专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20050282810A1 Oxindole derivatives 审中-公开
标题翻译：羟吲哚衍生物
公开(公告)号：US20050282810A1
公开(公告)日：2005-12-22
申请号：US11196597
申请日：2005-08-03
申请人： Philip Harris , Robert Hunter , Lee Kuyper , Karen Lackey , Robert McNutt , Michael Peel , Edgar Wood
发明人： Philip Harris , Robert Hunter , Lee Kuyper , Karen Lackey , Robert McNutt , Michael Peel , Edgar Wood
IPC分类号： A61K31/404 , A61K31/4045 , A61K31/405 , A61K31/4184 , A61K31/4196 , A61K31/4245 , A61K31/454 , A61K31/53 , A61P7/02 , A61P9/10 , A61P29/00 , A61P29/02 , A61P35/00 , A61P43/00 , C07D209/14 , C07D209/34 , C07D401/12 , C07D403/12 , C07D405/12 , C07D487/04
CPC分类号： C07D401/12 , A61K31/4045 , A61K31/405 , A61K31/4184 , A61K31/4196 , A61K31/4245 , A61K31/454 , A61K31/53 , C07D209/14 , C07D209/34 , C07D403/12 , C07D405/12 , C07D487/04
摘要： The present invention is related to oxindole derivatives, compositions containing the same, and methods of use and manufacture of the same. Such compounds generally are useful pharmacologically as agents in those disease states alleviated by the alteration of mitogen activated signaling pathways in general, and in particular in the inhibition or antagonism of protein kinases, which pathologically involve aberrant cellular proliferation. Such disease states include tumor growth, restenosis, atherosclerosis, pain and thrombosis. In particular, the present invention relates to a series of substituted oxindole compounds, which exhibit Trk family protein tyrosine kinase inhibition, and which are useful in cancer therapy and chronic pain indications.
摘要翻译：本发明涉及羟吲哚衍生物，含有它们的组合物及其使用和制造方法。这些化合物通常在药理学上作为通常通过改变促分裂原活化的信号通路而减轻的疾病状态中的药物有用，特别是在病理学上涉及异常细胞增殖的蛋白激酶的抑制或拮抗作用中。这种疾病状态包括肿瘤生长，再狭窄，动脉粥样硬化，疼痛和血栓形成。特别地，本发明涉及一系列取代的羟吲哚化合物，其表现出Trk家族蛋白酪氨酸激酶抑制，并且其可用于癌症治疗和慢性疼痛适应症。

2. 发明申请

US20050228025A1 Substituted oxindole derivatives as tyrosine kinase inhibitors 失效
标题翻译：取代的羟吲哚衍生物作为酪氨酸激酶抑制剂
公开(公告)号：US20050228025A1
公开(公告)日：2005-10-13
申请号：US11148635
申请日：2005-06-09
申请人： Scott Dickerson , Robert Hunter , Lee Kuyper , Karen Lackey , Michael Luzzio , Edgar Wood
发明人： Scott Dickerson , Robert Hunter , Lee Kuyper , Karen Lackey , Michael Luzzio , Edgar Wood
IPC分类号： A61K31/404 , A61K31/433 , A61K31/4439 , A61P25/04 , A61P29/00 , A61P29/02 , A61P35/00 , A61P43/00 , C07D209/34 , C07D209/40 , C07D401/12 , C07D417/12 , C07D417/02 , C07D43/02
CPC分类号： C07D401/12 , C07D209/34 , C07D209/40 , C07D417/12
摘要： The present invention is related to oxindole derivatives of structure (I), compositions containing the same, and methods of use and manufacture of the same. Such compounds generally are useful pharmacologically as agents in those disease states alleviated by the alteration of mitogen activated signaling pathways in general, and in particular in the inhibition or antagonism of protein kinases, which pathologically involve aberrant cellular proliferation. Such disease states include tumor growth, restenosis, atherosclerosis, pain and thrombosis. In particular, the present invention relates to a series of substituted oxindole compounds, which exhibit Trk family protein tyrosine kinase inhibition, and which are useful in cancer therapy and chronic pain indications.
摘要翻译：本发明涉及结构（I）的羟吲哚衍生物，含有它们的组合物及其使用和制造方法。这些化合物通常在药理学上作为通常通过改变促分裂原活化的信号通路而减轻的疾病状态中的药物有用，特别是在病理学上涉及异常细胞增殖的蛋白激酶的抑制或拮抗作用中。这种疾病状态包括肿瘤生长，再狭窄，动脉粥样硬化，疼痛和血栓形成。特别地，本发明涉及一系列取代的羟基吲哚化合物，其表现出Trk家族蛋白酪氨酸激酶抑制，并且其可用于癌症治疗和慢性疼痛适应症。

3. 发明申请

US20070142437A1 CHEMICAL COMPOUNDS 审中-公开
标题翻译：化学化合物
公开(公告)号：US20070142437A1
公开(公告)日：2007-06-21
申请号：US11670498
申请日：2007-02-02
申请人： Matthew Brown , Mui Cheung , Scott Dickerson , Cassandra Gauthier , Philip Harris , Robert Hunter , Gregory Pacofsky , Michael Peel , Jeffrey Stafford
发明人： Matthew Brown , Mui Cheung , Scott Dickerson , Cassandra Gauthier , Philip Harris , Robert Hunter , Gregory Pacofsky , Michael Peel , Jeffrey Stafford
IPC分类号： A61K31/4439 , A61K31/427 , A61K31/423 , C07D413/02 , C07D417/02
CPC分类号： C07D263/48 , C07D413/04 , C07D413/10 , C07D413/12 , C07D413/14 , C07D417/10 , C07D417/12 , C07D417/14
摘要： Oxazole derivatives, which are useful as VEGFR2, CDK2, and CDK4 inhibitors are described herein. The described invention also includes methods of making such oxazole derivatives as well as methods of using the same in the treatment of hyperproliferative diseases.
摘要翻译：本文描述了可用作VEGFR2，CDK2和CDK4抑制剂的恶唑衍生物。所述的发明还包括制备这种恶唑衍生物的方法以及使用它们在治疗过度增殖性疾病中的方法。

4. 发明申请

US20130194427A1 SYSTEMS METHODS FOR CAMERA CONTROL USING HISTORICAL OR PREDICTED EVENT DATA 有权
标题翻译：使用历史或预测事件数据进行摄像机控制的系统方法
公开(公告)号：US20130194427A1
公开(公告)日：2013-08-01
申请号：US13359856
申请日：2012-01-27
申请人： Robert Hunter
发明人： Robert Hunter
IPC分类号： H04N7/18
CPC分类号： H04N5/23206 , H04N7/188
摘要： According to some embodiments, systems, methods, apparatus, and computer program code for controlling a video camera to capture video associated with an event are provided which use historical or predictive data. In some embodiments, historical event information and participant information is received. Video camera configuration and position data is received, as well as current event data. The current event data may be received substantially in real time from the event. Video camera control signals are generated based on at least one of the event information, the participant information, and the current event data. The control signals are transmitted to a video camera to control the operation of the video camera.
摘要翻译：根据一些实施例，提供了使用历史或预测数据的用于控制摄像机捕获与事件相关联的视频的系统，方法，装置和计算机程序代码。在一些实施例中，接收历史事件信息和参与者信息。接收摄像机配置和位置数据，以及当前事件数据。可以从事件基本上实时地接收当前事件数据。基于事件信息，参与者信息和当前事件数据中的至少一个生成摄像机控制信号。将控制信号发送到摄像机以控制摄像机的操作。

5. 发明申请

US20120230804A1 Tilt Cylinder Support Structure 有权
标题翻译：倾斜气缸支撑结构
公开(公告)号：US20120230804A1
公开(公告)日：2012-09-13
申请号：US13045193
申请日：2011-03-10
申请人： Xiaoming Tan , Michael Sekulich , Allen Boyer , Robert Hunter , Sameer Rishipathak
发明人： Xiaoming Tan , Michael Sekulich , Allen Boyer , Robert Hunter , Sameer Rishipathak
IPC分类号： E02F9/00
CPC分类号： E02F9/2271
摘要： A support structure for a tilt cylinder of a machine that controls movement of an articulating implement may include a mounting plate, vertical support plates extending outwardly from a top surface of the mounting plate, and a central and side gussets connected to the top surface of the mounting plate and to the outer sides of the vertical support plates. The gussets assist in transitioning lateral or horizontal forces on the vertical support plates to the mounting plate and the end frame of the machine to reduce fatigue cracking at the points of connection of the vertical support plates to the mounting plate. The support structure may further include first and second lower support plates having top edges spaced from each other and connected to the bottom surface of the mounting plate, and bottom edges connected to each other so that the lower support plates and the mounting plate form a triangle in cross-section to further assist in transitioning the forces to the end frame.
摘要翻译：用于控制铰接工具的运动的机器的倾斜圆柱体的支撑结构可以包括安装板，从安装板的顶表面向外延伸的垂直支撑板，以及连接到安装板的顶表面的中心和侧部角撑板安装板和垂直支撑板的外侧。角撑板有助于将垂直支撑板上的横向或横向力转换到机器的安装板和端部框架，以减少垂直支撑板与安装板的连接点处的疲劳开裂。支撑结构还可以包括具有彼此间隔开并连接到安装板的底表面的顶部边缘的第一和第二下部支撑板以及彼此连接的底部边缘，使得下部支撑板和安装板形成三角形在横截面上进一步协助将力转移到端框。

6. 发明申请

US20070216902A1 Reference Wafer and Process for Manufacturing Same 失效
标题翻译：参考晶圆和制造工艺相同
公开(公告)号：US20070216902A1
公开(公告)日：2007-09-20
申请号：US11742468
申请日：2007-04-30
申请人： Adlai Smith , Robert Hunter
发明人： Adlai Smith , Robert Hunter
IPC分类号： G01B11/00
CPC分类号： G03F7/70458 , G03F1/44 , G03F7/70516 , G03F7/70616 , G03F7/70633 , G03F9/7076 , Y10S430/143 , Y10S430/168
摘要： An apparatus and method for manufacturing and using a calibrated registration reference wafer in a semiconductor manufacturing facility where an archive media includes etched alignment attributes. Exposing a pattern of complementary alignment attributes onto the archive media such that the pattern of complementary alignment attributes overlay and interlock with the etched alignment attributes thereby forming completed alignment attributes. Then, measuring offsets in the completed alignment attributes and constructing a calibration file for the archive media based upon the offset measurements and other characteristic data of the exposure tool.
摘要翻译：一种用于在半导体制造设备中制造和使用校准的配准参考晶片的装置和方法，其中存档介质包括蚀刻对准属性。将互补对准属性的图案公开在归档介质上，使得互补对准属性的图案覆盖并与蚀刻的对准属性互锁，从而形成完整的对准属性。然后，基于曝光工具的偏移测量值和其他特征数据，测量完成的对齐属性中的偏移并为归档介质构建校准文件。

7. 发明申请

US20060164618A1 Method and apparatus for measurement of exit pupil telecentricity and source boresighting 审中-公开
标题翻译：出射瞳孔远心和源视距的测量方法和装置
公开(公告)号：US20060164618A1
公开(公告)日：2006-07-27
申请号：US11340084
申请日：2006-01-26
申请人： Adlai Smith , Robert Hunter
发明人： Adlai Smith , Robert Hunter
IPC分类号： G03B27/52
CPC分类号： G03F7/70191 , G03F7/70591 , G03F7/70616
摘要： Exit pupil and source telecentricity of a projection imaging tool system is determined. The system contains a light source, an optical imager, a reticle, a substrate, and a positioner. The light source is optically coupled to the optical imager, the optical imager having an exit pupil. The combination of the light source and the optical imager define a projection imaging tool, are characterized by a partial coherence. The reticle has an array of patterns, each pattern having at least a first feature and a second feature. A substrate may be used to record at least a first image and a second image of the features. The positioner is used to dispose the first image and the second image such that the first image has a first defocus and the second image has a second defocus different from the first defocus. A processor is used to calculate the telecentricity based on an exit pupil and light source differential shift coefficient and positional offsets between features contained in the first image and features contained in the second image.
摘要翻译：确定投影成像工具系统的退出瞳孔和源远心。该系统包含光源，光学成像仪，光罩，基板和定位器。光源光学耦合到光学成像器，光学成像器具有出射光瞳。光源和光学成像器的组合定义了投影成像工具，其特征在于部分相干性。掩模版具有图案阵列，每个图案至少具有第一特征和第二特征。衬底可以用于记录特征的至少第一图像和第二图像。定位器用于配置第一图像和第二图像，使得第一图像具有第一散焦，并且第二图像具有不同于第一散焦的第二散焦。处理器用于基于出射光瞳和光源差分偏移系数以及包含在第一图像中的特征和包含在第二图像中的特征之间的位置偏移来计算远心度。

8. 发明申请

US20060042106A1 Method and apparatus for registration with integral alignment optics 失效
标题翻译：用于配准整体对准光学元件的方法和装置
公开(公告)号：US20060042106A1
公开(公告)日：2006-03-02
申请号：US10925745
申请日：2004-08-24
申请人： Adlai Smith , Robert Hunter , Bruce McArthur , Thomas Khuu , Yuji Yamaguchi
发明人： Adlai Smith , Robert Hunter , Bruce McArthur , Thomas Khuu , Yuji Yamaguchi
IPC分类号： G01C15/00
CPC分类号： G03F7/70633
摘要： A method and apparatus for front to back substrate registration is described. Alignment characteristics of features on surfaces of substrates can be used to physically align substrates with a multiplicity of integrated alignment optics. Measurement of offsets of the integral alignment optics are used to compute registration data for use in calibration of the substrate global alignment.
摘要翻译：描述了用于正面到背面衬底配准的方法和装置。可以使用衬底表面上的特征的对准特征来将衬底与多个集成对准光学器件物理对准。使用积分对准光学元件的偏移的测量来计算用于校准衬底全局对准的对准数据。

9. 发明申请

US20050243294A1 Apparatus and process for determination of dynamic scan field curvature 有权
标题翻译：用于确定动态扫描场曲率的装置和过程
公开(公告)号：US20050243294A1
公开(公告)日：2005-11-03
申请号：US10833781
申请日：2004-04-28
申请人： Adlai Smith , Robert Hunter
发明人： Adlai Smith , Robert Hunter
IPC分类号： G03F7/20 , G03B27/52
CPC分类号： G03F7/70791 , G03F7/70358 , G03F7/70516 , G03F7/706 , G03F7/70641
摘要： A process for the determination of focal plane deviation uniquely due to the scanning dynamics associated with a photolithographic scanner is described. A series of lithographic exposures is performed on a resist coated silicon wafer using a photolithographic scanner. The lithographic exposures produce an array of focusing fiducials that are displaced relative to each other in a unique way. The resulting measurements are fed into a computer algorithm that calculates the dynamic scanning field curvature in an absolute sense in the presence of wafer height variation and other wafer/reticle stage irregularities. The dynamic scan field curvature can be used to improve lithographic modeling, overlay modeling, and advanced process control techniques related to scanner stage dynamics.
摘要翻译：描述了由于与光刻扫描仪相关的扫描动力学而唯一地确定焦平面偏差的过程。使用光刻扫描仪在抗蚀剂涂覆的硅晶片上进行一系列光刻曝光。光刻曝光产生了以独特的方式相对于彼此移位的聚焦基准阵列。所得到的测量值被馈送到计算机算法中，该计算机算法在存在晶片高度变化和其它晶片/标线片级不规则性的情况下以绝对意义计算动态扫描场曲率。动态扫描场曲率可用于改进与扫描仪动态相关的光刻建模，叠加建模和先进的过程控制技术。

10. 发明申请

US20050202328A1 Process for determination of optimized exposure conditions for transverse distortion mapping 有权
标题翻译：用于确定横向畸变映射的优化暴露条件的过程
公开(公告)号：US20050202328A1
公开(公告)日：2005-09-15
申请号：US10800110
申请日：2004-03-12
申请人： Adlai Smith , Joseph Bendik , Robert Hunter
发明人： Adlai Smith , Joseph Bendik , Robert Hunter
IPC分类号： G03B27/00 , G03C5/00 , G03F7/20
CPC分类号： G03F7/705 , G03F7/701 , G03F7/706 , G03F7/70633
摘要： A process for providing illumination source conditions for the accurate determination Zernike tilt coefficients in the presence of coma is described. Large feature-shift coma sensitivity is simulated for a range of illumination conditions. The resulting source sensitivity data is modeled and a practical array of source shapes, each of which is optimized to eliminate the effects of transverse distortion due to third-order coma, is identified. The optimized set of source shapes can be used to more accurately determine Zernike terms a2 and a3 using a variety of methods. Knowledge of the lens distortion data in the absence of coma induced shifts can be entered into more traditional overlay regression routines to better identify systematic and random error. Additional applications of the above outlined procedure include: improved lithographic simulation using conventional optical modeling software and advanced process control in the form of feedback loops that automatically adjust the projection lens for optimum system performance.
摘要翻译：描述了在存在昏迷的情况下提供用于精确确定泽乃克倾斜系数的照明源条件的过程。对于一系列照明条件，模拟了特征移动敏感度。对所得到的源灵敏度数据进行建模，并且确定了源形状的实际阵列，每个源形状被优化以消除由于三阶昏迷引起的横向失真的影响。可以使用优化的源形状集来使用各种方法更准确地确定Zernike项a2和a3。在没有昏迷诱导的移位的情况下，对透镜失真数据的知识可以被输入到更传统的覆盖回归例程中，以更好地识别系统和随机误差。上述方法的其他应用包括：使用常规光学建模软件改进的光刻模拟和以反馈环形式的高级过程控制，其自动调整投影透镜以获得最佳系统性能。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式