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1. 发明申请

US20080081385A1 METHODS AND SYSTEMS FOR INSPECTION OF WAFERS AND RETICLES USING DESIGNER INTENT DATA 审中-公开
标题翻译：使用设计者信息数据检查波形和反射的方法和系统
公开(公告)号：US20080081385A1
公开(公告)日：2008-04-03
申请号：US11939983
申请日：2007-11-14
申请人： Paul Marella , Sharon McCauley , Ellis Chang , William Volk , James Wiley , Sterling Watson , Sagar Kekare , Carl Hess
发明人： Paul Marella , Sharon McCauley , Ellis Chang , William Volk , James Wiley , Sterling Watson , Sagar Kekare , Carl Hess
IPC分类号： H01L21/66
CPC分类号： G06T7/0006 , G01N21/9501 , G01N21/956 , G01N2021/95676 , G03F1/84 , G03F7/7065 , G06T7/0008 , G06T2207/30148
摘要： Methods and systems for inspection of wafers and reticles using designer intent data are provided. One computer-implemented method includes identifying nuisance defects on a wafer based on inspection data produced by inspection of a reticle, which is used to form a pattern on the wafer prior to inspection of the wafer. Another computer-implemented method includes detecting defects on a wafer by analyzing data generated by inspection of the wafer in combination with data representative of a reticle, which includes designations identifying different types of portions of the reticle. An additional computer-implemented method includes determining a property of a manufacturing process used to process a wafer based on defects that alter a characteristic of a device formed on the wafer. Further computer-implemented methods include altering or simulating one or more characteristics of a design of an integrated circuit based on data generated by inspection of a wafer.
摘要翻译：提供了使用设计人员意图数据检查晶圆和标线的方法和系统。一种计算机实现的方法包括基于通过检查光罩产生的检查数据来识别晶片上的有害缺陷，其用于在晶片检查之前在晶片上形成图案。另一种计算机实现的方法包括通过分析通过检查晶片产生的数据来结合表示标线的数据来检测晶片上的缺陷，该数据包括标识掩模版的不同类型的部分的标记。附加的计算机实现的方法包括基于改变晶片上形成的器件的特性的缺陷来确定用于处理晶片的制造工艺的特性。进一步的计算机实现的方法包括基于通过检查晶片产生的数据来改变或模拟集成电路的设计的一个或多个特性。

2. 发明申请

US20050004774A1 Methods and systems for inspection of wafers and reticles using designer intent data 有权
标题翻译：使用设计人员意图数据检查晶圆和标线片的方法和系统
公开(公告)号：US20050004774A1
公开(公告)日：2005-01-06
申请号：US10883372
申请日：2004-07-01
申请人： William Volk , James Wiley , Sterling Watson , Sagar Kekare , Carl Hess , Paul Marella , Sharon McCauley , Ellis Chang
发明人： William Volk , James Wiley , Sterling Watson , Sagar Kekare , Carl Hess , Paul Marella , Sharon McCauley , Ellis Chang
IPC分类号： G01N21/95 , G03F1/44 , G03F7/20 , G01N21/00
CPC分类号： G06T7/0006 , G01N21/9501 , G01N21/956 , G01N2021/95676 , G03F1/84 , G03F7/7065 , G06T7/0008 , G06T2207/30148
摘要： Methods and systems for inspection of wafers and reticles using designer intent data are provided. One computer-implemented method includes identifying nuisance defects on a wafer based on inspection data produced by inspection of a reticle, which is used to form a pattern on the wafer prior to inspection of the wafer. Another computer-implemented method includes detecting defects on a wafer by analyzing data generated by inspection of the wafer in combination with data representative of a reticle, which includes designations identifying different types of portions of the reticle. An additional computer-implemented method includes determining a property of a manufacturing process used to process a wafer based on defects that alter a characteristic of a device formed on the wafer. Further computer-implemented methods include altering or simulating one or more characteristics of a design of an integrated circuit based on data generated by inspection of a wafer.
摘要翻译：提供了使用设计人员意图数据检查晶圆和标线的方法和系统。一种计算机实现的方法包括基于通过检查光罩产生的检查数据来识别晶片上的有害缺陷，其用于在晶片检查之前在晶片上形成图案。另一种计算机实现的方法包括通过分析通过检查晶片产生的数据来结合表示标线的数据来检测晶片上的缺陷，该数据包括标识掩模版的不同类型的部分的标记。附加的计算机实现的方法包括基于改变晶片上形成的器件的特性的缺陷来确定用于处理晶片的制造工艺的特性。进一步的计算机实现的方法包括基于通过检查晶片产生的数据来改变或模拟集成电路的设计的一个或多个特性。

3. 发明授权

US09002497B2 Methods and systems for inspection of wafers and reticles using designer intent data 有权
标题翻译：使用设计人员意图数据检查晶圆和标线片的方法和系统
公开(公告)号：US09002497B2
公开(公告)日：2015-04-07
申请号：US10883372
申请日：2004-07-01
申请人： William Volk , James Wiley , Sterling Watson , Sagar A. Kekare , Carl Hess , Paul Frank Marella , Sharon McCauley , Ellis Chang
发明人： William Volk , James Wiley , Sterling Watson , Sagar A. Kekare , Carl Hess , Paul Frank Marella , Sharon McCauley , Ellis Chang
IPC分类号： G06F19/00 , G03F1/84 , G01N21/95 , G01N21/956 , G03F7/20
CPC分类号： G06T7/0006 , G01N21/9501 , G01N21/956 , G01N2021/95676 , G03F1/84 , G03F7/7065 , G06T7/0008 , G06T2207/30148
摘要： Methods and systems for inspection of wafers and reticles using designer intent data are provided. One computer-implemented method includes identifying nuisance defects on a wafer based on inspection data produced by inspection of a reticle, which is used to form a pattern on the wafer prior to inspection of the wafer. Another computer-implemented method includes detecting defects on a wafer by analyzing data generated by inspection of the wafer in combination with data representative of a reticle, which includes designations identifying different types of portions of the reticle. An additional computer-implemented method includes determining a property of a manufacturing process used to process a wafer based on defects that alter a characteristic of a device formed on the wafer. Further computer-implemented methods include altering or simulating one or more characteristics of a design of an integrated circuit based on data generated by inspection of a wafer.
摘要翻译：提供了使用设计人员意图数据检查晶圆和标线的方法和系统。一种计算机实现的方法包括基于通过检查光罩产生的检查数据来识别晶片上的有害缺陷，其用于在晶片检查之前在晶片上形成图案。另一种计算机实现的方法包括通过分析通过检查晶片产生的数据来结合表示标线的数据来检测晶片上的缺陷，该数据包括标识掩模版的不同类型的部分的标记。附加的计算机实现的方法包括基于改变晶片上形成的器件的特性的缺陷来确定用于处理晶片的制造工艺的特性。进一步的计算机实现的方法包括基于通过检查晶片产生的数据来改变或模拟集成电路的设计的一个或多个特性。

4. 发明授权

US08102408B2 Computer-implemented methods and systems for determining different process windows for a wafer printing process for different reticle designs 有权
标题翻译：用于确定用于不同掩模版设计的晶片印刷工艺的不同工艺窗口的计算机实现的方法和系统
公开(公告)号：US08102408B2
公开(公告)日：2012-01-24
申请号：US11770437
申请日：2007-06-28
申请人： Gaurav Verma , Bo Su , William Volk , Harold Lehon , Carl Hess
发明人： Gaurav Verma , Bo Su , William Volk , Harold Lehon , Carl Hess
IPC分类号： H04N7/18
CPC分类号： G03F1/84
摘要： Computer-implemented methods and systems for determining different process windows for a wafer printing process for different reticle designs are provided. One method includes generating simulated images illustrating how each of the different reticle designs will be printed on a wafer at different values of one or more parameters of the wafer printing process. The method also includes detecting defects in each of the different reticle designs using the simulated images. In addition, the method includes determining a process window for the wafer printing process for each of the different reticle designs based on results of the detecting step.
摘要翻译：提供了用于确定用于不同掩模版设计的晶片印刷工艺的不同工艺窗口的计算机实现的方法和系统。一种方法包括产生模拟图像，其示出了在晶片印刷过程的一个或多个参数的不同值下每个不同的标线设计将如何印刷在晶片上。该方法还包括使用模拟图像检测每个不同标线设计中的缺陷。此外，该方法包括基于检测步骤的结果确定用于每个不同掩模版设计的晶片印刷处理的处理窗口。

5. 发明申请

US20080072207A1 COMPUTER-IMPLEMENTED METHODS AND SYSTEMS FOR DETERMINING DIFFERENT PROCESS WINDOWS FOR A WAFER PRINTING PROCESS FOR DIFFERENT RETICLE DESIGNS 有权
标题翻译：用于确定不同过程窗口的计算机实现方法和系统，用于不同设计的WAFER打印过程
公开(公告)号：US20080072207A1
公开(公告)日：2008-03-20
申请号：US11770437
申请日：2007-06-28
申请人： Gaurav Verma , Bo Su , William Volk , Harold Lehon , Carl Hess
发明人： Gaurav Verma , Bo Su , William Volk , Harold Lehon , Carl Hess
IPC分类号： G06F17/50
CPC分类号： G03F1/84
摘要： Computer-implemented methods and systems for determining different process windows for a wafer printing process for different reticle designs are provided. One method includes generating simulated images illustrating how each of the different reticle designs will be printed on a wafer at different values of one or more parameters of the wafer printing process. The method also includes detecting defects in each of the different reticle designs using the simulated images. In addition, the method includes determining a process window for the wafer printing process for each of the different reticle designs based on results of the detecting step.
摘要翻译：提供了用于确定用于不同掩模版设计的晶片印刷工艺的不同工艺窗口的计算机实现的方法和系统。一种方法包括产生模拟图像，其示出了在晶片印刷过程的一个或多个参数的不同值下每个不同的标线设计将如何印刷在晶片上。该方法还包括使用模拟图像检测每个不同标线设计中的缺陷。此外，该方法包括基于检测步骤的结果确定用于每个不同掩模版设计的晶片印刷处理的处理窗口。

6. 发明授权

US3944413A Direct reduction of metallic oxides 失效
标题翻译：直接还原金属氧化物
公开(公告)号：US3944413A
公开(公告)日：1976-03-16
申请号：US506306
申请日：1974-09-16
申请人： William Volk
发明人： William Volk
IPC分类号： C21B13/00 , C21B13/02
CPC分类号： C21B13/0033 , Y02P10/136 , Y10S75/961 , Y10S75/962
摘要： The capacity and effectiveness of a fluidized multi-bed process for the direct reduction of broad size-range metallic oxides, such as ion oxide particles, can be materially improved by feeding the large-size particles into the uppermost zone and the fine-particle material such as bag dust to the lowest zone of a multiple bed reducer. The larger particles in the upper zones tend to restrain the fine particles from being carried out of the reducer by upwardly flowing reducing gas. In the lower zone location, complete reduction of the fine oxide particles is much more effective, as the reaction is initiated by the fresh reducing gas, which is normally high purity hydrogen.
摘要翻译：用于直接还原宽尺寸范围金属氧化物如离子氧化物颗粒的流化多床方法的能力和有效性可以通过将大尺寸颗粒进料到最上面的区域和细颗粒材料如袋尘至多床减速机的最低区域。上部区域中较大的颗粒倾向于通过向上流动的还原气体来抑制细颗粒从还原剂中进行。在较低的区域位置，氧化物微粒的完全还原更有效，因为反应是由新鲜的还原气体引起的，新鲜的还原气体通常是高纯度的氢气。

7. 发明授权

US07604906B1 Films for prevention of crystal growth on fused silica substrates for semiconductor lithography 失效
标题翻译：用于半导体光刻的熔融二氧化硅衬底上的晶体生长预防膜
公开(公告)号：US07604906B1
公开(公告)日：2009-10-20
申请号：US11231550
申请日：2005-09-21
申请人： William Volk , Ben Eynon , Brian Grenon
发明人： William Volk , Ben Eynon , Brian Grenon
IPC分类号： G03F1/00
CPC分类号： G03F1/48 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Photolithography masks, systems and methods and more particularly to photolithography masks systems and methods for making and using silicon dioxide mask substrates are disclosed. The mask generally includes a silicon-dioxide mask substrate having a front surface, a patterned layer disposed on the front surface, and a coating of a fluoride of an element of group IIA that covers the patterned layer. The coating reduces undesired crystal growth on the silicon dioxide mask substrate. Such masks can be incorporated into photolithography systems and used in photolithography methods wherein a layer of photoresist is formed on a substrate and to radiation that impinges on the mask. Such a mask can be fabricated, e.g., by forming a patterned layer on a front surface of a silicon dioxide mask substrate and covering the patterned layer with a coating of a fluoride of an element of group IIA.
摘要翻译：公开了光刻掩模，系统和方法，更具体地涉及用于制造和使用二氧化硅掩模基板的光刻掩模系统和方法。掩模通常包括具有前表面的二氧化硅掩模基底，设置在前表面上的图案化层和覆盖图案化层的IIA族元素的氟化物涂层。涂层减少二氧化硅掩模基底上的不希望的晶体生长。这样的掩模可以结合到光刻系统中并且用于光刻法中，其中光致抗蚀剂层形成在基底上并且辐射照射在掩模上。这样的掩模可以例如通过在二氧化硅掩模基板的前表面上形成图案化层并且用IIA族元素的氟化物的涂层覆盖图案化层来制造。

8. 发明授权

US3985516A Coal drying and passivation process 失效
标题翻译：煤干燥和钝化过程
公开(公告)号：US3985516A
公开(公告)日：1976-10-12
申请号：US606256
申请日：1975-08-20
申请人： Clarence A. Johnson , William Volk
发明人： Clarence A. Johnson , William Volk
IPC分类号： C10L9/10 , C10L9/00 , F26B3/08
CPC分类号： C10L9/10
摘要： Low rank coals such as subbituminous or lignites containing more than about 10 wt. % moisture are first dried and then passed to a fluidized bed where the coal is passivated against reabsorption of moisture by coating the warm coal particles with a heavy liquid hydrocarbon material. Such coating substantially prevents the reabsorption of moisture in the coal, and thereby prevents autogenous heating and possible spontaneous ignition during subsequent transportation or storage of the passivated coal.
摘要翻译：低级煤，如含有大于约10重量％的次烟或褐煤。首先干燥％的水分，然后通过流化床，其中通过用重的液体烃材料涂覆温煤颗粒来钝化煤而不再吸收水分。这种涂层基本上防止煤中的水分的再吸收，从而防止在随后的钝化煤的运输或储存期间的自发加热和可能的自发点燃。

9. 发明申请

US20070294177A1 Mobile content publishing system and method 审中-公开
标题翻译：移动内容发布系统和方法
公开(公告)号：US20070294177A1
公开(公告)日：2007-12-20
申请号：US11454763
申请日：2006-06-15
申请人： William Volk , Keith Arem , Sherri Cuono
发明人： William Volk , Keith Arem , Sherri Cuono
IPC分类号： G06Q99/00
CPC分类号： G06Q30/06
摘要： A mobile content publishing system and method. Enables creation, edit, upload, distribution and sale of ring tones, ringback tones, text, pictures, video or any other mobile content including music. Enables conversion of file formats depending on the playback device. Billing is performed for the creating user automatically. Users may sell and display content without dealing with the complexities of content formatting or billing. The system may also use a website with m-commerce capabilities that allows multiple consumers to purchase content. Editors such as a mixer may be used in one or more embodiments of the invention to create music or ring tones and ringback tones that are then uploaded to a publishing interface such as an e-commerce market for sale. The market may allow for revenue sharing between the market owner, the creator of the content or any other party involved in the distribution of media content.
摘要翻译：一种移动内容发布系统和方法。启用铃声，回铃音，文字，图片，视频或任何其他移动内容（包括音乐）的创建，编辑，上传，分发和销售。根据播放设备启用文件格式的转换。自动为创建用户执行计费。用户可以在不处理内容格式或计费的复杂性的情况下出售和显示内容。该系统还可以使用具有允许多个消费者购买内容的移动商务功能的网站。可以在本发明的一个或多个实施例中使用诸如混音器的编辑器来创建音乐或铃声和回铃音，然后上传到出版界面，例如电子商务市场以供销售。市场可能允许市场所有者，内容的创建者或媒体内容分发中涉及的任何其他方之间的收入分享。

10. 发明申请

US20070212185A1 "B" Hook Retainer for Railcar Anchor and Load Snugger Arrangement for Securing Cargo 有权
标题翻译： “B”用于固定货物的轨道车锚和负载锚定装置的钩保持器
公开(公告)号：US20070212185A1
公开(公告)日：2007-09-13
申请号：US11463704
申请日：2006-08-10
申请人： John Frett , William Volk , John Brewster
发明人： John Frett , William Volk , John Brewster
IPC分类号： B61D45/00
CPC分类号： B61D45/001 , B60P7/0807 , B60P7/0823 , B60P7/12
摘要： A B-hook retainer shaped and configured so as to maintain retention of B-hook hardware in a shaped aperture that secures various and multiple types of lading tie straps and strap hardware comprising of straps of woven webbing. The lading tie strap being held in place by the appropriate B-hook provision and the said anchor being contained within a pocket in the wall or floor of railway box or flat car. Various industry lading tie straps with said B-hook already in use are allowed to be connected to the shaped aperture anchor. An appropriate ratchet inherent to the specific type of tie strap being used is operated to remove any remaining slack in the lading ties and then apply the desired tension thereon to secure the lading to the railway car. If slack develops in the lading ties due to transport load shifting the B-hook retainer will prevent inadvertent removal of the B-hook from the shaped aperture resulting in lading tie strap no longer securing the lading to the railway car.
摘要翻译：一种B形钩保持器，其形状和构造为保持B形挂钩五金件保持在成形孔中，该固定孔固定各种和多种类型的编织带和包括编织织带带的带状硬币。通过适当的B-钩装置将提升的领带固定在适当位置，并且所述锚固件被容纳在铁路箱或平车的墙壁或地板的口袋内。允许使用已经使用的所述B形钩的各种工业领带系带连接到成形孔锚。操作所使用的特定类型的连接带固有的适当的棘轮，以去除任何在该领带上的剩余松弛，然后在其上施加所需的张力以将该提单固定在铁路车辆上。由于运输负荷的变化，由于B型钩保持架将会避免B型钩从成形孔中无意中取出，导致系带不再将提升固定在铁路车上，因此，

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