会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Method and system for performing shapes correction of a multi-cell reticle photomask design
    • 用于执行多单元掩模版光掩模设计的形状校正的方法和系统
    • US07302673B2
    • 2007-11-27
    • US11162586
    • 2005-09-15
    • Peter Anton HabitzDavid James HathawayJerry D. HayesAnthony D. PolsonTad Jeffrey Wilder
    • Peter Anton HabitzDavid James HathawayJerry D. HayesAnthony D. PolsonTad Jeffrey Wilder
    • G06F17/50
    • G03F1/36
    • A method for reticle design correction and electrical parameter extraction of a multi-cell reticle design. The method including: selecting a subset of cell designs of a multi-cell reticle design, each cell design of the subset of cell designs having a corresponding shape to process, for each cell design of the subset of cell designs determining a respective cell design location of the corresponding shape; determining a common shapes processing rule for all corresponding shapes of each cell design based on the respective cell design locations of each of the corresponding shapes; and performing shapes processing of the corresponding shape only of a single cell design of the subset of cell designs to generate resulting data for the subset of cell designs. Also a computer usable medium including computer readable program code having an algorithm adapted to implement the method for reticle design correction and electrical extraction.
    • 一种多光栅掩模版设计的掩模版设计校正和电参数提取的方法。 该方法包括:选择多小区掩模版设计的小区设计的子集,小区设计子集的每个小区设计具有相应的处理形状,用于确定相应小区设计位置的小区设计子集的每个小区设计 的相应形状; 基于每个相应形状的相应单元设计位置,确定每个单元设计的所有对应形状的共同形状处理规则; 以及仅对单元设计的子集的单个单元设计执行相应形状的形状处理,以生成用于所述单元设计的子集的结果数据。 还有一种包括计算机可读程序代码的计算机可用介质,其具有适于实现掩模版设计校正和电提取的方法的算法。