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1. 发明授权

US07386944B2 Method and apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer 失效
标题翻译：用于干燥晶片的方法和装置，以及用于清洁和干燥晶片的装置
公开(公告)号：US07386944B2
公开(公告)日：2008-06-17
申请号：US10983023
申请日：2004-11-05
申请人： Hun-Jung Yi , Won-Young Chung , Sang-Oh Park , Ye-Ro Lee
发明人： Hun-Jung Yi , Won-Young Chung , Sang-Oh Park , Ye-Ro Lee
IPC分类号： F26B21/06 , F26B21/12 , B08B3/00
CPC分类号： H01L21/67051 , H01L21/67028 , Y10S134/902
摘要： A method an apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer are provided. In the apparatus for cleaning and drying a wafer, the wafer is dipped into a cleaning solution in a cleaning tank. The wafer is then dried using a drying gas in a drying chamber disposed over the cleaning tank. A shutter separates the cleaning tank from the drying tank. A wafer boat moves the wafer vertically between the cleaning tank and the drying tank. Nozzles for providing the cleaning solution onto the wafer are disposed at both inner sides of the drying tank. The nozzles are connected to a drying gas supply unit to alternately and periodically provide the drying gas onto the wafer.
摘要翻译：提供了一种用于干燥晶片的设备以及用于清洁和干燥晶片的设备。在用于清洗和干燥晶片的装置中，将晶片浸入清洗槽中的清洁溶液中。然后使用设置在清洁槽上的干燥室中的干燥气体干燥晶片。快门将清洁箱与干燥箱分开。晶片舟将晶片在清洁槽和干燥箱之间垂直移动。用于在晶片上提供清洁溶液的喷嘴设置在干燥箱的两侧。喷嘴连接到干燥气体供应单元以交替地并周期性地将干燥气体提供到晶片上。

2. 发明申请

US20050097771A1 Method and apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer 失效
标题翻译：用于干燥晶片的方法和装置，以及用于清洁和干燥晶片的装置
公开(公告)号：US20050097771A1
公开(公告)日：2005-05-12
申请号：US10983023
申请日：2004-11-05
申请人： Hun-Jung Yi , Won-Young Chung , Sang-Oh Park , Ye-Ro Lee
发明人： Hun-Jung Yi , Won-Young Chung , Sang-Oh Park , Ye-Ro Lee
IPC分类号： H01L21/304 , H01L21/00 , B08B3/00 , F26B3/00
CPC分类号： H01L21/67051 , H01L21/67028 , Y10S134/902
摘要： A method an apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer are provided. In the apparatus for cleaning and drying a wafer, the wafer is dipped into a cleaning solution in a cleaning tank. The wafer is then dried using a drying gas in a drying chamber disposed over the cleaning tank. A shutter separates the cleaning tank from the drying tank. A wafer boat moves the wafer vertically between the cleaning tank and the drying tank. Nozzles for providing the cleaning solution onto the wafer are disposed at both inner sides of the drying tank. The nozzles are connected to a drying gas supply unit to alternately and periodically provide the drying gas onto the wafer.
摘要翻译：提供了一种用于干燥晶片的设备以及用于清洁和干燥晶片的设备。在用于清洗和干燥晶片的装置中，将晶片浸入清洗槽中的清洁溶液中。然后使用设置在清洁槽上的干燥室中的干燥气体干燥晶片。快门将清洁箱与干燥箱分开。晶片舟将晶片在清洁槽和干燥箱之间垂直移动。用于在晶片上提供清洁溶液的喷嘴设置在干燥箱的两侧。喷嘴连接到干燥气体供应单元以交替地并周期性地将干燥气体提供到晶片上。

3. 发明授权

US07100306B2 Wafer guides for processing semiconductor substrates 失效
标题翻译：用于处理半导体衬底的晶片导板
公开(公告)号：US07100306B2
公开(公告)日：2006-09-05
申请号：US11234033
申请日：2005-09-24
申请人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
发明人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
IPC分类号： F26B3/08
CPC分类号： H01L21/67326 , B65D25/103 , H01L21/67057 , Y10S134/902
摘要： A wafer guide includes a horizontal support panel and at least three vertical panels attached on one surface of the support panel. Each of the vertical panels has a vertical body panel and a plurality of protrusions upwardly extended from a top surface of the vertical body panel. Gap regions between the protrusions act as slots for holding wafers. Sidewalls of the slots have a convex shaped profile when viewed from a top view, and bottom surfaces of the slots also have a convex shaped profile when viewed from a cross sectional view that crosses the vertical panels.
摘要翻译：晶片引导件包括水平支撑板和附接在支撑板的一个表面上的至少三个垂直板。每个垂直面板具有垂直的主体面板和从垂直主体面板的顶面向上延伸的多个突起。突起之间的间隙区域用作保持晶片的槽。当从顶视图观察时，槽的侧壁具有凸形的轮廓，并且当从横切垂直板的横截面视图观察时，槽的底表面也具有凸形轮廓。

4. 发明申请

US20050091871A1 Apparatus and method for drying semiconductor substrates 有权
标题翻译：用于干燥半导体衬底的装置和方法
公开(公告)号：US20050091871A1
公开(公告)日：2005-05-05
申请号：US10831175
申请日：2004-04-26
申请人： Hun-Jung Yi , Sang-Oh Park
发明人： Hun-Jung Yi , Sang-Oh Park
IPC分类号： H01L21/304 , H01L21/00 , F26B3/34
CPC分类号： H01L21/67034
摘要： A drying apparatus and method of drying a wafer including supplying a drying material for drying a wafer and controlling a flow of the drying material to uniformly or substantially dry the wafer. The flow of the drying material may be controlled by a vent unit including at least one part for controlling the flow of the drying material to uniformly or substantially uniformly dry the wafer.
摘要翻译：一种干燥装置和干燥晶片的方法，包括提供用于干燥晶片的干燥材料并控制干燥材料的流动以使晶片均匀或基本干燥。干燥材料的流动可以由包括至少一个部分的排气单元控制，用于控制干燥材料的流动以均匀地或基本均匀地干燥晶片。

5. 发明申请

US20050039776A1 Apparatus and method for cleaning semiconductor substrates 审中-公开
标题翻译：用于清洁半导体衬底的装置和方法
公开(公告)号：US20050039776A1
公开(公告)日：2005-02-24
申请号：US10827512
申请日：2004-04-19
申请人： Hun-Jung Yi , Sang-Oh Park
发明人： Hun-Jung Yi , Sang-Oh Park
IPC分类号： H01L21/304 , B08B3/02 , B08B3/04 , B08B3/00 , B08B1/02
CPC分类号： B08B3/02 , B08B3/048
摘要： An apparatus for cleaning semiconductor substrates includes a chamber having a cleaning room and a drying room disposed over the cleaning room. The cleaning room and the drying room are separated or placed in communication with one another by a separation plate. An exhaust path is formed at a central portion of the separation plate. As de-ionized water (DI water) filling the cleaning room is drained during a dry process, the inside of the drying room is decompressed, and a drying fluid in the drying room flows from the drying room to the cleaning room along the exhaust path.
摘要翻译：用于清洁半导体衬底的设备包括具有清洁室和设置在清洁室上方的干燥室的室。清洁室和干燥室通过分隔板彼此分离或放置成彼此连通。排气路径形成在分离板的中心部分。由于在干燥过程中排出填充清洁室的去离子水（去离子水），干燥室内部被减压，干燥室内的干燥液沿着排气通路从干燥室流向清洗室。

6. 发明授权

US07520068B2 Apparatus and method for drying semiconductor substrates 有权
标题翻译：用于干燥半导体衬底的装置和方法
公开(公告)号：US07520068B2
公开(公告)日：2009-04-21
申请号：US10831175
申请日：2004-04-26
申请人： Hun-Jung Yi , Sang-Oh Park
发明人： Hun-Jung Yi , Sang-Oh Park
IPC分类号： F26B25/06
CPC分类号： H01L21/67034
摘要： A drying apparatus and method of drying a wafer including supplying a drying material for drying a wafer and controlling a flow of the drying material to uniformly or substantially dry the wafer. The flow of the drying material may be controlled by a vent unit including at least one part for controlling the flow of the drying material to uniformly or substantially uniformly dry the wafer.
摘要翻译：一种干燥装置和干燥晶片的方法，包括提供用于干燥晶片的干燥材料并控制干燥材料的流动以使晶片均匀或基本干燥。干燥材料的流动可以由包括至少一个部分的排气单元控制，用于控制干燥材料的流动以均匀地或基本均匀地干燥晶片。

7. 发明申请

US20060027513A1 Wafer guides for processing semiconductor substrates 失效
标题翻译：用于处理半导体衬底的晶片导板
公开(公告)号：US20060027513A1
公开(公告)日：2006-02-09
申请号：US11234033
申请日：2005-09-24
申请人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
发明人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
IPC分类号： A47G19/08
CPC分类号： H01L21/67326 , B65D25/103 , H01L21/67057 , Y10S134/902
摘要： A wafer guide used in cleaning and/or drying processes of semiconductor wafers is provided. The wafer guide includes a horizontal support panel and at least three vertical panels attached on one surface of the support panel. Each of the vertical panels has a vertical body panel and a plurality of protrusions upwardly extended from a top surface of the vertical body panel. Gap regions between the protrusions act as slots for holding wafers. Sidewalls of the slots have a convex shaped profile when viewed from a top view, and bottom surfaces of the slots also have a convex shaped profile when viewed from a cross sectional view that crosses the vertical panels. Accordingly, contact areas between the wafers and the wafer guide are reduced to improve a drying efficiency of the wafers.
摘要翻译：提供了用于半导体晶片的清洁和/或干燥处理的晶片引导件。晶片引导件包括水平支撑面板和至少三个垂直面板，其附接在支撑面板的一个表面上。每个垂直面板具有垂直的主体面板和从垂直主体面板的顶面向上延伸的多个突起。突起之间的间隙区域用作保持晶片的槽。当从顶视图观察时，槽的侧壁具有凸形的轮廓，并且当从横切垂直板的横截面视图观察时，槽的底表面也具有凸形轮廓。因此，晶片和晶片引导件之间的接触面积减小，以提高晶片的干燥效率。

8. 发明申请

US20070169795A1 Apparatus for cleaning substrates 审中-公开
标题翻译：清洗基板的设备
公开(公告)号：US20070169795A1
公开(公告)日：2007-07-26
申请号：US11656446
申请日：2007-01-23
申请人： Hun-Jung Yi , Sang-Oh Park
发明人： Hun-Jung Yi , Sang-Oh Park
IPC分类号： C23G1/00 , B08B3/00 , H01L21/306
CPC分类号： H01L21/67051 , B08B3/041 , B08B3/048 , H01L21/6708
摘要： An apparatus for cleaning substrates includes a supporting member supporting substrates in an upright position, and a liquid supplying member including a first nozzle disposed at one side of a vertical centerline of the substrates, and a second nozzle is disposed at another side of the vertical centerline of the substrates. Each of the first and second nozzles may include first injection holes to inject cleaning liquid toward lower ends of the substrates or regions adjacent to the lower ends of the substrates.
摘要翻译：一种用于清洁基板的设备包括：一个支撑件，用于支撑直立位置的基板，以及一个液体供应构件，其包括设置在基板垂直中心线一侧的第一喷嘴，第二喷嘴设置在垂直中心线的另一侧的基材。第一和第二喷嘴中的每一个可以包括第一喷射孔，以将清洁液体朝向与基板的下端相邻的基板或区域的下端喷射。

9. 发明授权

US06959823B2 Wafer guides for processing semiconductor substrates 失效
标题翻译：用于处理半导体衬底的晶片导板
公开(公告)号：US06959823B2
公开(公告)日：2005-11-01
申请号：US10619999
申请日：2003-07-14
申请人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
发明人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
IPC分类号： H01L21/304 , B65D25/10 , H01L21/00 , H01L21/673 , A47G19/08
CPC分类号： H01L21/67326 , B65D25/103 , H01L21/67057 , Y10S134/902
摘要： A wafer guide includes a horizontal support panel and at least three vertical panels attached on one surface of the support panel. Each of the vertical panels has a vertical body panel and a plurality of protrusions upwardly extended from a top surface of the vertical body panel. Gap regions between the protrusions act as slots for holding wafers. Sidewalls of the slots have a convex shaped profile when viewed from a top view, and bottom surfaces of the slots also have a convex shaped profile when viewed from a cross sectional view that crosses the vertical panels.
摘要翻译：晶片引导件包括水平支撑板和附接在支撑板的一个表面上的至少三个垂直板。每个垂直面板具有垂直的主体面板和从垂直主体面板的顶面向上延伸的多个突起。突起之间的间隙区域用作保持晶片的槽。当从顶视图观察时，槽的侧壁具有凸形的轮廓，并且当从横切垂直板的横截面视图观察时，槽的底表面也具有凸形轮廓。

10. 发明申请

US20080216347A1 Apparatus and method for drying semiconductor substrates 审中-公开
标题翻译：用于干燥半导体衬底的装置和方法
公开(公告)号：US20080216347A1
公开(公告)日：2008-09-11
申请号：US12078554
申请日：2008-04-01
申请人： Hun-Jung Yi , Sang-Oh Park
发明人： Hun-Jung Yi , Sang-Oh Park
IPC分类号： F26B3/00
CPC分类号： H01L21/67034
摘要： A drying apparatus and method of drying a wafer including supplying a drying material for drying a wafer and controlling a flow of the drying material to uniformly or substantially uniformly dry the wafer. The flow of the drying material may be controlled by a vent unit including at least one part for controlling the flow of the drying material to uniformly or substantially uniformly dry the wafer.
摘要翻译：一种干燥装置和干燥晶片的方法，包括提供用于干燥晶片的干燥材料并控制干燥材料的流动以均匀或基本均匀地干燥晶片。干燥材料的流动可以由包括至少一个部分的排气单元控制，用于控制干燥材料的流动以均匀地或基本均匀地干燥晶片。

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