装置及其制造方法。第一结构层设置在基板上。流体室设置在基板和第一结构层之间。至少一个气泡生成器设置在第一结构层上和流体室的相对侧上。第一钝化层设置在覆盖气泡发生器的第一结构层上。第二结构层设置在钝化层上。第二钝化层顺应地沉积在第二钝化层上。与气泡发生器相邻的喷嘴穿过第二钝化层，第二结构层，第一钝化层和连通流体室的第一结构层，其中喷嘴的侧壁由第一结构，第一钝化层和第二钝化层。

6. 发明授权

US06789880B2 Microinjector for jetting droplets of different sizes 有权
标题翻译：用于喷射不同大小的液滴的微量注射器
公开(公告)号：US06789880B2
公开(公告)日：2004-09-14
申请号：US10064254
申请日：2002-06-26
申请人： Chung-Cheng Chou , Tsung-Ping Hsu , In-Yao Lee , Wei-Lin Chen , Hung-Sheng Hu
发明人： Chung-Cheng Chou , Tsung-Ping Hsu , In-Yao Lee , Wei-Lin Chen , Hung-Sheng Hu
IPC分类号： B41J214
CPC分类号： B41J2/14137 , B41J2/1412 , B41J2002/1437
摘要： A microinjector uses bubbles as virtual valves to eject droplets of different sizes. The microinjector is in fluid communications with a reservoir and has a substrate, an orifice layer, and a plurality of nozzles. The substrate has a manifold for receiving ink from the reservoir. The orifice layer is positioned on the top of the substrate so that a plurality of chambers are formed between the orifice layer and the top of the substrate. Each of the nozzles has an orifice and at least three bubble generating components. The bubble generating components are selectively driven by a driving circuit so that each nozzle can eject droplets of different sizes.
摘要翻译：微量注射器使用气泡作为虚拟阀来喷射不同尺寸的液滴。微型注射器与储存器流体连通，并具有基底，孔层和多个喷嘴。衬底具有用于从储存器接收墨水的歧管。孔层位于基板的顶部，使得在孔板层和基板的顶部之间形成多个室。每个喷嘴具有孔口和至少三个气泡产生部件。气泡生成部件由驱动电路选择性地驱动，使得每个喷嘴可喷射不同尺寸的液滴。

7. 发明授权

US06733616B2 Surface isolation device 失效
标题翻译：表面隔离装置
公开(公告)号：US06733616B2
公开(公告)日：2004-05-11
申请号：US10063878
申请日：2002-05-21
申请人： Hung-Sheng Hu , Tsung-Ping Hsu , Wei-Lin Chen , Chung-Cheng Chou , In-Yao Lee
发明人： Hung-Sheng Hu , Tsung-Ping Hsu , Wei-Lin Chen , Chung-Cheng Chou , In-Yao Lee
IPC分类号： H05H100
CPC分类号： H01L21/67126 , H01L21/30604 , H01L21/31111 , H01L21/67086
摘要： A surface isolation device for isolating a predetermined area of a second surface of a wafer from an etching solution while the etching solution etches a first surface of the wafer to form a plurality of manifolds in the wafer. The surface isolation device has a base for positioning the wafer, a fixture for fixing the wafer on the base, and an isolation ring positioned on the base for isolating the predetermined area from the etching solution. When the fixture fixes the wafer on the base, the wafer sticks to the isolation ring, forming a seal that isolates the predetermined area from the etching solution.
摘要翻译：一种表面隔离装置，用于在蚀刻溶液蚀刻晶片的第一表面以在晶片中形成多个歧管时，将晶片的第二表面的预定区域与蚀刻溶液隔离。表面隔离装置具有用于定位晶片的基座，用于将晶片固定在基座上的固定器，以及位于基座上用于将预定区域与蚀刻溶液隔离的隔离环。当夹具将晶片固定在基座上时，晶片粘附到隔离环上，形成将预定面积与蚀刻溶液隔离的密封。

8. 发明授权

US07439163B2 Methods for fabricating fluid injection devices 失效
标题翻译：制造流体注射装置的方法
公开(公告)号：US07439163B2
公开(公告)日：2008-10-21
申请号：US11355982
申请日：2006-02-17
申请人： Hung-Sheng Hu , Wei-Lin Chen , Tsung-Ping Hsu , Der-Rong Shyn
发明人： Hung-Sheng Hu , Wei-Lin Chen , Tsung-Ping Hsu , Der-Rong Shyn
IPC分类号： H01L21/20
CPC分类号： B41J2/14137 , B41J2/1603 , B41J2/1626 , B41J2/1631
摘要： Methods for fabricating fluid injection devices. A patterned sacrificial layer is formed on a substrate. A patterned first structural layer is formed on the substrate covering the sacrificial layer. At least one fluid actuator is formed on the structural layer. A first passivation layer is formed on the first structural covering the at least one fluid actuator. An under bump metal (UBM) layer is conformably formed on the first passivation layer. A patterned first photoresist is formed at a predetermined nozzle site and a contact opening site exposes the UBM layer. A second structural layer is formed on the UBM layer. An etching protective layer is formed on the second structural layer. The first photoresist is removed creating an opening at the nozzle site exposing the UBM layer. The UBM layer in the opening is removed.
摘要翻译：制造流体注射装置的方法。图案化的牺牲层形成在衬底上。在覆盖牺牲层的基板上形成图案化的第一结构层。在结构层上形成至少一个流体致动器。在覆盖至少一个流体致动器的第一结构上形成第一钝化层。在第一钝化层上顺应地形成凸块下金属（UBM）层。在预定的喷嘴位置处形成图案化的第一光致抗蚀剂，并且接触开口部位露出UBM层。在UBM层上形成第二结构层。在第二结构层上形成蚀刻保护层。去除第一光致抗蚀剂，在暴露UBM层的喷嘴位置产生开口。开口中的UBM层被去除。

9. 发明申请

US20070105382A1 FLUID EJECTION DEVICE AND METHOD OF FABRICATING THE SAME 审中-公开
标题翻译：流体喷射装置及其制造方法
公开(公告)号：US20070105382A1
公开(公告)日：2007-05-10
申请号：US11619628
申请日：2007-01-04
申请人： Hung-Sheng Hu , Wei-Lin Chen
发明人： Hung-Sheng Hu , Wei-Lin Chen
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： B41J2/14137 , B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1642 , Y10T29/49401
摘要： A fluid ejection device includes a first substrate having a first crystal orientation, a second substrate having a second crystal orientation, bound to the first substrate, a manifold through the first and second substrates, a chamber formed in the second substrate, connected with the manifold, and a plurality of nozzles connecting to the chamber, wherein the first crystal orientation is different from the second crystal orientation. A method of fabricating the same is also disclosed.
摘要翻译：流体喷射装置包括具有第一晶体取向的第一基板，具有第二晶体取向的第二基板，与第一基板结合的歧管，通过第一和第二基板的歧管，形成在第二基板中的与歧管连接的腔室以及连接到所述室的多个喷嘴，其中所述第一晶体取向不同于所述第二晶体取向。还公开了一种制造该方法的方法。

10. 发明申请

US20060284932A1 Fluid injector and method of manufacturing the same 失效
标题翻译：流体注射器及其制造方法
公开(公告)号：US20060284932A1
公开(公告)日：2006-12-21
申请号：US11372964
申请日：2006-03-09
申请人： Hung-Sheng Hu , Wei-Lin Chen , In-Yao Lee , Tsung-Ping Hsu , Chung-Cheng Chou , ShangShi Wu
发明人： Hung-Sheng Hu , Wei-Lin Chen , In-Yao Lee , Tsung-Ping Hsu , Chung-Cheng Chou , ShangShi Wu
IPC分类号： B41J2/04
CPC分类号： B41J2/14137 , Y10T29/49126 , Y10T29/49128 , Y10T29/4913 , Y10T29/49401
摘要： A fluid injector and method of manufacturing the same. The fluid injector comprises a base, a first through hole, a bubble generator, a passivation layer, and a metal layer. The base includes a chamber and a surface. The first through hole communicates with the chamber, and is disposed in the base. The bubble generator is disposed on the surface near the first through hole, and is located outside the chamber. The passivation layer is disposed on the surface. The metal layer defines a second through hole, and is disposed on the passivation layer outside the chamber. The second through hole communicates with the first through hole.
摘要翻译：一种流体注射器及其制造方法。流体注射器包括底座，第一通孔，气泡发生器，钝化层和金属层。底座包括一个腔室和一个表面。第一通孔与腔室连通，并设置在基座中。气泡发生器设置在靠近第一通孔的表面上，并且位于室外。钝化层设置在表面上。金属层限定第二通孔，并且设置在室外的钝化层上。第二通孔与第一通孔连通。

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