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1. 发明授权

US4550411A Sources used in molecular beam epitaxy 失效
标题翻译：用于分子束外延的源
公开(公告)号：US4550411A
公开(公告)日：1985-10-29
申请号：US502628
申请日：1983-06-09
申请人： Paul R. Stonestreet , David Williams , Kenneth Anderson , Peter J. L. Butcher
发明人： Paul R. Stonestreet , David Williams , Kenneth Anderson , Peter J. L. Butcher
IPC分类号： C30B23/06 , H05B3/02
CPC分类号： C30B23/066
摘要： A molecular or atomic beam source for use in molecular beam epitaxy comprises a hollow cylindrical crucible, preferably made of boron nitride, which is heated by an electric current passed through a plurality of very thin elongate metal strips disposed outside of and spaced apart from said crucible and mounted parallel to its axis. In order to maintain the strips in the correct position irrespective of temperature, they may be mounted on springs at each end, but preferably they are made in self supporting pairs linked at the open end of the crucible and mounted on brackets at the other end. The thin strips can be made self supporting by folding along lines parallel to their long axis in a variety of ways. They are arranged to present a large surface area to the crucible which ensures efficient heating and increases the maximum operating temperature of the source. The links between strips at the open end of the crucible can be made from the same material as the strips so that they provide additional heat at the open end of the crucible. This allows the crucible to be operated at higher temperatures than conventional sources and permits higher intensity molecular beams to be produced with true Knusden type evaporation. Therefore the source can also be used to produce beams from high melting point materials such as iron and silicon, as well as more usual materials such as galium, arsenic and phosphorus.
摘要翻译：用于分子束外延的分子或原子束源包括优选由氮化硼制成的中空圆柱形坩埚，其由通过多个非常薄的细长金属条的电流加热，所述细长金属条布置在所述坩埚之外并与所述坩埚间隔开并平行于其轴线安装。为了将条带保持在正确的位置而不管温度如何，它们可以安装在每个端部的弹簧上，但是优选地，它们被制成在坩埚的开口端处连接的自支撑对，并且在另一端安装在支架上。通过以各种方式沿平行于其长轴的线折叠，可以使细条自我支撑。它们被布置为向坩埚呈现大的表面积，这确保了有效的加热并且增加了源的最大工作温度。在坩埚的开口端处的条带之间的连接可以由与条状物相同的材料制成，使得它们在坩埚的开口端提供额外的热量。这允许坩埚在比常规源更高的温度下操作，并且允许使用真正的Knusden型蒸发来产生更高强度的分子束。因此，源也可以用于从诸如铁和硅的高熔点材料以及更常见的材料如镓，砷和磷生产束。

2. 发明授权

US5026454A Vacuum evaporation and deposition 失效
标题翻译：真空蒸发和沉积
公开(公告)号：US5026454A
公开(公告)日：1991-06-25
申请号：US269570
申请日：1988-11-10
申请人： John J. Parmenter , Robert B. Phillips , Paul R. Stonestreet
发明人： John J. Parmenter , Robert B. Phillips , Paul R. Stonestreet
IPC分类号： C23C14/24 , C23C14/54
CPC分类号： C23C14/24 , C23C14/54
摘要： Method and apparatus for the deposition of material onto a substrate, the method comprising evaporating material from a source, controlling the dosage of material at the substrate by moving a shutter between an open position and a closed position, with a closing step comprising beginning to decelerate said shutter before reaching the closed position, subsequently thereby bringing the shutter substantially to rest at the closed position. Preferably the motion of the shutter is substantially harmonic with the acceleration of the shutter being directed towards, and proportional to the distance of the shutter from, the point mid-way between the open and closed positions. Contamination is reduced from prior methods and the invention is especially advantageous in molecular beam epitaxy.
摘要翻译：用于将材料沉积到基底上的方法和装置，所述方法包括从源蒸发材料，通过在打开位置和关闭位置之间移动快门来控制所述基板上的材料的剂量，封闭步骤包括开始减速所述快门在到达关闭位置之前，随后使快门基本上停在关闭位置。优选地，快门的运动基本上是谐波的，而快门的加速度被指向并且与打开和关闭位置之间的中点处的快门的距离成比例。污染从现有方法中减少，本发明在分子束外延中是特别有利的。

3. 发明授权

US4945774A Sample treatment apparatus 失效
标题翻译：样品处理装置
公开(公告)号：US4945774A
公开(公告)日：1990-08-07
申请号：US283623
申请日：1988-12-13
申请人： Nigel W. Beard , Robert B. Phillips , Paul R. Stonestreet
发明人： Nigel W. Beard , Robert B. Phillips , Paul R. Stonestreet
IPC分类号： C23C14/50 , C30B23/02 , C30B35/00 , H01L21/00
CPC分类号： H01L21/67115 , C23C14/505 , C30B23/02 , C30B35/005
摘要： An apparatus for the treatment of a sample in a vacuum enclosure having a wall on which a vacuum-tight feedthrough is mounted; the sample being supported on an elongate hollow rotor rotatable about an axis and disposed within the vacuum enclosure, the sample having a front face which is to be treated and also having a rear face; energy conducting means passing from the feedthrough towards the rear face of the sample through the rotor; inner magnet field generator(s) affixed to the rotor; outer magnet field generator(s) mounted to rotate outside of the vacuum enclosure about the axis, the outer magnetic field generator(s) being magnetically coupled to the inner magnet field generator(s), and thereby capable of causing the inner magnet field generator(s) and the rotor to rotate about their common axis; and a source for directing material or radiation at the front face.
摘要翻译：一种用于在真空封壳中处理样品的装置，其具有安装有真空密封馈通的壁; 所述样品被支撑在可围绕轴线旋转并且设置在所述真空外壳内的细长中空转子上，所述样品具有待被处理的前表面并且还具有后表面; 能量传导装置通过转子从馈通件穿过样品的后表面; 内磁场发生器固定在转子上; 外磁场发生器安装成围绕轴线旋转到真空外壳外部，外磁场发生器磁耦合到内磁场发生器，从而能够使内磁场发生器并且转子围绕它们的共同轴线旋转; 以及用于在前表面引导材料或辐射的源。

4. 发明授权

US4889319A Bakeable vacuum systems 失效
标题翻译：可烘烤真空系统
公开(公告)号：US4889319A
公开(公告)日：1989-12-26
申请号：US202692
申请日：1988-06-03
申请人： Robert B. Phillips , Paul R. Stonestreet
发明人： Robert B. Phillips , Paul R. Stonestreet
IPC分类号： F04B37/16 , C30B23/02 , C30B23/08 , F16J15/10 , H01L21/00 , H01L21/203
CPC分类号： H01L21/67126 , C30B23/02 , F16J15/104 , H01L21/67115 , Y10S277/913 , Y10S277/933
摘要： An apparatus and method providing a bakeable sealing means for a vacuum system, and thereby an improved bakeable ultra-high vacuum system; the apparatus comprising: a first sealing element composed substantially of an elastomeric material; a second sealing element comprising PTFE; and means for engaging the first sealing element with the second sealing element and for compressing the first sealing element; as for example in an improved bakeable seal between a first and a second flange, or in a gate valve, or a vacuum chamber entry lock.

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