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1. 发明授权

US07050146B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07050146B2
公开(公告)日：2006-05-23
申请号：US10773461
申请日：2004-02-09
申请人： Paulus Cornelis Duineveld , Peter Dirksen , Aleksey Yurievich Kolesnychenko , Helmar Van Santen
发明人： Paulus Cornelis Duineveld , Peter Dirksen , Aleksey Yurievich Kolesnychenko , Helmar Van Santen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus includes a voltage generator or power source that applies a potential difference to an object in contact with the immersion liquid such that bubbles and/or particles in the immersion liquid are either attracted or repelled from that object due to the electrokinetic potential of the surface of the bubble in the immersion liquid.
摘要翻译：浸没式光刻设备包括电压发生器或电源，该电压发生器或电源对与浸入液体接触的物体施加电位差，使得浸没液体中的气泡和/或颗粒被吸引或排斥于该物体，这是由于电动势浸泡液中的气泡表面。

2. 再颁专利

USRE42849E1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：USRE42849E1
公开(公告)日：2011-10-18
申请号：US12153717
申请日：2008-05-22
申请人： Paulus Cornelis Duineveld , Peter Dirksen , Aleksey Yurievich Kolesnychenko , Helmar Van Santen
发明人： Paulus Cornelis Duineveld , Peter Dirksen , Aleksey Yurievich Kolesnychenko , Helmar Van Santen
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus includes a voltage generator or power source that applies a potential difference to an object in contact with the immersion liquid such that bubbles and/or particles in the immersion liquid are either attracted or repelled from that object due to the electrokinetic potential of the surface of the bubble in the immersion liquid.
摘要翻译：浸没式光刻设备包括电压发生器或电源，该电压发生器或电源对与浸入液体接触的物体施加电位差，使得浸没液体中的气泡和/或颗粒被吸引或排斥于该物体，这是由于电动势浸泡液中的气泡表面。

3. 发明申请

US20050174549A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050174549A1
公开(公告)日：2005-08-11
申请号：US10773461
申请日：2004-02-09
申请人： Paulus Duineveld , Peter Dirksen , Aleksey Kolesnychenko , Helmar Van Santen
发明人： Paulus Duineveld , Peter Dirksen , Aleksey Kolesnychenko , Helmar Van Santen
IPC分类号： H01L21/027 , G03F7/20 , G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus includes a voltage generator or power source that applies a potential difference to an object in contact with the immersion liquid such that bubbles and/or particles in the immersion liquid are either attracted or repelled from that object due to the electrokinetic potential of the surface of the bubble in the immersion liquid.
摘要翻译：浸没式光刻设备包括电压发生器或电源，该电压发生器或电源对与浸入液体接触的物体施加电位差，使得浸没液体中的气泡和/或颗粒被吸引或排斥于该物体，这是由于电动势浸泡液中的气泡表面。

4. 发明申请

US20140005521A1 CATHETER COMPRISING CAPACITIVE MICROMACHINED ULTRASONIC TRANSDUCERS WITH AN ADJUSTABLE FOCUS 有权
标题翻译：包含具有可调焦点的电容式微超声波超声波传感器的导管
公开(公告)号：US20140005521A1
公开(公告)日：2014-01-02
申请号：US13885791
申请日：2011-11-15
申请人： Max Oskar Köhler , Peter Dirksen , Shunmugavelu Sokka , Ronald Dekker
发明人： Max Oskar Köhler , Peter Dirksen , Shunmugavelu Sokka , Ronald Dekker
IPC分类号： A61N7/02 , A61B5/055 , A61B5/01 , A61B6/00 , A61B8/12 , A61B8/00 , A61B5/00 , A61B6/03
CPC分类号： A61B5/015 , A61B5/055 , A61B5/064 , A61B5/4836 , A61B6/03 , A61B6/12 , A61B6/4057 , A61B8/0841 , A61B8/12 , A61B8/445 , A61B8/4488 , A61B8/54 , A61B8/58 , A61B2018/00023 , A61B2090/064 , A61B2090/374 , A61B2562/028 , A61N7/022 , A61N2007/0095 , B06B1/0292 , G06F19/00
摘要： A catheter (700, 800, 1206) comprising: a shaft with distal (808, 906, 1004, 208) and proximal ends (1006),wherein the distal end comprises at least one array of capacitive micromachined ultrasound transducers (308, 402, 404, 500, 512, 600, 604, 802, 008) with an adjustable focus for controllably heating a target zone (806, 1014, 1210); and a connector (1012) at the proximal end for supplying the at least one array of capacitive micromachined ultrasound transducers with electrical power and for controlling the adjustable focus.
摘要翻译：导管（700,800,1206）包括：具有远端（808,906,1004,208）和近端（1006）的轴，其中所述远端包括至少一个电容微加工超声换能器阵列（308,402，具有可调焦点，用于可控制地加热目标区域（806,104,1210）; 以及在所述近端处的用于向所述至少一个电容微加工超声换能器阵列供电并用于控制所述可调焦点的连接器（1012）。

5. 发明授权

US08343424B2 Analysis device with an array of focusing microstructures 有权
标题翻译：具有聚焦微结构阵列的分析装置
公开(公告)号：US08343424B2
公开(公告)日：2013-01-01
申请号：US12097082
申请日：2006-12-15
申请人： Peter Dirksen , Yuri Aksenov , Fredericus Christiaan Van Den Heuvel , Johannes Arnoldus Jacobus Maria Kwinten
发明人： Peter Dirksen , Yuri Aksenov , Fredericus Christiaan Van Den Heuvel , Johannes Arnoldus Jacobus Maria Kwinten
IPC分类号： G01N21/01
CPC分类号： G03F7/70616 , B01L3/502707 , B01L2200/12 , B01L2300/0654 , B01L2300/0819 , G03F7/70608 , G03F9/7011 , G03F9/7019 , G03F9/7076 , G06F3/016 , G11C16/16
摘要： A device includes first and second material facing towards each other as to form at least one focusing microstructure with a focal point located outside of the first material.
摘要翻译：一种装置包括朝向彼此的第一和第二材料，以形成至少一个聚焦微结构，焦点位于第一材料的外侧。

6. 发明授权

US08148052B2 Double patterning for lithography to increase feature spatial density 有权
标题翻译：用于光刻的双重图案化以增加特征空间密度
公开(公告)号：US08148052B2
公开(公告)日：2012-04-03
申请号：US12514777
申请日：2007-11-13
申请人： Anja Monique Vanleenhove , Peter Dirksen , David Van Steenwinckel , Gerben Doornbos , Casper Juffermans , Mark Van Dal
发明人： Anja Monique Vanleenhove , Peter Dirksen , David Van Steenwinckel , Gerben Doornbos , Casper Juffermans , Mark Van Dal
IPC分类号： G03F7/26
CPC分类号： G03F7/0035 , G03F7/11 , H01L21/0271 , H01L21/0273 , H01L21/823821 , H01L29/66795 , H01L29/6681 , H01L29/785
摘要： A method of forming a pattern in at least one device layer in or on a substrate comprises: coating the device layer with a first photoresist layer; exposing the first photoresist using a first mask; developing the first photoresist layer to form a first pattern on the substrate; coating the substrate with a protection layer; treating the protection layer to cause a change therein where it is in contact with the first photoresist, to render the changed protection layer substantially immune to a subsequent exposure and/or developing step; coating the substrate with a second photoresist layer; exposing the second photoresist layer using a second mask; and developing the second photoresist layer to form a second pattern on the substrate without significantly affecting the first pattern in the first photoresist layer, wherein the first and second patterns together define interspersed features having a spatial frequency greater than that of the features defined in each of the first and second patterns separately. The process has particular utility in defining source, drain and fin features of finFET devices with a smaller feature size than otherwise achievable with the prevailing lithography tools.
摘要翻译：在衬底中或衬底上的至少一个器件层中形成图案的方法包括：用第一光致抗蚀剂层涂覆器件层; 使用第一掩模曝光第一光致抗蚀剂; 显影第一光致抗蚀剂层以在基底上形成第一图案; 用保护层涂覆基板; 处理保护层以在其中与第一光致抗蚀剂接触的地方发生变化，使得改变的保护层基本上不受随后的曝光和/或显影步骤的影响; 用第二光致抗蚀剂层涂覆基板; 使用第二掩模曝光所述第二光致抗蚀剂层; 并且显影所述第二光致抗蚀剂层以在所述基板上形成第二图案，而不会显着影响所述第一光致抗蚀剂层中的所述第一图案，其中所述第一和第二图案一起限定散布特征，其空间频率大于第一和第二模式分开。该方法在定义具有较小的特征尺寸的finFET器件的源极，漏极和鳍片特征方面具有特别的用途，而与主要的光刻工具不同。

7. 发明申请

US20120039522A1 MASK INSPECTION APPARATUS AND METHOD 审中-公开
标题翻译：屏蔽检查装置和方法
公开(公告)号：US20120039522A1
公开(公告)日：2012-02-16
申请号：US10597615
申请日：2005-02-02
申请人： Peter Dirksen , Thomas Steffen
发明人： Peter Dirksen , Thomas Steffen
IPC分类号： G06K9/00
CPC分类号： G03F1/84 , G03F1/44
摘要： Apparatus for optical inspection of an object, comprising: an optical imaging system (5) for generating an actual image of the real object, a calculation unit (12) for calculating an estimated image of an object of desired shape in respect of a known aberration coefficient of the optical imaging system, an image analysis unit (13) for detecting differences between the actual image and the image calculated by the calculation unit (12).
摘要翻译：一种用于物体光学检测的装置，包括：用于产生实际物体的实际图像的光学成像系统（5），用于计算已知像差的所需形状的物体的估计图像的计算单元（12）光学成像系统的系数，用于检测由计算单元（12）计算出的实际图像和图像之间的差异的图像分析单元（13）。

8. 发明申请

US20110003614A1 PROXIMITY SENSOR, IN PARTICULAR MICROPHONE FOR RECEPTION OF SOUND SIGNALS IN THE HUMAN AUDIBLE SOUND RANGE, WITH ULTRASONIC PROXIMITY ESTIMATION 有权
标题翻译：接近传感器，用于接收人声可听声音范围内的声音信号的特殊麦克风，具有超声逼近估计
公开(公告)号：US20110003614A1
公开(公告)日：2011-01-06
申请号：US12828482
申请日：2010-07-01
申请人： Geert Langereis , Twan van Lippen , Peter Dirksen , Frank Pasveer
发明人： Geert Langereis , Twan van Lippen , Peter Dirksen , Frank Pasveer
IPC分类号： H04R29/00 , H04W88/02
CPC分类号： H04R19/005 , G01S15/06 , G01S15/876 , H03K17/94 , H03K2217/94005 , H04M1/6016 , H04M1/72569 , H04R19/04 , H04R2400/01
摘要： Proximity sensor, particularly for usage in an electronic mobile device, comprising at least one acoustic transducer adapted for receiving acoustic signals at least in parts of the frequency range of human audible sound and emitting and/or receiving ultrasonic signals for proximity estimation. The acoustic transducer preferably is a Micro-Electro-Mechanical-Systems (MEMS) microphone. Further, a method in an electronic device comprising an acoustic transducer is provided comprising the steps of generating at least one electric signal in the frequency range of ultrasonic sound, emitting at least one ultrasonic signal by means of the acoustic transducer; receiving at least one ultrasonic signal by means of the acoustic transducer; deducing from the at least one emitted ultrasonic signal and the at least one received ultrasonic signal at least the delay between emission of the emitted ultrasonic signal and reception of the corresponding ultrasonic signal.
摘要翻译：特别是用于电子移动设备的接近传感器，包括至少一个声学传感器，适于在至少部分人类可听见的声音的频率范围内接收声学信号，并发射和/或接收用于邻近估计的超声波信号。声换能器优选地是微机电系统（MEMS）麦克风。此外，提供了一种包括声换能器的电子设备中的方法，包括以下步骤：在超声波的频率范围内产生至少一个电信号，借助于声换能器发射至少一个超声波信号; 通过声换能器接收至少一个超声波信号; 从所述至少一个发射的超声波信号和所述至少一个接收到的超声波信号中减去所发射的超声信号的发射与对应的超声波信号的接收之间的延迟。

9. 发明申请

US20100215273A1 METHODS AND DEVICES FOR CHARACTERIZING POLARIZATION OF ILLUMINATION SYSTEM 审中-公开
标题翻译：用于表征照明系统极化的方法和装置
公开(公告)号：US20100215273A1
公开(公告)日：2010-08-26
申请号：US11993063
申请日：2006-06-20
申请人： Yuri Aksenov , Peter Dirksen , Peter Zandbergen , Michael Benndorf , David Van Steenwinckle
发明人： Yuri Aksenov , Peter Dirksen , Peter Zandbergen , Michael Benndorf , David Van Steenwinckle
IPC分类号： G06K9/46
CPC分类号： G03F7/7085 , G03F1/44 , G03F7/70058 , G03F7/70566
摘要： In a method for evaluating the polarization state of an illumination system (52) in an optical system (50), a mask (56) is provided in the optical system (50) such that an illumination beam incident on the mask (56) is adapted such as to substantially differently diffract incident components of a light beam having different polarization states. An image of the mask (56) is then obtained, using an illumination beam of the illumination system (52) of the optical system (50). The obtained image, being either an intensity plot or a structure created in a resist layer by exposing the resist layer with the image of the mask (56), is then used to extract polarization related information about the illumination system (52). The image used for evaluating may be a diffraction image of the mask.
摘要翻译：在用于评估光学系统（50）中的照明系统（52）的偏振状态的方法中，在光学系统（50）中设置掩模（56），使得入射在掩模（56）上的照明光束是适于使得具有不同极化状态的光束的入射分量基本不同的衍射。然后使用光学系统（50）的照明系统（52）的照明光束获得掩模（56）的图像。所获得的图像是强度图或通过用掩模（56）的图像曝光抗蚀剂层在抗蚀剂层中产生的结构，然后用于提取关于照明系统（52）的偏振相关信息。用于评估的图像可以是掩模的衍射图像。

10. 发明授权

US07423739B2 Method of and system for determining the aberration of an imaging system test object and detector for use with the method 失效
标题翻译：用于确定用于该方法的成像系统测试对象和检测器的像差的方法和系统
公开(公告)号：US07423739B2
公开(公告)日：2008-09-09
申请号：US10499271
申请日：2002-05-03
申请人： Peter Dirksen , Casparus Anthonius Henricus Juffermans , Augustus Josephus Elizabeth Maria Janssen
发明人： Peter Dirksen , Casparus Anthonius Henricus Juffermans , Augustus Josephus Elizabeth Maria Janssen
IPC分类号： G01J1/00
CPC分类号： G03F7/706 , G03F7/7085
摘要： For determining aberrations of an optical imaging system (PL), a test object (12,14) comprising at least one delta test feature (10) is imaged either on an aerial scanning detector (110) or in a resist layer (71), which layer is scanned by a scanning device, for example a SEM. A new analytical method is used to retrieve from the data stream generated by the aerial detector or the scanning device different Zernike coefficients (Zn).
摘要翻译：为了确定光学成像系统（PL）的像差，包括至少一个δ测试特征（10）的测试对象（12,14）在空中扫描检测器（110）或抗蚀剂层（71）中成像，哪个层被扫描装置扫描，例如SEM。使用新的分析方法从天线检测器或扫描装置生成的数据流中检索不同的泽尼克系数（Zn）。

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