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1. 发明授权

US07100306B2 Wafer guides for processing semiconductor substrates 失效
标题翻译：用于处理半导体衬底的晶片导板
公开(公告)号：US07100306B2
公开(公告)日：2006-09-05
申请号：US11234033
申请日：2005-09-24
申请人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
发明人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
IPC分类号： F26B3/08
CPC分类号： H01L21/67326 , B65D25/103 , H01L21/67057 , Y10S134/902
摘要： A wafer guide includes a horizontal support panel and at least three vertical panels attached on one surface of the support panel. Each of the vertical panels has a vertical body panel and a plurality of protrusions upwardly extended from a top surface of the vertical body panel. Gap regions between the protrusions act as slots for holding wafers. Sidewalls of the slots have a convex shaped profile when viewed from a top view, and bottom surfaces of the slots also have a convex shaped profile when viewed from a cross sectional view that crosses the vertical panels.
摘要翻译：晶片引导件包括水平支撑板和附接在支撑板的一个表面上的至少三个垂直板。每个垂直面板具有垂直的主体面板和从垂直主体面板的顶面向上延伸的多个突起。突起之间的间隙区域用作保持晶片的槽。当从顶视图观察时，槽的侧壁具有凸形的轮廓，并且当从横切垂直板的横截面视图观察时，槽的底表面也具有凸形轮廓。

2. 发明申请

US20060027513A1 Wafer guides for processing semiconductor substrates 失效
标题翻译：用于处理半导体衬底的晶片导板
公开(公告)号：US20060027513A1
公开(公告)日：2006-02-09
申请号：US11234033
申请日：2005-09-24
申请人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
发明人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
IPC分类号： A47G19/08
CPC分类号： H01L21/67326 , B65D25/103 , H01L21/67057 , Y10S134/902
摘要： A wafer guide used in cleaning and/or drying processes of semiconductor wafers is provided. The wafer guide includes a horizontal support panel and at least three vertical panels attached on one surface of the support panel. Each of the vertical panels has a vertical body panel and a plurality of protrusions upwardly extended from a top surface of the vertical body panel. Gap regions between the protrusions act as slots for holding wafers. Sidewalls of the slots have a convex shaped profile when viewed from a top view, and bottom surfaces of the slots also have a convex shaped profile when viewed from a cross sectional view that crosses the vertical panels. Accordingly, contact areas between the wafers and the wafer guide are reduced to improve a drying efficiency of the wafers.
摘要翻译：提供了用于半导体晶片的清洁和/或干燥处理的晶片引导件。晶片引导件包括水平支撑面板和至少三个垂直面板，其附接在支撑面板的一个表面上。每个垂直面板具有垂直的主体面板和从垂直主体面板的顶面向上延伸的多个突起。突起之间的间隙区域用作保持晶片的槽。当从顶视图观察时，槽的侧壁具有凸形的轮廓，并且当从横切垂直板的横截面视图观察时，槽的底表面也具有凸形轮廓。因此，晶片和晶片引导件之间的接触面积减小，以提高晶片的干燥效率。

3. 发明授权

US06959823B2 Wafer guides for processing semiconductor substrates 失效
标题翻译：用于处理半导体衬底的晶片导板
公开(公告)号：US06959823B2
公开(公告)日：2005-11-01
申请号：US10619999
申请日：2003-07-14
申请人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
发明人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
IPC分类号： H01L21/304 , B65D25/10 , H01L21/00 , H01L21/673 , A47G19/08
CPC分类号： H01L21/67326 , B65D25/103 , H01L21/67057 , Y10S134/902
摘要： A wafer guide includes a horizontal support panel and at least three vertical panels attached on one surface of the support panel. Each of the vertical panels has a vertical body panel and a plurality of protrusions upwardly extended from a top surface of the vertical body panel. Gap regions between the protrusions act as slots for holding wafers. Sidewalls of the slots have a convex shaped profile when viewed from a top view, and bottom surfaces of the slots also have a convex shaped profile when viewed from a cross sectional view that crosses the vertical panels.
摘要翻译：晶片引导件包括水平支撑板和附接在支撑板的一个表面上的至少三个垂直板。每个垂直面板具有垂直的主体面板和从垂直主体面板的顶面向上延伸的多个突起。突起之间的间隙区域用作保持晶片的槽。当从顶视图观察时，槽的侧壁具有凸形的轮廓，并且当从横切垂直板的横截面视图观察时，槽的底表面也具有凸形轮廓。

4. 发明申请

US20060260149A1 Wafer guides for processing semiconductor substrates 审中-公开
公开(公告)号：US20060260149A1
公开(公告)日：2006-11-23
申请号：US11492591
申请日：2006-07-25
申请人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
发明人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
IPC分类号： F26B7/00
CPC分类号： H01L21/67326 , B65D25/103 , H01L21/67057 , Y10S134/902
摘要： A wafer guide includes a horizontal support panel and at least three vertical panels attached on one surface of the support panel. Each of the vertical panels has a vertical body panel and a plurality of protrusions upwardly extended from a top surface of the vertical body panel. Gap regions between the protrusions act as slots for holding wafers. Sidewalls of the slots have a convex shaped profile when viewed from a top view, and bottom surfaces of the slots also have a convex shaped profile when viewed from a cross sectional view that crosses the vertical panels.

5. 发明授权

US06905570B2 Apparatus for manufacturing integrated circuit device 失效
标题翻译：集成电路器件制造装置
公开(公告)号：US06905570B2
公开(公告)日：2005-06-14
申请号：US10627565
申请日：2003-07-24
申请人： Kwang-Shin Lim , Pil-Kwon Jun , Hun-Jung Yi , Sang-Oh Park , Yong-Kyun Ko
发明人： Kwang-Shin Lim , Pil-Kwon Jun , Hun-Jung Yi , Sang-Oh Park , Yong-Kyun Ko
IPC分类号： B65G49/04 , B65G49/07 , H01L21/304 , H01L21/673 , H01L21/677 , H01L21/687 , B08B7/02 , H01L21/22
CPC分类号： H01L21/67313 , H01L21/67326 , H01L21/68707
摘要： An apparatus includes a chamber for containing a fluid, a guide seated in the chamber, and a transfer robot for loading and/or unloading a plurality of wafers to and/or from the guide. The wafers are located on the guide. The guide has a supporting member for supporting a wafer and a stopper member for preventing the wafer from being inclined over a predetermined range. The stopper member is in contact with a wafer edge disposed at a higher position than a wafer edge supported by the supporting member. A wafer guide has a stopper member to prevent adjacent wafers from being inclined and coming in contact with each other. Therefore, it is possible to suppress a poor drying such as water spots (or watermarks) produced when wafers are adhered to each other in a drying process.
摘要翻译：一种装置包括用于容纳流体的腔室，位于腔室中的导向器和用于将多个晶片装载和/或从该引导件卸载的传送机器人。晶片位于导轨上。引导件具有用于支撑晶片的支撑构件和用于防止晶片倾斜超过预定范围的止动构件。止动构件与设置在比由支撑构件支撑的晶片边缘更高的位置处的晶片边缘接触。晶片引导件具有阻止相邻晶片倾斜并彼此接触的止动件。因此，可以抑制在干燥过程中晶片彼此粘附时产生的水斑（或水印）等干燥不良。

6. 发明授权

US06883248B2 Apparatus for drying a substrate using an isopropyl alcohol vapor 有权
标题翻译：使用异丙醇蒸气干燥基材的装置
公开(公告)号：US06883248B2
公开(公告)日：2005-04-26
申请号：US10635458
申请日：2003-08-07
申请人： Yong-Kyun Ko , Jae-Jun Ryu , Hun-Jung Yi , Pil-Kwon Jun
发明人： Yong-Kyun Ko , Jae-Jun Ryu , Hun-Jung Yi , Pil-Kwon Jun
IPC分类号： H01L21/304 , H01L21/00 , F26B21/06
CPC分类号： H01L21/67034
摘要： An apparatus for drying a substrate using an isopropyl alcohol vapor includes a container for receiving an isopropyl alcohol vapor to dry a plurality of substrates wherein an opening is vertically formed through an upper portion of the container to permit the loading and unloading of the substrates; a supporting member for supporting the plurality of substrates in the container in a vertical direction and for supporting the substrates side by side in a horizontal direction, wherein the supporting member extends through the container and through the opening; and a cover for obstructing a flow of clean air from flowing directly from an air cleaner disposed over the container into the container through the opening. In addition, the apparatus may include an inert gas supplying member to supply an inert gas onto the substrates to prevent native oxide films from forming on the substrates.
摘要翻译：使用异丙醇蒸气干燥基材的装置包括：用于接收异丙醇蒸气以干燥多个基板的容器，其中通过容器的上部垂直形成开口以允许基板的装载和卸载; 支撑部件，用于在垂直方向上支撑容器中的多个基板，并且用于在水平方向上并排地支撑基板，其中支撑部件延伸穿过容器并穿过开口; 以及用于阻挡清洁空气的流动的盖子，其通过开口直接从设置在容器上的空气滤清器流入容器。此外，该装置可以包括惰性气体供应构件，以在衬底上提供惰性气体，以防止在衬底上形成自然氧化膜。

7. 发明申请

US20060237033A1 CLEANING APPARATUS AND METHOD 审中-公开
标题翻译：清洁装置和方法
公开(公告)号：US20060237033A1
公开(公告)日：2006-10-26
申请号：US11380286
申请日：2006-04-26
申请人： Hun-Jung Yi , Yang-Koo Lee , Pil-Kwon Jun , Sang-Oh Park , Jai-Young Woo
发明人： Hun-Jung Yi , Yang-Koo Lee , Pil-Kwon Jun , Sang-Oh Park , Jai-Young Woo
IPC分类号： B08B3/00 , C23G1/00
CPC分类号： H01L21/02052 , B08B3/04 , H01L21/67017 , H01L21/67028 , H01L21/67126
摘要： In an embodiment, a cleaning apparatus and method can prevent adsorption of nano-size particles by wafers. The apparatus includes a cleaning chamber for filling with a cleaning solution for cleaning an object and a drying chamber disposed over the cleaning chamber for drying the object by supplying drying fluid from an upper part. It also includes a transferring unit for transferring the object by moving it between the cleaning and drying chambers. Further, it includes a moveable exhaust plate disposed between the drying chamber and the cleaning chamber for dividing the two chambers and for exhausting the drying fluid supplied to the drying chamber. The drying fluid flows in a uniform laminar flow in the drying chamber.
摘要翻译：在一个实施例中，清洁装置和方法可以防止由晶片吸收纳米尺寸的颗粒。该装置包括用于填充用于清洁物体的清洁溶液的清洁室和设置在清洁室上方的干燥室，用于通过从上部供应干燥流体来干燥物体。它还包括用于通过在清洁和干燥室之间移动物体来传送物体的转印单元。此外，其包括设置在干燥室和清洁室之间的可移动排气板，用于分隔两个室并排出供应到干燥室的干燥流体。干燥流体在干燥室中以均匀的层流流动。

8. 发明申请

US20050091871A1 Apparatus and method for drying semiconductor substrates 有权
标题翻译：用于干燥半导体衬底的装置和方法
公开(公告)号：US20050091871A1
公开(公告)日：2005-05-05
申请号：US10831175
申请日：2004-04-26
申请人： Hun-Jung Yi , Sang-Oh Park
发明人： Hun-Jung Yi , Sang-Oh Park
IPC分类号： H01L21/304 , H01L21/00 , F26B3/34
CPC分类号： H01L21/67034
摘要： A drying apparatus and method of drying a wafer including supplying a drying material for drying a wafer and controlling a flow of the drying material to uniformly or substantially dry the wafer. The flow of the drying material may be controlled by a vent unit including at least one part for controlling the flow of the drying material to uniformly or substantially uniformly dry the wafer.
摘要翻译：一种干燥装置和干燥晶片的方法，包括提供用于干燥晶片的干燥材料并控制干燥材料的流动以使晶片均匀或基本干燥。干燥材料的流动可以由包括至少一个部分的排气单元控制，用于控制干燥材料的流动以均匀地或基本均匀地干燥晶片。

9. 发明授权

US07386944B2 Method and apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer 失效
标题翻译：用于干燥晶片的方法和装置，以及用于清洁和干燥晶片的装置
公开(公告)号：US07386944B2
公开(公告)日：2008-06-17
申请号：US10983023
申请日：2004-11-05
申请人： Hun-Jung Yi , Won-Young Chung , Sang-Oh Park , Ye-Ro Lee
发明人： Hun-Jung Yi , Won-Young Chung , Sang-Oh Park , Ye-Ro Lee
IPC分类号： F26B21/06 , F26B21/12 , B08B3/00
CPC分类号： H01L21/67051 , H01L21/67028 , Y10S134/902
摘要： A method an apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer are provided. In the apparatus for cleaning and drying a wafer, the wafer is dipped into a cleaning solution in a cleaning tank. The wafer is then dried using a drying gas in a drying chamber disposed over the cleaning tank. A shutter separates the cleaning tank from the drying tank. A wafer boat moves the wafer vertically between the cleaning tank and the drying tank. Nozzles for providing the cleaning solution onto the wafer are disposed at both inner sides of the drying tank. The nozzles are connected to a drying gas supply unit to alternately and periodically provide the drying gas onto the wafer.
摘要翻译：提供了一种用于干燥晶片的设备以及用于清洁和干燥晶片的设备。在用于清洗和干燥晶片的装置中，将晶片浸入清洗槽中的清洁溶液中。然后使用设置在清洁槽上的干燥室中的干燥气体干燥晶片。快门将清洁箱与干燥箱分开。晶片舟将晶片在清洁槽和干燥箱之间垂直移动。用于在晶片上提供清洁溶液的喷嘴设置在干燥箱的两侧。喷嘴连接到干燥气体供应单元以交替地并周期性地将干燥气体提供到晶片上。

10. 发明申请

US20050039776A1 Apparatus and method for cleaning semiconductor substrates 审中-公开
标题翻译：用于清洁半导体衬底的装置和方法
公开(公告)号：US20050039776A1
公开(公告)日：2005-02-24
申请号：US10827512
申请日：2004-04-19
申请人： Hun-Jung Yi , Sang-Oh Park
发明人： Hun-Jung Yi , Sang-Oh Park
IPC分类号： H01L21/304 , B08B3/02 , B08B3/04 , B08B3/00 , B08B1/02
CPC分类号： B08B3/02 , B08B3/048
摘要： An apparatus for cleaning semiconductor substrates includes a chamber having a cleaning room and a drying room disposed over the cleaning room. The cleaning room and the drying room are separated or placed in communication with one another by a separation plate. An exhaust path is formed at a central portion of the separation plate. As de-ionized water (DI water) filling the cleaning room is drained during a dry process, the inside of the drying room is decompressed, and a drying fluid in the drying room flows from the drying room to the cleaning room along the exhaust path.
摘要翻译：用于清洁半导体衬底的设备包括具有清洁室和设置在清洁室上方的干燥室的室。清洁室和干燥室通过分隔板彼此分离或放置成彼此连通。排气路径形成在分离板的中心部分。由于在干燥过程中排出填充清洁室的去离子水（去离子水），干燥室内部被减压，干燥室内的干燥液沿着排气通路从干燥室流向清洗室。

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