会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • MEMS based multi-polar electrostatic chuck
    • 基于MEMS的多极静电卡盘
    • US07072165B2
    • 2006-07-04
    • US10642939
    • 2003-08-18
    • Peter L. KellermanShu QinDouglas A. Brown
    • Peter L. KellermanShu QinDouglas A. Brown
    • H01L21/683
    • H01L21/6875H01L21/6833
    • The present invention is directed to a semiconductor processing apparatus and a method for clamping a semiconductor substrate and controlling a heat transfer associated therewith. According to one aspect of the present invention, a multi-polar electrostatic chuck and associated method is disclosed which provides a controlled and uniform heat transfer coefficient across a surface thereof. The multi-polar electrostatic chuck comprises a semiconductor platform having a plurality of protrusions that define gaps therebetween, wherein a distance or depth of the gaps is uniform and associated with a mean free path of the cooling gas therein. The electrostatic chuck is permits a control of a backside pressure of a cooling gas within the plurality of gaps to thus control a heat transfer coefficient of the cooling gas. The plurality of protrusions further provide a uniform contact surface, wherein a contact conductivity between the plurality of protrusions and the substrate is controllable and significantly uniform across the substrate.
    • 本发明涉及一种用于夹持半导体衬底并控制与之相关的热传递的半导体处理装置和方法。 根据本发明的一个方面,公开了一种多极静电卡盘和相关方法,其提供跨越其表面的受控且均匀的传热系数。 多极静电卡盘包括具有限定间隙的多个突起的半导体平台,其中间隙的距离或深度是均匀的,并且与其中的冷却气体的平均自由路径相关联。 静电吸盘可以控制多个间隙内的冷却气体的背侧压力,从而控制冷却气体的传热系数。 多个突起还提供均匀的接触表面,其中多个突起和基底之间的接触导电性在基底上是可控的和显着均匀的。
    • 3. 发明授权
    • Method of making a MEMS electrostatic chuck
    • 制造MEMS静电卡盘的方法
    • US06946403B2
    • 2005-09-20
    • US10695153
    • 2003-10-28
    • Peter L. KellermanShu QinErnie AllenDouglas A. Brown
    • Peter L. KellermanShu QinErnie AllenDouglas A. Brown
    • H01L21/683H01L21/469
    • H01L21/6833
    • The present invention is directed to a method of forming a clamping plate for a multi-polar electrostatic chuck. The method comprises forming a first electrically conductive layer over a semiconductor platform and defining a plurality of portions of the first electrically conductive layer which are electrically isolated from one another. A first electrically insulative layer is formed over the first electrically conductive layer, the first electrically insulative layer comprising a top surface having a plurality of MEMS protrusions extending a first distance therefrom. A plurality of poles are furthermore electrically connected to the respective plurality of portions of the first electrically conductive layer, wherein a voltage applied between the plurality of poles is operable to induce an electrostatic force in the clamping plate.
    • 本发明涉及一种形成多极静电卡盘夹紧板的方法。 该方法包括在半导体平台上形成第一导电层,并且限定彼此电隔离的第一导电层的多个部分。 第一电绝缘层形成在第一导电层之上,第一电绝缘层包括具有从其延伸第一距离的多个MEMS突起的顶表面。 多个极还电连接到第一导电层的相应多个部分,其中施加在多个极之间的电压可操作以在夹持板中引起静电力。
    • 4. 发明授权
    • MEMS based contact conductivity electrostatic chuck
    • 基于MEMS的接触导电静电卡盘
    • US06905984B2
    • 2005-06-14
    • US10683679
    • 2003-10-10
    • Peter L. KellermanShu QinErnie AllenDouglas A. Brown
    • Peter L. KellermanShu QinErnie AllenDouglas A. Brown
    • H01L21/683H01L21/00
    • H01L21/6831Y10S438/964
    • The present invention is directed to a method for clamping and processing a semiconductor substrate using a semiconductor processing apparatus. According to one aspect of the present invention, a multi-polar electrostatic chuck and associated method is disclosed which provides heating or cooling of a substrate by thermal contact conduction between the electrostatic chuck and the substrate. The multi-polar electrostatic chuck includes a semiconductor platform having a plurality of protrusions that define gaps therebetween, wherein a surface roughness of the plurality of protrusions is less than 100 Angstroms. The electrostatic chuck further includes a voltage control system operable to control a voltage applied to the electrostatic chuck to thus control a contact heat transfer coefficient of the electrostatic chuck, wherein the heat transfer coefficient of the electrostatic chuck is primarily a function of a contact pressure between the substrate and the plurality of protrusions.
    • 本发明涉及使用半导体处理装置夹持和处理半导体衬底的方法。 根据本发明的一个方面,公开了一种多极静电卡盘和相关方法,其通过静电卡盘和基板之间的热接触传导来提供加热或冷却基板。 多极静电卡盘包括具有多个突起的半导体平台,所述突起在其间形成间隙,其中多个突起的表面粗糙度小于100埃。 静电卡盘还包括电压控制系统,其可操作以控制施加到静电卡盘的电压,从而控制静电卡盘的接触传热系数,其中静电卡盘的传热系数主要是介于静电卡盘之间的接触压力的函数 基板和多个突起。
    • 5. 发明授权
    • Social content management
    • 社会内容管理
    • US08903912B2
    • 2014-12-02
    • US13475496
    • 2012-05-18
    • Douglas A. Brown
    • Douglas A. Brown
    • G06F15/16G06Q50/00
    • G06Q50/01
    • A method includes, in a server residing in a network of interconnected computers, populating a repository with content, each one of the content categorized by at least one community designation, one topic designation, one tag and/or one company designation, receiving registration information for users, the registration information including a username and at least one community designation, one topic designation, one tag and/or one company designation, receiving content from a first user, the content including at least one community designation, one topic designation, one tag and/or one company designation, storing the received content in the repository, and notifying a subset of users of the received content, the community designation, topic designation, tag and/or company designation of each of the subset of users matching the community designation, topic designation, tag and/or company designation of received content.
    • 一种方法包括:在驻留在互连计算机网络中的服务器中,使用内容填充存储库,通过至少一个社区指定,一个主题标识,一个标签和/或一个公司标识分类的每个内容,接收注册信息 对于用户,注册信息包括从第一用户接收内容的用户名和至少一个社区指定,一个主题标识,一个标签和/或一个公司名称,所述内容包括至少一个社区指定,一个主题标识,一个 标签和/或一个公司名称,将接收到的内容存储在存储库中,以及通知与所述社区匹配的每个用户的所接收内容的用户的群体,社区指定,主题标识,标签和/或公司指定 指定,主题指定,标签和/或所接收内容的公司名称。
    • 7. 发明授权
    • Ion implanter having two-stage deceleration beamline
    • 离子注入机具有两级减速束线
    • US06998625B1
    • 2006-02-14
    • US09602059
    • 2000-06-23
    • Charles M. McKennaNicholas R. WhiteDouglas A. BrownEdward BellSvetlana Radovanov
    • Charles M. McKennaNicholas R. WhiteDouglas A. BrownEdward BellSvetlana Radovanov
    • G21K5/10H01J37/08
    • H01J37/3171H01J2237/0041H01J2237/022H01J2237/047H01J2237/31705
    • An ion implanter includes an ion source for generating an ion beam, an analyzer for separating unwanted components from the ion beam, a first beam transport device for transporting the ion beam through the analyzer at a first transport energy, a first deceleration stage positioned downstream of the analyzer for decelerating the ion beam from the first transport energy to a second transport energy, a beam filter positioned downstream of the first deceleration stage for separating neutral particles from the ion beam, a second beam transport device for transporting the ion beam through the beam filter at the second transport energy, a second deceleration stage positioned downstream of the beam filter for decelerating the ion beam from the second transport energy to a final energy, and a target site for supporting a target for ion implantation. The ion beam is delivered to the target site at the final energy. In a double deceleration mode, the second transport energy is greater than the final energy for highest current at low energy. In an enhanced drift mode, the second transport energy is equal to the final energy for highest beam purity at low energy.
    • 离子注入机包括用于产生离子束的离子源,用于从离子束分离不需要的组分的分析器,用于以第一输送能量输送离子束通过分析器的第一束输送装置,位于离子束下游的第一减速阶段 用于将离子束从第一输送能量减速到第二输送能量的分析器,位于第一减速阶段下游的用于从离子束分离中性粒子的光束过滤器,用于将离子束传送通过束 在所述第二输送能量下进行过滤,所述第二减速阶段位于所述束过滤器的下游,用于将所述离子束从所述第二输送能量减速到最终能量,以及用于支撑用于离子注入的靶的靶位点。 离子束以最终能量传递到目标位置。 在双重减速模式中,第二传输能量大于最低能量时的最终能量。 在增强的漂移模式中,第二传输能量等于在低能量下最高光束纯度的最终能量。